JP2006517903A5 - - Google Patents

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Publication number
JP2006517903A5
JP2006517903A5 JP2006503570A JP2006503570A JP2006517903A5 JP 2006517903 A5 JP2006517903 A5 JP 2006517903A5 JP 2006503570 A JP2006503570 A JP 2006503570A JP 2006503570 A JP2006503570 A JP 2006503570A JP 2006517903 A5 JP2006517903 A5 JP 2006517903A5
Authority
JP
Japan
Prior art keywords
silica
product
granules
dentifrice
precipitated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2006503570A
Other languages
English (en)
Japanese (ja)
Other versions
JP5025259B2 (ja
JP2006517903A (ja
Filing date
Publication date
Priority claimed from US10/366,604 external-priority patent/US6946119B2/en
Application filed filed Critical
Publication of JP2006517903A publication Critical patent/JP2006517903A/ja
Publication of JP2006517903A5 publication Critical patent/JP2006517903A5/ja
Application granted granted Critical
Publication of JP5025259B2 publication Critical patent/JP5025259B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2006503570A 2003-02-14 2004-02-10 表面積が低い沈降シリカ生成物、それらを含む歯磨き剤および方法 Expired - Fee Related JP5025259B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/366,604 US6946119B2 (en) 2003-02-14 2003-02-14 Precipitated silica product with low surface area, dentifrices containing same, and processes
US10/366,604 2003-02-14
PCT/US2004/004338 WO2004073380A2 (en) 2003-02-14 2004-02-10 Precipitated silica product with low surface area, dentifrices containing same, and processes

Publications (3)

Publication Number Publication Date
JP2006517903A JP2006517903A (ja) 2006-08-03
JP2006517903A5 true JP2006517903A5 (enExample) 2007-03-29
JP5025259B2 JP5025259B2 (ja) 2012-09-12

Family

ID=32849785

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2006503477A Expired - Fee Related JP4927527B2 (ja) 2003-02-14 2004-02-09 沈降シリカ生成物、それらを含む歯磨き剤および方法
JP2006503570A Expired - Fee Related JP5025259B2 (ja) 2003-02-14 2004-02-10 表面積が低い沈降シリカ生成物、それらを含む歯磨き剤および方法

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP2006503477A Expired - Fee Related JP4927527B2 (ja) 2003-02-14 2004-02-09 沈降シリカ生成物、それらを含む歯磨き剤および方法

Country Status (4)

Country Link
US (2) US6946119B2 (enExample)
EP (1) EP1596817B1 (enExample)
JP (2) JP4927527B2 (enExample)
WO (1) WO2004073380A2 (enExample)

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US7306788B2 (en) * 2004-11-24 2007-12-11 J.M. Huber Corporation High-cleaning/moderate abrasive silica materials and dentifrice containing such materials
US7303742B2 (en) * 2004-11-24 2007-12-04 J.M. Huber Corporation Viscosity-modifying silica materials that exhibit low cleaning and abrasive levels and dentifrices thereof
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US9155310B2 (en) 2011-05-24 2015-10-13 Agienic, Inc. Antimicrobial compositions for use in products for petroleum extraction, personal care, wound care and other applications
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US11352551B2 (en) 2012-11-26 2022-06-07 Agienic, Inc. Proppant coatings containing antimicrobial agents
JP5868310B2 (ja) * 2012-12-11 2016-02-24 合同会社地球環境・麦飯石研究所 歯垢除去剤
US20140271900A1 (en) * 2013-03-15 2014-09-18 J.M. Huber Corporation High Cleaning Silica with Low Abrasion and Method for Making Same
CN103274422B (zh) * 2013-05-31 2016-03-30 肇庆金三江硅材料有限公司 核壳型沉淀二氧化硅、制备方法及含有该二氧化硅的牙膏
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CN104276577B (zh) * 2014-09-22 2016-08-24 无锡恒诚硅业有限公司 一种具有颗粒均一性的沉淀二氧化硅、制备方法及其用途
PL3355862T3 (pl) * 2015-09-28 2020-11-30 Evonik Operations Gmbh Doustne kompozycje przeciwdrobnoustrojowe na bazie krzemionki
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US11173471B2 (en) * 2016-11-24 2021-11-16 Universidad De Los Andes Oxygen-absorbent composition comprising a silica matrix that encapsulates fatty acids, unsaturated esters or compounds containing same, and method for producing said composition
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CN108383130A (zh) * 2018-05-04 2018-08-10 福建远翔新材料股份有限公司 一种沉淀水合二氧化硅的合成方法
FI3807217T3 (fi) 2018-06-12 2023-11-02 Evonik Operations Gmbh Pallomaisia tinayhteensopivia silikapartikkeleita pienempää rda-arvoa varten
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CN111017933B (zh) * 2020-01-13 2021-09-03 福建省三明正元化工有限公司 一种高比表面积二氧化硅的制备方法
US11279849B2 (en) 2020-05-21 2022-03-22 Kraton Polymers Llc Deodorized rosin ester and methods for making
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