JP2006269498A - Device and method for holding substrate - Google Patents

Device and method for holding substrate Download PDF

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JP2006269498A
JP2006269498A JP2005081608A JP2005081608A JP2006269498A JP 2006269498 A JP2006269498 A JP 2006269498A JP 2005081608 A JP2005081608 A JP 2005081608A JP 2005081608 A JP2005081608 A JP 2005081608A JP 2006269498 A JP2006269498 A JP 2006269498A
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substrate
glass substrate
suction
holding
contact member
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JP4895518B2 (en
JP2006269498A5 (en
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Hiroshi Kato
洋 加藤
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Olympus Corp
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Olympus Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To reliably hold a glass substrate at a prescribed position by regulating the travel of the floated glass substrate. <P>SOLUTION: A through-hole 26 is provided on a unit body 20 of a suction conveyance unit 17 for sucking, holding, and conveying the glass substrate W; and a sucking/holding mechanism 25 is provided at the through-hole 26. The sucking/holding mechanism 25 has a cylindrical elastic member 31 connected to a compressed air supply 30, and a suction pad 33 is fitted to the upper end 32 of the elastic member 31. In the suction pad 33, a suction hole 36 communicating with the elastic member 31 is formed. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、浮上している基板の移動を規制し、保持する基板保持装置及び、基板の保持方法に関する。   The present invention relates to a substrate holding apparatus that regulates and holds movement of a floating substrate and a substrate holding method.

液晶ディスプレィ(LCD)や、プラズマディスプレィ(PDP)などのフラットパネルディスプレィ(FPD)の製造過程でガラス基板の検査を行う際には、ガラス基板を基準位置に位置決めして保持する位置決め保持装置が用いられている。
ここで、従来の位置決め保持装置としては、XYステージの最上層のXステージ上にボールキャスタを介して保持ステージを移動自在に設け、この保持ステージにガラス基板を吸着保持させ、突き当てシリンダで保持ステージを移動させて、Xステージに固定されている基準ピンにガラス基板を直接押し当てて位置決めするものがある(例えば、特許文献1参照)。
When inspecting a glass substrate in the manufacturing process of a flat panel display (FPD) such as a liquid crystal display (LCD) or a plasma display (PDP), a positioning and holding device that positions and holds the glass substrate at a reference position is used. It has been.
Here, as a conventional positioning and holding device, a holding stage is movably provided on the uppermost X stage of the XY stage via a ball caster, and a glass substrate is sucked and held on this holding stage and held by an abutting cylinder. There is one in which a stage is moved and a glass substrate is directly pressed against a reference pin fixed to the X stage for positioning (see, for example, Patent Document 1).

ところが、特許文献1に開示されているような位置決め保持装置では、XYステージがXY方向に移動するためにガラス基板の面積の4倍の移動スペースが必要となり、ガラス基板の大型化に伴って装置全体が大型化してしまうという問題があった。さらに、ガラス基板の大型化に伴って、XYステージの重量が増すために、XYステージ上のガラス基板の側面を基準ピンに直接押し当てる際に、XYステージの慣性モーメントが非常に大きくなり、ガラス基板が基準ピンに当接した際に破損するおそれがあり、これを防止するための複雑な機構が必要になる。
この大型化したガラス基板を複数のころが回転自在に設けられたころ搬送部上に載置させ、このガラス基板にシリンダを突き当てて、ガラス基板の側面を位置決めピンに当接させて位置決めをする装置が開発されている(例えば、特許文献2参照)。
特開平8−313815号公報 特開2000−9661号公報
However, in the positioning and holding device as disclosed in Patent Document 1, a movement space that is four times the area of the glass substrate is required for the XY stage to move in the XY direction. There was a problem that the whole was enlarged. Furthermore, since the weight of the XY stage increases as the size of the glass substrate increases, the moment of inertia of the XY stage becomes very large when the side surface of the glass substrate on the XY stage is directly pressed against the reference pin. There is a risk of damage when the substrate abuts against the reference pin, and a complicated mechanism for preventing this is required.
This enlarged glass substrate is placed on a roller transport section in which a plurality of rollers are rotatably provided, a cylinder is abutted against the glass substrate, and the side surface of the glass substrate is brought into contact with a positioning pin for positioning. An apparatus has been developed (see, for example, Patent Document 2).
JP-A-8-313815 JP 2000-9661 A

しかしながら、特許文献2に開示されている装置では、多数のころでガラス基板を支えるために、ガラス基板がころの回転方向と直交する方向に押されると、ガラス基板はころ上を摺りながら移動することになるので、ころとガラス基板との間の摩擦抵抗によりガラス基板の裏面にころの摩擦痕が生じるおそれがあった。
ここで、ガラス基板の移動時の摩擦抵抗を低減させるために、浮上ステージを用いてガラス基板をエアーで浮上させつつガラス基板の位置決めを行う方法が考えられる。このようにガラス基板をエアー浮上させた場合には、浮上ステージとガラス基板との間の摩擦抵抗が非常に小さくなるため、わずかな外力が加わった場合でも大きく移動してしまうと共に、ガラス基板が基準ピンに当たって跳ね返るなど、位置決めの安定性に欠けるという問題が生じる。また、浮上したガラス基板の端部を保持して強制的に搬送する搬送機構を備えることが考えられるが、このガラス基板を搬送途中で、一方の搬送機構から他方の搬送機構に受け渡す際に、ガラス基板が小さな外力や、ガラス基板自身の慣性力によって移動してしまう問題が生じる。
この発明は、これらの事情を鑑みてなされたものであり、その目的とするところは、浮上させたガラス基板の移動を規制して、所定の位置に確実に保持できるようにすることである。
However, in the apparatus disclosed in Patent Document 2, in order to support the glass substrate with a large number of rollers, when the glass substrate is pushed in a direction orthogonal to the rotation direction of the rollers, the glass substrate moves while sliding on the rollers. As a result, the frictional resistance between the roller and the glass substrate may cause a roller friction mark on the back surface of the glass substrate.
Here, in order to reduce the frictional resistance during movement of the glass substrate, a method of positioning the glass substrate while using a levitation stage to float the glass substrate with air can be considered. Thus, when the glass substrate is levitated by air, the frictional resistance between the levitation stage and the glass substrate becomes very small, so that even if a slight external force is applied, the glass substrate moves greatly, and the glass substrate There arises a problem that the positioning is not stable, for example, it hits the reference pin and rebounds. In addition, it is conceivable to have a transport mechanism that forcibly transports the end of the glass substrate that has floated, but when transferring this glass substrate from one transport mechanism to the other transport mechanism during transport There arises a problem that the glass substrate moves due to a small external force or an inertial force of the glass substrate itself.
The present invention has been made in view of these circumstances, and an object of the present invention is to restrict the movement of the floated glass substrate so that the glass substrate can be reliably held at a predetermined position.

