JP2007019258A - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP2007019258A JP2007019258A JP2005198967A JP2005198967A JP2007019258A JP 2007019258 A JP2007019258 A JP 2007019258A JP 2005198967 A JP2005198967 A JP 2005198967A JP 2005198967 A JP2005198967 A JP 2005198967A JP 2007019258 A JP2007019258 A JP 2007019258A
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- H01L21/76802—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics
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- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/528—Geometry or layout of the interconnection structure
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- H01L23/532—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body characterised by the materials
- H01L23/53204—Conductive materials
- H01L23/53209—Conductive materials based on metals, e.g. alloys, metal silicides
- H01L23/53228—Conductive materials based on metals, e.g. alloys, metal silicides the principal metal being copper
- H01L23/53238—Additional layers associated with copper layers, e.g. adhesion, barrier, cladding layers
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- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/532—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body characterised by the materials
- H01L23/5329—Insulating materials
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- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
- H01L21/76802—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics
- H01L21/76807—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics for dual damascene structures
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- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
- H01L21/76829—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing characterised by the formation of thin functional dielectric layers, e.g. dielectric etch-stop, barrier, capping or liner layers
- H01L21/76832—Multiple layers
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Abstract
【解決手段】半導体基板1上に複数層の層間絶縁膜7が積層形成されている。これら複数層の層間絶縁膜7の少なくとも1層の層間絶縁膜7内に第1の導電体14が設けられている。この第1の導電体14が設けられている層間絶縁膜7内において、第1の導電体14の下面に接続されて、かつ、第1の導電体14の下方に向けて延ばされて、複数本の第2の導電体15が設けられている。それら各第2の導電体15は、第1の導電体14の下方において、第1の方向およびこの第1の方向と略直交する第2の方向のそれぞれの方向に沿って、複数本ずつ互いに離間されて延ばされて格子形状をなして設けられている。
【選択図】 図12
Description
先ず、本発明に係る第1実施形態を図1〜図14を参照しつつ説明する。図14は、本実施形態に係る半導体装置の一実施例を示す平面図であり、図1〜図13は、本実施形態に係る半導体装置の製造工程を示している。
次に、本発明に係る第2実施形態を図15〜図17を参照しつつ説明する。図15は、本実施形態に対する比較例としての半導体装置を示す断面図である。図16は、本実施形態に係る半導体装置を示す断面図である。図17は、本実施形態に係る半導体装置および第2実施形態に対する比較例としての半導体装置を比較して示す平面図である。なお、第1実施形態と同一部分には同一符号を付して、その詳しい説明を省略する。
次に、本発明に係る第3実施形態を図18および図19を参照しつつ説明する。図18は、本実施形態に係る半導体装置を示す断面図である。図19は、本実施形態に係る半導体装置を示す平面図である。なお、前述した第1および第2の各実施形態と同一部分には同一符号を付して、その詳しい説明を省略する。
次に、本発明に係る第4実施形態を図20を参照しつつ説明する。図20は、本実施形態に係る半導体装置を示す断面図である。なお、前述した第1〜第3の各実施形態と同一部分には同一符号を付して、その詳しい説明を省略する。
