JP2006344545A - Method of manufacturing organic el element, and organic el element - Google Patents

Method of manufacturing organic el element, and organic el element Download PDF

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JP2006344545A
JP2006344545A JP2005170597A JP2005170597A JP2006344545A JP 2006344545 A JP2006344545 A JP 2006344545A JP 2005170597 A JP2005170597 A JP 2005170597A JP 2005170597 A JP2005170597 A JP 2005170597A JP 2006344545 A JP2006344545 A JP 2006344545A
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organic
light emitting
printing
organic light
layer
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Takahisa Shimizu
貴央 清水
Kenichi Ota
健一 太田
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Toppan Inc
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Toppan Printing Co Ltd
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • H10K71/12Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/06Luminescent, e.g. electroluminescent, chemiluminescent materials containing organic luminescent materials
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/12Light sources with substantially two-dimensional radiating surfaces
    • H05B33/14Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of the electroluminescent material, or by the simultaneous addition of the electroluminescent material in or onto the light source
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/17Passive-matrix OLED displays
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/17Passive-matrix OLED displays
    • H10K59/179Interconnections, e.g. wiring lines or terminals
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/10Organic polymers or oligomers
    • H10K85/111Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
    • H10K85/113Heteroaromatic compounds comprising sulfur or selene, e.g. polythiophene
    • H10K85/1135Polyethylene dioxythiophene [PEDOT]; Derivatives thereof
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/10Organic polymers or oligomers
    • H10K85/111Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
    • H10K85/114Poly-phenylenevinylene; Derivatives thereof

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a technology for overcoming the present situation in which the largest size of manufacturable flexographic printing plates and reverse printing plates is about 800 mm square and printing on larger-sized substrates is impossible. <P>SOLUTION: This method of manufacturing an organic EL element comprising at least a transparent electrode layer, counter electrodes and an organic luminescent medium layer including an organic luminescent layer and allowing the organic luminescent layer to emit light by allowing a current to flow from both electrodes to the organic luminescent layer, is characterized in that a forming process of the organic luminescent layer in the manufacturing process is divided in a plurality of regions for printing to form the organic luminescent layer. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、有機発光材料が高分子材料である有機EL素子の製造方法および有機EL素子に関し、特に凸版印刷法によって有機発光層を形成する有機EL素子および有機ELディスプレイの製造方法および有機EL素子に関する。   The present invention relates to a method for manufacturing an organic EL element and an organic EL element in which an organic light emitting material is a polymer material, and more particularly to an organic EL element for forming an organic light emitting layer by a relief printing method, a method for manufacturing an organic EL display, and an organic EL element About.

近年、液晶表示装置(以下LCD)に代表されるフラットパネルディスプレイ(以下FPD)の製品開発が著しい。   In recent years, product development of flat panel displays (hereinafter referred to as FPD) represented by liquid crystal display devices (hereinafter referred to as LCD) has been remarkable.

特にLCDでは、小型のビューファインダー、携帯、中型のノートPC、モニター、大型のTV等にて、広範囲のアプリケーションに適用されている。   In particular, LCDs are applied to a wide range of applications such as small viewfinders, mobile phones, medium-sized notebook PCs, monitors, large TVs, and the like.

LCDの生産面では、マザーガラスの大型化によるパネル多面取りにて生産効率の増強が進み、より低コストのLCDパネルの供給が可能となっている.
LCDの生産当初は300mm×350mm基板サイズであったが、今や1500mm×1800mm基板サイズの生産ラインが現実に稼動しており、この大型化による製造コストの削減がLCDの市場拡大に大きく貢献しているのは言うまでもない。
On the LCD production side, the production efficiency has been increased by increasing the size of the mother glass and increasing the number of panels, making it possible to supply lower-cost LCD panels.
LCD production was initially 300mm x 350mm substrate size, but now a production line with 1500mm x 1800mm substrate size is actually in operation, and the reduction in manufacturing cost due to this increase in size has greatly contributed to the expansion of the LCD market. Needless to say.

かたや、LCDに変わるFPDとして、有機エレクトロルミネッセンス(以下有機EL)の技術開発が著しい。   On the other hand, the technical development of organic electroluminescence (hereinafter referred to as organic EL) is remarkable as an FPD replacing the LCD.

有機ELは自発光の表示素子であり、表示品位に優れた表示が得られる。   The organic EL is a self-luminous display element, and a display excellent in display quality can be obtained.

またLCDが光源としてのバックライト、色彩表示の為のカラーフィルター、かつ偏光板や位相差板等の各種光学フィルムを必要とするのに対し、有機ELはこれらの部材を一切必要としない。   Further, the LCD requires a backlight as a light source, a color filter for color display, and various optical films such as a polarizing plate and a retardation plate, whereas the organic EL does not require any of these members.

部材の調達、コストの面でもLCDより優位性があると考えられる。   It is considered that there is an advantage over LCD in terms of material procurement and cost.