上記の課題を解決する本発明は、浮上ステージから基板を浮上させつつ、前記基板を位置決めして保持する基板保持装置であって、前記基板の裏面に当接可能な接触部材と、浮上している前記基板の裏面に前記接触部材を当接させて前記基板の移動を規制した状態で、前記基板を所定位置に位置決めする位置決め機構と、前記位置決め機構により位置決めされた前記基板を吸着保持させる吸引機構と、を具備したことを特徴とする基板保持装置とした。
この基板保持装置では、ガラス等からなる基板を自由に移動可能な状態に浮上させ、接触部材を基板の裏面に当接させてから、位置決め機構で基板の位置決めを行う。基板と接触部材との間の小さな摩擦力により浮上した基板は、基板と接触部材との間の小さな摩擦力により基板の移動が規制される。このようにして、基板の移動を規制しつつ位置決めを行ったら、基板を吸着保持する。なお、接触部材と基板との接触面積は、基板の面積に比べて十分に小さくなるように設定される。
The present invention for solving the above-described problems is a substrate holding device that positions and holds the substrate while levitating the substrate from the levitation stage, and a contact member that can contact the back surface of the substrate, A positioning mechanism that positions the substrate at a predetermined position in a state where the contact member is brought into contact with the back surface of the substrate and the movement of the substrate is regulated, and suction that holds the substrate positioned by the positioning mechanism by suction And a mechanism for holding the substrate.
In this substrate holding device, the substrate made of glass or the like is floated in a freely movable state, the contact member is brought into contact with the back surface of the substrate, and then the substrate is positioned by the positioning mechanism. The movement of the substrate that is levitated by the small frictional force between the substrate and the contact member is restricted by the small frictional force between the substrate and the contact member. Thus, if positioning is performed while restricting movement of the substrate, the substrate is sucked and held. Note that the contact area between the contact member and the substrate is set to be sufficiently smaller than the area of the substrate.

また、本発明は、基板を浮上させる工程と、浮上した前記基板の裏面に接触部材を当接させて前記基板の移動を規制する工程と、前記接触部材と前記基板との当接状態を維持しつつ前記基板を移動させて、前記基板の位置決めをする工程と、位置決め後に前記基板を吸着保持する工程と、と備えることを特徴とする基板の保持方法とした。
この基板の保持方法では、接触部材と基板裏面との間の小さな摩擦力によって基板の移動を規制しつつ位置決めを行い、吸着保持するので、基板の位置決めを確実に、かつ速やかに行える。
The present invention also includes a step of levitating the substrate, a step of bringing a contact member into contact with the back surface of the levitated substrate to restrict movement of the substrate, and maintaining a contact state between the contact member and the substrate. However, the substrate holding method includes: a step of moving the substrate to position the substrate; and a step of sucking and holding the substrate after positioning.
In this substrate holding method, positioning is performed while adsorbing and holding the substrate while restricting movement of the substrate by a small frictional force between the contact member and the back surface of the substrate, so that the substrate can be positioned reliably and promptly.

本発明によれば、基板を浮上させた状態で、その裏面に接触部材を押し当ててから位置決め機構で基板を基準位置に移動させ、その後に吸着保持するようにしたので、基板と接触部材との間の小さな摩擦力によって、基板の移動を規制しつつ基板の位置決めを行うことができる。したがって、自由に移動可能な状態に浮上させた基板の裏面に基板が移動しない程度の小さな摩擦力を発生させることにより、基板の移動を規制することができ、基板の位置決めを安定して確実に、かつ効率良く行える。このようにして基板の移動を規制することで、小さな押圧力で基板を移動させることが可能になり、位置決め時における基板の破損が防止される。また、このとき接触部材との間に発生する摩擦力は、基板の全面を接触支持させた場合に比べて十分に小さいので、位置決め機構が基板を押圧する力が小さくて済み、位置決め機構の簡略化、小型化が図れる。   According to the present invention, the contact member is pressed against the back surface of the substrate while the substrate is levitated, and then the substrate is moved to the reference position by the positioning mechanism and is then held by suction. The substrate can be positioned while the movement of the substrate is restricted by a small frictional force between the two. Therefore, it is possible to regulate the movement of the substrate by generating a small frictional force that does not move the substrate on the back surface of the substrate that is levitated in a freely movable state, and to ensure stable and reliable positioning of the substrate. And efficient. By restricting the movement of the substrate in this way, the substrate can be moved with a small pressing force, and the substrate is prevented from being damaged during positioning. In addition, the frictional force generated between the contact member and the contact member at this time is sufficiently small as compared with the case where the entire surface of the substrate is in contact with the support member. And downsizing.

発明を実施するための第1の実施の形態について図面を参照しながら詳細に説明する。なお、第1の実施の形態における基板保持装置は、FPD用のガラス基板を浮上させて搬送する浮上搬送装置に適用されており、図1及び図2には浮上搬送装置の概略構成図が示されている。
図1に示すように、浮上搬送装置1は、床面に設置される図示しない除振台上にベース部2が設置され、このベース部2の上には、浮上ステージ3が固定されている。図2に示すように、浮上ステージ3の上面には、複数のエアー吹き出し孔4が規則的に配設されている。また、浮上ステージ3のガラス基板搬入側(基端部3a側)には、ワークであるガラス基板Wを機械的に昇降させる複数のリフター5が、浮上ステージ3に形成された貫通孔6内に突没自在に配設されている。ここで、リフター5の一例を図3に示す。リフター5は、貫通孔6の下面側に設けられたU字形状の支持部材7と、支持部材7の底部に固定された空気圧シリンダ8とを備え、空気圧シリンダ8の伸縮ロッド9の先端には、連結部材10を介して棒状のリフトピン11が取り付けられている。リフトピン11は、空気圧シリンダ8によって、貫通孔6内に没入した待機位置から、図3に破線で示すような、浮上ステージ3の上面から突出した支持位置まで移動可能になっている。
A first embodiment for carrying out the invention will be described in detail with reference to the drawings. The substrate holding device in the first embodiment is applied to a levitation conveyance device that floats and conveys a glass substrate for FPD, and FIGS. 1 and 2 are schematic configuration diagrams of the levitation conveyance device. Has been.
As shown in FIG. 1, the levitation transfer apparatus 1 has a base portion 2 installed on a vibration isolation table (not shown) installed on a floor surface, and a levitation stage 3 is fixed on the base portion 2. . As shown in FIG. 2, a plurality of air blowing holes 4 are regularly arranged on the upper surface of the levitation stage 3. In addition, on the glass substrate carry-in side (base end 3 a side) of the levitation stage 3, a plurality of lifters 5 that mechanically lift and lower the glass substrate W as a workpiece are placed in the through holes 6 formed in the levitation stage 3. It is arranged so that it can project and retract. An example of the lifter 5 is shown in FIG. The lifter 5 includes a U-shaped support member 7 provided on the lower surface side of the through hole 6 and a pneumatic cylinder 8 fixed to the bottom of the support member 7. A rod-like lift pin 11 is attached via the connecting member 10. The lift pin 11 can be moved by a pneumatic cylinder 8 from a standby position immersed in the through hole 6 to a support position protruding from the upper surface of the levitation stage 3 as indicated by a broken line in FIG.

図1及び図2に示すように、ベース部2の長手方向に沿った側面のそれぞれには、ガイドレール15,16が各側面に沿って設けられている。このガイドレール15,16には、吸着搬送ユニット17,18が往復移動自在に取り付けられている。両吸着搬送ユニット17,18は、不図示の制御装置によって同期して移動するように制御される。   As shown in FIGS. 1 and 2, guide rails 15 and 16 are provided along the side surfaces on the side surfaces along the longitudinal direction of the base portion 2. Adsorption transport units 17 and 18 are attached to the guide rails 15 and 16 so as to be reciprocally movable. Both suction conveyance units 17 and 18 are controlled to move in synchronization by a control device (not shown).

