JP2006344545A - 有機el素子の製造方法および有機el素子 - Google Patents
有機el素子の製造方法および有機el素子 Download PDFInfo
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- JP2006344545A JP2006344545A JP2005170597A JP2005170597A JP2006344545A JP 2006344545 A JP2006344545 A JP 2006344545A JP 2005170597 A JP2005170597 A JP 2005170597A JP 2005170597 A JP2005170597 A JP 2005170597A JP 2006344545 A JP2006344545 A JP 2006344545A
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- organic
- light emitting
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 33
- 238000007639 printing Methods 0.000 claims abstract description 55
- 238000011161 development Methods 0.000 claims description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 4
- 238000000034 method Methods 0.000 abstract description 49
- 239000000758 substrate Substances 0.000 abstract description 34
- 238000005516 engineering process Methods 0.000 abstract description 2
- 239000000976 ink Substances 0.000 description 29
- 239000000463 material Substances 0.000 description 27
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 24
- 239000011347 resin Substances 0.000 description 12
- 229920005989 resin Polymers 0.000 description 12
- 238000000576 coating method Methods 0.000 description 9
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 8
- 239000011521 glass Substances 0.000 description 8
- 230000005525 hole transport Effects 0.000 description 8
- 238000007740 vapor deposition Methods 0.000 description 8
- 239000008096 xylene Substances 0.000 description 8
- 238000007774 anilox coating Methods 0.000 description 6
- 229920001971 elastomer Polymers 0.000 description 6
- 239000005060 rubber Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 229920000642 polymer Polymers 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- 229920001609 Poly(3,4-ethylenedioxythiophene) Polymers 0.000 description 4
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 239000011159 matrix material Substances 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 239000002861 polymer material Substances 0.000 description 4
- 230000008961 swelling Effects 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 239000002635 aromatic organic solvent Substances 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 229920001477 hydrophilic polymer Polymers 0.000 description 3
- 238000007645 offset printing Methods 0.000 description 3
- 229920002647 polyamide Polymers 0.000 description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- NRCMAYZCPIVABH-UHFFFAOYSA-N Quinacridone Chemical compound N1C2=CC=CC=C2C(=O)C2=C1C=C1C(=O)C3=CC=CC=C3NC1=C2 NRCMAYZCPIVABH-UHFFFAOYSA-N 0.000 description 2
- 229920002678 cellulose Polymers 0.000 description 2
- 239000001913 cellulose Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
- 238000007644 letterpress printing Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 229920000767 polyaniline Polymers 0.000 description 2
- 229920000412 polyarylene Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- MGADZUXDNSDTHW-UHFFFAOYSA-N 2H-pyran Chemical compound C1OC=CC=C1 MGADZUXDNSDTHW-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 238000012356 Product development Methods 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 229920000109 alkoxy-substituted poly(p-phenylene vinylene) Polymers 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- RJGDLRCDCYRQOQ-UHFFFAOYSA-N anthrone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3CC2=C1 RJGDLRCDCYRQOQ-UHFFFAOYSA-N 0.000 description 1
- -1 aromatic carbonyl compounds Chemical class 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000007611 bar coating method Methods 0.000 description 1
