JP2006522079A - アセチレンに含まれる溶媒の除去方法及び前記方法を実施するための装置 - Google Patents

アセチレンに含まれる溶媒の除去方法及び前記方法を実施するための装置 Download PDF

Info

Publication number
JP2006522079A
JP2006522079A JP2006505854A JP2006505854A JP2006522079A JP 2006522079 A JP2006522079 A JP 2006522079A JP 2006505854 A JP2006505854 A JP 2006505854A JP 2006505854 A JP2006505854 A JP 2006505854A JP 2006522079 A JP2006522079 A JP 2006522079A
Authority
JP
Japan
Prior art keywords
acetylene
solvent
pressure
gas stream
outlet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006505854A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006522079A5 (enExample
Inventor
デルコルソ、ファブリス
Original Assignee
レール・リキード−ソシエテ・アノニム・ア・ディレクトワール・エ・コンセイユ・ドゥ・スールベイランス・プール・レテュード・エ・レクスプロワタシオン・デ・プロセデ・ジョルジュ・クロード
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by レール・リキード−ソシエテ・アノニム・ア・ディレクトワール・エ・コンセイユ・ドゥ・スールベイランス・プール・レテュード・エ・レクスプロワタシオン・デ・プロセデ・ジョルジュ・クロード filed Critical レール・リキード−ソシエテ・アノニム・ア・ディレクトワール・エ・コンセイユ・ドゥ・スールベイランス・プール・レテュード・エ・レクスプロワタシオン・デ・プロセデ・ジョルジュ・クロード
Publication of JP2006522079A publication Critical patent/JP2006522079A/ja
Publication of JP2006522079A5 publication Critical patent/JP2006522079A5/ja
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C7/00Purification; Separation; Use of additives
    • C07C7/12Purification; Separation; Use of additives by adsorption, i.e. purification or separation of hydrocarbons with the aid of solids, e.g. with ion-exchangers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Water Supply & Treatment (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Separation Of Gases By Adsorption (AREA)
  • Treatment Of Liquids With Adsorbents In General (AREA)
JP2006505854A 2003-04-04 2004-03-17 アセチレンに含まれる溶媒の除去方法及び前記方法を実施するための装置 Pending JP2006522079A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0304192A FR2853313B1 (fr) 2003-04-04 2003-04-04 Procede d'elimination d'un solvant contenu dans l'acetylene, installation pour la mise en oeuvre du procede
PCT/FR2004/050112 WO2004089859A2 (fr) 2003-04-04 2004-03-17 Procede d'elimination d'un solvant contenu dans l'acetylene. installation pour la mise en oeuvre du procede

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2010186242A Division JP2011021017A (ja) 2003-04-04 2010-08-23 アセチレンに含まれる溶媒の除去方法及び前記方法を実施するための装置

Publications (2)

Publication Number Publication Date
JP2006522079A true JP2006522079A (ja) 2006-09-28
JP2006522079A5 JP2006522079A5 (enExample) 2010-10-21

Family

ID=32982233

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2006505854A Pending JP2006522079A (ja) 2003-04-04 2004-03-17 アセチレンに含まれる溶媒の除去方法及び前記方法を実施するための装置
JP2010186242A Withdrawn JP2011021017A (ja) 2003-04-04 2010-08-23 アセチレンに含まれる溶媒の除去方法及び前記方法を実施するための装置

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2010186242A Withdrawn JP2011021017A (ja) 2003-04-04 2010-08-23 アセチレンに含まれる溶媒の除去方法及び前記方法を実施するための装置

Country Status (4)

Country Link
EP (1) EP1613575A2 (enExample)
JP (2) JP2006522079A (enExample)
FR (1) FR2853313B1 (enExample)
WO (1) WO2004089859A2 (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010070554A (ja) * 2008-09-16 2010-04-02 Air Products & Chemicals Inc アセチレンを供給するための方法およびシステム
KR101493756B1 (ko) * 2008-09-16 2015-02-17 에어 프로덕츠 앤드 케미칼스, 인코오포레이티드 아세틸렌을 제공하기 위한 방법 및 시스템
JP2019099847A (ja) * 2017-11-29 2019-06-24 大陽日酸株式会社 真空浸炭炉用アセチレンガス供給装置及びその供給方法

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7915166B1 (en) 2007-02-22 2011-03-29 Novellus Systems, Inc. Diffusion barrier and etch stop films
US20080242912A1 (en) * 2007-03-29 2008-10-02 Olivier Letessier Methods and Apparatus for Providing a High Purity Acetylene Product
FR2915991A1 (fr) * 2007-07-17 2008-11-14 Air Liquide Nouveau procede d'elimination d'un solvant contenu dans de l'acetylene detendu. installation pour la mise en oeuvre du procede
FR2912401A1 (fr) * 2007-07-17 2008-08-15 Air Liquide Nouveau procede d'elimination d'un solvant contenu dans de l'acetylene sous pression. installation pour la mise en oeuvre du procede
US8962101B2 (en) 2007-08-31 2015-02-24 Novellus Systems, Inc. Methods and apparatus for plasma-based deposition
US7820556B2 (en) * 2008-06-04 2010-10-26 Novellus Systems, Inc. Method for purifying acetylene gas for use in semiconductor processes
US8435608B1 (en) 2008-06-27 2013-05-07 Novellus Systems, Inc. Methods of depositing smooth and conformal ashable hard mask films
US8398747B2 (en) 2009-06-23 2013-03-19 Praxair Technology, Inc. Processes for purification of acetylene
US8563414B1 (en) 2010-04-23 2013-10-22 Novellus Systems, Inc. Methods for forming conductive carbon films by PECVD
SG195494A1 (en) 2012-05-18 2013-12-30 Novellus Systems Inc Carbon deposition-etch-ash gap fill process
US9362133B2 (en) 2012-12-14 2016-06-07 Lam Research Corporation Method for forming a mask by etching conformal film on patterned ashable hardmask
US9304396B2 (en) 2013-02-25 2016-04-05 Lam Research Corporation PECVD films for EUV lithography
US9589799B2 (en) 2013-09-30 2017-03-07 Lam Research Corporation High selectivity and low stress carbon hardmask by pulsed low frequency RF power
US9320387B2 (en) 2013-09-30 2016-04-26 Lam Research Corporation Sulfur doped carbon hard masks
TW202113121A (zh) 2019-05-29 2021-04-01 美商蘭姆研究公司 藉由高功率脈衝低頻率射頻產生的高選擇性、低應力、且低氫之類鑽石碳硬遮罩
CN114342043A (zh) 2019-08-30 2022-04-12 朗姆研究公司 低压下的高密度、模量和硬度的非晶碳膜