図2に示すように、吸着搬送ユニット17は、不図示のリニアモータなどの駆動源によってガイドレール15に沿って移動するユニット本体20を有し、ユニット本体20の上面には、位置決め機構を構成する複数の基準ピン21,22,23と、複数の押し付けピン24とが配設されている。基準ピン21と基準ピン22とは、ガラス基板Wの一方の長辺Waを位置決めするために、ガイドレール15に平行に所定の間隔をおいてユニット本体20上に固定されている。基準ピン23は、ガラス基板Wの一方の短辺Wbを位置決めするために、ユニット本体20上で基準ピン21,22よりも搬送路側に寄った位置に固定されている。押し付けピン24は、ガラス基板Wを挟んで基準ピン23に対峙するようにユニット本体20上に配置され、不図示のエアーシリンダなどに連結されており、対峙する基準ピン23に向けて動可能になっている。さらに、押し付けピン24から基準ピン23に至るまでの間には、ガラス基板Wの一方の長辺Waの側縁部をエアー吸着して保持する6つの吸着保持機構25が等間隔に配設されている。   As shown in FIG. 2, the suction conveyance unit 17 has a unit main body 20 that moves along the guide rail 15 by a drive source such as a linear motor (not shown), and a positioning mechanism is formed on the upper surface of the unit main body 20. A plurality of reference pins 21, 22, 23 and a plurality of pressing pins 24 are disposed. In order to position one long side Wa of the glass substrate W, the reference pin 21 and the reference pin 22 are fixed on the unit main body 20 at a predetermined interval in parallel with the guide rail 15. In order to position one short side Wb of the glass substrate W, the reference pin 23 is fixed on the unit body 20 at a position closer to the transport path side than the reference pins 21 and 22. The pressing pin 24 is disposed on the unit main body 20 so as to face the reference pin 23 with the glass substrate W interposed therebetween, and is connected to an air cylinder (not shown) or the like so as to be movable toward the facing reference pin 23. It has become. Furthermore, between the pressing pin 24 and the reference pin 23, six suction holding mechanisms 25 that hold the side edge portion of one long side Wa of the glass substrate W by air suction are arranged at equal intervals. ing.

図4に示すように、吸着保持機構25は、ユニット本体20を上下に貫通する貫通孔26内に設けられており、ユニット本体20の下面の開口を覆う支持部材27を介して固定される吸引機構を備えている。吸引機構は、配管28を備え、配管28には、バルブ29が設けられており、配管28の下端部には、圧搾エアー供給部30が接続されている。また、配管28の上端部には、略筒状の弾性部材31が連結されている。弾性部材31の上端部32は、蛇腹状になっており、上下方向に伸縮自在になっている。弾性部材31の先端には、接触部材である吸着パッド33が気密に装着され、かつ首振り自在に貫通孔26内に嵌め込まれている。弾性部材31は、自然状態(吸引停止状態)で吸着パッド33の上部(吸着面34a)が所定位置にくるような長さに設定されている。ここで、所定位置とは、吸着パッド33の上面が、浮上ステージ3の上面から浮上したガラス基板Wの浮上高さより若干高い位置である。   As shown in FIG. 4, the suction holding mechanism 25 is provided in a through hole 26 that vertically penetrates the unit body 20 and is fixed via a support member 27 that covers the opening on the lower surface of the unit body 20. It has a mechanism. The suction mechanism includes a pipe 28, a valve 29 is provided in the pipe 28, and a compressed air supply unit 30 is connected to a lower end portion of the pipe 28. A substantially cylindrical elastic member 31 is connected to the upper end of the pipe 28. The upper end portion 32 of the elastic member 31 has a bellows shape, and is extendable in the vertical direction. A suction pad 33, which is a contact member, is airtightly attached to the tip of the elastic member 31, and is fitted into the through hole 26 so as to swing freely. The elastic member 31 is set to such a length that the upper part (suction surface 34a) of the suction pad 33 is at a predetermined position in a natural state (suction stop state). Here, the predetermined position is a position where the upper surface of the suction pad 33 is slightly higher than the flying height of the glass substrate W that has floated from the upper surface of the floating stage 3.

吸着パッド33は、耐摩耗性を有する樹脂から製造されており、ガラス基板Wに当接する吸着面34aと、吸着部34から下方に延設される湾曲部35とが一体に形成されている。吸着部34の外径は、ユニット本体20の貫通孔26の径に略等しく、その上面にはガラス基板Wに押し当てられる吸着面34aが形成されている。ここで、吸着部34の中心には、吸着部34を上下に貫通する吸引孔36が形成されているので、吸着面34aは、環状になっている。吸引孔36は、吸着面34aから吸着部34の下面34bに至る間に段差部38を有し、この段差部38によって下面34b側が縮径されている。さらに、吸引孔36の縮径された部分36aは、下面34bに向かって縮径するようなテーパ状に成形されており、ここに弾性部材31の上端部32の縮径部分が係止されている。このため、弾性部材31の内部と、吸引孔36とは、連通している。   The suction pad 33 is manufactured from a resin having wear resistance, and a suction surface 34 a that contacts the glass substrate W and a curved portion 35 that extends downward from the suction portion 34 are integrally formed. The outer diameter of the suction portion 34 is substantially equal to the diameter of the through hole 26 of the unit body 20, and a suction surface 34 a that is pressed against the glass substrate W is formed on the upper surface thereof. Here, since the suction hole 36 penetrating the suction part 34 vertically is formed at the center of the suction part 34, the suction surface 34a is annular. The suction hole 36 has a stepped portion 38 between the suction surface 34 a and the lower surface 34 b of the suction portion 34, and the lower surface 34 b side is reduced in diameter by the stepped portion 38. Further, the diameter-reduced portion 36a of the suction hole 36 is formed in a taper shape so that the diameter is reduced toward the lower surface 34b, and the diameter-reduced portion of the upper end portion 32 of the elastic member 31 is locked thereto. Yes. For this reason, the inside of the elastic member 31 and the suction hole 36 are in communication.

また、図2に示すような吸着搬送ユニット18は、吸着搬送ユニット17と略対称な構成になっている。すなわち、ユニット本体40に基準ピン41と、押し付けピン42,43,44と、吸着保持機構25とが設けられ、不図示のリニアモータなどの駆動源によってガイドレール16に沿って往復移動可能に構成されている。基準ピン41と、これに対峙する押し付けピン42とは、吸着搬送ユニット17と同様の配置及び構成になっている。押し付けピン43及び、押し付けピン44は、吸着搬送ユニット17の基準ピン21及び、基準ピン22にそれぞれ対峙して配置され、それぞれが、不図示のシリンダなどに接続されており、対峙する基準ピン21,22に向けて移動自在に構成されている。吸着保持機構25の構成及び配置は、吸着搬送ユニット17の吸着保持機構25と同一である。   Further, the suction conveyance unit 18 as shown in FIG. 2 has a substantially symmetric configuration with the suction conveyance unit 17. That is, the unit main body 40 is provided with a reference pin 41, pressing pins 42, 43, and 44, and a suction holding mechanism 25, and can be reciprocated along the guide rail 16 by a driving source such as a linear motor (not shown). Has been. The reference pin 41 and the pressing pin 42 opposite to the reference pin 41 have the same arrangement and configuration as the suction conveyance unit 17. The pressing pin 43 and the pressing pin 44 are respectively arranged so as to face the reference pin 21 and the reference pin 22 of the suction conveyance unit 17, and each is connected to a cylinder (not shown) or the like, and the facing reference pin 21. , 22 is configured to be movable toward the head. The configuration and arrangement of the suction holding mechanism 25 are the same as the suction holding mechanism 25 of the suction conveyance unit 17.