次に、本発明に係る第5実施形態を図21および図22を参照しつつ説明する。図21は、本実施形態に係る半導体装置を示す断面図である。図22は、図21中破断線D−D’に沿って示す断面図である。なお、前述した第1〜第4の各実施形態と同一部分には同一符号を付して、その詳しい説明を省略する。
Claims (5)
- 基板上に積層形成された複数層の層間絶縁膜と、
これら複数層の層間絶縁膜の少なくとも1層の層間絶縁膜内に設けられた第1の導電体と、
この第1の導電体が設けられている前記層間絶縁膜内で前記第1の導電体の下面に接続されて、かつ、前記第1の導電体の下方に向けて延ばされて設けられているとともに、第1の方向およびこの第1の方向と略直交する第2の方向のそれぞれの方向に沿って複数本ずつ互いに離間されて延ばされて格子形状をなす第2の導電体と、
を具備することを特徴とする半導体装置。 - 前記第1の導電体が設けられている前記層間絶縁膜の下層の層間絶縁膜内で前記第1の導電体とその下方で少なくとも一部が重なる位置に設けられた前記第1の導電体とは電気的に非接続の下層導電体をさらに具備し、前記第2の導電体は、前記下層導電体の上方を除く位置に、前記第1の導電体が設けられている前記層間絶縁膜をその膜厚方向に貫通して形成されていることを特徴とする請求項1に記載の半導体装置。
- 基板上に積層形成された複数層の層間絶縁膜と、
これら複数層の層間絶縁膜の少なくとも1層の層間絶縁膜内に通電経路の一部として設けられた下層導電体と、
この下層導電体および前記下層導電体が設けられている前記層間絶縁膜とその上方で実質的に重なる位置に、前記下層導電体が設けられている前記層間絶縁膜の上層の層間絶縁膜をその膜厚方向に貫通して形成されているとともに、前記下層導電体に電気的に接続されて前記通電経路の一部となる第1の導電体と、
を具備することを特徴とする半導体装置。 - 基板上に積層形成された複数層の層間絶縁膜と、
これら複数層の層間絶縁膜の少なくとも1層の層間絶縁膜内に設けられた下層導電体と、
この下層導電体が設けられている前記層間絶縁膜の上層の層間絶縁膜内で前記下層導電体とその上方で少なくとも一部が重なる位置に設けられ、前記下層導電体の上方を除く少なくとも一部分が前記下層導電体の上方より小さい線幅で、かつ、前記上層の層間絶縁膜をその膜厚方向に貫通して形成されている、前記下層導電体とは電気的に非接続の第1の導電体と、
を具備することを特徴とする半導体装置。 - 基板上に積層形成された複数層の層間絶縁膜と、
これら複数層の層間絶縁膜の少なくとも1層の層間絶縁膜内に設けられた下層導電体と、
この下層導電体とその上方で重なる位置を挟んで、前記下層導電体が設けられている前記層間絶縁膜の上層の層間絶縁膜をその膜厚方向に貫通して形成された第1および第2の通電部分を有し、これら第1および第2の通電部分が電気的に接続されて通電経路の一部を形成する、前記下層導電体とは電気的に非接続の第1の導電体と、
前記下層導電体とその上方で重なる位置に、前記第1の導電体の前記第1および第2の通電部分が設けられている前記層間絶縁膜のさらに上層の層間絶縁膜をその膜厚方向に貫通して形成されているとともに、前記第1の導電体の前記第1および第2の通電部分に電気的に接続されて前記通電経路の一部となる上層導電体と、
を具備することを特徴とする半導体装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005198967A JP4550678B2 (ja) | 2005-07-07 | 2005-07-07 | 半導体装置 |
US11/244,140 US7285859B2 (en) | 2005-07-07 | 2005-10-06 | Semiconductor device |
TW095114177A TWI305374B (en) | 2005-07-07 | 2006-04-20 | Semiconductor device |
CNB200610101719XA CN100463163C (zh) | 2005-07-07 | 2006-07-07 | 半导体器件 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005198967A JP4550678B2 (ja) | 2005-07-07 | 2005-07-07 | 半導体装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007019258A true JP2007019258A (ja) | 2007-01-25 |
JP4550678B2 JP4550678B2 (ja) | 2010-09-22 |
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Application Number | Title | Priority Date | Filing Date |
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JP2005198967A Expired - Fee Related JP4550678B2 (ja) | 2005-07-07 | 2005-07-07 | 半導体装置 |
Country Status (4)
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US (1) | US7285859B2 (ja) |
JP (1) | JP4550678B2 (ja) |
CN (1) | CN100463163C (ja) |
TW (1) | TWI305374B (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010153677A (ja) * | 2008-12-26 | 2010-07-08 | Consortium For Advanced Semiconductor Materials & Related Technologies | 半導体装置、及び半導体装置の製造方法 |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7456479B2 (en) * | 2005-12-15 | 2008-11-25 | United Microelectronics Corp. | Method for fabricating a probing pad of an integrated circuit chip |
JP2007213269A (ja) * | 2006-02-08 | 2007-08-23 | Toshiba Corp | 応力解析方法、配線構造設計方法、プログラム及び半導体装置の製造方法 |
