JP6255590B2 - プラズマガス生成装置 - Google Patents
プラズマガス生成装置 Download PDFInfo
- Publication number
- JP6255590B2 JP6255590B2 JP2013551734A JP2013551734A JP6255590B2 JP 6255590 B2 JP6255590 B2 JP 6255590B2 JP 2013551734 A JP2013551734 A JP 2013551734A JP 2013551734 A JP2013551734 A JP 2013551734A JP 6255590 B2 JP6255590 B2 JP 6255590B2
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- gas
- plasma gas
- antenna
- frequency
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J2219/085—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy creating magnetic fields
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0894—Processes carried out in the presence of a plasma
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/461—Microwave discharges
- H05H1/463—Microwave discharges using antennas or applicators
Description
スリット状の前記噴出口に沿って強電場を移動させることを特徴とするプラズマガス生成装置である。
《実施形態1》
−プラズマ生成装置1の動作−
−実施形態1の効果−
プラズマ生成部1は、UHF帯の高周波によりプラズマを生成させるので、低温の安定したプラズマガスPGを噴出させることができる。
《実施形態2》
《実施形態3》
《実施形態4》
《実施形態5》
《その他の実施形態》
《ミスト生成装置30への適用例》
《静電気防止装置への適用例》
4 希釈ガス供給手段
5 電磁波発生装置
8 伝送路
8a 本線
8b 支線
8c 分配器
9 アンテナ
10 プラズマ生成装置
11 アンテナ駆動手段
12 周波数変更手段
Claims (2)
- プラズマ発生用ガスとして、アルゴン、ヘリウム、ネオンの少なくとも一つが貯蔵されるプラズマ生成用ガスボンベと、
前記プラズマ生成用ガスボンベからプラズマ発生用ガスを供給し、高周波によってプラズマを生成させるプラズマ生成部と、
前記プラズマ生成部が生成した前記プラズマを希釈する希釈ガスを供給する希釈ガス供給手段と、
前記プラズマを前記希釈ガスで希釈することにより得られたプラズマガスを噴出させる噴出口とを備えたプラズマガス生成装置において、
前記噴出口から噴出されるプラズマガスに、本線と、該本線から枝分かれする複数の支線を備えたアンテナから電磁波を照射し、該アンテナから放出する電磁波の周波数を複数の所定の周波数に変更可能な周波数変更手段を有する電磁波発生装置を備え、
前記複数の支線のうち特定の支線の長さが、前記周波数変更手段により変更された所定の周波数に対応して電磁波の振幅が大きくなるような長さに設定されることを特徴とするプラズマガス生成装置。 - 請求項1において、
前記噴出口は、チューブの端部開口として形成されていることを特徴とするプラズマ生成装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011289697 | 2011-12-28 | ||
JP2011289697 | 2011-12-28 | ||
PCT/JP2012/083633 WO2013099934A1 (ja) | 2011-12-28 | 2012-12-26 | プラズマ生成装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2013099934A1 JPWO2013099934A1 (ja) | 2015-05-11 |
JP6255590B2 true JP6255590B2 (ja) | 2018-01-10 |
Family
ID=48697416
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013551734A Expired - Fee Related JP6255590B2 (ja) | 2011-12-28 | 2012-12-26 | プラズマガス生成装置 |
Country Status (4)
Country | Link |
---|---|
US (1) | US9358519B2 (ja) |
EP (1) | EP2804447A4 (ja) |
JP (1) | JP6255590B2 (ja) |
WO (1) | WO2013099934A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
MX2016013234A (es) | 2014-04-08 | 2017-05-19 | Plasma Igniter LLC | Generacion de plasma de resonador de cavidad coaxial de señal doble. |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0724238B2 (ja) * | 1985-09-19 | 1995-03-15 | 日本高周波株式会社 | 無電極高周波プラズマ反応装置 |
JPH1167114A (ja) | 1997-08-14 | 1999-03-09 | Toshiba Microelectron Corp | プラズマ生成装置およびイオン注入装置 |
JP2002008894A (ja) * | 2000-06-27 | 2002-01-11 | Matsushita Electric Works Ltd | プラズマ処理装置及びプラズマ点灯方法 |
JP3889918B2 (ja) * | 2000-08-25 | 2007-03-07 | 富士通株式会社 | プラズマエッチング方法、プラズマエッチング装置及びプラズマ処理装置 |
US6976353B2 (en) * | 2002-01-25 | 2005-12-20 | Arvin Technologies, Inc. | Apparatus and method for operating a fuel reformer to provide reformate gas to both a fuel cell and an emission abatement device |
JP4146773B2 (ja) * | 2002-08-28 | 2008-09-10 | 松下電器産業株式会社 | プラズマ処理方法及び装置 |
US7465407B2 (en) | 2002-08-28 | 2008-12-16 | Panasonic Corporation | Plasma processing method and apparatus |
JP4418227B2 (ja) | 2003-12-26 | 2010-02-17 | アリオス株式会社 | 大気圧プラズマ源 |
JP2005340079A (ja) * | 2004-05-28 | 2005-12-08 | Adtec Plasma Technology Co Ltd | マイクロ波プラズマ発生装置 |
US7806077B2 (en) * | 2004-07-30 | 2010-10-05 | Amarante Technologies, Inc. | Plasma nozzle array for providing uniform scalable microwave plasma generation |
JP4916776B2 (ja) * | 2006-05-01 | 2012-04-18 | 国立大学法人 東京大学 | 吹き出し形マイクロ波励起プラズマ処理装置 |
US7453566B2 (en) * | 2006-08-31 | 2008-11-18 | Massachusetts Institute Of Technology | Hybrid plasma element monitor |
WO2009008519A1 (ja) * | 2007-07-12 | 2009-01-15 | Imagineering, Inc. | ガス処理装置、ガス処理システム及びガス処理方法、並びにそれを用いた排気ガス処理システム及び内燃機関 |
WO2009008525A1 (ja) * | 2007-07-12 | 2009-01-15 | Imagineering, Inc. | 排ガスの物質浄化装置 |
CN102282916A (zh) * | 2009-01-13 | 2011-12-14 | 里巴贝鲁株式会社 | 等离子体生成装置及方法 |
CN102365785B (zh) * | 2009-03-27 | 2014-02-26 | 东京毅力科创株式会社 | 调谐器和微波等离子体源 |
WO2011034190A1 (ja) * | 2009-09-17 | 2011-03-24 | イマジニアリング株式会社 | プラズマ生成装置 |
WO2011034189A1 (ja) * | 2009-09-17 | 2011-03-24 | イマジニアリング株式会社 | ガス処理装置、及び内燃機関 |
-
2012
- 2012-12-26 JP JP2013551734A patent/JP6255590B2/ja not_active Expired - Fee Related
- 2012-12-26 US US14/369,036 patent/US9358519B2/en active Active
- 2012-12-26 WO PCT/JP2012/083633 patent/WO2013099934A1/ja active Application Filing
- 2012-12-26 EP EP12862609.0A patent/EP2804447A4/en not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
JPWO2013099934A1 (ja) | 2015-05-11 |
EP2804447A1 (en) | 2014-11-19 |
EP2804447A4 (en) | 2015-10-07 |
US20150010439A1 (en) | 2015-01-08 |
WO2013099934A1 (ja) | 2013-07-04 |
US9358519B2 (en) | 2016-06-07 |
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