JP2007154225A5 - - Google Patents

Download PDF

Info

Publication number
JP2007154225A5
JP2007154225A5 JP2005347614A JP2005347614A JP2007154225A5 JP 2007154225 A5 JP2007154225 A5 JP 2007154225A5 JP 2005347614 A JP2005347614 A JP 2005347614A JP 2005347614 A JP2005347614 A JP 2005347614A JP 2007154225 A5 JP2007154225 A5 JP 2007154225A5
Authority
JP
Japan
Prior art keywords
vapor deposition
gas
nozzle
jet port
jet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2005347614A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007154225A (ja
JP4816034B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2005347614A priority Critical patent/JP4816034B2/ja
Priority claimed from JP2005347614A external-priority patent/JP4816034B2/ja
Publication of JP2007154225A publication Critical patent/JP2007154225A/ja
Publication of JP2007154225A5 publication Critical patent/JP2007154225A5/ja
Application granted granted Critical
Publication of JP4816034B2 publication Critical patent/JP4816034B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2005347614A 2005-12-01 2005-12-01 処理方法及び処理装置 Expired - Fee Related JP4816034B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005347614A JP4816034B2 (ja) 2005-12-01 2005-12-01 処理方法及び処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005347614A JP4816034B2 (ja) 2005-12-01 2005-12-01 処理方法及び処理装置

Publications (3)

Publication Number Publication Date
JP2007154225A JP2007154225A (ja) 2007-06-21
JP2007154225A5 true JP2007154225A5 (enExample) 2008-07-10
JP4816034B2 JP4816034B2 (ja) 2011-11-16

Family

ID=38238966

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005347614A Expired - Fee Related JP4816034B2 (ja) 2005-12-01 2005-12-01 処理方法及び処理装置

Country Status (1)

Country Link
JP (1) JP4816034B2 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20110014653A (ko) * 2008-05-19 2011-02-11 이 아이 듀폰 디 네모아 앤드 캄파니 전자 소자에서 증기 코팅 장치 및 방법
KR101441737B1 (ko) 2009-05-01 2014-09-17 카티바, 인크. 유기 증기 인쇄용 장치 및 방법

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3345079B2 (ja) * 1993-02-26 2002-11-18 株式会社半導体エネルギー研究所 大気圧放電装置
JPH07258828A (ja) * 1994-03-24 1995-10-09 Matsushita Electric Works Ltd 膜形成方法

Similar Documents

Publication Publication Date Title
JP5140382B2 (ja) 蒸気放出装置、有機薄膜蒸着装置及び有機薄膜蒸着方法
EP2396456B1 (en) Plasma source and method for removing materials from substrates utilizing pressure waves
JP2007517647A5 (enExample)
JP2010539644A (ja) 表面処理又は表面コーティング方法及び装置
JP2010530795A5 (enExample)
JP2019186565A5 (enExample)
JP2010212293A5 (enExample)
US20080047489A1 (en) Chemical vapor deposition reactor that pre-heats applied gas and substrate before reaction
JP2007154225A5 (enExample)
JP5528927B2 (ja) 基板洗浄装置および基板洗浄方法
KR101263602B1 (ko) 콘젯 모드 정전기 스프레이 장치
US7432469B2 (en) Arc spraying torch head
JP6360045B2 (ja) プラズマ処理装置
JP7461961B2 (ja) プラズマ発生装置、およびプラズマ処理方法
JP2016060157A (ja) インクジェット記録装置及び印刷方法
JP6816260B2 (ja) プラズマ発生装置
KR101275221B1 (ko) 액적 토출 장치
KR20090088056A (ko) 가스공급 유닛 및 화학기상증착 장치
JP4816034B2 (ja) 処理方法及び処理装置
JP4765845B2 (ja) ヘアーケア装置
JP2004074118A (ja) 薬液塗布装置
JPH0529092Y2 (enExample)
JP2008053367A5 (enExample)
JP2020011460A (ja) プラズマ処理インクジェット印刷装置
JP2005193388A5 (enExample)