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5220442B1 (enExample) * 1967-09-09 1977-06-03
JPS6219539A (ja) * 1985-07-18 1987-01-28 Nichigou Asechiren Kk アセチレンの精製法およびそれに用いる装置
JPS62285988A (ja) * 1986-06-04 1987-12-11 Nichigou Asechiren Kk 高純度アセチレンガスの提供方法およびそれに用いる精製装置
JP2004148257A (ja) * 2002-10-31 2004-05-27 Nichigo Acetylene Kk 可搬式超高純度アセチレン供給装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6446098A (en) * 1987-08-07 1989-02-20 Nichigo Acetylen Method for cleaning inside of container of dissolved acetylene

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5220442B1 (enExample) * 1967-09-09 1977-06-03
JPS6219539A (ja) * 1985-07-18 1987-01-28 Nichigou Asechiren Kk アセチレンの精製法およびそれに用いる装置
JPS62285988A (ja) * 1986-06-04 1987-12-11 Nichigou Asechiren Kk 高純度アセチレンガスの提供方法およびそれに用いる精製装置
JP2004148257A (ja) * 2002-10-31 2004-05-27 Nichigo Acetylene Kk 可搬式超高純度アセチレン供給装置

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010070554A (ja) * 2008-09-16 2010-04-02 Air Products & Chemicals Inc アセチレンを供給するための方法およびシステム
JP2014055675A (ja) * 2008-09-16 2014-03-27 Air Products And Chemicals Inc アセチレンを供給するための方法およびシステム
KR101493756B1 (ko) * 2008-09-16 2015-02-17 에어 프로덕츠 앤드 케미칼스, 인코오포레이티드 아세틸렌을 제공하기 위한 방법 및 시스템
JP2019099847A (ja) * 2017-11-29 2019-06-24 大陽日酸株式会社 真空浸炭炉用アセチレンガス供給装置及びその供給方法

Also Published As

Publication number Publication date
JP2011021017A (ja) 2011-02-03
EP1613575A2 (fr) 2006-01-11
WO2004089859A3 (fr) 2004-11-25
FR2853313A1 (fr) 2004-10-08
WO2004089859A2 (fr) 2004-10-21
FR2853313B1 (fr) 2005-05-06

Similar Documents

Publication Publication Date Title
JP2011021017A (ja) アセチレンに含まれる溶媒の除去方法及び前記方法を実施するための装置
US8398747B2 (en) Processes for purification of acetylene
JP5873228B2 (ja) メタンに富むガス流の精製のための方法および装置
EP0349655A1 (en) Process for separating and recovering carbonic acid gas from gas mixture by adsorption
EP0046141A1 (en) Process for removing and recovering volatile organic substances from industrial waste gases
JP4922804B2 (ja) 含水有機化合物の脱水方法
US4025321A (en) Purification of natural gas streams containing oxygen
JP2017222853A (ja) 重質炭化水素除去方法
JPH0578108A (ja) アルゴン精製方法及び装置
KR102570998B1 (ko) 공급 기체 스트림의 예비정제를 위한 시스템 및 방법
JP2003535209A (ja) 炭化水素の流体流の脱酸法
JP3084248B2 (ja) 燃焼排ガスから二酸化炭素を回収するための2段式吸着分離設備および2段式二酸化炭素吸着分離方法
RU2547021C1 (ru) Способ и установка очистки природного газа от диоксида углерода и сероводорода
WO2017033217A1 (ja) 炭化水素ガスの液化前処理設備及び出荷基地設備
CN102256686A (zh) 用于净化气体和获得酸性气体的方法
JPH06234511A (ja) 圧縮熱を使用する精製方法及び装置
CN100374184C (zh) 净化溴化氢的方法和装置
TW565468B (en) Method and device for recovering hydrocarbon vapor
JP4724418B2 (ja) メタノールから二酸化炭素を除去するためのシステムユニット
KR102570997B1 (ko) 공급 기체 스트림의 예비정제를 위한 시스템
JP4839114B2 (ja) 液化炭酸ガス精製装置
KR19990014226A (ko) 고순도의 비활성 가스를 제조하는 방법 및 장치
JPH10202115A (ja) 触媒吸着剤床の再生方法
JPH04310509A (ja) 窒素中の不純酸素の除去方法
JPS63267878A (ja) 精製アルゴン塔廃ガス中のアルゴン・水素を回収するアルゴン精製方法

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20070119

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20091224

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100223

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20100524

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20100531

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100823

A524 Written submission of copy of amendment under article 19 pct

Free format text: JAPANESE INTERMEDIATE CODE: A524

Effective date: 20100823

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20110524