有機ELにおいてもLCDと同様に、薄膜トランジスタ(Thin Film Transistor:以下TFT)でのアクティブマトリクス駆動を適用することにより、モニターやTVで要求される高密度高精細な表示が可能となる。   In the organic EL, similarly to the LCD, by applying active matrix driving with a thin film transistor (hereinafter referred to as TFT), high-density and high-definition display required for a monitor or a TV can be realized.

現状、LCDではアモルフアスシリコン(以下α−Si)を半導体として用いるTFTと、低温ポリシリコン(以下LTPS)を半導体として用いるTFTとの2種類が量産化されている。   Currently, LCDs are mass-produced in two types: TFTs using amorphous silicon (hereinafter α-Si) as a semiconductor and TFTs using low-temperature polysilicon (hereinafter LTPS) as a semiconductor.

α−SiTFTの生産ラインは既に1500mm×1800mmサイズのガラスを使用しており、大型化が難しいとされていたLTPSTFTにおいても730mm×920mmサイズのガラス基板が既に使用されている。   The α-Si TFT production line already uses glass of 1500 mm × 1800 mm size, and a glass substrate of 730 mm × 920 mm size is already used even in LTPSTFT, which has been considered difficult to increase in size.

有機ELのアクティブマトリクス駆動のTFTは、α−SiでもLTPSでもどちらでも可能である。その意味では、有機EL用のTFT生産ラインは、現状のLCD用TFT生産ラインをそのまま転用使用することが可能である。   The organic EL active matrix driving TFT can be either α-Si or LTPS. In that sense, the TFT production line for organic EL can be diverted and used as it is for the current LCD TFT production line.

このことは、有機ELの生産ライン構築においては現行TFTラインの転用にて新たな設備投資が不要となり、かつ大型化における新たな技術開発も不要となる。   This means that in the construction of an organic EL production line, a new capital investment is not required due to the diversion of the current TFT line, and a new technology development for an increase in size is not required.

よって、初期投資コストの大幅削減が可能である。   Therefore, the initial investment cost can be greatly reduced.

一方、有機ELにおいては、低分子発光材料を昇華蒸着することで発光層を形成する方法が確立し、量産に到っている。   On the other hand, in organic EL, a method for forming a light emitting layer by sublimation vapor deposition of a low molecular light emitting material has been established, and mass production has been achieved.

しかしながら、蒸着法はパターン化においてメタルマスクが必要となり、このメタルマスクの大型化対応が進まず、現状では500mm角までが生産出来る最大サイズとなっている。   However, the vapor deposition method requires a metal mask for patterning, and the metal mask does not respond to an increase in size, and is currently the maximum size that can be produced up to 500 mm square.

これに対し、最近では有機発光材料に高分子材料を用い、有機発光材料を溶剤に溶かして塗工液にし、これをウェットコーティング法で薄膜形成する方法が試みられるようになってきている。薄膜形成するためのウェットコーティング法としては、スピンコート法、バーコート法、突出コート法、ディップコート法等があるが、高精細にパターニングしたりRGB3色に塗り分けしたりするためには、これらのウェットコーティング法では難しく、塗り分け、パターニングを得意とする印刷法による薄膜形成が最も有効であると考えられる。   On the other hand, recently, a method of using a polymer material as an organic light emitting material, dissolving the organic light emitting material in a solvent to form a coating liquid, and forming a thin film by a wet coating method has been tried. As the wet coating method for forming a thin film, there are a spin coating method, a bar coating method, a protruding coating method, a dip coating method, and the like. However, it is considered difficult to form a thin film by a printing method that is good at coating and patterning.

さらに、各種印刷法のなかでも、有機EL素子やディスプレイでは、基板としてガラス基板を用いることが多いため、グラビア印刷法等のように金属製の印刷版等の硬い版を用いる方法は不向きであり、弾性を有するゴムブランケットを用いるオフセット印刷法や同じく弾性を有するゴム版や感光性樹脂版を用いる凸版印刷法が適正である。実際にこれらの印刷法による試みとして、オフセット印刷による方法(特許文献1)、凸版印刷による方法(特許文献2)などが提唱されている。   Further, among various printing methods, organic EL elements and displays often use a glass substrate as a substrate, so that a method using a hard plate such as a metal printing plate such as a gravure printing method is not suitable. An offset printing method using an elastic rubber blanket and a relief printing method using an elastic rubber plate or a photosensitive resin plate are also appropriate. Actually, as an attempt by these printing methods, a method by offset printing (Patent Document 1), a method by letterpress printing (Patent Document 2), and the like have been proposed.

特許文献は以下の通りである。
特開2001-93668号公報 特開2001-155858号公報
Patent documents are as follows.
JP 2001-93668 A Japanese Patent Laid-Open No. 2001-155858

大型基板への高分子発光材料を用いた印刷法では、印刷版のサイズが問題になる。   In a printing method using a polymer light emitting material on a large substrate, the size of the printing plate becomes a problem.

現状、作製可能なフレキソ印刷版、反転印刷版の最大サイズは800mm角程度であり、それ以上の大型基板への印刷は不可能となる。   At present, the maximum size of a flexographic printing plate and a reverse printing plate that can be produced is about 800 mm square, and printing on a large substrate beyond that is impossible.

