JP2007158131A5 - - Google Patents

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Publication number
JP2007158131A5
JP2007158131A5 JP2005352726A JP2005352726A JP2007158131A5 JP 2007158131 A5 JP2007158131 A5 JP 2007158131A5 JP 2005352726 A JP2005352726 A JP 2005352726A JP 2005352726 A JP2005352726 A JP 2005352726A JP 2007158131 A5 JP2007158131 A5 JP 2007158131A5
Authority
JP
Japan
Prior art keywords
group iii
compound semiconductor
iii nitride
electrode layer
nitride compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2005352726A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007158131A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2005352726A priority Critical patent/JP2007158131A/ja
Priority claimed from JP2005352726A external-priority patent/JP2007158131A/ja
Priority to US11/633,621 priority patent/US20070138540A1/en
Publication of JP2007158131A publication Critical patent/JP2007158131A/ja
Publication of JP2007158131A5 publication Critical patent/JP2007158131A5/ja
Withdrawn legal-status Critical Current

Links

JP2005352726A 2005-06-12 2005-12-06 Iii族窒化物系化合物半導体光素子 Withdrawn JP2007158131A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2005352726A JP2007158131A (ja) 2005-12-06 2005-12-06 Iii族窒化物系化合物半導体光素子
US11/633,621 US20070138540A1 (en) 2005-06-12 2006-12-05 Group III nitride based compound semiconductor optical device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005352726A JP2007158131A (ja) 2005-12-06 2005-12-06 Iii族窒化物系化合物半導体光素子

Publications (2)

Publication Number Publication Date
JP2007158131A JP2007158131A (ja) 2007-06-21
JP2007158131A5 true JP2007158131A5 (enExample) 2009-12-24

Family

ID=38172462

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005352726A Withdrawn JP2007158131A (ja) 2005-06-12 2005-12-06 Iii族窒化物系化合物半導体光素子

Country Status (2)

Country Link
US (1) US20070138540A1 (enExample)
JP (1) JP2007158131A (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007040295A1 (en) * 2005-10-04 2007-04-12 Seoul Opto Device Co., Ltd. (al, ga, in)n-based compound semiconductor and method of fabricating the same
KR100872717B1 (ko) 2007-06-22 2008-12-05 엘지이노텍 주식회사 발광 소자 및 그 제조방법
KR101441833B1 (ko) 2010-09-30 2014-09-18 도와 일렉트로닉스 가부시키가이샤 Ⅲ족 질화물 반도체 발광소자 및 그 제조 방법
WO2012091311A2 (en) * 2010-12-28 2012-07-05 Seoul Opto Device Co., Ltd. High efficiency light emitting diode
JP2012175040A (ja) 2011-02-24 2012-09-10 Toshiba Corp 半導体発光素子及び発光装置
JP2013175761A (ja) * 2013-04-17 2013-09-05 Toshiba Corp 半導体発光素子及び発光装置
JP2023154555A (ja) * 2022-04-07 2023-10-20 株式会社デンソー 半導体装置の製造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6071795A (en) * 1998-01-23 2000-06-06 The Regents Of The University Of California Separation of thin films from transparent substrates by selective optical processing
US6936859B1 (en) * 1998-05-13 2005-08-30 Toyoda Gosei Co., Ltd. Light-emitting semiconductor device using group III nitride compound
US6222207B1 (en) * 1999-05-24 2001-04-24 Lumileds Lighting, U.S. Llc Diffusion barrier for increased mirror reflectivity in reflective solderable contacts on high power LED chip
US6608360B2 (en) * 2000-12-15 2003-08-19 University Of Houston One-chip micro-integrated optoelectronic sensor
JP3912044B2 (ja) * 2001-06-06 2007-05-09 豊田合成株式会社 Iii族窒化物系化合物半導体発光素子の製造方法
US6762069B2 (en) * 2002-11-19 2004-07-13 United Epitaxy Company, Ltd. Method for manufacturing light-emitting element on non-transparent substrate
JP2006066868A (ja) * 2004-03-23 2006-03-09 Toyoda Gosei Co Ltd 固体素子および固体素子デバイス

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