なお、この浮上搬送装置1は、浮上ステージ3の上方に、不図示の顕微鏡などが設けられており、ガラス基板Wの表面の欠陥検査などが可能になっている。
また、基準ピン21,22,23,41と押し付けピン24,42,43は、ガラス基板Wを所定の基準位置に位置決めする位置決め機構として機能し、吸着保持機構25は、位置決め機構により位置決めされたガラス基板Wを吸着保持する吸引機構として機能する。
The levitation transport apparatus 1 is provided with a microscope (not shown) or the like above the levitation stage 3 so that the surface of the glass substrate W can be inspected for defects.
The reference pins 21, 22, 23, and 41 and the pressing pins 24, 42, and 43 function as a positioning mechanism that positions the glass substrate W at a predetermined reference position, and the suction holding mechanism 25 is positioned by the positioning mechanism. It functions as a suction mechanism that holds the glass substrate W by suction.

次に、この実施の形態の作用について説明する。
まず、図1に示すように、吸着搬送ユニット17,18を浮上ステージ3の基端部3aに配置し、リフトピン11を、図3に破線で示すように、浮上ステージ3の上面から上向きに突出させる。また、エアー吹き出し孔4からは、エアーを吹き出させておく。このとき、吸着保持機構25は、稼動しておらず、吸着面34a(図4参照)は、浮上ステージ3の上面よりも高い位置にある。ガラス基板Wを搬入する際には、搬入ロボットがガラス基板Wをリフトピン11に移載する。
Next, the operation of this embodiment will be described.
First, as shown in FIG. 1, the suction conveyance units 17 and 18 are arranged at the base end portion 3 a of the levitation stage 3, and the lift pins 11 protrude upward from the upper surface of the levitation stage 3 as indicated by broken lines in FIG. 3. Let Air is blown out from the air blowing hole 4. At this time, the suction holding mechanism 25 is not in operation, and the suction surface 34 a (see FIG. 4) is higher than the upper surface of the levitation stage 3. When loading the glass substrate W, the loading robot transfers the glass substrate W to the lift pins 11.

ガラス基板Wを搬入したら、リフトピン11を下げ、ガラス基板Wを吸着保持機構25の吸着パッド33に当接させる。吸着面34aは、ガラス基板Wの裏面に密着し、吸着パッド33の吸引孔36は、ガラス基板Wによって密閉される。ガラス基板Wが反ったり、傾斜していたりした場合には、吸着パッド33の湾曲部35と貫通孔26との接触位置がずれて、吸着パッド33が首振りすることにより、ガラス基板Wと吸着面34aとの密着状態が形成される。
図2に示すように、吸着保持機構25は、搬送方向Fに平行に、ガラス基板Wの左右に6つずつ振り分けられて配置されており、各吸着面34aの面積は、ガラス基板Wの裏面全体の面積に比べて十分に小さい、したがって、ガラス基板Wを吸着パッド33上に置くことにより、ガラス基板Wと吸着面34aとの間には小さな摩擦力が発生し、この小さな摩擦力によってガラス基板Wの移動が規制される。この状態で、押し付けピン24,42,43,44を移動させ、ガラス基板Wのそれぞれの側面に小さな摩擦力よりも大きな押圧力で押し付けさせると、ガラス基板Wは、各押し付けピン24,42,43,44からの押圧力を受けて、吸着パッド33上を滑るようにして移動し、その側面が基準ピン21,22,23,41に当接させられ、これによって基準位置に位置決めされる。
When the glass substrate W is carried in, the lift pins 11 are lowered and the glass substrate W is brought into contact with the suction pad 33 of the suction holding mechanism 25. The suction surface 34 a is in close contact with the back surface of the glass substrate W, and the suction hole 36 of the suction pad 33 is sealed by the glass substrate W. When the glass substrate W is warped or inclined, the contact position between the curved portion 35 of the suction pad 33 and the through hole 26 is shifted, and the suction pad 33 swings, so that the glass substrate W and the suction are absorbed. A close contact state with the surface 34a is formed.
As shown in FIG. 2, the suction holding mechanism 25 is arranged so as to be distributed six by six on the left and right sides of the glass substrate W in parallel with the transport direction F, and the area of each suction surface 34 a is the back surface of the glass substrate W. Since the glass substrate W is placed on the suction pad 33, a small frictional force is generated between the glass substrate W and the suction surface 34a. The movement of the substrate W is restricted. In this state, when the pressing pins 24, 42, 43, 44 are moved and pressed against the respective side surfaces of the glass substrate W with a pressing force larger than a small frictional force, the glass substrate W is pressed against each pressing pin 24, 42, In response to the pressing force from 43, 44, it moves so as to slide on the suction pad 33, and its side surface is brought into contact with the reference pins 21, 22, 23, 41, thereby being positioned at the reference position.

ガラス基板Wの位置決めが終了したら、図4に示す吸着保持機構25の圧搾エアー供給部30を稼動させ、バルブ29を開く。配管28内及び、弾性部材31内の圧力が次第に下がり、吸引孔36を介してガラス基板Wが吸着パッド33に吸着される。さらに、配管28内及び、弾性部材31内並びに、吸引孔36の圧力が下がると、弾性部材31が縮んで、ガラス基板Wがさらに確実に吸着保持される。これによって、ガラス基板Wは、位置決めされた状態で両側部が吸着保持され、浮上ステージ3上にエアー浮上させられる。   When the positioning of the glass substrate W is completed, the compressed air supply unit 30 of the suction holding mechanism 25 shown in FIG. The pressure in the pipe 28 and the elastic member 31 gradually decreases, and the glass substrate W is sucked to the suction pad 33 through the suction hole 36. Furthermore, when the pressure in the pipe 28, the elastic member 31, and the suction hole 36 is reduced, the elastic member 31 is contracted, and the glass substrate W is more securely held by suction. As a result, the glass substrate W is attracted and held on both sides in a positioned state, and the air is levitated on the levitating stage 3.

