JP2007119294A5 - - Google Patents
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- Publication number
- JP2007119294A5 JP2007119294A5 JP2005313361A JP2005313361A JP2007119294A5 JP 2007119294 A5 JP2007119294 A5 JP 2007119294A5 JP 2005313361 A JP2005313361 A JP 2005313361A JP 2005313361 A JP2005313361 A JP 2005313361A JP 2007119294 A5 JP2007119294 A5 JP 2007119294A5
- Authority
- JP
- Japan
- Prior art keywords
- gas
- nitrogen trifluoride
- producing nitrogen
- tubular reactor
- solid product
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- QKCGXXHCELUCKW-UHFFFAOYSA-N n-[4-[4-(dinaphthalen-2-ylamino)phenyl]phenyl]-n-naphthalen-2-ylnaphthalen-2-amine Chemical compound C1=CC=CC2=CC(N(C=3C=CC(=CC=3)C=3C=CC(=CC=3)N(C=3C=C4C=CC=CC4=CC=3)C=3C=C4C=CC=CC4=CC=3)C3=CC4=CC=CC=C4C=C3)=CC=C21 QKCGXXHCELUCKW-UHFFFAOYSA-N 0.000 claims description 51
- 238000004519 manufacturing process Methods 0.000 claims description 47
- 239000007789 gas Substances 0.000 claims description 42
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 23
- 229910052731 fluorine Inorganic materials 0.000 claims description 23
- 239000011737 fluorine Substances 0.000 claims description 23
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 22
- 239000012265 solid product Substances 0.000 claims description 20
- 229910052760 oxygen Inorganic materials 0.000 claims description 17
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 12
- 150000001875 compounds Chemical class 0.000 claims description 12
- 239000001301 oxygen Substances 0.000 claims description 12
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 8
- 239000011261 inert gas Substances 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 6
- 239000000047 product Substances 0.000 claims description 5
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 claims description 4
- 229910052786 argon Inorganic materials 0.000 claims description 4
- 238000010790 dilution Methods 0.000 claims description 4
- 239000012895 dilution Substances 0.000 claims description 4
- 239000001307 helium Substances 0.000 claims description 4
- 229910052734 helium Inorganic materials 0.000 claims description 4
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 4
- 229910052757 nitrogen Inorganic materials 0.000 claims description 4
- 230000003197 catalytic effect Effects 0.000 claims description 3
- 239000003085 diluting agent Substances 0.000 claims description 3
- 229910018503 SF6 Inorganic materials 0.000 claims description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 2
- 239000007864 aqueous solution Substances 0.000 claims description 2
- KVBCYCWRDBDGBG-UHFFFAOYSA-N azane;dihydrofluoride Chemical compound [NH4+].F.[F-] KVBCYCWRDBDGBG-UHFFFAOYSA-N 0.000 claims description 2
- 238000001816 cooling Methods 0.000 claims description 2
- WMIYKQLTONQJES-UHFFFAOYSA-N hexafluoroethane Chemical compound FC(F)(F)C(F)(F)F WMIYKQLTONQJES-UHFFFAOYSA-N 0.000 claims description 2
- QYSGYZVSCZSLHT-UHFFFAOYSA-N octafluoropropane Chemical compound FC(F)(F)C(F)(F)C(F)(F)F QYSGYZVSCZSLHT-UHFFFAOYSA-N 0.000 claims description 2
- 229960004065 perflutren Drugs 0.000 claims description 2
- SFZCNBIFKDRMGX-UHFFFAOYSA-N sulfur hexafluoride Chemical compound FS(F)(F)(F)(F)F SFZCNBIFKDRMGX-UHFFFAOYSA-N 0.000 claims description 2
- 229960000909 sulfur hexafluoride Drugs 0.000 claims description 2
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 claims description 2
- 230000002378 acidificating effect Effects 0.000 claims 1
- GVGCUCJTUSOZKP-UHFFFAOYSA-N nitrogen trifluoride Chemical compound FN(F)F GVGCUCJTUSOZKP-UHFFFAOYSA-N 0.000 claims 1
- 239000007787 solid Substances 0.000 claims 1
- 238000000034 method Methods 0.000 description 2
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005313361A JP4624905B2 (ja) | 2005-10-27 | 2005-10-27 | 三フッ化窒素の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005313361A JP4624905B2 (ja) | 2005-10-27 | 2005-10-27 | 三フッ化窒素の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2007119294A JP2007119294A (ja) | 2007-05-17 |
| JP2007119294A5 true JP2007119294A5 (enExample) | 2008-12-04 |
| JP4624905B2 JP4624905B2 (ja) | 2011-02-02 |
Family
ID=38143526
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005313361A Expired - Fee Related JP4624905B2 (ja) | 2005-10-27 | 2005-10-27 | 三フッ化窒素の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4624905B2 (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102014204785A1 (de) * | 2014-03-14 | 2015-09-17 | Evonik Degussa Gmbh | Verfahren zur Herstellung von reinem Trisilylamin |
| CN113606820B (zh) * | 2021-08-27 | 2022-09-23 | 中船(邯郸)派瑞特种气体股份有限公司 | 一种直接与间接制冷相结合的三氟化氮电解气超低温冷阱装置 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0225511A (ja) * | 1988-07-12 | 1990-01-29 | Nippon Steel Corp | 廃棄タイヤによる転炉発生ガス量増加方法 |
| JPH0225512A (ja) * | 1988-07-14 | 1990-01-29 | Nkk Corp | 電気炉の底吹き用羽口 |
| JPH0225513A (ja) * | 1988-07-14 | 1990-01-29 | Nkk Corp | 環流式真空脱ガス装置の下部構造 |
| JPH05105411A (ja) * | 1991-10-22 | 1993-04-27 | Onoda Cement Co Ltd | 三フツ化窒素の製造方法 |
| JPH0986909A (ja) * | 1995-09-28 | 1997-03-31 | Mitsui Toatsu Chem Inc | 高純度三フッ化窒素ガスの製造方法 |
| JP3550074B2 (ja) * | 2000-04-07 | 2004-08-04 | 東洋炭素株式会社 | フッ素ガスまたは三フッ化窒素ガス発生用炭素電極及びそれを用いたフッ素ガスまたは三フッ化窒素ガス発生装置 |
| JP4508356B2 (ja) * | 2000-05-12 | 2010-07-21 | 昭和電工株式会社 | 三フッ化窒素の製造方法及びその用途 |
| US6908601B2 (en) * | 2002-02-08 | 2005-06-21 | The Boc Group, Inc. | Method for the production of nitrogen trifluoride |
| WO2007023968A1 (ja) * | 2005-08-26 | 2007-03-01 | Showa Denko K. K. | 三フッ化窒素の製造方法および製造装置 |
-
2005
- 2005-10-27 JP JP2005313361A patent/JP4624905B2/ja not_active Expired - Fee Related
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