JP2008053367A5 - - Google Patents

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Publication number
JP2008053367A5
JP2008053367A5 JP2006226819A JP2006226819A JP2008053367A5 JP 2008053367 A5 JP2008053367 A5 JP 2008053367A5 JP 2006226819 A JP2006226819 A JP 2006226819A JP 2006226819 A JP2006226819 A JP 2006226819A JP 2008053367 A5 JP2008053367 A5 JP 2008053367A5
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JP
Japan
Prior art keywords
gas
plasma
nozzles
processing apparatus
workpiece
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2006226819A
Other languages
English (en)
Japanese (ja)
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JP2008053367A (ja
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Publication date
Application filed filed Critical
Priority to JP2006226819A priority Critical patent/JP2008053367A/ja
Priority claimed from JP2006226819A external-priority patent/JP2008053367A/ja
Publication of JP2008053367A publication Critical patent/JP2008053367A/ja
Publication of JP2008053367A5 publication Critical patent/JP2008053367A5/ja
Withdrawn legal-status Critical Current

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JP2006226819A 2006-08-23 2006-08-23 プラズマ処理装置 Withdrawn JP2008053367A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006226819A JP2008053367A (ja) 2006-08-23 2006-08-23 プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006226819A JP2008053367A (ja) 2006-08-23 2006-08-23 プラズマ処理装置

Publications (2)

Publication Number Publication Date
JP2008053367A JP2008053367A (ja) 2008-03-06
JP2008053367A5 true JP2008053367A5 (enExample) 2009-08-27

Family

ID=39237148

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006226819A Withdrawn JP2008053367A (ja) 2006-08-23 2006-08-23 プラズマ処理装置

Country Status (1)

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JP (1) JP2008053367A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009246263A (ja) * 2008-03-31 2009-10-22 Shibaura Mechatronics Corp プラズマ処理装置、プラズマ処理方法、および電子デバイスの製造方法
EP2226832A1 (en) 2009-03-06 2010-09-08 FUJIFILM Manufacturing Europe B.V. Substrate plasma treatment using side tabs
JP6560071B2 (ja) * 2015-09-11 2019-08-14 株式会社日立ハイテクノロジーズ プラズマ処理装置

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