そして、図2に示す両吸着搬送ユニット17,18を、同期して浮上ステージ3の先端部3b側に向かってスライド移動させ、両吸着搬送ユニット17,18に吸着保持されているガラス基板Wを搬送する。この間、浮上ステージ3の上方に設けられた顕微鏡で欠陥検査が行われる。
欠陥検査が終了したら、ガラス基板Wを浮上ステージ3の先端部3bから搬出する。搬出にあたっては、吸着保持機構25による吸着を解除し、ガラス基板Wと吸着パッド33との間に生じる小さな摩擦力でガラス基板Wを保持した状態で、不図示の搬出ロボットを用いて、ガラス基板Wを搬出させる。なお、吸着を解除する方法としては、圧搾エアーを弾性部材31内に供給したり、弾性部材31内を大気開放したりすることがあげられる。
Then, the two suction conveyance units 17 and 18 shown in FIG. 2 are slid in synchronization toward the tip 3b side of the levitation stage 3, and the glass substrate W held by the suction conveyance units 17 and 18 is held. Transport. During this time, defect inspection is performed with a microscope provided above the floating stage 3.
When the defect inspection is completed, the glass substrate W is unloaded from the tip 3b of the levitation stage 3. At the time of carrying out, the suction by the suction holding mechanism 25 is released, and the glass substrate W is held with a small frictional force generated between the glass substrate W and the suction pad 33 using a carry-out robot (not shown). W is carried out. In addition, as a method of canceling | sucking adsorption | suction, supplying compressed air in the elastic member 31 or opening the inside of the elastic member 31 to the atmosphere is mention | raise | lifted.

この実施の形態によれば、エアー浮上するガラス基板Wの裏面に、吸着保持機構25を設け、吸着保持機構25を弾性部材31などからなる吸引機構と、吸着パッド33とから構成し、この吸着パッド33を、エアー浮上させられているガラス基板Wの面積に比べて十分に小さい接触面積でガラス基板Wを支持させるようにしたので、ガラス基板Wと吸着パッド33との間に発生する小さな摩擦力でガラス基板Wの移動を規制することができ、押し付けピン24,42,43,44で押し付けた際のガラス基板Wの移動を容易にコントロールすることができる。したがって、位置決め時の安定性が向上し、ガラス基板Wの損傷等を防止できる。さらに、位置決めに要する時間を短縮でき、作業効率が向上する。   According to this embodiment, the suction holding mechanism 25 is provided on the back surface of the glass substrate W that floats on the air, and the suction holding mechanism 25 includes the suction mechanism including the elastic member 31 and the suction pad 33, and this suction Since the glass substrate W is supported by the pad 33 with a contact area sufficiently smaller than the area of the glass substrate W that is air levitated, the small friction generated between the glass substrate W and the suction pad 33. The movement of the glass substrate W can be regulated by force, and the movement of the glass substrate W when pressed by the pressing pins 24, 42, 43, 44 can be easily controlled. Therefore, stability at the time of positioning is improved, and damage to the glass substrate W can be prevented. Furthermore, the time required for positioning can be shortened, and the working efficiency is improved.

また、吸着保持機構25は、位置決めが終了した後のガラス基板Wをそのまま吸着保持することができるので、簡単な構成で、速やかに位置決めされた状態を保持することができる。この際に、吸着パッド33は、弾性部材31によって弾力性が付与されるので、ガラス基板Wに対して柔軟性を持たせつつ当接させることが可能で、ガラス基板Wの裏面に損傷等を与えることがない。
さらに、吸着保持機構25を2つの吸着搬送ユニット17,18のそれぞれに設けたので、ガラス基板Wを位置決め及び、吸着保持した状態で浮上ステージ3に沿って搬送することが可能になる。ガラス基板Wは位置決めされた状態で搬送されるので、顕微鏡による欠陥観察などを行った際に、正しい検査結果を得ることができる。この際に、ガラス基板Wの他の部分は、エアー浮上させているので、ガラス基板Wの移動時に、ガラス基板Wの裏面を傷付けることはない。
Further, the suction holding mechanism 25 can suck and hold the glass substrate W after the positioning is completed as it is, so that it is possible to quickly hold the positioned state with a simple configuration. At this time, since the elasticity of the suction pad 33 is given by the elastic member 31, the suction pad 33 can be brought into contact with the glass substrate W while having flexibility, and the back surface of the glass substrate W is damaged. Never give.
Further, since the suction holding mechanism 25 is provided in each of the two suction transfer units 17 and 18, the glass substrate W can be transferred along the floating stage 3 in a state of positioning and suction holding. Since the glass substrate W is conveyed in a positioned state, a correct inspection result can be obtained when a defect is observed with a microscope. At this time, since the other portions of the glass substrate W are floated on the air, the back surface of the glass substrate W is not damaged when the glass substrate W is moved.

また、浮上ステージ3でエアー浮上させつつ吸着保持機構25による吸着を解除するようにしたので、ガラス基板Wと吸着パッド33の吸着面34aとの間の小さな摩擦力により、ガラス基板Wの移動が規制されるため、ガラス基板Wを安定して搬出することができる。
さらに、ガラス基板Wの位置決め時に、ガラス基板Wを支持した状態で吸着保持機構25でガラス基板Wを吸着保持するようにしたので、簡単な構成でガラス基板Wの位置決めと吸着保持とを連続して行うことができ、この間の位置ずれを防止することができる。
また、浮上ステージ3を挟むように2つの吸着搬送ユニット17,18を設けたので、ガラス基板Wの吸着保持を精度良く行うことができると共に、搬送時の位置ずれを防止できる。
Further, since the suction by the suction holding mechanism 25 is released while the air is floated on the levitation stage 3, the movement of the glass substrate W is caused by a small frictional force between the glass substrate W and the suction surface 34a of the suction pad 33. Since it is regulated, the glass substrate W can be carried out stably.
Furthermore, when the glass substrate W is positioned, the glass substrate W is sucked and held by the sucking and holding mechanism 25 while the glass substrate W is supported. Therefore, the glass substrate W is positioned and sucked and held continuously with a simple configuration. It is possible to prevent misalignment during this period.
In addition, since the two suction transfer units 17 and 18 are provided so as to sandwich the floating stage 3, the glass substrate W can be sucked and held with high accuracy, and position shift during transfer can be prevented.

ここで、浮上ステージ3は、リフトピン11を備えずに、吸着保持機構25を上昇させてガラス基板Wを浮上ステージ3から持ち上げた状態で搬入ロボットによりガラス基板Wの搬入出を行っても良い。この場合には、簡単な構成で、前記と同様の作用及び、効果が得られる。   Here, the levitation stage 3 may not carry the lift pins 11 but may carry the glass substrate W in and out by the carry-in robot in a state where the suction holding mechanism 25 is raised and the glass substrate W is lifted from the levitation stage 3. In this case, the same operation and effect as described above can be obtained with a simple configuration.

