JP2007002310A - 金の回収方法および装置 - Google Patents
金の回収方法および装置 Download PDFInfo
- Publication number
- JP2007002310A JP2007002310A JP2005184904A JP2005184904A JP2007002310A JP 2007002310 A JP2007002310 A JP 2007002310A JP 2005184904 A JP2005184904 A JP 2005184904A JP 2005184904 A JP2005184904 A JP 2005184904A JP 2007002310 A JP2007002310 A JP 2007002310A
- Authority
- JP
- Japan
- Prior art keywords
- gold
- waste liquid
- aqueous waste
- cathode
- deposited
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010931 gold Substances 0.000 title claims abstract description 231
- 229910052737 gold Inorganic materials 0.000 title claims abstract description 231
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 title claims abstract description 230
- 238000000034 method Methods 0.000 title claims abstract description 34
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims abstract description 30
- 229910052717 sulfur Inorganic materials 0.000 claims abstract description 30
- 239000011593 sulfur Substances 0.000 claims abstract description 30
- 150000002344 gold compounds Chemical class 0.000 claims abstract description 28
- 239000007788 liquid Substances 0.000 claims description 131
- 239000002699 waste material Substances 0.000 claims description 119
- 238000011084 recovery Methods 0.000 claims description 60
- 150000008044 alkali metal hydroxides Chemical class 0.000 claims description 6
- 238000007790 scraping Methods 0.000 claims description 5
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 239000002351 wastewater Substances 0.000 abstract 4
- 238000000354 decomposition reaction Methods 0.000 abstract 1
- 238000005868 electrolysis reaction Methods 0.000 description 38
- 210000004027 cell Anatomy 0.000 description 30
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 27
- 238000007747 plating Methods 0.000 description 23
- 239000000243 solution Substances 0.000 description 16
- 239000002585 base Substances 0.000 description 14
- 238000000151 deposition Methods 0.000 description 13
- 239000002994 raw material Substances 0.000 description 13
- 230000008021 deposition Effects 0.000 description 11
- -1 gold thiosulfate compound Chemical class 0.000 description 11
- 239000003638 chemical reducing agent Substances 0.000 description 10
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 8
- 238000006722 reduction reaction Methods 0.000 description 7
- 238000001556 precipitation Methods 0.000 description 5
- 230000003014 reinforcing effect Effects 0.000 description 5
- 229910021529 ammonia Inorganic materials 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- 239000004743 Polypropylene Substances 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229920001155 polypropylene Polymers 0.000 description 3
- 230000002269 spontaneous effect Effects 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 2
- 229920006362 Teflon® Polymers 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- ADPOBOOHCUVXGO-UHFFFAOYSA-H dioxido-oxo-sulfanylidene-$l^{6}-sulfane;gold(3+) Chemical class [Au+3].[Au+3].[O-]S([O-])(=O)=S.[O-]S([O-])(=O)=S.[O-]S([O-])(=O)=S ADPOBOOHCUVXGO-UHFFFAOYSA-H 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000003637 basic solution Substances 0.000 description 1
- 210000002421 cell wall Anatomy 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- FDWREHZXQUYJFJ-UHFFFAOYSA-M gold monochloride Chemical compound [Cl-].[Au+] FDWREHZXQUYJFJ-UHFFFAOYSA-M 0.000 description 1
- MXZVHYUSLJAVOE-UHFFFAOYSA-N gold(3+);tricyanide Chemical compound [Au+3].N#[C-].N#[C-].N#[C-] MXZVHYUSLJAVOE-UHFFFAOYSA-N 0.000 description 1
