JP2007099599A5 - - Google Patents
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- Publication number
- JP2007099599A5 JP2007099599A5 JP2005295497A JP2005295497A JP2007099599A5 JP 2007099599 A5 JP2007099599 A5 JP 2007099599A5 JP 2005295497 A JP2005295497 A JP 2005295497A JP 2005295497 A JP2005295497 A JP 2005295497A JP 2007099599 A5 JP2007099599 A5 JP 2007099599A5
- Authority
- JP
- Japan
- Prior art keywords
- gas
- nitrogen trifluoride
- producing nitrogen
- tubular reactor
- fluorine gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007789 gas Substances 0.000 claims description 44
- QKCGXXHCELUCKW-UHFFFAOYSA-N n-[4-[4-(dinaphthalen-2-ylamino)phenyl]phenyl]-n-naphthalen-2-ylnaphthalen-2-amine Chemical compound C1=CC=CC2=CC(N(C=3C=CC(=CC=3)C=3C=CC(=CC=3)N(C=3C=C4C=CC=CC4=CC=3)C=3C=C4C=CC=CC4=CC=3)C3=CC4=CC=CC=C4C=C3)=CC=C21 QKCGXXHCELUCKW-UHFFFAOYSA-N 0.000 claims description 36
- 238000004519 manufacturing process Methods 0.000 claims description 33
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 24
- 229910052731 fluorine Inorganic materials 0.000 claims description 24
- 239000011737 fluorine Substances 0.000 claims description 24
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 22
- 229910052760 oxygen Inorganic materials 0.000 claims description 16
- 239000012265 solid product Substances 0.000 claims description 13
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 12
- 150000001875 compounds Chemical class 0.000 claims description 12
- 239000001301 oxygen Substances 0.000 claims description 12
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 8
- 239000000047 product Substances 0.000 claims description 6
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 claims description 5
- 239000003085 diluting agent Substances 0.000 claims description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 4
- 230000003197 catalytic effect Effects 0.000 claims description 4
- 229910052757 nitrogen Inorganic materials 0.000 claims description 4
- KVBCYCWRDBDGBG-UHFFFAOYSA-N azane;dihydrofluoride Chemical compound [NH4+].F.[F-] KVBCYCWRDBDGBG-UHFFFAOYSA-N 0.000 claims description 3
- 238000010790 dilution Methods 0.000 claims description 3
- 239000012895 dilution Substances 0.000 claims description 3
- 229910018503 SF6 Inorganic materials 0.000 claims description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 2
- 239000007864 aqueous solution Substances 0.000 claims description 2
- 229910052786 argon Inorganic materials 0.000 claims description 2
- 238000001816 cooling Methods 0.000 claims description 2
- 238000007599 discharging Methods 0.000 claims description 2
- 239000001307 helium Substances 0.000 claims description 2
- 229910052734 helium Inorganic materials 0.000 claims description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 2
- WMIYKQLTONQJES-UHFFFAOYSA-N hexafluoroethane Chemical compound FC(F)(F)C(F)(F)F WMIYKQLTONQJES-UHFFFAOYSA-N 0.000 claims description 2
- QYSGYZVSCZSLHT-UHFFFAOYSA-N octafluoropropane Chemical compound FC(F)(F)C(F)(F)C(F)(F)F QYSGYZVSCZSLHT-UHFFFAOYSA-N 0.000 claims description 2
- 229960004065 perflutren Drugs 0.000 claims description 2
- 239000007787 solid Substances 0.000 claims description 2
- SFZCNBIFKDRMGX-UHFFFAOYSA-N sulfur hexafluoride Chemical compound FS(F)(F)(F)(F)F SFZCNBIFKDRMGX-UHFFFAOYSA-N 0.000 claims description 2
- 229960000909 sulfur hexafluoride Drugs 0.000 claims description 2
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 claims description 2
- 238000000034 method Methods 0.000 claims 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims 1
- GVGCUCJTUSOZKP-UHFFFAOYSA-N nitrogen trifluoride Chemical compound FN(F)F GVGCUCJTUSOZKP-UHFFFAOYSA-N 0.000 claims 1
- 230000002378 acidificating effect Effects 0.000 description 1
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005295497A JP2007099599A (ja) | 2005-10-07 | 2005-10-07 | 三フッ化窒素の製造方法および製造装置 |
| PCT/JP2006/316778 WO2007023968A1 (ja) | 2005-08-26 | 2006-08-25 | 三フッ化窒素の製造方法および製造装置 |
| TW095131376A TW200722370A (en) | 2005-08-26 | 2006-08-25 | Method and apparatus for producing nitrogen trifluoride |
| KR1020087007173A KR100975490B1 (ko) | 2005-08-26 | 2006-08-25 | 삼불화질소의 제조 방법 및 제조 장치 |
| US12/064,927 US7820127B2 (en) | 2005-08-26 | 2006-08-25 | Method and apparatus for producing nitrogen trifluoride |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005295497A JP2007099599A (ja) | 2005-10-07 | 2005-10-07 | 三フッ化窒素の製造方法および製造装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2007099599A JP2007099599A (ja) | 2007-04-19 |
| JP2007099599A5 true JP2007099599A5 (enExample) | 2008-11-20 |
Family
ID=38026892
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005295497A Pending JP2007099599A (ja) | 2005-08-26 | 2005-10-07 | 三フッ化窒素の製造方法および製造装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2007099599A (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114572944B (zh) * | 2021-12-23 | 2024-09-17 | 西安近代化学研究所 | 一种三氟化氮及三氟化氮混合气体的制备方法 |
| CN117463096B (zh) * | 2023-06-12 | 2025-02-14 | 福建德尔科技股份有限公司 | 高纯三氟化氮制备系统 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05105411A (ja) * | 1991-10-22 | 1993-04-27 | Onoda Cement Co Ltd | 三フツ化窒素の製造方法 |
| JP3390116B2 (ja) * | 1996-03-28 | 2003-03-24 | 東洋エンジニアリング株式会社 | 分離器内部の付着防止方法 |
| JP4508356B2 (ja) * | 2000-05-12 | 2010-07-21 | 昭和電工株式会社 | 三フッ化窒素の製造方法及びその用途 |
-
2005
- 2005-10-07 JP JP2005295497A patent/JP2007099599A/ja active Pending
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