また、モニター、TV等の高密度高精細のマトリクス表示を実現させる為には、下地電極基板(アクティブマトリクス駆動の場合はTFT基板)とのパターン位置整合の為、高い印刷精度が要求される。   Further, in order to realize a high-density and high-definition matrix display such as a monitor or a TV, high printing accuracy is required for pattern position matching with a base electrode substrate (TFT substrate in the case of active matrix driving).

現行のフレキソ印刷法、反転印刷法での印刷精度は、500mm基板での基板両端間のトータルピッチ精度として±20μmである。   The printing accuracy in the current flexographic printing method and reverse printing method is ± 20 μm as the total pitch accuracy between both ends of a 500 mm substrate.

しかしながら基板サイズが大きくなるとこのトータルピッチ精度はより大きくなる。   However, the total pitch accuracy increases as the substrate size increases.

有機ELにてVGA(Video graphics array:640×480ドットのグラフィック画面)クラスのディスプレイを実現させる為には、パターンの整合精度として±20μm必要となる。   In order to realize a VGA (Video graphics array: 640 × 480 dot graphic screen) class display in an organic EL, a pattern matching accuracy of ± 20 μm is required.

よって、トータルピッチ精度の点から、印刷法にて適用出来る基板サイズはおのずと、500mm角サイズ以下となってしまう。   Therefore, from the viewpoint of total pitch accuracy, the substrate size applicable by the printing method is naturally 500 mm square size or less.

請求項1に係る本願発明においては、少なくとも透明電極層と対向電極と有機発光層を含む有機発光媒体層からなり、両電極から有機発光層に電流を流すことにより有機発光層を発光させる有機EL素子の製造方法において、その製造工程中の有機発光層の形成工程を複数の領域に分割して印刷することにより形成することを特徴とする有機EL素子の製造方法を提供するものである。   In this invention concerning Claim 1, it consists of an organic light emitting medium layer containing at least a transparent electrode layer, a counter electrode, and an organic light emitting layer, and an organic EL that emits light from the organic light emitting layer by flowing current from both electrodes to the organic light emitting layer. In the element manufacturing method, the organic light emitting layer forming process in the manufacturing process is formed by dividing into a plurality of regions and printing.

請求項2に係る本願発明においては、前記印刷が、水現像により凸部を形成する水現像タイプの凸版により行うものであることを特徴とする請求項1記載の有機EL素子の製造方法を提供するものである。   According to a second aspect of the present invention, there is provided the method for producing an organic EL element according to the first aspect, wherein the printing is performed by a water development type relief plate that forms a convex portion by water development. To do.

請求項3に係る本願発明においては、前記分割された各領域の大きさが、500mm角以下であることを特徴とする請求項1または2記載の有機EL素子の製造方法を提供するものである。   In this invention which concerns on Claim 3, the magnitude | size of the said each area | region divided | segmented is 500 mm square or less, The manufacturing method of the organic EL element of Claim 1 or 2 characterized by the above-mentioned is provided. .

請求項4に係る本願発明においては、請求項1乃至3のいずれかに記載の製造方法を用い、有機発光層が形成されたことを特徴とする有機EL素子を提供するものである。   According to a fourth aspect of the present invention, there is provided an organic EL element in which an organic light emitting layer is formed using the manufacturing method according to any one of the first to third aspects.

本発明によれば、フレキソ印刷法により有機EL素子を作製するため多面どり方法であり、版の縮み等による版の歪みの影響を与えることなく、有機ELディスプレイ等の高精細な印刷を行うことが出きる。   According to the present invention, it is a multi-faceted method for producing an organic EL element by a flexographic printing method, and performs high-definition printing of an organic EL display or the like without affecting the distortion of the plate due to shrinkage of the plate. Comes out.

請求項1に係る本発明では、現行のフレキソ印刷法、反転印刷法を用いるにもかかわらず、500mm角サイズ以上の、トータルピッチ精度として±20μm以下の有機EL素子の製造を、現行のフレキソ印刷法、反転印刷法を用いながらも適用可能になり、例えば、800mm角サイズの様な有機EL素子の製造が可能になった。   In the present invention according to claim 1, in spite of using the current flexographic printing method and the reverse printing method, an organic EL element having a total pitch accuracy of ± 20 μm or less is manufactured at a size of 500 mm square or larger. For example, an organic EL element having a size of 800 mm square can be manufactured.