さらに、リフトピン11で浮上したガラス基板Wを保持した状態で位置決めを行うことも可能である。具体的には、ガラス基板Wを支持した状態でリフトピン11を下降させ、ガラス基板Wがエアーによって浮上する高さより若干高い位置でリフトピン11を停止させる。このとき、ガラス基板Wは、エアーにより上方に持ち上げられるため、リフトピン11に加わるガラス基板Wの荷重が軽減され、リフトピン11との間に生じる摩擦力が小さくなる。このようにリフトピン11とガラス基板Wとの間に生じる摩擦力を小さくした状態で、ガラス基板Wを押し付けピン24,42,43,44により押し付けることで、ガラス基板Wがリフトピン11上を滑るようにして移動して基準位置に位置決めされる。そして、位置決めの後には、吸着保持機構25でガラス基板Wを吸着保持すると同時にリフトピン11を下降させる。   Further, it is possible to perform positioning in a state where the glass substrate W floated by the lift pins 11 is held. Specifically, the lift pins 11 are lowered while the glass substrate W is supported, and the lift pins 11 are stopped at a position slightly higher than the height at which the glass substrate W is lifted by air. At this time, since the glass substrate W is lifted upward by the air, the load of the glass substrate W applied to the lift pins 11 is reduced, and the frictional force generated between the lift pins 11 is reduced. Thus, the glass substrate W slides on the lift pins 11 by pressing the glass substrate W with the pressing pins 24, 42, 43, 44 in a state where the frictional force generated between the lift pins 11 and the glass substrate W is reduced. To move to the reference position. After the positioning, the lift pin 11 is lowered simultaneously with the suction holding mechanism 25 holding the glass substrate W by suction.

次に、本発明の第2の実施の形態について図面を参照して説明する。なお、第1の実施の形態と同じ構成要素には同一の符号を付してある。また、重複する説明は省略する。
図5及び図6に示すように、この実施の形態は、基板保持装置をFPD用のガラス基板Wを載置するステージに適用したものである。
ステージ51の基板載置面には、ガラス基板Wを浮上させる不図示のエアー吹き出し孔が複数配設されており、ガラス基板Wの載置位置の下方の所定箇所には、基板保持機構50が4つ配設されている。このステージ51は、ガラス基板Wを位置決め保持するもので、位置決め機構を構成する基準ピン52,53,54,55及び、押し付けピン56,57,58,59がガラス基板Wを挟んでそれぞれ対峙するように複数配設されている。
Next, a second embodiment of the present invention will be described with reference to the drawings. In addition, the same code | symbol is attached | subjected to the same component as 1st Embodiment. In addition, overlapping description is omitted.
As shown in FIGS. 5 and 6, in this embodiment, the substrate holding device is applied to a stage on which a glass substrate W for FPD is placed.
A plurality of air blowing holes (not shown) for floating the glass substrate W are provided on the substrate placement surface of the stage 51. A substrate holding mechanism 50 is provided at a predetermined position below the placement position of the glass substrate W. Four are arranged. This stage 51 positions and holds the glass substrate W, and the reference pins 52, 53, 54, and 55 and the pressing pins 56, 57, 58, and 59 that constitute the positioning mechanism face each other with the glass substrate W interposed therebetween. A plurality are arranged.

図6に示すように、基板保持機構50は、ステージ51に形成された貫通孔60の下面側の開口を覆う支持部材61を有し、支持部材61の中央に形成されている孔には、配管62の上端部が挿入され、固定されている。配管62には、エアー圧力調整弁63が設けられており、さらに配管62の下端部には、圧搾エアー供給部64が接続されている。エアー圧力調整弁63は、弁の開閉動作によって、貫通孔60に供給されるエアーの流量を調整したり、エアー供給を断続させたりする。また、貫通孔60の上面側の開口部には、耐摩耗性を有する樹脂製の接触部材65が上下方向に摺動可能に挿入されている。接触部材65は、その上面が閉塞された筒形状を有し、この上面がガラス基板Wに当接する当接部66になる。接触部材65の外周は、貫通孔60の径に略等しく、接触部材65を挿入することで貫通孔60の気密が確保される。さらに、接触部材65の下縁部には、ストッパ67が径方向外側に向かって環状に延設されている。そして、このストッパ67を収容するように、貫通孔60の内周面に環状溝68が形成されている。   As shown in FIG. 6, the substrate holding mechanism 50 has a support member 61 that covers the opening on the lower surface side of the through hole 60 formed in the stage 51, and the hole formed in the center of the support member 61 includes The upper end of the pipe 62 is inserted and fixed. An air pressure adjusting valve 63 is provided in the pipe 62, and a compressed air supply unit 64 is connected to the lower end of the pipe 62. The air pressure adjusting valve 63 adjusts the flow rate of the air supplied to the through hole 60 or interrupts the air supply by opening and closing the valve. A wear-resistant resin contact member 65 is inserted into the opening on the upper surface side of the through hole 60 so as to be slidable in the vertical direction. The contact member 65 has a cylindrical shape whose upper surface is closed, and the upper surface serves as a contact portion 66 that contacts the glass substrate W. The outer periphery of the contact member 65 is substantially equal to the diameter of the through hole 60, and the air tightness of the through hole 60 is secured by inserting the contact member 65. Furthermore, a stopper 67 extends annularly toward the outer side in the radial direction at the lower edge of the contact member 65. An annular groove 68 is formed on the inner peripheral surface of the through hole 60 so as to accommodate the stopper 67.

環状溝68は、貫通孔60の高さ方向に平行に、かつ貫通孔60の径を増大させるように形成されており、環状溝68の上端はステージ51の上面よりも下側で止まっており、環状溝68の高さの分だけ接触部材65を上下に移動させることができる。ここにおいて、ストッパ67の他の形態としては、周方向の1箇所に突設されたストッパや、例えば、周方向に半周分ずらした位置に1つずつ設けるなど、複数突設されたストッパなどがあげられる。これらの場合には、ストッパの数及び、形成位置に応じて、ストッパ67を遊嵌させる溝が形成される。   The annular groove 68 is formed to be parallel to the height direction of the through hole 60 and to increase the diameter of the through hole 60, and the upper end of the annular groove 68 stops below the upper surface of the stage 51. The contact member 65 can be moved up and down by the height of the annular groove 68. Here, as other forms of the stopper 67, there are a stopper protruding in one place in the circumferential direction, a stopper protruding in plural, for example, one at a position shifted by a half circumference in the circumferential direction, etc. can give. In these cases, a groove for loosely fitting the stopper 67 is formed according to the number of stoppers and the formation position.

また、ステージ51には、ガラス基板Wの周縁部に相当する位置に、位置決めされたガラス基板Wをステージ51の載置面上に保持する吸引機構69が配設されている。この吸引機構69は、例えば、不図示の吸引ポンプに配管で接続された吸着パッドから構成されている。   The stage 51 is provided with a suction mechanism 69 that holds the positioned glass substrate W on the mounting surface of the stage 51 at a position corresponding to the peripheral edge of the glass substrate W. The suction mechanism 69 is constituted by, for example, a suction pad connected to a suction pump (not shown) by piping.

この実施の形態の作用について説明する。
まず、エアー吹き出し孔からエアーを吹き出してガラス基板Wを浮上させた状態で、圧搾エアー供給部64及びエアー圧力調整弁63を駆動させ、所定圧力の圧搾エアーを配管62を通して貫通孔60に供給する。なお、このときのエアーの流量は、エアー圧力調整弁63の弁開度によって調整される。
前記したように、貫通孔60は、気密構造になっているので、貫通孔60の内圧が徐々に高くなり、接触部材65に作用する圧力も徐々に高くなる。これにより、接触部材65は、上方に押し上げられて、ガラス基板Wの裏面に当接し、これによってガラス基板Wが接触部材に支持される。このとき、接触部材65は、圧搾エアーの弾力性によってガラス基板Wに対して柔軟性を持って当接する。
The operation of this embodiment will be described.
First, in a state where air is blown out from the air blowing hole and the glass substrate W is floated, the compressed air supply unit 64 and the air pressure adjusting valve 63 are driven, and compressed air having a predetermined pressure is supplied to the through hole 60 through the pipe 62. . The air flow rate at this time is adjusted by the valve opening degree of the air pressure adjustment valve 63.
As described above, since the through hole 60 has an airtight structure, the internal pressure of the through hole 60 gradually increases and the pressure acting on the contact member 65 also gradually increases. As a result, the contact member 65 is pushed upward and comes into contact with the back surface of the glass substrate W, whereby the glass substrate W is supported by the contact member. At this time, the contact member 65 comes into contact with the glass substrate W with flexibility by the elasticity of the compressed air.

