JP2007099599A - 三フッ化窒素の製造方法および製造装置 - Google Patents
三フッ化窒素の製造方法および製造装置 Download PDFInfo
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- JP2007099599A JP2007099599A JP2005295497A JP2005295497A JP2007099599A JP 2007099599 A JP2007099599 A JP 2007099599A JP 2005295497 A JP2005295497 A JP 2005295497A JP 2005295497 A JP2005295497 A JP 2005295497A JP 2007099599 A JP2007099599 A JP 2007099599A
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- JP
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- Prior art keywords
- gas
- nitrogen trifluoride
- reactor
- producing nitrogen
- fluorine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- QKCGXXHCELUCKW-UHFFFAOYSA-N n-[4-[4-(dinaphthalen-2-ylamino)phenyl]phenyl]-n-naphthalen-2-ylnaphthalen-2-amine Chemical compound C1=CC=CC2=CC(N(C=3C=CC(=CC=3)C=3C=CC(=CC=3)N(C=3C=C4C=CC=CC4=CC=3)C=3C=C4C=CC=CC4=CC=3)C3=CC4=CC=CC=C4C=C3)=CC=C21 QKCGXXHCELUCKW-UHFFFAOYSA-N 0.000 title claims abstract description 57
- 238000000034 method Methods 0.000 title claims abstract description 43
- 239000007789 gas Substances 0.000 claims abstract description 225
- 238000004519 manufacturing process Methods 0.000 claims abstract description 55
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 46
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims abstract description 45
- 239000011737 fluorine Substances 0.000 claims abstract description 45
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims abstract description 43
- 239000012265 solid product Substances 0.000 claims abstract description 34
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 claims abstract description 15
- 239000000047 product Substances 0.000 claims abstract description 14
- 229910052760 oxygen Inorganic materials 0.000 claims description 49
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 41
- 239000001301 oxygen Substances 0.000 claims description 41
- 238000006243 chemical reaction Methods 0.000 claims description 37
- 150000001875 compounds Chemical class 0.000 claims description 31
- 239000007787 solid Substances 0.000 claims description 25
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 22
- 239000003085 diluting agent Substances 0.000 claims description 16
- 238000001816 cooling Methods 0.000 claims description 14
- 238000010790 dilution Methods 0.000 claims description 13
- 239000012895 dilution Substances 0.000 claims description 13
- 229910052757 nitrogen Inorganic materials 0.000 claims description 13
- 230000003197 catalytic effect Effects 0.000 claims description 8
- 229910018503 SF6 Inorganic materials 0.000 claims description 7
- KVBCYCWRDBDGBG-UHFFFAOYSA-N azane;dihydrofluoride Chemical compound [NH4+].F.[F-] KVBCYCWRDBDGBG-UHFFFAOYSA-N 0.000 claims description 7
- 238000007599 discharging Methods 0.000 claims description 7
- SFZCNBIFKDRMGX-UHFFFAOYSA-N sulfur hexafluoride Chemical compound FS(F)(F)(F)(F)F SFZCNBIFKDRMGX-UHFFFAOYSA-N 0.000 claims description 7
- 229960000909 sulfur hexafluoride Drugs 0.000 claims description 7
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 claims description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 6
- 239000007864 aqueous solution Substances 0.000 claims description 6
- 238000003860 storage Methods 0.000 claims description 6
- WMIYKQLTONQJES-UHFFFAOYSA-N hexafluoroethane Chemical compound FC(F)(F)C(F)(F)F WMIYKQLTONQJES-UHFFFAOYSA-N 0.000 claims description 4
- QYSGYZVSCZSLHT-UHFFFAOYSA-N octafluoropropane Chemical compound FC(F)(F)C(F)(F)C(F)(F)F QYSGYZVSCZSLHT-UHFFFAOYSA-N 0.000 claims description 4
- 229960004065 perflutren Drugs 0.000 claims description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 3
- 229910052786 argon Inorganic materials 0.000 claims description 3
- 229910052734 helium Inorganic materials 0.000 claims description 3
- 239000001307 helium Substances 0.000 claims description 3
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims description 2
- GVGCUCJTUSOZKP-UHFFFAOYSA-N nitrogen trifluoride Chemical compound FN(F)F GVGCUCJTUSOZKP-UHFFFAOYSA-N 0.000 claims 1
- 238000003682 fluorination reaction Methods 0.000 abstract description 6
- 230000002378 acidificating effect Effects 0.000 abstract description 4
- 229910021529 ammonia Inorganic materials 0.000 abstract description 3
- 239000003054 catalyst Substances 0.000 abstract description 3
