JP2006522079A5 - - Google Patents

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Publication number
JP2006522079A5
JP2006522079A5 JP2006505854A JP2006505854A JP2006522079A5 JP 2006522079 A5 JP2006522079 A5 JP 2006522079A5 JP 2006505854 A JP2006505854 A JP 2006505854A JP 2006505854 A JP2006505854 A JP 2006505854A JP 2006522079 A5 JP2006522079 A5 JP 2006522079A5
Authority
JP
Japan
Prior art keywords
nonconformities
acetylene
mercury
adsorption
consist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006505854A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006522079A (ja
Filing date
Publication date
Priority claimed from FR0304192A external-priority patent/FR2853313B1/fr
Application filed filed Critical
Publication of JP2006522079A publication Critical patent/JP2006522079A/ja
Publication of JP2006522079A5 publication Critical patent/JP2006522079A5/ja
Pending legal-status Critical Current

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JP2006505854A 2003-04-04 2004-03-17 アセチレンに含まれる溶媒の除去方法及び前記方法を実施するための装置 Pending JP2006522079A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0304192A FR2853313B1 (fr) 2003-04-04 2003-04-04 Procede d'elimination d'un solvant contenu dans l'acetylene, installation pour la mise en oeuvre du procede
PCT/FR2004/050112 WO2004089859A2 (fr) 2003-04-04 2004-03-17 Procede d'elimination d'un solvant contenu dans l'acetylene. installation pour la mise en oeuvre du procede

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2010186242A Division JP2011021017A (ja) 2003-04-04 2010-08-23 アセチレンに含まれる溶媒の除去方法及び前記方法を実施するための装置

Publications (2)

Publication Number Publication Date
JP2006522079A JP2006522079A (ja) 2006-09-28
JP2006522079A5 true JP2006522079A5 (enExample) 2010-10-21

Family

ID=32982233

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2006505854A Pending JP2006522079A (ja) 2003-04-04 2004-03-17 アセチレンに含まれる溶媒の除去方法及び前記方法を実施するための装置
JP2010186242A Withdrawn JP2011021017A (ja) 2003-04-04 2010-08-23 アセチレンに含まれる溶媒の除去方法及び前記方法を実施するための装置

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2010186242A Withdrawn JP2011021017A (ja) 2003-04-04 2010-08-23 アセチレンに含まれる溶媒の除去方法及び前記方法を実施するための装置

Country Status (4)

Country Link
EP (1) EP1613575A2 (enExample)
JP (2) JP2006522079A (enExample)
FR (1) FR2853313B1 (enExample)
WO (1) WO2004089859A2 (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7915166B1 (en) 2007-02-22 2011-03-29 Novellus Systems, Inc. Diffusion barrier and etch stop films
US20080242912A1 (en) * 2007-03-29 2008-10-02 Olivier Letessier Methods and Apparatus for Providing a High Purity Acetylene Product
FR2912401A1 (fr) * 2007-07-17 2008-08-15 Air Liquide Nouveau procede d'elimination d'un solvant contenu dans de l'acetylene sous pression. installation pour la mise en oeuvre du procede
FR2915991A1 (fr) * 2007-07-17 2008-11-14 Air Liquide Nouveau procede d'elimination d'un solvant contenu dans de l'acetylene detendu. installation pour la mise en oeuvre du procede
US8962101B2 (en) 2007-08-31 2015-02-24 Novellus Systems, Inc. Methods and apparatus for plasma-based deposition
US7820556B2 (en) * 2008-06-04 2010-10-26 Novellus Systems, Inc. Method for purifying acetylene gas for use in semiconductor processes
US8435608B1 (en) 2008-06-27 2013-05-07 Novellus Systems, Inc. Methods of depositing smooth and conformal ashable hard mask films
US8129577B2 (en) * 2008-09-16 2012-03-06 Air Products And Chemicals, Inc. Process and system for providing acetylene
KR101493756B1 (ko) * 2008-09-16 2015-02-17 에어 프로덕츠 앤드 케미칼스, 인코오포레이티드 아세틸렌을 제공하기 위한 방법 및 시스템
US8398747B2 (en) 2009-06-23 2013-03-19 Praxair Technology, Inc. Processes for purification of acetylene
US8563414B1 (en) 2010-04-23 2013-10-22 Novellus Systems, Inc. Methods for forming conductive carbon films by PECVD
SG195494A1 (en) 2012-05-18 2013-12-30 Novellus Systems Inc Carbon deposition-etch-ash gap fill process
US9362133B2 (en) 2012-12-14 2016-06-07 Lam Research Corporation Method for forming a mask by etching conformal film on patterned ashable hardmask
US9304396B2 (en) 2013-02-25 2016-04-05 Lam Research Corporation PECVD films for EUV lithography
US9320387B2 (en) 2013-09-30 2016-04-26 Lam Research Corporation Sulfur doped carbon hard masks
US9589799B2 (en) 2013-09-30 2017-03-07 Lam Research Corporation High selectivity and low stress carbon hardmask by pulsed low frequency RF power
JP6975625B2 (ja) * 2017-11-29 2021-12-01 大陽日酸株式会社 真空浸炭炉用アセチレンガス供給装置及びその供給方法
WO2020243342A1 (en) 2019-05-29 2020-12-03 Lam Research Corporation High selectivity, low stress, and low hydrogen diamond-like carbon hardmasks by high power pulsed low frequency rf
KR102888630B1 (ko) 2019-08-30 2025-11-19 램 리써치 코포레이션 저압에서의 고밀도, 고모듈러스, 및 고경도 비정질 탄소 막들

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES344914A1 (es) * 1967-09-09 1969-02-01 Flix Electro Quimica Procedimiento e instalacion para secado de gases de poca solubilidad inertes frente a salmueras inorganicas y a baja presion.
JPH062682B2 (ja) * 1985-07-18 1994-01-12 日合アセチレン株式会社 アセチレンの精製法およびそれに用いる装置
JPS62285988A (ja) * 1986-06-04 1987-12-11 Nichigou Asechiren Kk 高純度アセチレンガスの提供方法およびそれに用いる精製装置
JPS6446098A (en) * 1987-08-07 1989-02-20 Nichigo Acetylen Method for cleaning inside of container of dissolved acetylene
JP4314015B2 (ja) * 2002-10-31 2009-08-12 ニチゴー日興株式会社 可搬式超高純度アセチレン供給装置

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