JP2007134458A5 - - Google Patents

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Publication number
JP2007134458A5
JP2007134458A5 JP2005325090A JP2005325090A JP2007134458A5 JP 2007134458 A5 JP2007134458 A5 JP 2007134458A5 JP 2005325090 A JP2005325090 A JP 2005325090A JP 2005325090 A JP2005325090 A JP 2005325090A JP 2007134458 A5 JP2007134458 A5 JP 2007134458A5
Authority
JP
Japan
Prior art keywords
pattern
forming
connection portion
wiring
semiconductor chip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2005325090A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007134458A (ja
JP4718305B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2005325090A priority Critical patent/JP4718305B2/ja
Priority claimed from JP2005325090A external-priority patent/JP4718305B2/ja
Priority to KR1020060104331A priority patent/KR101195886B1/ko
Priority to US11/594,074 priority patent/US20070111387A1/en
Priority to TW095141468A priority patent/TW200731436A/zh
Publication of JP2007134458A publication Critical patent/JP2007134458A/ja
Publication of JP2007134458A5 publication Critical patent/JP2007134458A5/ja
Application granted granted Critical
Publication of JP4718305B2 publication Critical patent/JP4718305B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2005325090A 2005-11-09 2005-11-09 配線基板の製造方法および半導体装置の製造方法 Expired - Fee Related JP4718305B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2005325090A JP4718305B2 (ja) 2005-11-09 2005-11-09 配線基板の製造方法および半導体装置の製造方法
KR1020060104331A KR101195886B1 (ko) 2005-11-09 2006-10-26 배선 기판의 제조 방법 및 반도체 장치의 제조 방법
US11/594,074 US20070111387A1 (en) 2005-11-09 2006-11-08 Manufacturing method of wiring board and manufacturing method of semiconductor device
TW095141468A TW200731436A (en) 2005-11-09 2006-11-09 Manufacturing method of wiring board and manufacturing method of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005325090A JP4718305B2 (ja) 2005-11-09 2005-11-09 配線基板の製造方法および半導体装置の製造方法

Publications (3)

Publication Number Publication Date
JP2007134458A JP2007134458A (ja) 2007-05-31
JP2007134458A5 true JP2007134458A5 (enExample) 2008-08-07
JP4718305B2 JP4718305B2 (ja) 2011-07-06

Family

ID=38041418

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005325090A Expired - Fee Related JP4718305B2 (ja) 2005-11-09 2005-11-09 配線基板の製造方法および半導体装置の製造方法

Country Status (4)

Country Link
US (1) US20070111387A1 (enExample)
JP (1) JP4718305B2 (enExample)
KR (1) KR101195886B1 (enExample)
TW (1) TW200731436A (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI434405B (zh) * 2011-06-07 2014-04-11 國立交通大學 具有積體電路與發光二極體之異質整合結構及其製作方法
US20150195912A1 (en) * 2014-01-08 2015-07-09 Zhuhai Advanced Chip Carriers & Electronic Substrate Solutions Technologies Co. Ltd. Substrates With Ultra Fine Pitch Flip Chip Bumps
US9642261B2 (en) * 2014-01-24 2017-05-02 Zhuhai Advanced Chip Carriers & Electronic Substrate Solutions Technologies Co. Ltd. Composite electronic structure with partially exposed and protruding copper termination posts
JP6502814B2 (ja) * 2015-09-25 2019-04-17 京セラ株式会社 指紋センサー用配線基板
JP2017063163A (ja) * 2015-09-25 2017-03-30 京セラ株式会社 指紋センサー用配線基板

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0245996A (ja) * 1988-08-05 1990-02-15 Nec Corp 混成集積回路の製造方法
JPH02162734A (ja) * 1988-12-16 1990-06-22 Fujitsu Ltd 半導体装置の製造方法
JPH03129831A (ja) * 1989-10-16 1991-06-03 Nec Corp 半導体装置の製造方法
JPH03139851A (ja) * 1989-10-25 1991-06-14 Aoi Denshi Kk 半導体装置
JP3003394B2 (ja) * 1992-06-24 2000-01-24 松下電器産業株式会社 突起電極の製造方法
JPH0964493A (ja) * 1995-08-29 1997-03-07 Nippon Mektron Ltd 回路基板の配線構造及びその形成法
JP3405640B2 (ja) * 1996-08-09 2003-05-12 松下電工株式会社 独立回路へのメッキ方法
JP2002009203A (ja) * 2000-06-23 2002-01-11 Dainippon Printing Co Ltd 配線形成方法と配線基板
JP4480111B2 (ja) * 2000-08-02 2010-06-16 大日本印刷株式会社 配線形成方法および配線部材
US6890829B2 (en) * 2000-10-24 2005-05-10 Intel Corporation Fabrication of on-package and on-chip structure using build-up layer process
JP2002141437A (ja) * 2000-11-06 2002-05-17 Dainippon Printing Co Ltd Cspタイプの半導体装置及びその作製方法
JP2002170845A (ja) * 2000-12-04 2002-06-14 Sumitomo Bakelite Co Ltd 半導体装置の製造方法および半導体装置
JP2002246744A (ja) * 2001-02-20 2002-08-30 Nec Corp 導体形成方法およびこれを用いた多層配線基板製造方法
US6660633B1 (en) * 2002-02-26 2003-12-09 Advanced Micro Devices, Inc. Method of reducing electromigration in a copper line by electroplating an interim copper-zinc alloy thin film on a copper surface and a semiconductor device thereby formed
DE10355953B4 (de) * 2003-11-29 2005-10-20 Infineon Technologies Ag Verfahren zum Galvanisieren und Kontaktvorsprungsanordnung
KR100597993B1 (ko) * 2004-04-08 2006-07-10 주식회사 네패스 반도체 패키지용 범프, 그 범프를 적용한 반도체 패키지 및 제조방법
JP4441328B2 (ja) * 2004-05-25 2010-03-31 株式会社ルネサステクノロジ 半導体装置及びその製造方法
US7179738B2 (en) * 2004-06-17 2007-02-20 Texas Instruments Incorporated Semiconductor assembly having substrate with electroplated contact pads

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