請求項2に係る本発明では、請求項1記載の様な製造方法において、従来の印刷に用いるゴムブランケットはトルエンやキシレン等の芳香族有機溶剤によって膨潤や変形を起こしやすいという問題がある。オフセット印刷は、パターンが形成されている版にインキを付け、そのインキを弾性をもつブランケットに転移させ、さらにブランケットから印刷基材にインキを転写することで印刷する方式であるが、インキの転移を仲介するブランケットは弾性をもつことが要求され、一般にゴム製のものが使用される。使用されるゴムの種類はオレフィン系のゴムからシリコーン系のゴムまで多様であるが、いずれのゴムもトルエン、キシレンといった芳香族系有機溶剤に対して膨潤や変形が起こりやすい。   In the present invention according to claim 2, in the manufacturing method as described in claim 1, there is a problem that a rubber blanket used for conventional printing is likely to swell or deform due to an aromatic organic solvent such as toluene or xylene. Offset printing is a system in which ink is applied to a plate on which a pattern is formed, the ink is transferred to an elastic blanket, and the ink is transferred from the blanket to the printing substrate. The blanket that mediates is required to have elasticity, and rubber is generally used. The types of rubbers used vary from olefinic rubbers to silicone rubbers, but all rubbers are prone to swelling and deformation with respect to aromatic organic solvents such as toluene and xylene.

これに対し、水現像タイプの感光性樹脂版ではインキに対する耐性が乏しく、版が膨潤、変形してしまい、良質な印刷物が得られなくなってしまう問題を解決し、有機発光インキを構成する有機溶剤による樹脂凸版の膨潤、変形が低減され、パターン印刷することが可能となった。   In contrast, the water-developable photosensitive resin plate has poor resistance to ink, solves the problem that the plate swells and deforms, and a high-quality printed matter cannot be obtained, and an organic solvent constituting the organic light-emitting ink. Swelling and deformation of the resin relief printing plate due to the ink were reduced, and pattern printing became possible.

請求項3に係る本発明では、具体的に伸縮性の材料を用いた印刷にもかかわらず材料の伸縮による歪みが生じない構成のトータルピッチ精度を維持可能な具体的な有機EL素子の製造方法を提供することが可能になった。   According to the third aspect of the present invention, there is provided a specific method for manufacturing an organic EL element capable of maintaining the total pitch accuracy of a configuration in which distortion due to material expansion / contraction does not occur despite printing using a specific elastic material. It became possible to provide.

請求項4に係る本発明では、具体的にトータルピッチ精度が高い、例えば±20μm以下の有機EL素子を提供することが可能になった。   In the present invention according to claim 4, it has become possible to provide an organic EL element having specifically high total pitch accuracy, for example, ± 20 μm or less.

本発明の好適な実施の形態を具体的に説明する。なお、本発明はこれに限るものではない。   A preferred embodiment of the present invention will be specifically described. The present invention is not limited to this.

少なくとも透明電極層と対向電極と有機発光層を含む有機発光媒体層からなり、両電極から有機発光層に電流を流すことにより有機発光層を発光させる有機EL素子の製造方法において、その製造工程中の有機発光層の形成工程を複数の領域に分割して印刷することにより形成する。   In an organic EL element manufacturing method comprising an organic light emitting medium layer including at least a transparent electrode layer, a counter electrode, and an organic light emitting layer, and causing the organic light emitting layer to emit light by passing a current from both electrodes to the organic light emitting layer. The organic light emitting layer forming step is divided into a plurality of regions and printed.

具体的には、多面取り(例えば48面取り)用のガラス基板である透光性基板1にフォトリソでエッチングするなどの方法でITOラインを各面に配する様に全面にパターン状に設け、透明電極層とした。なお、基板はガラス基板が一般的であるが、金属基板、樹脂基板でも構わない。   Specifically, the transparent substrate 1 which is a glass substrate for multiple chamfering (for example, 48 chamfering) is provided with a pattern on the entire surface so that the ITO lines are arranged on each surface by a method such as etching with photolithography. An electrode layer was obtained. The substrate is generally a glass substrate, but may be a metal substrate or a resin substrate.

その後、ITO端部をカバーするよう絶縁性レジストをフォトリソ法等の手段でパターン状に設けた。透明電極としては例えばインジウム−錫酸化物(ITO)膜が挙げられる。   Thereafter, an insulating resist was provided in a pattern by means such as a photolithography method so as to cover the ITO end. An example of the transparent electrode is an indium-tin oxide (ITO) film.

続いて洗浄を行った後、正孔輸送層を形成した。例えばポリアニリン(PANI)、3,4-ポリエチレンジオキシチオフェン(PEDOT)が挙げられる。透明電極の形成方法、正孔輸送層の形成方法としては各種塗工方法が用いられるが、透明電極の形成方法としてはドライプロセスのひとつであるスパッタ法、正孔輸送層の形成方法としてはウエットプロセスのひとつであるスピンコート法が用いられる。   Subsequently, after cleaning, a hole transport layer was formed. Examples thereof include polyaniline (PANI) and 3,4-polyethylenedioxythiophene (PEDOT). Various coating methods are used as the transparent electrode forming method and the hole transport layer forming method. The transparent electrode forming method is a sputtering method, which is one of the dry processes, and the wet transport method as the hole transport layer forming method. A spin coating method, which is one of the processes, is used.

