FR2853313B1 - Procede d'elimination d'un solvant contenu dans l'acetylene, installation pour la mise en oeuvre du procede - Google Patents
Procede d'elimination d'un solvant contenu dans l'acetylene, installation pour la mise en oeuvre du procedeInfo
- Publication number
- FR2853313B1 FR2853313B1 FR0304192A FR0304192A FR2853313B1 FR 2853313 B1 FR2853313 B1 FR 2853313B1 FR 0304192 A FR0304192 A FR 0304192A FR 0304192 A FR0304192 A FR 0304192A FR 2853313 B1 FR2853313 B1 FR 2853313B1
- Authority
- FR
- France
- Prior art keywords
- acetylene
- installation
- carrying
- solvent contained
- solvent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C7/00—Purification; Separation; Use of additives
- C07C7/12—Purification; Separation; Use of additives by adsorption, i.e. purification or separation of hydrocarbons with the aid of solids, e.g. with ion-exchangers
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Analytical Chemistry (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Water Supply & Treatment (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Separation Of Gases By Adsorption (AREA)
- Treatment Of Liquids With Adsorbents In General (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR0304192A FR2853313B1 (fr) | 2003-04-04 | 2003-04-04 | Procede d'elimination d'un solvant contenu dans l'acetylene, installation pour la mise en oeuvre du procede |
| PCT/FR2004/050112 WO2004089859A2 (fr) | 2003-04-04 | 2004-03-17 | Procede d'elimination d'un solvant contenu dans l'acetylene. installation pour la mise en oeuvre du procede |
| JP2006505854A JP2006522079A (ja) | 2003-04-04 | 2004-03-17 | アセチレンに含まれる溶媒の除去方法及び前記方法を実施するための装置 |
| EP04721218A EP1613575A2 (fr) | 2003-04-04 | 2004-03-17 | Procede d elimination d un solvant contenu dans l' acetylene. installation pour la mise en oeuvre du procede |
| JP2010186242A JP2011021017A (ja) | 2003-04-04 | 2010-08-23 | アセチレンに含まれる溶媒の除去方法及び前記方法を実施するための装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR0304192A FR2853313B1 (fr) | 2003-04-04 | 2003-04-04 | Procede d'elimination d'un solvant contenu dans l'acetylene, installation pour la mise en oeuvre du procede |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2853313A1 FR2853313A1 (fr) | 2004-10-08 |
| FR2853313B1 true FR2853313B1 (fr) | 2005-05-06 |
Family
ID=32982233
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR0304192A Expired - Fee Related FR2853313B1 (fr) | 2003-04-04 | 2003-04-04 | Procede d'elimination d'un solvant contenu dans l'acetylene, installation pour la mise en oeuvre du procede |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP1613575A2 (enExample) |
| JP (2) | JP2006522079A (enExample) |
| FR (1) | FR2853313B1 (enExample) |
| WO (1) | WO2004089859A2 (enExample) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8669181B1 (en) | 2007-02-22 | 2014-03-11 | Novellus Systems, Inc. | Diffusion barrier and etch stop films |
| US8962101B2 (en) | 2007-08-31 | 2015-02-24 | Novellus Systems, Inc. | Methods and apparatus for plasma-based deposition |
| US9023731B2 (en) | 2012-05-18 | 2015-05-05 | Novellus Systems, Inc. | Carbon deposition-etch-ash gap fill process |
| US9240320B1 (en) | 2008-06-27 | 2016-01-19 | Novellus Systems, Inc. | Methods of depositing smooth and conformal ashable hard mask films |
| US9304396B2 (en) | 2013-02-25 | 2016-04-05 | Lam Research Corporation | PECVD films for EUV lithography |
| US9320387B2 (en) | 2013-09-30 | 2016-04-26 | Lam Research Corporation | Sulfur doped carbon hard masks |
| US9362133B2 (en) | 2012-12-14 | 2016-06-07 | Lam Research Corporation | Method for forming a mask by etching conformal film on patterned ashable hardmask |
| US9589799B2 (en) | 2013-09-30 | 2017-03-07 | Lam Research Corporation | High selectivity and low stress carbon hardmask by pulsed low frequency RF power |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080242912A1 (en) * | 2007-03-29 | 2008-10-02 | Olivier Letessier | Methods and Apparatus for Providing a High Purity Acetylene Product |
