JP2006515472A5 - - Google Patents
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- Publication number
- JP2006515472A5 JP2006515472A5 JP2006501321A JP2006501321A JP2006515472A5 JP 2006515472 A5 JP2006515472 A5 JP 2006515472A5 JP 2006501321 A JP2006501321 A JP 2006501321A JP 2006501321 A JP2006501321 A JP 2006501321A JP 2006515472 A5 JP2006515472 A5 JP 2006515472A5
- Authority
- JP
- Japan
- Prior art keywords
- inspection system
- anomaly
- level information
- system parameters
- displaying
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007689 inspection Methods 0.000 claims 43
- 238000000034 method Methods 0.000 claims 17
- 230000007547 defect Effects 0.000 claims 11
- 230000005856 abnormality Effects 0.000 claims 5
- 230000003287 optical effect Effects 0.000 claims 2
- 239000004065 semiconductor Substances 0.000 claims 2
- GNFTZDOKVXKIBK-UHFFFAOYSA-N 3-(2-methoxyethoxy)benzohydrazide Chemical compound COCCOC1=CC=CC(C(=O)NN)=C1 GNFTZDOKVXKIBK-UHFFFAOYSA-N 0.000 claims 1
- FGUUSXIOTUKUDN-IBGZPJMESA-N C1(=CC=CC=C1)N1C2=C(NC([C@H](C1)NC=1OC(=NN=1)C1=CC=CC=C1)=O)C=CC=C2 Chemical compound C1(=CC=CC=C1)N1C2=C(NC([C@H](C1)NC=1OC(=NN=1)C1=CC=CC=C1)=O)C=CC=C2 FGUUSXIOTUKUDN-IBGZPJMESA-N 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/644,319 | 2003-08-20 | ||
| US10/644,319 US6985220B1 (en) | 2003-08-20 | 2003-08-20 | Interactive threshold tuning |
| PCT/US2004/026548 WO2005036634A2 (en) | 2003-08-20 | 2004-08-16 | Interactive threshold tuning in an inspection system |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010204492A Division JP5371916B2 (ja) | 2003-08-20 | 2010-09-13 | 検査システムにおける対話型閾値調整方法及びシステム |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2006515472A JP2006515472A (ja) | 2006-05-25 |
| JP2006515472A5 true JP2006515472A5 (enExample) | 2006-07-06 |
| JP5268253B2 JP5268253B2 (ja) | 2013-08-21 |
Family
ID=34435295
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006501321A Expired - Lifetime JP5268253B2 (ja) | 2003-08-20 | 2004-08-16 | 対話型閾値調整 |
| JP2010204492A Expired - Lifetime JP5371916B2 (ja) | 2003-08-20 | 2010-09-13 | 検査システムにおける対話型閾値調整方法及びシステム |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010204492A Expired - Lifetime JP5371916B2 (ja) | 2003-08-20 | 2010-09-13 | 検査システムにおける対話型閾値調整方法及びシステム |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US6985220B1 (enExample) |
| EP (1) | EP1656596B1 (enExample) |
| JP (2) | JP5268253B2 (enExample) |
| AT (1) | ATE518175T1 (enExample) |
| WO (1) | WO2005036634A2 (enExample) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20070258085A1 (en) * | 2006-05-02 | 2007-11-08 | Robbins Michael D | Substrate illumination and inspection system |
| CN101297294A (zh) * | 2004-05-21 | 2008-10-29 | 派拉斯科技术公司 | 图形重新检验用户设置界面 |
| US7471382B2 (en) * | 2004-10-04 | 2008-12-30 | Kla-Tencor Technologies Corporation | Surface inspection system with improved capabilities |
| US20090116727A1 (en) * | 2006-05-02 | 2009-05-07 | Accretech Usa, Inc. | Apparatus and Method for Wafer Edge Defects Detection |
| US20090122304A1 (en) * | 2006-05-02 | 2009-05-14 | Accretech Usa, Inc. | Apparatus and Method for Wafer Edge Exclusion Measurement |