ここで、圧搾エアーの供給量及び、圧力を制御することで、接触部材65と、ガラス基板Wの裏面との間に生じる摩擦力が小さくなるように調整することができるので、そのような状態で押し付けピン56,57,58,59をガラス基板Wに押し付けると、ガラス基板Wが接触部材65上を滑るようにして移動し、基準ピン52,53,54,55に当接し、基準位置に位置決めされる。
その後、エアー圧力調整弁63を閉じ、貫通孔60内の圧搾エアーを排気して接触部材65を下降させると共に、ステージ51のエアー吹き出し孔からのエアー吹き出しを停止させ、ガラス基板Wをステージ51上に載置する。この状態でガラス基板Wの周縁部の裏面を吸引機構69により吸着保持する。
Here, by controlling the supply amount and pressure of the compressed air, the frictional force generated between the contact member 65 and the back surface of the glass substrate W can be adjusted so as to be small. When the pressing pins 56, 57, 58, 59 are pressed against the glass substrate W, the glass substrate W moves so as to slide on the contact member 65, contacts the reference pins 52, 53, 54, 55, and reaches the reference position. Positioned.
Thereafter, the air pressure adjustment valve 63 is closed, the compressed air in the through hole 60 is exhausted, the contact member 65 is lowered, the air blowing from the air blowing hole of the stage 51 is stopped, and the glass substrate W is placed on the stage 51. Placed on. In this state, the back surface of the peripheral edge portion of the glass substrate W is sucked and held by the suction mechanism 69.

この実施の形態によれば、ガラス基板Wをエアーでステージ51上に浮上させると共に、接触部材65を空気圧によって昇降させることで、ガラス基板Wとステージ51との間の摩擦を小さくし、接触部材65との間の摩擦力を利用してガラス基板Wの移動を規制しつつ押し付けピン56,57,58,59による移動が可能になる。これにより、ガラス基板Wの大きさに関係なく、簡単な構成でガラス基板Wを確実に、かつ安定して位置決めし、保持することが可能になる。特に、このように空気圧を利用した基板保持機構50は、小型化が可能であるので、顕微鏡などを備えるLCD等の基板検査装置に容易に組み込むことが可能である。
また、圧搾エアーの供給量や圧力を制御したり、圧搾エアーの弾性力を利用したりすることで、接触部材65からの力がガラス基板Wに過度に作用することを防止できるので、ガラス基板Wの裏面に損傷等が生じなくなる。
さらに、接触部材65にストッパ67を設けたので、接触部材65が貫通孔60から抜け出ることが防止され、基板保持機構50を安定して駆動させることが可能になる。
According to this embodiment, the glass substrate W is floated on the stage 51 with air, and the contact member 65 is lifted and lowered by air pressure, thereby reducing the friction between the glass substrate W and the stage 51, and the contact member. The movement by the pressing pins 56, 57, 58, 59 becomes possible while restricting the movement of the glass substrate W using the frictional force between 65 and 65. Thereby, regardless of the size of the glass substrate W, the glass substrate W can be reliably and stably positioned and held with a simple configuration. In particular, since the substrate holding mechanism 50 using air pressure can be reduced in size as described above, it can be easily incorporated into a substrate inspection apparatus such as an LCD equipped with a microscope.
Moreover, since it can prevent that the force from the contact member 65 acts on the glass substrate W by controlling the supply amount and pressure of compressed air, or utilizing the elastic force of compressed air, a glass substrate No damage or the like occurs on the back surface of W.
Furthermore, since the stopper 67 is provided on the contact member 65, the contact member 65 is prevented from coming out of the through hole 60, and the substrate holding mechanism 50 can be driven stably.

なお、本発明は、上記の各実施の形態に限定されるものではなく、その要旨を逸脱しない範囲で変形することが可能である。
例えば、図5において、基板保持機構50は、方形の各頂点に相当する位置に4つ配設されているが、基板保持機構50は、浮上しているガラス基板Wを裏面から支持でき、かつ摩擦力が不必要に増大しないものであれば、配置や、数は任意に設定することができる。同様に、図2に示す吸着保持機構25の数及び、配置も実施の形態に限定されない。
また、図2において吸着搬送ユニット17,18は、浮上ステージ3の一方の側部のみに設けても良い。機構を簡略化することができる。
さらに、位置決めされて吸着保持される対象となるワークは、ガラス基板Wに限定されずに、種々の基板を適用することができる。また、ガラス基板Wの浮上に用いる気体は、エアーに限定されない。
The present invention is not limited to the above embodiments, and can be modified without departing from the scope of the invention.
For example, in FIG. 5, four substrate holding mechanisms 50 are arranged at positions corresponding to the apexes of the square, but the substrate holding mechanism 50 can support the floating glass substrate W from the back surface, and If the frictional force does not increase unnecessarily, the arrangement and number can be arbitrarily set. Similarly, the number and arrangement of the suction holding mechanisms 25 shown in FIG. 2 are not limited to the embodiment.
In FIG. 2, the suction conveyance units 17 and 18 may be provided only on one side portion of the levitation stage 3. The mechanism can be simplified.
Furthermore, the workpiece to be positioned and attracted and held is not limited to the glass substrate W, and various substrates can be applied. Moreover, the gas used for the floating of the glass substrate W is not limited to air.