| FR2915991A1 (fr) * | 2007-07-17 | 2008-11-14 | Air Liquide | Nouveau procede d'elimination d'un solvant contenu dans de l'acetylene detendu. installation pour la mise en oeuvre du procede |
| FR2912401A1 (fr) * | 2007-07-17 | 2008-08-15 | Air Liquide | Nouveau procede d'elimination d'un solvant contenu dans de l'acetylene sous pression. installation pour la mise en oeuvre du procede |
| US7820556B2 (en) * | 2008-06-04 | 2010-10-26 | Novellus Systems, Inc. | Method for purifying acetylene gas for use in semiconductor processes |
| US8129577B2 (en) | 2008-09-16 | 2012-03-06 | Air Products And Chemicals, Inc. | Process and system for providing acetylene |
| KR101493756B1 (ko) * | 2008-09-16 | 2015-02-17 | 에어 프로덕츠 앤드 케미칼스, 인코오포레이티드 | 아세틸렌을 제공하기 위한 방법 및 시스템 |
| US8398747B2 (en) | 2009-06-23 | 2013-03-19 | Praxair Technology, Inc. | Processes for purification of acetylene |
| US8563414B1 (en) | 2010-04-23 | 2013-10-22 | Novellus Systems, Inc. | Methods for forming conductive carbon films by PECVD |
| JP6975625B2 (ja) * | 2017-11-29 | 2021-12-01 | 大陽日酸株式会社 | 真空浸炭炉用アセチレンガス供給装置及びその供給方法 |
| TW202113121A (zh) | 2019-05-29 | 2021-04-01 | 美商蘭姆研究公司 | 藉由高功率脈衝低頻率射頻產生的高選擇性、低應力、且低氫之類鑽石碳硬遮罩 |
| CN114342043A (zh) | 2019-08-30 | 2022-04-12 | 朗姆研究公司 | 低压下的高密度、模量和硬度的非晶碳膜 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ES344914A1 (es) * | 1967-09-09 | 1969-02-01 | Flix Electro Quimica | Procedimiento e instalacion para secado de gases de poca solubilidad inertes frente a salmueras inorganicas y a baja presion. |
| JPH062682B2 (ja) * | 1985-07-18 | 1994-01-12 | 日合アセチレン株式会社 | アセチレンの精製法およびそれに用いる装置 |
| JPS62285988A (ja) * | 1986-06-04 | 1987-12-11 | Nichigou Asechiren Kk | 高純度アセチレンガスの提供方法およびそれに用いる精製装置 |
| JPS6446098A (en) * | 1987-08-07 | 1989-02-20 | Nichigo Acetylen | Method for cleaning inside of container of dissolved acetylene |
| JP4314015B2 (ja) * | 2002-10-31 | 2009-08-12 | ニチゴー日興株式会社 | 可搬式超高純度アセチレン供給装置 |
-
2003
- 2003-04-04 FR FR0304192A patent/FR2853313B1/fr not_active Expired - Fee Related
-
2004
- 2004-03-17 JP JP2006505854A patent/JP2006522079A/ja active Pending
- 2004-03-17 EP EP04721218A patent/EP1613575A2/fr not_active Withdrawn
- 2004-03-17 WO PCT/FR2004/050112 patent/WO2004089859A2/fr not_active Ceased
-
2010
- 2010-08-23 JP JP2010186242A patent/JP2011021017A/ja not_active Withdrawn
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8669181B1 (en) | 2007-02-22 | 2014-03-11 | Novellus Systems, Inc. | Diffusion barrier and etch stop films |
| US8962101B2 (en) | 2007-08-31 | 2015-02-24 | Novellus Systems, Inc. | Methods and apparatus for plasma-based deposition |
| US9240320B1 (en) | 2008-06-27 | 2016-01-19 | Novellus Systems, Inc. | Methods of depositing smooth and conformal ashable hard mask films |
| US9023731B2 (en) | 2012-05-18 | 2015-05-05 | Novellus Systems, Inc. | Carbon deposition-etch-ash gap fill process |
| US9362133B2 (en) | 2012-12-14 | 2016-06-07 | Lam Research Corporation | Method for forming a mask by etching conformal film on patterned ashable hardmask |
| US9304396B2 (en) | 2013-02-25 | 2016-04-05 | Lam Research Corporation | PECVD films for EUV lithography |
| US9320387B2 (en) | 2013-09-30 | 2016-04-26 | Lam Research Corporation | Sulfur doped carbon hard masks |
| US9589799B2 (en) | 2013-09-30 | 2017-03-07 | Lam Research Corporation | High selectivity and low stress carbon hardmask by pulsed low frequency RF power |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2011021017A (ja) | 2011-02-03 |
| JP2006522079A (ja) | 2006-09-28 |
| EP1613575A2 (fr) | 2006-01-11 |
| WO2004089859A3 (fr) | 2004-11-25 |
| FR2853313A1 (fr) | 2004-10-08 |
| WO2004089859A2 (fr) | 2004-10-21 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |
Effective date: 20131231 |