WO2004089859A3 - Procede d'elimination d'un solvant contenu dans l'acetylene. installation pour la mise en oeuvre du procede - Google Patents

Procede d'elimination d'un solvant contenu dans l'acetylene. installation pour la mise en oeuvre du procede Download PDF

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Publication number
WO2004089859A3
WO2004089859A3 PCT/FR2004/050112 FR2004050112W WO2004089859A3 WO 2004089859 A3 WO2004089859 A3 WO 2004089859A3 FR 2004050112 W FR2004050112 W FR 2004050112W WO 2004089859 A3 WO2004089859 A3 WO 2004089859A3
Authority
WO
WIPO (PCT)
Prior art keywords
acetylene
removal
carrying
unit
solvent contained
Prior art date
Application number
PCT/FR2004/050112
Other languages
English (en)
Other versions
WO2004089859A2 (fr
Inventor
Fabrice Delcorso
Original Assignee
Air Liquide
Fabrice Delcorso
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Liquide, Fabrice Delcorso filed Critical Air Liquide
Priority to EP04721218A priority Critical patent/EP1613575A2/fr
Priority to JP2006505854A priority patent/JP2006522079A/ja
Publication of WO2004089859A2 publication Critical patent/WO2004089859A2/fr
Publication of WO2004089859A3 publication Critical patent/WO2004089859A3/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C7/00—Purification; Separation; Use of additives
    • C07C7/12—Purification; Separation; Use of additives by adsorption, i.e. purification or separation of hydrocarbons with the aid of solids, e.g. with ion-exchangers

Abstract

Procédé d'épuration d'acétylène stocké sous pression dans un contenant en solution dans un solvant ou un mélange de solvant, caractérisé en ce qu'il comprend : au moins une étape (a) de détente de l'acétylène en sortie du contenant, pour produire un flux d'acétylène gazeux comprenant une quantité non nulle d'impuretés liquides, et au moins une étape (b) de séparation desdites impuretés liquides dudit flux produit à l'étape (a) et au moins une étape (c) d’épuration dudit flux de gaz issu de l’étape (b) par adsorption sur un support solide des impuretés liquides résiduelles. Installation pour la mise en oeuvre du procédé.
PCT/FR2004/050112 2003-04-04 2004-03-17 Procede d'elimination d'un solvant contenu dans l'acetylene. installation pour la mise en oeuvre du procede WO2004089859A2 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
EP04721218A EP1613575A2 (fr) 2003-04-04 2004-03-17 Procede d elimination d un solvant contenu dans l' acetylene. installation pour la mise en oeuvre du procede
JP2006505854A JP2006522079A (ja) 2003-04-04 2004-03-17 アセチレンに含まれる溶媒の除去方法及び前記方法を実施するための装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0304192A FR2853313B1 (fr) 2003-04-04 2003-04-04 Procede d'elimination d'un solvant contenu dans l'acetylene, installation pour la mise en oeuvre du procede
FR0304192 2003-04-04

Publications (2)

Publication Number Publication Date
WO2004089859A2 WO2004089859A2 (fr) 2004-10-21
WO2004089859A3 true WO2004089859A3 (fr) 2004-11-25

Family

ID=32982233

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/FR2004/050112 WO2004089859A2 (fr) 2003-04-04 2004-03-17 Procede d'elimination d'un solvant contenu dans l'acetylene. installation pour la mise en oeuvre du procede

Country Status (4)

