JP2006332527A - 磁気記憶素子 - Google Patents

磁気記憶素子 Download PDF

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Publication number
JP2006332527A
JP2006332527A JP2005157459A JP2005157459A JP2006332527A JP 2006332527 A JP2006332527 A JP 2006332527A JP 2005157459 A JP2005157459 A JP 2005157459A JP 2005157459 A JP2005157459 A JP 2005157459A JP 2006332527 A JP2006332527 A JP 2006332527A
Authority
JP
Japan
Prior art keywords
layer
ferromagnetic
recording layer
magnetic field
magnetization
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2005157459A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006332527A5 (enExample
Inventor
Takashi Osanaga
隆志 長永
Takeharu Kuroiwa
丈晴 黒岩
Hiroshi Kobayashi
浩 小林
Satokatsu Haiyama
沙徳克 拜山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Renesas Technology Corp
Original Assignee
Renesas Technology Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Renesas Technology Corp filed Critical Renesas Technology Corp
Priority to JP2005157459A priority Critical patent/JP2006332527A/ja
Priority to KR1020060046932A priority patent/KR20060124578A/ko
Priority to TW095118753A priority patent/TW200703328A/zh
Priority to US11/442,290 priority patent/US8036024B2/en
Publication of JP2006332527A publication Critical patent/JP2006332527A/ja
Publication of JP2006332527A5 publication Critical patent/JP2006332527A5/ja
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
    • G11C11/14—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using thin-film elements
    • G11C11/15—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using thin-film elements using multiple magnetic layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/22—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using ferroelectric elements
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00—Galvanomagnetic devices
    • H10N50/10—Magnetoresistive devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B61/00—Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices
    • H10B61/20—Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices comprising components having three or more electrodes, e.g. transistors
    • H10B61/22—Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices comprising components having three or more electrodes, e.g. transistors of the field-effect transistor [FET] type
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/11—Magnetic recording head
    • Y10T428/1107—Magnetoresistive
    • Y10T428/1114—Magnetoresistive having tunnel junction effect
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/11—Magnetic recording head
    • Y10T428/1107—Magnetoresistive
    • Y10T428/1143—Magnetoresistive with defined structural feature

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Hall/Mr Elements (AREA)
  • Mram Or Spin Memory Techniques (AREA)
  • Semiconductor Memories (AREA)
JP2005157459A 2005-05-30 2005-05-30 磁気記憶素子 Pending JP2006332527A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2005157459A JP2006332527A (ja) 2005-05-30 2005-05-30 磁気記憶素子
KR1020060046932A KR20060124578A (ko) 2005-05-30 2006-05-25 자기저항효과에 의해 데이터를 기억하는 자기기억소자
TW095118753A TW200703328A (en) 2005-05-30 2006-05-26 Magnetic storage element
US11/442,290 US8036024B2 (en) 2005-05-30 2006-05-30 Magnetic storage element storing data by magnetoresistive effect

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005157459A JP2006332527A (ja) 2005-05-30 2005-05-30 磁気記憶素子

Publications (2)

Publication Number Publication Date
JP2006332527A true JP2006332527A (ja) 2006-12-07
JP2006332527A5 JP2006332527A5 (enExample) 2008-06-26

Family

ID=37462257

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005157459A Pending JP2006332527A (ja) 2005-05-30 2005-05-30 磁気記憶素子

Country Status (4)

Country Link
US (1) US8036024B2 (enExample)
JP (1) JP2006332527A (enExample)
KR (1) KR20060124578A (enExample)
TW (1) TW200703328A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008244482A (ja) * 2007-03-26 2008-10-09 Magic Technologies Inc Ｍｒａｍデバイスおよびその形成方法
JP2010123967A (ja) * 2008-11-19 2010-06-03 Headway Technologies Inc フリー層およびその形成方法、磁気抵抗効果素子
JP2023545902A (ja) * 2020-09-18 2023-11-01 クロッカス・テクノロジー・ソシエテ・アノニム ヒステリシス応答を低減した２次元磁気センサ用磁気抵抗素子

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2465370A (en) * 2008-11-13 2010-05-19 Ingenia Holdings Magnetic data storage comprising a synthetic anti-ferromagnetic stack arranged to maintain solitons
JP5441024B2 (ja) * 2008-12-15 2014-03-12 ルネサスエレクトロニクス株式会社 磁気記憶装置
US8852762B2 (en) 2012-07-31 2014-10-07 International Business Machines Corporation Magnetic random access memory with synthetic antiferromagnetic storage layers and non-pinned reference layers
US20140037991A1 (en) 2012-07-31 2014-02-06 International Business Machines Corporation Magnetic random access memory with synthetic antiferromagnetic storage layers
US20140037992A1 (en) * 2012-07-31 2014-02-06 International Business Machines Corporation Magnetic random access memory with synthetic antiferromagnetic storage layers