US7767570B2 (en) * | 2006-03-22 | 2010-08-03 | Taiwan Semiconductor Manufacturing Company, Ltd. | Dummy vias for damascene process |
JP2008166422A (ja) * | 2006-12-27 | 2008-07-17 | Toshiba Corp | 半導体装置 |
JP2009021528A (ja) * | 2007-07-13 | 2009-01-29 | Toshiba Corp | 半導体装置 |
WO2019066792A1 (en) * | 2017-09-27 | 2019-04-04 | Intel Corporation | INTEGRATED CIRCUIT COMPONENTS WITH FACIAL STRUCTURES |
KR102029099B1 (ko) * | 2018-02-05 | 2019-10-07 | 삼성전자주식회사 | 반도체 패키지 |
EP3671821A1 (en) * | 2018-12-19 | 2020-06-24 | IMEC vzw | Interconnection system of an integrated circuit |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10199925A (ja) * | 1997-01-06 | 1998-07-31 | Sony Corp | 半導体装置及びその製造方法 |
JP2002170881A (ja) * | 2000-11-30 | 2002-06-14 | Sanyo Electric Co Ltd | 半導体装置及びその製造方法 |
JP2003100864A (ja) * | 2001-07-09 | 2003-04-04 | Texas Instruments Inc | 二重ダマシーン構造体を形成する方法 |
JP2004095916A (ja) * | 2002-08-30 | 2004-03-25 | Fujitsu Ltd | 半導体装置及びその製造方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW444252B (en) * | 1999-03-19 | 2001-07-01 | Toshiba Corp | Semiconductor apparatus and its fabricating method |
JP2001267323A (ja) * | 2000-03-21 | 2001-09-28 | Matsushita Electric Ind Co Ltd | 半導体装置及びその製造方法 |
US6559543B1 (en) * | 2001-11-16 | 2003-05-06 | International Business Machines Corporation | Stacked fill structures for support of dielectric layers |
JP3615205B2 (ja) * | 2002-07-01 | 2005-02-02 | 株式会社東芝 | 半導体装置及び半導体装置の製造方法 |
TWI233145B (en) | 2002-09-03 | 2005-05-21 | Toshiba Corp | Semiconductor device |
JP4005958B2 (ja) | 2002-09-03 | 2007-11-14 | 株式会社東芝 | 半導体装置 |
JP4619705B2 (ja) | 2004-01-15 | 2011-01-26 | 株式会社東芝 | 半導体装置 |
-
2005
- 2005-07-07 JP JP2005198967A patent/JP4550678B2/ja not_active Expired - Fee Related
- 2005-10-06 US US11/244,140 patent/US7285859B2/en not_active Expired - Fee Related
-
2006
- 2006-04-20 TW TW095114177A patent/TWI305374B/zh not_active IP Right Cessation
- 2006-07-07 CN CNB200610101719XA patent/CN100463163C/zh not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10199925A (ja) * | 1997-01-06 | 1998-07-31 | Sony Corp | 半導体装置及びその製造方法 |
JP2002170881A (ja) * | 2000-11-30 | 2002-06-14 | Sanyo Electric Co Ltd | 半導体装置及びその製造方法 |
JP2003100864A (ja) * | 2001-07-09 | 2003-04-04 | Texas Instruments Inc | 二重ダマシーン構造体を形成する方法 |
JP2004095916A (ja) * | 2002-08-30 | 2004-03-25 | Fujitsu Ltd | 半導体装置及びその製造方法 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010153677A (ja) * | 2008-12-26 | 2010-07-08 | Consortium For Advanced Semiconductor Materials & Related Technologies | 半導体装置、及び半導体装置の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
TWI305374B (en) | 2009-01-11 |
US7285859B2 (en) | 2007-10-23 |
US20070007618A1 (en) | 2007-01-11 |
CN100463163C (zh) | 2009-02-18 |
JP4550678B2 (ja) | 2010-09-22 |
CN1893059A (zh) | 2007-01-10 |
TW200705539A (en) | 2007-02-01 |
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