- XJHABGPPCLHLLV-UHFFFAOYSA-N benzo[de]isoquinoline-1,3-dione Chemical class C1=CC(C(=O)NC2=O)=C3C2=CC=CC3=C1 XJHABGPPCLHLLV-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000010549 co-Evaporation Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- HHNHBFLGXIUXCM-GFCCVEGCSA-N cyclohexylbenzene Chemical compound [CH]1CCCC[C@@H]1C1=CC=CC=C1 HHNHBFLGXIUXCM-GFCCVEGCSA-N 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000013013 elastic material Substances 0.000 description 1
- 238000005401 electroluminescence Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 125000005678 ethenylene group Chemical group [H]C([*:1])=C([H])[*:2] 0.000 description 1
- 238000007646 gravure printing Methods 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical class [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000003550 marker Substances 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 229920006285 olefinic elastomer Polymers 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920000172 poly(styrenesulfonic acid) Polymers 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920002098 polyfluorene Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 229940005642 polystyrene sulfonic acid Drugs 0.000 description 1
- RQGPLDBZHMVWCH-UHFFFAOYSA-N pyrrolo[3,2-b]pyrrole Chemical class C1=NC2=CC=NC2=C1 RQGPLDBZHMVWCH-UHFFFAOYSA-N 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
- H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/06—Luminescent, e.g. electroluminescent, chemiluminescent materials containing organic luminescent materials
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
- H05B33/14—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of the electroluminescent material, or by the simultaneous addition of the electroluminescent material in or onto the light source
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/17—Passive-matrix OLED displays
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/17—Passive-matrix OLED displays
- H10K59/179—Interconnections, e.g. wiring lines or terminals
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
- H10K85/113—Heteroaromatic compounds comprising sulfur or selene, e.g. polythiophene
- H10K85/1135—Polyethylene dioxythiophene [PEDOT]; Derivatives thereof
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
- H10K85/114—Poly-phenylenevinylene; Derivatives thereof
Abstract
【解決手段】少なくとも透明電極層と対向電極と有機発光層を含む有機発光媒体層からなり、両電極から有機発光層に電流を流すことにより有機発光層を発光させる有機EL素子の製造方法において、その製造工程中の有機発光層の形成工程を複数の領域に分割して印刷することにより形成することを特徴とする有機EL素子の製造方法を提供するものである。
【選択図】 図1
Description
LCDの生産当初は300mm×350mm基板サイズであったが、今や1500mm×1800mm基板サイズの生産ラインが現実に稼動しており、この大型化による製造コストの削減がLCDの市場拡大に大きく貢献しているのは言うまでもない。
があった。しかし、本発明では有機発光インキは有機溶剤からなるため、親水性が高い方が有機溶剤に対する親和性が低く、インキ耐性が高くなるため好ましく、現像適性とインキ耐性の両立が容易である。
。平台20には、透明電極および正孔輸送層が形成された基板が版材16の凸部による印刷位置にまで図示していない搬送手段によって搬送されるようになっている。そして、版材16の凸部にあるインキは被印刷基板に対してある領域の印刷がされる。
上記実施例の版を550×650mm基板に一度に印刷できる大きさにした(570×670mm)ところ、基板周辺部に位置するディスプレイが、版の縮みにより、形成した発光層のラインが電極上からずれてしまった。
2:透明導電層
3:正孔輸送層
4:蛍光体層
5:陰極層
6:絶縁性レジスト
10:インクタンク
12:インキチャンバー
14:アニロックスロール
14a:インキ層
16:版材
18:版銅
20:平台
22:レーザー照射装置
24:被印刷基板
30:個々のディスプレイ
31:画素部
32:ディスプレイラインパターン
33:アライメントマーク
34:配線接続領域
35:陰極層
Claims (4)
- 少なくとも透明電極層と対向電極と有機発光層を含む有機発光媒体層からなり、両電極から有機発光層に電流を流すことにより有機発光層を発光させる有機EL素子の製造方法において、その製造工程中の有機発光層の形成工程を複数の領域に分割して印刷することにより形成することを特徴とする有機EL素子の製造方法。
- 前記印刷が、水現像により凸部を形成する水現像タイプの凸版により行うものであることを特徴とする請求項1記載の有機EL素子の製造方法。
- 前記分割された各領域の大きさが、500mm角以下であることを特徴とする請求項1または2記載の有機EL素子の製造方法。
- 請求項1乃至3のいずれかに記載の製造方法を用い、有機発光層が形成されたことを特徴とする有機EL素子。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005170597A JP2006344545A (ja) | 2005-06-10 | 2005-06-10 | 有機el素子の製造方法および有機el素子 |