- 238000007865 diluting Methods 0.000 abstract 1
- 238000004817 gas chromatography Methods 0.000 description 15
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 14
- 239000002994 raw material Substances 0.000 description 12
- 238000000926 separation method Methods 0.000 description 11
- 238000002360 preparation method Methods 0.000 description 10
- 239000012535 impurity Substances 0.000 description 9
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 7
- 239000006227 byproduct Substances 0.000 description 7
- 239000001257 hydrogen Substances 0.000 description 7
- 229910052739 hydrogen Inorganic materials 0.000 description 7
- 230000007423 decrease Effects 0.000 description 6
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 6
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 6
- 238000000746 purification Methods 0.000 description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 5
- 238000009835 boiling Methods 0.000 description 5
- 238000004821 distillation Methods 0.000 description 4
- 238000005868 electrolysis reaction Methods 0.000 description 4
- 238000004880 explosion Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 239000003507 refrigerant Substances 0.000 description 4
- 238000007086 side reaction Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 229910017855 NH 4 F Inorganic materials 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 238000007664 blowing Methods 0.000 description 3
- 238000002485 combustion reaction Methods 0.000 description 3
- 239000002808 molecular sieve Substances 0.000 description 3
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 238000009776 industrial production Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000011084 recovery Methods 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000005292 vacuum distillation Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- -1 and at the same time Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
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Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005295497A JP2007099599A (ja) | 2005-10-07 | 2005-10-07 | 三フッ化窒素の製造方法および製造装置 |
| PCT/JP2006/316778 WO2007023968A1 (ja) | 2005-08-26 | 2006-08-25 | 三フッ化窒素の製造方法および製造装置 |
| TW095131376A TW200722370A (en) | 2005-08-26 | 2006-08-25 | Method and apparatus for producing nitrogen trifluoride |
| KR1020087007173A KR100975490B1 (ko) | 2005-08-26 | 2006-08-25 | 삼불화질소의 제조 방법 및 제조 장치 |
| US12/064,927 US7820127B2 (en) | 2005-08-26 | 2006-08-25 | Method and apparatus for producing nitrogen trifluoride |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005295497A JP2007099599A (ja) | 2005-10-07 | 2005-10-07 | 三フッ化窒素の製造方法および製造装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2007099599A true JP2007099599A (ja) | 2007-04-19 |
| JP2007099599A5 JP2007099599A5 (enExample) | 2008-11-20 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005295497A Pending JP2007099599A (ja) | 2005-08-26 | 2005-10-07 | 三フッ化窒素の製造方法および製造装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2007099599A (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114572944A (zh) * | 2021-12-23 | 2022-06-03 | 西安近代化学研究所 | 一种三氟化氮及三氟化氮混合气体的制备方法 |
| CN116407913A (zh) * | 2023-06-12 | 2023-07-11 | 福建德尔科技股份有限公司 | 用于三氟化氮制备的汽水分离装置及制备系统 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05105411A (ja) * | 1991-10-22 | 1993-04-27 | Onoda Cement Co Ltd | 三フツ化窒素の製造方法 |
| JPH09255650A (ja) * | 1996-03-28 | 1997-09-30 | Toyo Eng Corp | 分離器内部の付着防止方法 |
| JP2001322806A (ja) * | 2000-05-12 | 2001-11-20 | Showa Denko Kk | 三フッ化窒素の製造方法及びその用途 |
-
2005
- 2005-10-07 JP JP2005295497A patent/JP2007099599A/ja active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05105411A (ja) * | 1991-10-22 | 1993-04-27 | Onoda Cement Co Ltd | 三フツ化窒素の製造方法 |
| JPH09255650A (ja) * | 1996-03-28 | 1997-09-30 | Toyo Eng Corp | 分離器内部の付着防止方法 |
| JP2001322806A (ja) * | 2000-05-12 | 2001-11-20 | Showa Denko Kk | 三フッ化窒素の製造方法及びその用途 |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114572944A (zh) * | 2021-12-23 | 2022-06-03 | 西安近代化学研究所 | 一种三氟化氮及三氟化氮混合气体的制备方法 |
| CN116407913A (zh) * | 2023-06-12 | 2023-07-11 | 福建德尔科技股份有限公司 | 用于三氟化氮制备的汽水分离装置及制备系统 |
| CN116407913B (zh) * | 2023-06-12 | 2023-08-29 | 福建德尔科技股份有限公司 | 用于三氟化氮制备的汽水分离装置及制备系统 |
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