- SRCZENKQCOSNAI-UHFFFAOYSA-H gold(3+);trisulfite Chemical class [Au+3].[Au+3].[O-]S([O-])=O.[O-]S([O-])=O.[O-]S([O-])=O SRCZENKQCOSNAI-UHFFFAOYSA-H 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000012279 sodium borohydride Substances 0.000 description 1
- 229910000033 sodium borohydride Inorganic materials 0.000 description 1
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
- C25C1/20—Electrolytic production, recovery or refining of metals by electrolysis of solutions of noble metals
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
- C25C7/02—Electrodes; Connections thereof
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
- C25C7/06—Operating or servicing
- C25C7/08—Separating of deposited metals from the cathode
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrolytic Production Of Metals (AREA)
- Manufacture And Refinement Of Metals (AREA)
Abstract
【解決手段】 水溶性硫黄含有金化合物を含む水性廃液から金を回収するにあたり、前記水性廃液を強塩基性に調整した後、該水性廃液を電気分解することにより陰極表面に析出する金の全部または一部を下方へ落下させて回収する。
【選択図】 図1
Description
水溶性硫黄含有金化合物を含む水性廃液(以下、原料廃液という)の安定性について調べた。原料廃液は、水溶性硫黄含有化合物として亜硫酸金化合物を含むメッキ廃液を用いた(金の量は15.5g/L)。前記原料廃液30mLをガラス製の容器に入れ、これに下記表1に示した添加物を濃度が4.8質量%となるように添加し、撹拌した後、48時間静置した。
上記実験例1で用いた原料廃液100mLに、濃度が4.8質量%となるようにNaOHを添加した液を電気分解し、金を回収した。なお、液のpHは13.3であった。
上記実験例1で用いた原料廃液100mLに、下記表2に示す濃度となるようにNaOHを添加した液を調製し、この液を電解液として用い、電気分解して金を回収した。金の回収には前記図1に示した回収装置を用い、回収条件は上記実験例2と同じ条件とした。
上記実験例1で用いた原料廃液160Lに、濃度が1.92質量%となるようにNaOHを添加した液を電気分解し、金を回収した。なお、液のpHは12.5であった。
上記実験例4において、陰極表面に析出した金を掻き落とす機構としてスクレーパーを備えた回収装置を用い、上記実験例4と同じ条件で電気分解して金を回収した。
上記実験例4において、NaOHの濃度を1.92質量%とする代わりに、KOHの濃度を1.92質量%とする以外は、上記実験例4と同じ条件で電気分解して金を回収した。なお、液のpHは12.0であった。
上記実験例4において、NaOHの濃度を0.24質量%とする以外は、上記実験例4と同じ条件で電気分解して金を回収した。なお、液のpHは10.5であった。
上記実験例4において、原料廃液にNaOHを添加せず、また電流密度を0.033A/cm2に変更する以外は、上記実験例4と同じ条件で電気分解して金を回収した。なお、液のpHは7.0であった。
2 受け部
3 電極
4 取り出し口
5 水性廃液の供給口
6 水性廃液の排出口
7 循環用水性廃液供給口
8 循環用水性廃液排出口
9 オーバーフローした水性廃液の排出口
11 テーパ
12 スクレーパー
21 金
31 貯留槽(ストックタンク)
32 金回収装置
33 バッファータンク
34 塩基貯留槽
41〜44 ポンプ
51〜57 経路
Claims (6)
- 水溶性硫黄含有金化合物を含む水性廃液から金を回収するにあたり、前記水性廃液を強塩基性に調整した後、該水性廃液を電気分解することにより陰極表面に析出する金の全部または一部を下方へ落下させて回収することを特徴とする金の回収方法。
- 前記水性廃液を強塩基性に調整するにあたりアルカリ金属の水酸化物を使用する請求項1に記載の回収方法。
- 請求項1または2に記載の方法で金を回収するための装置であって、水性廃液を強塩基性に調整する調整手段、電解槽、該電解槽内に設けられた少なくとも1対の陽極と陰極、および前記陰極の下方に陰極表面から剥がれ落ちた金を回収するための受け部を有すると共に、前記受け部には堆積した金を前記電解槽の外へ取り出すための取り出し口を備えており、且つ前記電解槽の下方は、前記受け部に向かって下り勾配の傾斜面で構成されていることを特徴とする金の回収装置。
- 前記受け部の底面は、前記取り出し口に向かって下り勾配に形成されている請求項3に記載の回収装置。
- 前記受け部は、金を回収するための受け器を備え、該受け器は前記回収装置に対し出し入れ可能に構成されている請求項3に記載の回収装置。
- 前記陰極表面に析出した金を掻き落とす機構を備えている請求項3〜5のいずれかに記載の回収装置。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005184904A JP4699105B2 (ja) | 2005-06-24 | 2005-06-24 | 金の回収方法および装置 |
KR1020050062104A KR100733838B1 (ko) | 2005-06-24 | 2005-07-11 | 비시안계 수성 폐액으로부터의 금 회수 방법 및 장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005184904A JP4699105B2 (ja) | 2005-06-24 | 2005-06-24 | 金の回収方法および装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007002310A true JP2007002310A (ja) | 2007-01-11 |
JP4699105B2 JP4699105B2 (ja) | 2011-06-08 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005184904A Active JP4699105B2 (ja) | 2005-06-24 | 2005-06-24 | 金の回収方法および装置 |
Country Status (2)
Country | Link |
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JP (1) | JP4699105B2 (ja) |
KR (1) | KR100733838B1 (ja) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100876682B1 (ko) | 2008-06-24 | 2009-01-07 | 한국지질자원연구원 | 귀금속 용해장치 |
JP2010222603A (ja) * | 2009-03-19 | 2010-10-07 | Furukawa Electric Co Ltd:The | 銅微粒子分散液の製造方法 |
JP2013504691A (ja) * | 2009-09-14 | 2013-02-07 | スク,サンヨプ | 接触比表面積を増大させた有価金属回収用電解槽 |
WO2013150664A1 (ja) * | 2012-04-03 | 2013-10-10 | アサヒプリテック株式会社 | 貴金属の回収方法 |