US11/438,786 US20060280859A1 (en) | 2005-06-10 | 2006-05-22 | Manufacturing method of an organic electroluminescent device and an organic electroluminescent device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005170597A JP2006344545A (ja) | 2005-06-10 | 2005-06-10 | 有機el素子の製造方法および有機el素子 |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2006344545A true JP2006344545A (ja) | 2006-12-21 |
Family
ID=37524394
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005170597A Pending JP2006344545A (ja) | 2005-06-10 | 2005-06-10 | 有機el素子の製造方法および有機el素子 |
Country Status (2)
Country | Link |
---|---|
US (1) | US20060280859A1 (ja) |
JP (1) | JP2006344545A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008258249A (ja) * | 2007-04-02 | 2008-10-23 | Dainippon Screen Mfg Co Ltd | パターン形成方法、パターン形成装置および表示装置用の基板 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1990792A4 (en) * | 2006-03-02 | 2014-05-07 | Toshiba Kk | STRUCTURE GENERATION DEVICE AND STRUCTURE MANUFACTURING METHOD |
JP4803321B2 (ja) * | 2009-02-16 | 2011-10-26 | 凸版印刷株式会社 | 有機エレクトロルミネッセンスディスプレイ及びその製造方法 |
Citations (6)
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JPH1167081A (ja) * | 1997-08-15 | 1999-03-09 | Canon Inc | 平板型画像形成装置の製造方法、および平板型画像形成装置 |
JP2001155858A (ja) * | 1999-11-24 | 2001-06-08 | Sharp Corp | 有機el素子の製造方法 |
JP2001185354A (ja) * | 1999-10-12 | 2001-07-06 | Semiconductor Energy Lab Co Ltd | 電気光学装置及びその作製方法 |
JP2001290286A (ja) * | 2000-04-07 | 2001-10-19 | Asahi Kasei Corp | 水現像性固体版樹脂の強化方法 |
JP2003082059A (ja) * | 2001-05-25 | 2003-03-19 | Kyoeisha Chem Co Ltd | 印刷機用印刷版、およびそれを固定する粘着材料 |
JP2003308969A (ja) * | 2002-04-16 | 2003-10-31 | Hitachi Ltd | 有機elディスプレイおよびその製造方法 |
Family Cites Families (8)
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JPH09244253A (ja) * | 1996-03-05 | 1997-09-19 | Nitto Boseki Co Ltd | パターン形成方法 |
US6106352A (en) * | 1998-03-18 | 2000-08-22 | Sanyo Electric Co., Ltd. | Method for fabrication of organic electroluminescent device |
TW556357B (en) * | 1999-06-28 | 2003-10-01 | Semiconductor Energy Lab | Method of manufacturing an electro-optical device |
US6582504B1 (en) * | 1999-11-24 | 2003-06-24 | Sharp Kabushiki Kaisha | Coating liquid for forming organic EL element |
US6655281B1 (en) * | 2000-08-08 | 2003-12-02 | 3M Innovative Properties Company | Flexographic printing elements with improved air bleed |
GB2379412A (en) * | 2001-09-10 | 2003-03-12 | Seiko Epson Corp | Deposition of soluble materials |
EP1338431A3 (en) * | 2002-02-08 | 2003-10-01 | Fuji Photo Film Co., Ltd. | Visible image receiving material having surface hydrophilicity |
GB2391686B (en) * | 2002-07-31 | 2006-03-22 | Dainippon Printing Co Ltd | Electroluminescent display and process for producing the same |
-
2005
- 2005-06-10 JP JP2005170597A patent/JP2006344545A/ja active Pending
-
2006
- 2006-05-22 US US11/438,786 patent/US20060280859A1/en not_active Abandoned
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1167081A (ja) * | 1997-08-15 | 1999-03-09 | Canon Inc | 平板型画像形成装置の製造方法、および平板型画像形成装置 |
JP2001185354A (ja) * | 1999-10-12 | 2001-07-06 | Semiconductor Energy Lab Co Ltd | 電気光学装置及びその作製方法 |
JP2001155858A (ja) * | 1999-11-24 | 2001-06-08 | Sharp Corp | 有機el素子の製造方法 |
JP2001290286A (ja) * | 2000-04-07 | 2001-10-19 | Asahi Kasei Corp | 水現像性固体版樹脂の強化方法 |
JP2003082059A (ja) * | 2001-05-25 | 2003-03-19 | Kyoeisha Chem Co Ltd | 印刷機用印刷版、およびそれを固定する粘着材料 |
JP2003308969A (ja) * | 2002-04-16 | 2003-10-31 | Hitachi Ltd | 有機elディスプレイおよびその製造方法 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008258249A (ja) * | 2007-04-02 | 2008-10-23 | Dainippon Screen Mfg Co Ltd | パターン形成方法、パターン形成装置および表示装置用の基板 |
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Publication number | Publication date |
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US20060280859A1 (en) | 2006-12-14 |
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