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004172599A (ja) * 2002-11-01 2004-06-17 Nec Corp 磁気抵抗デバイス及びその製造方法
JP2005510048A (ja) * 2001-10-16 2005-04-14 フリースケール セミコンダクター インコーポレイテッド 縮小可能性が改良された磁気抵抗ランダムアクセスメモリ

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US6271997B1 (en) * 1999-11-22 2001-08-07 International Business Machines Corporation Read head spin valve sensor with triple antiparallel coupled free layer structure
US6767655B2 (en) * 2000-08-21 2004-07-27 Matsushita Electric Industrial Co., Ltd. Magneto-resistive element
JP2002092829A (ja) * 2000-09-21 2002-03-29 Fujitsu Ltd 磁気抵抗センサ及び磁気抵抗ヘッド
CN1270323C (zh) * 2001-06-19 2006-08-16 松下电器产业株式会社 磁性存储器的驱动方法
US6936903B2 (en) * 2001-09-25 2005-08-30 Hewlett-Packard Development Company, L.P. Magnetic memory cell having a soft reference layer
US20030235016A1 (en) * 2002-06-19 2003-12-25 International Business Machines Corporation Stabilization structures for CPP sensor
JP4237991B2 (ja) * 2002-08-29 2009-03-11 アルプス電気株式会社 磁気検出素子
US7216648B2 (en) * 2002-09-06 2007-05-15 Apneon, Inc. Systems and methods for moving and/or restraining tissue in the upper respiratory system
JP3863484B2 (ja) * 2002-11-22 2006-12-27 株式会社東芝 磁気抵抗効果素子および磁気メモリ
US7130166B2 (en) * 2003-07-02 2006-10-31 Hitachi Global Storage Technologies Netherlands B.V. CPP GMR with improved synthetic free layer
US7298595B2 (en) * 2003-09-26 2007-11-20 Hitachi Global Storage Technologies Netherlands B.V. Differential GMR sensor with multi-layer bias structure between free layers of first and second self-pinned GMR sensors
JP4337641B2 (ja) * 2004-06-10 2009-09-30 ソニー株式会社 不揮発性磁気メモリ装置及びフォトマスク
US7242556B2 (en) * 2004-06-21 2007-07-10 Hitachi Global Storage Technologies Netherlands B.V. CPP differential GMR sensor having antiparallel stabilized free layers for perpendicular recording
US7280326B2 (en) * 2004-07-30 2007-10-09 Hitachi Global Storage Technologies Netherlands B.V. Trilayer SAF with current confining layer
JP4550552B2 (ja) * 2004-11-02 2010-09-22 株式会社東芝 磁気抵抗効果素子、磁気ランダムアクセスメモリ、磁気抵抗効果素子の製造方法
US7129098B2 (en) * 2004-11-24 2006-10-31 Freescale Semiconductor, Inc. Reduced power magnetoresistive random access memory elements
US7423850B2 (en) * 2005-03-31 2008-09-09 Hitachi Global Storage Technologies Netherlands B.V. CPP-GMR read head sensor with synthetic free layer providing suppression of spin torque noise
JP2007027575A (ja) * 2005-07-20 2007-02-01 Toshiba Corp 磁気抵抗効果素子および磁気メモリ
US7301801B2 (en) * 2005-10-28 2007-11-27 International Business Machines Corporation Tuned pinned layers for magnetic tunnel junctions with multicomponent free layers
WO2008146610A1 (ja) * 2007-05-28 2008-12-04 Nec Corporation 磁性体記憶装置
US7948044B2 (en) * 2008-04-09 2011-05-24 Magic Technologies, Inc. Low switching current MTJ element for ultra-high STT-RAM and a method for making the same

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005510048A (ja) * 2001-10-16 2005-04-14 フリースケール セミコンダクター インコーポレイテッド 縮小可能性が改良された磁気抵抗ランダムアクセスメモリ
JP2004172599A (ja) * 2002-11-01 2004-06-17 Nec Corp 磁気抵抗デバイス及びその製造方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008244482A (ja) * 2007-03-26 2008-10-09 Magic Technologies Inc Ｍｒａｍデバイスおよびその形成方法
JP2010123967A (ja) * 2008-11-19 2010-06-03 Headway Technologies Inc フリー層およびその形成方法、磁気抵抗効果素子
JP2023545902A (ja) * 2020-09-18 2023-11-01 クロッカス・テクノロジー・ソシエテ・アノニム ヒステリシス応答を低減した２次元磁気センサ用磁気抵抗素子
JP7555484B2 (ja) 2020-09-18 2024-09-24 アレグロ・マイクロシステムズ・リミテッド・ライアビリティ・カンパニー ヒステリシス応答を低減した２次元磁気センサ用磁気抵抗素子
US12174276B2 (en) 2020-09-18 2024-12-24 Allegro Microsystems, Llc Magnetoresistive element for a 2D magnetic sensor having a reduced hysteresis response

Also Published As

Publication number Publication date
US20060267058A1 (en) 2006-11-30
KR20060124578A (ko) 2006-12-05
TW200703328A (en) 2007-01-16
US8036024B2 (en) 2011-10-11

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