JP4816034B2 - 処理方法及び処理装置 - Google Patents

処理方法及び処理装置 Download PDF

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Publication number
JP4816034B2
JP4816034B2 JP2005347614A JP2005347614A JP4816034B2 JP 4816034 B2 JP4816034 B2 JP 4816034B2 JP 2005347614 A JP2005347614 A JP 2005347614A JP 2005347614 A JP2005347614 A JP 2005347614A JP 4816034 B2 JP4816034 B2 JP 4816034B2
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Japan
Prior art keywords
vapor deposition
gas
nozzle
jet port
port
Prior art date
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Expired - Fee Related
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JP2005347614A
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English (en)
Japanese (ja)
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JP2007154225A (ja
JP2007154225A5 (enExample
Inventor
剛 小岩崎
智洋 奥村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Panasonic Holdings Corp
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Panasonic Corp
Matsushita Electric Industrial Co Ltd
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Priority to JP2005347614A priority Critical patent/JP4816034B2/ja
Publication of JP2007154225A publication Critical patent/JP2007154225A/ja
Publication of JP2007154225A5 publication Critical patent/JP2007154225A5/ja
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Publication of JP4816034B2 publication Critical patent/JP4816034B2/ja
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  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
JP2005347614A 2005-12-01 2005-12-01 処理方法及び処理装置 Expired - Fee Related JP4816034B2 (ja)

Priority Applications (1)

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JP2005347614A JP4816034B2 (ja) 2005-12-01 2005-12-01 処理方法及び処理装置

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JP2005347614A JP4816034B2 (ja) 2005-12-01 2005-12-01 処理方法及び処理装置

Publications (3)

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JP2007154225A JP2007154225A (ja) 2007-06-21
JP2007154225A5 JP2007154225A5 (enExample) 2008-07-10
JP4816034B2 true JP4816034B2 (ja) 2011-11-16

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ID=38238966

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JP2005347614A Expired - Fee Related JP4816034B2 (ja) 2005-12-01 2005-12-01 処理方法及び処理装置

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JP (1) JP4816034B2 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20110014653A (ko) * 2008-05-19 2011-02-11 이 아이 듀폰 디 네모아 앤드 캄파니 전자 소자에서 증기 코팅 장치 및 방법
KR101441737B1 (ko) 2009-05-01 2014-09-17 카티바, 인크. 유기 증기 인쇄용 장치 및 방법

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3345079B2 (ja) * 1993-02-26 2002-11-18 株式会社半導体エネルギー研究所 大気圧放電装置
JPH07258828A (ja) * 1994-03-24 1995-10-09 Matsushita Electric Works Ltd 膜形成方法

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JP2007154225A (ja) 2007-06-21

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