続いて、有機発光層を凸版印刷法を用いて領域分割して各領域毎に設けた。この場合、各領域は各領域がトータルピッチ精度を維持できる限界の大きさ以下の大きさに分割し、位置合わせして各領域毎に印刷した。次に、必要に応じて各画素に対応する様にRGBのパターン形成を行った。勿論、単色の場合はこの工程は必要ではない。また、このRGBの各色の形成方法も何等問うものではないが、有機発光層と同様な印刷法で形成しても良い。この場合、トータルピッチ精度が同じであるので、各色の印刷も有機発光層と同様に領域分割して順次形成することとなる。次いで、陰極層をマスク蒸着(必要に応じて分割蒸着)することでパターンで形成して、有機EL素子を作製した。   Subsequently, the organic light emitting layer was divided into regions using a relief printing method and provided for each region. In this case, each area was divided into a size equal to or smaller than a limit size in which each area can maintain the total pitch accuracy, aligned, and printed for each area. Next, RGB patterns were formed so as to correspond to the respective pixels as required. Of course, this step is not necessary for a single color. Further, the formation method of each color of RGB is not particularly limited, but it may be formed by a printing method similar to that of the organic light emitting layer. In this case, since the total pitch accuracy is the same, the printing of each color is sequentially formed by dividing the area in the same manner as the organic light emitting layer. Subsequently, the cathode layer was formed in a pattern by performing mask vapor deposition (divided vapor deposition as necessary) to produce an organic EL element.

この場合、領域間の位置合わせが必要であるので、アライメントマークを事前に形成し、このアライメントマークを用いて位置合わせして印刷を行う。   In this case, since alignment between regions is necessary, an alignment mark is formed in advance, and alignment is performed using this alignment mark for printing.

なお、本発明における凸版は各種のものが用いられるが、膨潤や変形を防止するために水現像タイプの感光性樹脂のものが考えられる。例えば、親水性のポリマーと不飽和結合を含むモノマーと光重合開始材を構成要素とするタイプが挙げられる。このタイプでは親水性ポリマーとしてポリアミド、ポリビニルアルコール、セルロース誘導体が挙げられる。また、不飽和結合を含むモノマーとしては例えばビニル結合を有するメタクリレート類が挙げられ、光重合開始剤としては例えば芳香族カルボニル化合物が挙げられる。中でも、印刷適性の面からポリアミド系の水現像タイプの感光性樹脂が好適である。   In addition, although various types of letterpress are used in the present invention, a water-developing type photosensitive resin is conceivable in order to prevent swelling and deformation. For example, a type having a hydrophilic polymer, a monomer containing an unsaturated bond, and a photopolymerization initiator as constituent elements can be mentioned. In this type, examples of hydrophilic polymers include polyamide, polyvinyl alcohol, and cellulose derivatives. Examples of the monomer containing an unsaturated bond include methacrylates having a vinyl bond, and examples of the photopolymerization initiator include aromatic carbonyl compounds. Among these, a polyamide-based water-developable photosensitive resin is preferable from the viewpoint of printability.

水現像タイプの感光性樹脂は親水性成分を多く含むが、いわいる一般印刷に使われるインキは水、アルコール系であることが多く、水現像タイプの感光性樹脂版は親水性が高いために印刷時に版が膨潤、変形してしまうため、親水性と疎水性のバランスをとる難しさ
があった。しかし、本発明では有機発光インキは有機溶剤からなるため、親水性が高い方が有機溶剤に対する親和性が低く、インキ耐性が高くなるため好ましく、現像適性とインキ耐性の両立が容易である。
Water-developable photosensitive resins contain a lot of hydrophilic components, but so-called general printing inks are often water and alcohol, and water-developable photosensitive resin plates are highly hydrophilic. Since the plate swells and deforms during printing, it is difficult to balance hydrophilicity and hydrophobicity. However, in the present invention, since the organic light-emitting ink is composed of an organic solvent, it is preferable that the hydrophilicity is high because the affinity for the organic solvent is low and the ink resistance is high, and both development suitability and ink resistance are easy.

トルエンの溶解度パラメータ(以下、SP値)は8.9であり、キシレンのSP値は8.8である。対して、ポリアミド(ナイロン)のSP値は13.6、ポリビニルアルコールのSP値は12.6、セルロースのSP値は15.7であり、トルエン、キシレンのSP値と十分に離れていることから、これらの親水性ポリマーからなる水現像タイプの感光性樹脂はトルエン、キシレンに対して十分な耐性を持っていることが分かる。   The solubility parameter (hereinafter referred to as SP value) of toluene is 8.9, and the SP value of xylene is 8.8. On the other hand, the SP value of polyamide (nylon) is 13.6, the SP value of polyvinyl alcohol is 12.6, and the SP value of cellulose is 15.7, which is sufficiently away from the SP values of toluene and xylene. It can be seen that the water-developable photosensitive resin made of these hydrophilic polymers has sufficient resistance to toluene and xylene.