| US7508504B2 (en) * | 2006-05-02 | 2009-03-24 | Accretech Usa, Inc. | Automatic wafer edge inspection and review system |
| US7433033B2 (en) * | 2006-05-05 | 2008-10-07 | Asml Netherlands B.V. | Inspection method and apparatus using same |
| US8126255B2 (en) * | 2007-09-20 | 2012-02-28 | Kla-Tencor Corp. | Systems and methods for creating persistent data for a wafer and for using persistent data for inspection-related functions |
| US8000922B2 (en) * | 2008-05-29 | 2011-08-16 | Kla-Tencor Corp. | Methods and systems for generating information to be used for selecting values for one or more parameters of a detection algorithm |
| FR2973110B1 (fr) * | 2011-03-25 | 2013-04-26 | Snecma | Procede d'inspection des impacts observes dans des carters de soufflante |
| EP2828882B1 (en) * | 2012-03-19 | 2019-09-18 | Kla-Tencor Corporation | Method, computer system and apparatus for recipe generation for automated inspection semiconductor devices |
| US9222895B2 (en) | 2013-02-25 | 2015-12-29 | Kla-Tencor Corp. | Generalized virtual inspector |
| DE102013014112A1 (de) * | 2013-08-22 | 2015-02-26 | J.G. WEISSER SöHNE GMBH & CO. KG | Maschine und Verfahren zur Diagnose einer Maschine |
| US9816939B2 (en) | 2014-07-22 | 2017-11-14 | Kla-Tencor Corp. | Virtual inspection systems with multiple modes |
| KR102084535B1 (ko) | 2016-03-30 | 2020-03-05 | 가부시키가이샤 히다치 하이테크놀로지즈 | 결함 검사 장치, 결함 검사 방법 |
| US10372113B2 (en) * | 2016-09-23 | 2019-08-06 | Kla-Tencor Corporation | Method for defocus detection |
| US10737446B2 (en) * | 2017-04-28 | 2020-08-11 | The Boeing Company | Process control of a composite fabrication process |
| JP7455607B2 (ja) | 2020-02-19 | 2024-03-26 | キヤノン株式会社 | 画像処理装置、サーバ装置、制御方法およびプログラム |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU627658B2 (en) * | 1990-06-13 | 1992-08-27 | Aluminium Company Of America | Video inspection system |
| KR100269942B1 (ko) * | 1998-02-03 | 2000-10-16 | 윤종용 | 반도체제조설비관리방법 |
| JP4163344B2 (ja) * | 1999-03-05 | 2008-10-08 | 株式会社東芝 | 基板検査方法および基板検査システム |
| JP2001168160A (ja) * | 1999-12-07 | 2001-06-22 | Sony Corp | 半導体ウェハの検査システム |
| JP2001304842A (ja) * | 2000-04-25 | 2001-10-31 | Hitachi Ltd | パターン検査方法及びその装置並びに基板の処理方法 |
| JP2001331784A (ja) * | 2000-05-18 | 2001-11-30 | Hitachi Ltd | 欠陥分類方法及びその装置 |
| US6898305B2 (en) * | 2001-02-22 | 2005-05-24 | Hitachi, Ltd. | Circuit pattern inspection method and apparatus |
| JP2002303586A (ja) * | 2001-04-03 | 2002-10-18 | Hitachi Ltd | 欠陥検査方法及び欠陥検査装置 |
| US6833913B1 (en) * | 2002-02-26 | 2004-12-21 | Kla-Tencor Technologies Corporation | Apparatus and methods for optically inspecting a sample for anomalies |
| JP2003059991A (ja) * | 2002-05-27 | 2003-02-28 | Hitachi Ltd | 外観検査装置および外観検査方法 |
-
2003
- 2003-08-20 US US10/644,319 patent/US6985220B1/en not_active Expired - Lifetime
-
2004
- 2004-08-16 WO PCT/US2004/026548 patent/WO2005036634A2/en not_active Ceased
- 2004-08-16 EP EP04809572A patent/EP1656596B1/en not_active Expired - Lifetime
- 2004-08-16 AT AT04809572T patent/ATE518175T1/de not_active IP Right Cessation
- 2004-08-16 JP JP2006501321A patent/JP5268253B2/ja not_active Expired - Lifetime
-
2010
- 2010-09-13 JP JP2010204492A patent/JP5371916B2/ja not_active Expired - Lifetime
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