また、基板保持装置は、図7に示すような吸着保持機構70を用いることも可能である。吸着保持機構70は、支持部材27と、バルブ29を備える配管28と、エアー吸排気部71と、吸着パッド72とからなる吸引機構を備えている。エアー吸排気部71は、エアーの吸気と排気とを行うことが可能な構成になっている。吸着パッド72は、吸着部73と、湾曲部35とからなる接触部材である。吸着部73は、中央に円形の凹部74が設けられた環状の吸着面73aを有し、凹部74の底部には、逆支弁76が設けられている。逆支弁76は、凹部74から吸着部73の下面73bに貫通する孔77と、この孔77を下面73b側から覆う弁体78とから構成されている。弁体78は、孔77の径よりも大きく、その一部が下面73bに固着されている。さらに、弁体78は、自然状態では孔77を塞ぎ、エアー吸排気部71によって貫通孔26内の空気が吸引された場合には、変形して孔77を開放するように、材質や、厚さが設定されている。このような吸着保持機構70は、エアー吸排気部71から貫通孔26に圧搾エアーを供給すると、吸着パッド72が貫通孔26に沿って上昇し、ガラス基板Wに当接する。したがって、吸着パッド72との間に発生する摩擦力を利用して、第1の実施の形態と同様にして位置決めをすることができる。その後、エアー吸排気部71で貫通孔26内のエアーを吸引すると、破線で示すように逆支弁76が開いて、凹部74が貫通孔26と連通し、その結果、ガラス基板Wが吸着保持される。このように、吸着保持機構70では、上下移動と、吸着保持と行うことが可能になる。なお、湾曲部35の下端部に、図6に示すようなストッパ67を設け、これに対応する環状溝68を貫通孔26に形成しても良い。   Further, the substrate holding apparatus can use a suction holding mechanism 70 as shown in FIG. The suction holding mechanism 70 includes a suction mechanism including a support member 27, a pipe 28 including a valve 29, an air intake / exhaust unit 71, and a suction pad 72. The air intake / exhaust unit 71 is configured to be able to perform intake and exhaust of air. The suction pad 72 is a contact member that includes the suction portion 73 and the bending portion 35. The suction portion 73 has an annular suction surface 73 a with a circular recess 74 provided at the center, and a reverse support valve 76 is provided at the bottom of the recess 74. The reverse support valve 76 includes a hole 77 penetrating from the concave portion 74 to the lower surface 73b of the suction portion 73, and a valve body 78 that covers the hole 77 from the lower surface 73b side. The valve body 78 is larger than the diameter of the hole 77, and a part thereof is fixed to the lower surface 73b. Further, the valve body 78 closes the hole 77 in a natural state, and when the air in the through hole 26 is sucked by the air intake / exhaust part 71, the valve body 78 is deformed to open the hole 77 and is made of a material and a thickness. Is set. In the suction holding mechanism 70, when compressed air is supplied from the air intake / exhaust portion 71 to the through hole 26, the suction pad 72 rises along the through hole 26 and comes into contact with the glass substrate W. Therefore, positioning can be performed in the same manner as in the first embodiment by using the frictional force generated between the suction pad 72 and the suction pad 72. Thereafter, when the air in the through hole 26 is sucked by the air intake / exhaust portion 71, the reverse support valve 76 is opened as shown by the broken line, and the concave portion 74 is communicated with the through hole 26. As a result, the glass substrate W is sucked and held. The As described above, the suction holding mechanism 70 can perform vertical movement and suction holding. A stopper 67 as shown in FIG. 6 may be provided at the lower end of the curved portion 35 and an annular groove 68 corresponding to the stopper 67 may be formed in the through hole 26.

本発明の実施の形態における基板保持装置である浮上搬送装置の概略構成を示す側面図である。It is a side view which shows schematic structure of the levitation conveyance apparatus which is a board | substrate holding | maintenance apparatus in embodiment of this invention. 浮上搬送装置の概略構成を示す平面図である。It is a top view which shows schematic structure of a levitation conveyance apparatus. 浮上搬送装置の断面図であって、リフトピンの構成を示す図である。It is sectional drawing of a levitation conveyance apparatus, Comprising: It is a figure which shows the structure of a lift pin. 浮上搬送装置の断面図であって、基板保持装置である吸着保持機構の構成を示す図である。It is sectional drawing of a levitation conveyance apparatus, Comprising: It is a figure which shows the structure of the adsorption holding mechanism which is a board | substrate holding apparatus. 浮上搬送装置の構成を示す図である。It is a figure which shows the structure of a levitation conveyance apparatus. 浮上搬送装置の断面図であって、基板保持装置の構成を示す図である。It is sectional drawing of a levitation conveyance apparatus, Comprising: It is a figure which shows the structure of a board | substrate holding | maintenance apparatus. 浮上搬送装置の断面図であって、基板保持装置である吸着保持機構の構成を示す図である。It is sectional drawing of a levitation conveyance apparatus, Comprising: It is a figure which shows the structure of the adsorption holding mechanism which is a board | substrate holding apparatus.

符号の説明Explanation of symbols

1 浮上搬送装置
3 浮上ステージ
11 リフトピン(接触部材)
17,18 吸着搬送ユニット
25 吸着保持機構
21,22,23,41,52,53,54,55 基準ピン(位置決め機構)
24,42,43,44,56,57,58,59 押し付けピン(位置決め機構)
28 配管(吸引機構)
29 バルブ(吸引機構)
30 圧搾エアー供給部(吸引機構)
31 弾性部材(吸引機構)
33,72 吸着パッド(接触部材)
50 基板保持機構
51 ステージ(基板保持装置)
65 接触部材
69 吸引機構
W ガラス基板

DESCRIPTION OF SYMBOLS 1 Levitation conveyance apparatus 3 Levitation stage 11 Lift pin (contact member)
17, 18 Adsorption transport unit 25 Adsorption holding mechanism 21, 22, 23, 41, 52, 53, 54, 55 Reference pin (positioning mechanism)
24, 42, 43, 44, 56, 57, 58, 59 Pressing pin (positioning mechanism)
28 Piping (suction mechanism)
29 Valve (Suction mechanism)
30 Compressed air supply unit (suction mechanism)
31 Elastic member (suction mechanism)
33,72 Suction pad (contact member)
50 Substrate holding mechanism 51 Stage (substrate holding device)
65 Contact member 69 Suction mechanism W Glass substrate

Claims (4)

浮上ステージから基板を浮上させつつ、前記基板を位置決めして保持する基板保持装置であって、
前記基板の裏面に当接可能な接触部材と、
浮上している前記基板の裏面に前記接触部材を当接させて前記基板の移動を規制した状態で、前記基板を所定位置に位置決めする位置決め機構と、
前記位置決め機構により位置決めされた前記基板を吸着保持させる吸引機構と、
を具備したことを特徴とする基板保持装置。
A substrate holding device that positions and holds the substrate while levitating the substrate from the levitation stage,
A contact member capable of contacting the back surface of the substrate;
A positioning mechanism for positioning the substrate at a predetermined position in a state where the contact member is brought into contact with the back surface of the floating substrate and the movement of the substrate is regulated;
A suction mechanism for sucking and holding the substrate positioned by the positioning mechanism;
A substrate holding apparatus comprising:
前記接触部材は、前記吸引機構に接続された吸着パッドであることを特徴とする請求項1に記載の基板保持装置。   The substrate holding apparatus according to claim 1, wherein the contact member is a suction pad connected to the suction mechanism. 前記接触部材と、前記吸引機構と、前記位置決め機構とを、前記浮上ステージに沿って往復移動自在な搬送ユニットに設けたことを特徴とする請求項1に記載の基板保持装置。   The substrate holding apparatus according to claim 1, wherein the contact member, the suction mechanism, and the positioning mechanism are provided in a transport unit that can reciprocate along the floating stage. 基板を浮上させる工程と、
浮上した前記基板の裏面に接触部材を当接させて前記基板の移動を規制する工程と、
前記接触部材と前記基板との当接状態を維持しつつ前記基板を移動させて、前記基板の位置決めをする工程と、
位置決め後に前記基板を吸着保持する工程と、
を備えることを特徴とする基板の保持方法。

A step of floating the substrate;
A step of restricting the movement of the substrate by bringing a contact member into contact with the back surface of the floating substrate;
A step of positioning the substrate by moving the substrate while maintaining a contact state between the contact member and the substrate;
Sucking and holding the substrate after positioning;
A method for holding a substrate, comprising:

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