この場合の樹脂凸版は、トルエンまたはキシレンに24時間浸漬したときの膨張率は5%以下となる。したがって、凸版印刷法にて長時間連続で有機発光層の印刷を行なった際に、樹脂凸版の膨潤や変形が低減され、所望のパターンを得ることができる。   In this case, the resin relief printing plate has an expansion rate of 5% or less when immersed in toluene or xylene for 24 hours. Therefore, when the organic light emitting layer is printed continuously for a long time by the letterpress printing method, swelling and deformation of the resin letterpress are reduced, and a desired pattern can be obtained.

樹脂凸版は基材とあわせ版材となり、版材は凸版印刷時に版銅にマウントされる。基材としてはポリエステルシート、スチール板、アルミ板が挙げられる。   The resin relief plate becomes a plate material together with the base material, and the plate material is mounted on the plate copper during relief printing. Examples of the substrate include a polyester sheet, a steel plate, and an aluminum plate.

また、有機発光層に用いられる有機発光材料としては低分子型の有機発光材料と高分子型の有機発光材料に分けられるが、低分子型の有機発光材料は蒸着法といった真空プロセスによって形成されることが多く、本発明では高分子型の有機発光材料が好適である。例えば、クマリン系、ペリレン系、ピラン系、アンスロン系、ポルフィレン系、キナクリドン系、N,N’-ジアルキル置換キナクリドン系、ナフタルイミド系、N,N’-ジアリール置換ピロロピロール系、イリジウム錯体系等の発光性色素をポリスチレン、ポリメチルメタクリレート、ポリビニルカルバゾール等の高分子中に分散させたものや、ポリアリーレン系、ポリアリーレンビニレン系やポリフルオレンといった高分子材料が挙げられる。   The organic light emitting material used for the organic light emitting layer can be divided into a low molecular weight organic light emitting material and a high molecular weight organic light emitting material. The low molecular weight organic light emitting material is formed by a vacuum process such as vapor deposition. In many cases, a polymer type organic light emitting material is suitable in the present invention. For example, coumarin, perylene, pyran, anthrone, porphyrene, quinacridone, N, N′-dialkyl substituted quinacridone, naphthalimide, N, N′-diaryl substituted pyrrolopyrrole, iridium complex, etc. Examples thereof include those obtained by dispersing a luminescent dye in a polymer such as polystyrene, polymethyl methacrylate, and polyvinyl carbazole, and polymer materials such as polyarylene, polyarylene vinylene, and polyfluorene.

有機発光材料を溶解分解させる有機溶剤としてはトルエン、キシレン、アセトン、アニソール、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン等の単独またはこれらの混合溶媒が挙げられる。中でも、トルエン、キシレン、アニソールといった芳香族有機溶剤が有機発光材料の溶解性の面から好適である。なお、有機発光インキには印刷適性を向上させるために各種添加剤を加えても良い。   Examples of the organic solvent for dissolving and decomposing the organic light-emitting material include toluene, xylene, acetone, anisole, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, or a mixed solvent thereof. Among these, aromatic organic solvents such as toluene, xylene, and anisole are preferable from the viewpoint of solubility of the organic light emitting material. Various additives may be added to the organic light emitting ink in order to improve printability.

また、この印刷方法としては有機発光層を形成するための被印刷基板は、基板の上に透明電極が形成されており、その上に高分子の正孔輸送層が形成されている状態に、凸版印刷装置の概略図に示した図6に示すように、有機発光材料からなる有機発光インキを、透明電極及び正孔輸送層が形成された基板上にパターン印刷する。   In addition, as a printing method, a substrate to be printed for forming an organic light emitting layer has a transparent electrode formed on the substrate, and a polymer hole transport layer is formed on the transparent electrode. As shown in FIG. 6 shown in the schematic diagram of the relief printing apparatus, an organic light emitting ink made of an organic light emitting material is pattern-printed on a substrate on which a transparent electrode and a hole transport layer are formed.

本製造装置はインクタンク10とインキチャンバー12とアニロックスロール14と各領域に対応した凸版が設けられた版材16がマウントされた版銅18を有している。この場合、各領域が同じ大きさで同じパターンの場合、同じ凸版を用いて位置を変えることで順次印刷をおこなっていく方式でも構わないことは当然である。   The manufacturing apparatus includes a printing copper 18 on which a printing plate 16 provided with an ink tank 10, an ink chamber 12, an anilox roll 14, and a relief plate corresponding to each region is mounted. In this case, when each region has the same size and the same pattern, it is a matter of course that a method of performing printing sequentially by changing the position using the same letterpress may be used.

インクタンク10には、溶剤で希釈された有機発光材料インキが収容されており、インキチャンバー12にはインクタンク10より有機発光材料インキが送り込まれるようになっている。アニロックスロール14はインキチャンバー12のインキ供給部に接して回転可能に支持されている。   The ink tank 10 contains organic light emitting material ink diluted with a solvent, and the organic light emitting material ink is fed into the ink chamber 12 from the ink tank 10. The anilox roll 14 is rotatably supported in contact with the ink supply part of the ink chamber 12.