JP2018003077A (ja) * | 2016-06-30 | 2018-01-11 | 住友金属鉱山株式会社 | 金属粉掻き落とし装置 |
KR20230091135A (ko) | 2020-10-21 | 2023-06-22 | 아사히 프리텍 가부시키가이샤 | 금속 회수 장치의 상태 감시 시스템 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
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KR102122801B1 (ko) | 2018-12-26 | 2020-06-26 | 씨앤씨테크(주) | 반도체 공정에서 사용된 금(Au) 폐액 및 에칭액 회수 방법 |
KR102314840B1 (ko) | 2019-12-10 | 2021-10-19 | 한국과학기술원 | 광조사에 의해 금이온을 선택적으로 흡착하는 반도체 기반 흡착제 및 이를 이용한 금의 회수 방법 |
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US3475292A (en) * | 1966-02-10 | 1969-10-28 | Technic | Gold plating bath and process |
JPS53149827A (en) * | 1978-03-02 | 1978-12-27 | Okubo Katsuhiro | Continuous circulation system electrolytic treatment device of plating wash water |
JPS5416848A (en) * | 1977-05-03 | 1979-02-07 | Goetzelmann Ind Abwasser | Method of and device for treating waste water containing metal |
JPS57126986A (en) * | 1980-09-29 | 1982-08-06 | Sandoz Ag | Electrolytic tank |
JPS57188691A (en) * | 1981-05-13 | 1982-11-19 | Nec Corp | Recovering method for gold from waste liquid of stripping of gold plating |
JPH01246388A (ja) * | 1988-03-25 | 1989-10-02 | Mitsubishi Metal Corp | 銀の電解精錬装置 |
JPH049489A (ja) * | 1990-04-27 | 1992-01-14 | Fuji Photo Film Co Ltd | 写真処理液の銀回収方法及び装置 |
JP2001192878A (ja) * | 2000-01-11 | 2001-07-17 | Yuken Industry Co Ltd | 金属組成物からの貴金属回収法 |
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JPS61104096A (ja) | 1984-10-26 | 1986-05-22 | Toppan Printing Co Ltd | 金属回収装置 |
US4834850A (en) * | 1987-07-27 | 1989-05-30 | Eltech Systems Corporation | Efficient electrolytic precious metal recovery system |
-
2005
- 2005-06-24 JP JP2005184904A patent/JP4699105B2/ja active Active
- 2005-07-11 KR KR1020050062104A patent/KR100733838B1/ko active IP Right Grant
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
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US3475292A (en) * | 1966-02-10 | 1969-10-28 | Technic | Gold plating bath and process |
JPS5416848A (en) * | 1977-05-03 | 1979-02-07 | Goetzelmann Ind Abwasser | Method of and device for treating waste water containing metal |
JPS53149827A (en) * | 1978-03-02 | 1978-12-27 | Okubo Katsuhiro | Continuous circulation system electrolytic treatment device of plating wash water |
JPS57126986A (en) * | 1980-09-29 | 1982-08-06 | Sandoz Ag | Electrolytic tank |
JPS57188691A (en) * | 1981-05-13 | 1982-11-19 | Nec Corp | Recovering method for gold from waste liquid of stripping of gold plating |
JPH01246388A (ja) * | 1988-03-25 | 1989-10-02 | Mitsubishi Metal Corp | 銀の電解精錬装置 |
JPH049489A (ja) * | 1990-04-27 | 1992-01-14 | Fuji Photo Film Co Ltd | 写真処理液の銀回収方法及び装置 |
JP2001192878A (ja) * | 2000-01-11 | 2001-07-17 | Yuken Industry Co Ltd | 金属組成物からの貴金属回収法 |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100876682B1 (ko) | 2008-06-24 | 2009-01-07 | 한국지질자원연구원 | 귀금속 용해장치 |
JP2010222603A (ja) * | 2009-03-19 | 2010-10-07 | Furukawa Electric Co Ltd:The | 銅微粒子分散液の製造方法 |
JP2013504691A (ja) * | 2009-09-14 | 2013-02-07 | スク,サンヨプ | 接触比表面積を増大させた有価金属回収用電解槽 |
WO2013150664A1 (ja) * | 2012-04-03 | 2013-10-10 | アサヒプリテック株式会社 | 貴金属の回収方法 |
JP2013213267A (ja) * | 2012-04-03 | 2013-10-17 | Asahi Pretec Corp | 貴金属の回収方法 |
CN104169473A (zh) * | 2012-04-03 | 2014-11-26 | 朝日浦力环境科技有限公司 | 贵金属的回收方法 |
JP2018003077A (ja) * | 2016-06-30 | 2018-01-11 | 住友金属鉱山株式会社 | 金属粉掻き落とし装置 |
KR20230091135A (ko) | 2020-10-21 | 2023-06-22 | 아사히 프리텍 가부시키가이샤 | 금속 회수 장치의 상태 감시 시스템 |
Also Published As
Publication number | Publication date |
---|---|
JP4699105B2 (ja) | 2011-06-08 |
KR100733838B1 (ko) | 2007-07-03 |
KR20060135463A (ko) | 2006-12-29 |
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