Country Link
EP (1) EP1613575A2 (fr)
JP (2) JP2006522079A (fr)
FR (1) FR2853313B1 (fr)
WO (1) WO2004089859A2 (fr)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7915166B1 (en) 2007-02-22 2011-03-29 Novellus Systems, Inc. Diffusion barrier and etch stop films
US20080242912A1 (en) * 2007-03-29 2008-10-02 Olivier Letessier Methods and Apparatus for Providing a High Purity Acetylene Product
FR2915991A1 (fr) * 2007-07-17 2008-11-14 Air Liquide Nouveau procede d'elimination d'un solvant contenu dans de l'acetylene detendu. installation pour la mise en oeuvre du procede
FR2912401A1 (fr) * 2007-07-17 2008-08-15 Air Liquide Nouveau procede d'elimination d'un solvant contenu dans de l'acetylene sous pression. installation pour la mise en oeuvre du procede
US8962101B2 (en) 2007-08-31 2015-02-24 Novellus Systems, Inc. Methods and apparatus for plasma-based deposition
US7820556B2 (en) * 2008-06-04 2010-10-26 Novellus Systems, Inc. Method for purifying acetylene gas for use in semiconductor processes
US8435608B1 (en) 2008-06-27 2013-05-07 Novellus Systems, Inc. Methods of depositing smooth and conformal ashable hard mask films
KR101493756B1 (ko) * 2008-09-16 2015-02-17 에어 프로덕츠 앤드 케미칼스, 인코오포레이티드 아세틸렌을 제공하기 위한 방법 및 시스템
US8129577B2 (en) * 2008-09-16 2012-03-06 Air Products And Chemicals, Inc. Process and system for providing acetylene
US8398747B2 (en) 2009-06-23 2013-03-19 Praxair Technology, Inc. Processes for purification of acetylene
US8563414B1 (en) 2010-04-23 2013-10-22 Novellus Systems, Inc. Methods for forming conductive carbon films by PECVD
SG195494A1 (en) 2012-05-18 2013-12-30 Novellus Systems Inc Carbon deposition-etch-ash gap fill process
US9362133B2 (en) 2012-12-14 2016-06-07 Lam Research Corporation Method for forming a mask by etching conformal film on patterned ashable hardmask
US9304396B2 (en) 2013-02-25 2016-04-05 Lam Research Corporation PECVD films for EUV lithography
US9320387B2 (en) 2013-09-30 2016-04-26 Lam Research Corporation Sulfur doped carbon hard masks
US9589799B2 (en) 2013-09-30 2017-03-07 Lam Research Corporation High selectivity and low stress carbon hardmask by pulsed low frequency RF power
CN113891954A (zh) 2019-05-29 2022-01-04 朗姆研究公司 通过高功率脉冲低频率rf产生的高选择性、低应力、且低氢的类金刚石碳硬掩模

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6219539A (ja) * 1985-07-18 1987-01-28 Nichigou Asechiren Kk アセチレンの精製法およびそれに用いる装置
JPS62285988A (ja) * 1986-06-04 1987-12-11 Nichigou Asechiren Kk 高純度アセチレンガスの提供方法およびそれに用いる精製装置
US4863493A (en) * 1987-08-07 1989-09-05 Nichigo Acetylene Kabushiki Kaisha High purity acetylene gas

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES344914A1 (es) * 1967-09-09 1969-02-01 Flix Electro Quimica Procedimiento e instalacion para secado de gases de poca solubilidad inertes frente a salmueras inorganicas y a baja presion.
JP4314015B2 (ja) * 2002-10-31 2009-08-12 ニチゴー日興株式会社 可搬式超高純度アセチレン供給装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6219539A (ja) * 1985-07-18 1987-01-28 Nichigou Asechiren Kk アセチレンの精製法およびそれに用いる装置
JPS62285988A (ja) * 1986-06-04 1987-12-11 Nichigou Asechiren Kk 高純度アセチレンガスの提供方法およびそれに用いる精製装置
US4863493A (en) * 1987-08-07 1989-09-05 Nichigo Acetylene Kabushiki Kaisha High purity acetylene gas

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 0111, no. 93 (C - 430) 20 June 1987 (1987-06-20) *
PATENT ABSTRACTS OF JAPAN vol. 0121, no. 81 (C - 499) 27 May 1988 (1988-05-27) *

Also Published As

Publication number Publication date
JP2011021017A (ja) 2011-02-03
WO2004089859A2 (fr) 2004-10-21
FR2853313B1 (fr) 2005-05-06
JP2006522079A (ja) 2006-09-28
FR2853313A1 (fr) 2004-10-08
EP1613575A2 (fr) 2006-01-11

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