アニロックスロール14の回転に伴い、アニロックスロール表面に供給された有機発光インキのインキ層14aは均一な膜厚に形成される。このインキ層のインキはアニロックスロールに近接して回転駆動される版胴18にマウントされた版材16の凸部に転移する
。平台20には、透明電極および正孔輸送層が形成された基板が版材16の凸部による印刷位置にまで図示していない搬送手段によって搬送されるようになっている。そして、版材16の凸部にあるインキは被印刷基板に対してある領域の印刷がされる。
As the anilox roll 14 rotates, the ink layer 14a of the organic light-emitting ink supplied to the anilox roll surface is formed with a uniform film thickness. The ink in this ink layer is transferred to the convex portion of the plate material 16 mounted on the plate cylinder 18 that is driven to rotate in the vicinity of the anilox roll. On the flat table 20, a substrate on which a transparent electrode and a hole transport layer are formed is transported to a printing position by a convex portion of the plate material 16 by a transport means (not shown). And the ink in the convex part of the plate material 16 is printed in a certain area on the substrate to be printed.

次の領域の印刷の場合、位置合わせを基板上に形成されたアライメントマークをCCDカメラで読み込み、モニター上のマーカと合わせ込むことで次の領域の印刷開始前の状態にして、再び同様に印刷を行う。   When printing the next area, the alignment mark formed on the substrate is read with a CCD camera and aligned with the marker on the monitor to make it the state before starting the printing of the next area. I do.

これを領域数だけ位置合わせと印刷を繰り返すことで、基板上に有機発光層がパターン形成され、さらにその上に蒸着法により、金属薄膜からなるAl等の陰極がパターン形成される。これらの有機EL素子は、外部の酸素や水分から保護するために、ガラスキャップで密閉封止され、有機ELディスプレイとなる。   By repeating this alignment and printing for the number of regions, an organic light emitting layer is patterned on the substrate, and a cathode of Al or the like made of a metal thin film is further formed thereon by vapor deposition. These organic EL elements are hermetically sealed with a glass cap in order to protect them from external oxygen and moisture, thereby forming an organic EL display.

以下、本発明における有機EL用塗布液を用いて、パッシブ駆動型有機EL素子を作製した一例を図に従って説明する。   Hereinafter, an example in which a passive drive type organic EL element is manufactured using the organic EL coating liquid of the present invention will be described with reference to the drawings.

図1に示すように、550mm×650mmのガラス基板に64RGB×64のディスプレイを48面どりする。各ディスプレイは図2の様な透明導電層を設け、さらに陰極層を設け、図5に示すような断面図とする場合で以下説明する。   As shown in FIG. 1, 48 displays of 64 RGB × 64 are made on a glass substrate of 550 mm × 650 mm. Each display will be described below in the case where a transparent conductive layer as shown in FIG. 2 is provided, a cathode layer is further provided, and a cross-sectional view as shown in FIG.

まず透光性基板1に200μmピッチ(L/S=160/40)のITOラインを厚さ150nmで192本設け、を透明導電層2として設けた。その後、ITO端部をカバーするためと隔壁を兼ねる意味で絶縁性レジスト6を最厚部で1.2μmとなる高さでフォトリソ法で設けた。続いて、UV/O3洗浄を行った後、下記化1で表されるポリ(3,4−エチレンジオキシチオフェン)とポリスチレンスルホン酸(以下PEDOT/PSSという)の1wt%水分散溶液、スリットコート法を用いて厚み80nmで塗布して正孔輸送層3を形成した。 First, 192 ITO lines with a thickness of 150 nm were provided as the transparent conductive layer 2 on the translucent substrate 1 with a 200 μm pitch (L / S = 160/40). Thereafter, an insulating resist 6 was provided by a photolithographic method at a thickness of 1.2 μm at the thickest portion in order to cover the ITO end portion and also as a partition. Subsequently, after UV / O 3 cleaning, a 1 wt% aqueous dispersion of poly (3,4-ethylenedioxythiophene) and polystyrene sulfonic acid (hereinafter referred to as PEDOT / PSS) represented by the following chemical formula 1, slit The hole transport layer 3 was formed by coating with a thickness of 80 nm using a coating method.

続いて、蛍光体層4として、下記化2で表される高分子発光材料MEH−PPVをシクロヘキシルベンゼン溶液に1.3wt%で溶解し、さらにポリスチレン(分子量Mw1000000、アルドリッチ社製)を0.26wt%で溶解した。このインキを凸版印刷法を用いて膜厚80nmで図4のような、版面21にディスプレイラインパターン22とアライメントマーク23が設けられている12面取りの版を用いてパターン形成し、それを基板の中で4ヶ所の領域毎に、RBGをラインで塗り分けた。   Subsequently, as the phosphor layer 4, a polymer light emitting material MEH-PPV represented by the following chemical formula 2 is dissolved in a cyclohexylbenzene solution at 1.3 wt%, and polystyrene (molecular weight Mw 1000000, manufactured by Aldrich) is 0.26 wt. % Dissolved. Using this relief printing method, a pattern is formed using a 12-sided plate having a display line pattern 22 and an alignment mark 23 on the plate surface 21 as shown in FIG. Among them, RBG was painted with a line every four areas.

