JP2006517486A5 - - Google Patents

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Publication number
JP2006517486A5
JP2006517486A5 JP2006503138A JP2006503138A JP2006517486A5 JP 2006517486 A5 JP2006517486 A5 JP 2006517486A5 JP 2006503138 A JP2006503138 A JP 2006503138A JP 2006503138 A JP2006503138 A JP 2006503138A JP 2006517486 A5 JP2006517486 A5 JP 2006517486A5
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JP
Japan
Prior art keywords
polymer film
stretching
biaxially stretched
orthogonal
plane retardance
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JP2006503138A
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English (en)
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JP2006517486A (ja
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Priority claimed from US10/364,940 external-priority patent/US7132065B2/en
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Publication of JP2006517486A publication Critical patent/JP2006517486A/ja
Publication of JP2006517486A5 publication Critical patent/JP2006517486A5/ja
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Claims (5)

  1. a)押出高分子フィルムを提供するステップと;
    )第1の方向に該高分子フィルムを延伸するステップと;
    )該第1の方向と異なる第2の方向に該高分子フィルムを延伸して二軸延伸高分子フィルムを形成するステップであって、該第2の方向に該高分子フィルムを延伸するステップの少なくとも一部分は、該第1の方向に該高分子フィルムを延伸するステップと同時に行われるステップと;
    を含む、光学フィルムの作製方法であって、
    該二軸延伸高分子フィルムが、長さと幅を有し、少なくとも1つの偏光状態の可視光に対して実質的に非吸収性かつ非散乱性であり;さらにx、y、およびz直交方向屈折率を有し、該直交方向屈折率の少なくとも2つが等しくなく、面内リターダンスが100nm以下であり、そして面外リターダンスが50nm以上である方法。
  2. a)押出高分子フィルムを提供するステップと;
    )第1の方向に高分子フィルムを延伸するステップと;
    )該第1の方向と異なる第2の方向に該高分子フィルムを延伸して二軸延伸高分子フィルムを形成するステップであって、該第2の方向に該高分子フィルムを延伸するステップの少なくとも一部分は、該第1の方向に該高分子フィルムを延伸するステップと同時に行われるステップと;
    を含む、光学フィルムの作製方法であって、
    該二軸延伸高分子フィルムが、少なくとも1つの偏光状態の可視光に対して実質的に非吸収性かつ非散乱性であり;さらに、x、y、およびz直交方向屈折率(ここで、該直交方向屈折率の少なくとも2つは等しくなく、面内リターダンスは100nm以下であり、そして面外リターダンスは50nm以上である)ならびに少なくとも0.65メートルの長さおよび幅を有し、そして該面内リターダンスおよび該面外リターダンスが、該長さおよび該幅を横切って実質的に均一である方法。
  3. a)押出高分子フィルムを提供するステップと;
    )第1の方向に高分子フィルムを延伸するステップと;
    )該第1の方向と異なる第2の方向に該高分子フィルムを延伸して二軸延伸高分子フィルムを形成するステップであって、該第2の方向に該高分子フィルムを延伸するステップの少なくとも一部分は、該第1の方向に該高分子フィルムを延伸するステップと同時に行われるステップと;
    を含む、光学フィルムの作製方法であって、
    該二軸延伸高分子フィルムが、長さと幅を有し、少なくとも1つの偏光状態の可視光に対して実質的に非吸収性かつ非散乱性であり;さらに、x、y、およびz直交方向屈折率(ここで、該直交方向屈折率の少なくとも2つは等しくなく、面内リターダンスは100nm以下であり、そして面外リターダンスは50nm以上である)ならびに5ミクロン〜200ミクロンの厚さを有する方法。
  4. a)結晶化調整剤を含む高分子フィルムを提供するステップと;
    b)第1の方向に該高分子フィルムを延伸するステップと;
    c)該第1の方向と異なる第2の方向に該高分子フィルムを延伸して二軸延伸高分子フィルムを形成するステップであって、該第2の方向に該高分子フィルムを延伸するステップの少なくとも一部分は、該第1の方向に該高分子フィルムを延伸するステップと同時に行われるステップと;
    を含む、光学フィルムの作製方法であって、
    該二軸延伸高分子フィルムが、長さと幅を有し、少なくとも1つの偏光状態の可視光に対して実質的に非吸収性かつ非散乱性であり;さらにx、y、およびz直交方向屈折率を有し、該直交方向屈折率の少なくとも2つが等しくなく、面内リターダンスが100nm以下であり、そして面外リターダンスが50nm以上である、方法。
  5. a)押出高分子フィルムを提供するステップと;
    b)第1の方向に高分子フィルムを延伸するステップと;
    c)該第1の方向と異なる第2の方向に該高分子フィルムを延伸して二軸延伸高分子フィルムを形成するステップであって、該第2の方向に該高分子フィルムを延伸するステップが、該第1の方向に該高分子フィルムを延伸するステップに引き続いて行われるステップと;
    を含む、光学フィルムの作製方法であって、
    該二軸延伸高分子フィルムが、長さと幅を有し、少なくとも1つの偏光状態の可視光に対して実質的に非吸収性かつ非散乱性であり;該二軸延伸高分子フィルムが、x、y、およびz直交方向屈折率を有し、該直交方向屈折率の少なくとも2つが等しくなく、面内リターダンスが100nm以下であり、そして面外リターダンスが50nm以上である、方法。
JP2006503138A 2003-02-12 2004-01-29 高分子光学フィルムの製造方法 Withdrawn JP2006517486A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/364,940 US7132065B2 (en) 2003-02-12 2003-02-12 Process for manufacturing polymeric optical film
PCT/US2004/002505 WO2004072712A2 (en) 2003-02-12 2004-01-29 Process for manufacturing polymeric optical film

Publications (2)

Publication Number Publication Date
JP2006517486A JP2006517486A (ja) 2006-07-27
JP2006517486A5 true JP2006517486A5 (ja) 2007-04-19

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JP2006503138A Withdrawn JP2006517486A (ja) 2003-02-12 2004-01-29 高分子光学フィルムの製造方法

Country Status (7)

Country Link
US (3) US7132065B2 (ja)
EP (1) EP1592543A2 (ja)
JP (1) JP2006517486A (ja)
KR (1) KR20050099998A (ja)
CN (1) CN100355550C (ja)
TW (1) TW200505668A (ja)
WO (1) WO2004072712A2 (ja)

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