JP2006517903A5 - - Google Patents

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Publication number
JP2006517903A5
JP2006517903A5 JP2006503570A JP2006503570A JP2006517903A5 JP 2006517903 A5 JP2006517903 A5 JP 2006517903A5 JP 2006503570 A JP2006503570 A JP 2006503570A JP 2006503570 A JP2006503570 A JP 2006503570A JP 2006517903 A5 JP2006517903 A5 JP 2006517903A5
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JP
Japan
Prior art keywords
silica
product
granules
dentifrice
precipitated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2006503570A
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English (en)
Japanese (ja)
Other versions
JP5025259B2 (ja
JP2006517903A (ja
Filing date
Publication date
Priority claimed from US10/366,604 external-priority patent/US6946119B2/en
Application filed filed Critical
Publication of JP2006517903A publication Critical patent/JP2006517903A/ja
Publication of JP2006517903A5 publication Critical patent/JP2006517903A5/ja
Application granted granted Critical
Publication of JP5025259B2 publication Critical patent/JP5025259B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2006503570A 2003-02-14 2004-02-10 表面積が低い沈降シリカ生成物、それらを含む歯磨き剤および方法 Expired - Fee Related JP5025259B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/366,604 US6946119B2 (en) 2003-02-14 2003-02-14 Precipitated silica product with low surface area, dentifrices containing same, and processes
US10/366,604 2003-02-14
PCT/US2004/004338 WO2004073380A2 (en) 2003-02-14 2004-02-10 Precipitated silica product with low surface area, dentifrices containing same, and processes

Publications (3)

Publication Number Publication Date
JP2006517903A JP2006517903A (ja) 2006-08-03
JP2006517903A5 true JP2006517903A5 (https=) 2007-03-29
JP5025259B2 JP5025259B2 (ja) 2012-09-12

Family

ID=32849785

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2006503477A Expired - Fee Related JP4927527B2 (ja) 2003-02-14 2004-02-09 沈降シリカ生成物、それらを含む歯磨き剤および方法
JP2006503570A Expired - Fee Related JP5025259B2 (ja) 2003-02-14 2004-02-10 表面積が低い沈降シリカ生成物、それらを含む歯磨き剤および方法

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP2006503477A Expired - Fee Related JP4927527B2 (ja) 2003-02-14 2004-02-09 沈降シリカ生成物、それらを含む歯磨き剤および方法

Country Status (4)

Country Link
US (2) US6946119B2 (https=)
EP (1) EP1596817B1 (https=)
JP (2) JP4927527B2 (https=)
WO (1) WO2004073380A2 (https=)

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US10208241B2 (en) 2012-11-26 2019-02-19 Agienic, Inc. Resin coated proppants with antimicrobial additives
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CN103274422B (zh) * 2013-05-31 2016-03-30 肇庆金三江硅材料有限公司 核壳型沉淀二氧化硅、制备方法及含有该二氧化硅的牙膏
CN111544320A (zh) * 2013-06-24 2020-08-18 宝洁公司 指示正确牙齿清洁的口腔组合物
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CN108383130A (zh) * 2018-05-04 2018-08-10 福建远翔新材料股份有限公司 一种沉淀水合二氧化硅的合成方法
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CN113164337A (zh) * 2018-12-04 2021-07-23 宝洁公司 具有改善的锡相容性的口腔护理组合物
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JP7316177B2 (ja) * 2019-10-03 2023-07-27 東ソー・シリカ株式会社 含水ケイ酸スラリー及びその製造方法
CN111017933B (zh) * 2020-01-13 2021-09-03 福建省三明正元化工有限公司 一种高比表面积二氧化硅的制备方法
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