次いで、陰極層5としてMgAgを2元共蒸着により200nmの厚みで図4のようなパターンをマスク蒸着することで形成して、パッシブ駆動型の有機EL素子を作製した。   Next, MgAg was formed as the cathode layer 5 by performing vapor deposition of a 200 nm-thick pattern by mask vapor deposition by binary co-evaporation to produce a passive drive type organic EL device.

Figure 2006344545
Figure 2006344545

Figure 2006344545
得られたパッシブ駆動型有機EL素子は、リーク電流が無く選択した画素のみを点灯でき、5Vで100cd/m2の均一な発光を示した。
Figure 2006344545
The obtained passive drive type organic EL element was able to light only selected pixels without leakage current, and showed uniform light emission of 100 cd / m 2 at 5V.

<比較例1>
上記実施例の版を550×650mm基板に一度に印刷できる大きさにした(570×670mm)ところ、基板周辺部に位置するディスプレイが、版の縮みにより、形成した発光層のラインが電極上からずれてしまった。
<Comparative Example 1>
When the plate of the above example was sized to be printed on a 550 × 650 mm substrate at one time (570 × 670 mm), the display located in the periphery of the substrate was shrunk from the plate, so that the line of the light emitting layer formed from above the electrode It has shifted.

本発明は、有機発光材料が高分子材料である有機EL素子の製造方法に利用可能であり、特に凸版印刷法によって有機発光層を形成する有機EL素子の製造方法に利用可能である。   The present invention can be used in a method for manufacturing an organic EL element in which the organic light emitting material is a polymer material, and in particular, can be used in a method for manufacturing an organic EL element in which an organic light emitting layer is formed by a relief printing method.

本発明に用いる印刷の領域を分割する場合を示す概要平面図である。It is an outline top view showing the case where the printing field used for the present invention is divided. 本発明の個々のディスプレイの透明導電層を設けた状態の概要平面図である。It is a general | schematic top view of the state which provided the transparent conductive layer of each display of this invention. 本発明の個々のディスプレイの陰極層を設けた状態の概要平面図である。It is a general | schematic top view of the state which provided the cathode layer of each display of this invention. 本発明の印刷工程で用いる版の平面図である。It is a top view of the plate used in the printing process of the present invention. 本発明の有機EL素子の製造工程のうち有機発光材料の印刷までの工程を示す概念平面図である。It is a conceptual top view which shows the process until the printing of an organic luminescent material among the manufacturing processes of the organic EL element of this invention. 本発明の有機EL素子の概念平面図である。要平面図である。It is a conceptual top view of the organic EL element of this invention. FIG.

符号の説明Explanation of symbols

1:透光性基板
2:透明導電層
3:正孔輸送層
4:蛍光体層
5:陰極層
6:絶縁性レジスト
10:インクタンク
12:インキチャンバー
14:アニロックスロール
14a:インキ層
16:版材
18:版銅
20:平台
22:レーザー照射装置
24:被印刷基板
30:個々のディスプレイ
31:画素部
32:ディスプレイラインパターン
33:アライメントマーク
34:配線接続領域
35:陰極層
1: translucent substrate 2: transparent conductive layer 3: hole transport layer 4: phosphor layer 5: cathode layer 6: insulating resist 10: ink tank 12: ink chamber 14: anilox roll 14a: ink layer 16: plate Material 18: Plate copper 20: Flat table 22: Laser irradiation device 24: Printed substrate 30: Individual display 31: Pixel portion 32: Display line pattern 33: Alignment mark 34: Wiring connection region 35: Cathode layer

Claims (4)

少なくとも透明電極層と対向電極と有機発光層を含む有機発光媒体層からなり、両電極から有機発光層に電流を流すことにより有機発光層を発光させる有機EL素子の製造方法において、その製造工程中の有機発光層の形成工程を複数の領域に分割して印刷することにより形成することを特徴とする有機EL素子の製造方法。   In an organic EL element manufacturing method comprising an organic light emitting medium layer including at least a transparent electrode layer, a counter electrode, and an organic light emitting layer, and causing the organic light emitting layer to emit light by passing a current from both electrodes to the organic light emitting layer. A method for producing an organic EL element, comprising forming the organic light emitting layer by dividing the step of forming the organic light emitting layer into a plurality of regions and printing. 前記印刷が、水現像により凸部を形成する水現像タイプの凸版により行うものであることを特徴とする請求項1記載の有機EL素子の製造方法。   2. The method for producing an organic EL element according to claim 1, wherein the printing is performed by a water-developing type relief plate that forms a convex portion by water development. 前記分割された各領域の大きさが、500mm角以下であることを特徴とする請求項1または2記載の有機EL素子の製造方法。   The method of manufacturing an organic EL element according to claim 1 or 2, wherein the size of each of the divided regions is 500 mm square or less. 請求項1乃至3のいずれかに記載の製造方法を用い、有機発光層が形成されたことを特徴とする有機EL素子。   An organic EL device, wherein an organic light emitting layer is formed using the manufacturing method according to claim 1.
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