JP2006169123A - メークアップ化粧料 - Google Patents

メークアップ化粧料 Download PDF

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Publication number
JP2006169123A
JP2006169123A JP2004359749A JP2004359749A JP2006169123A JP 2006169123 A JP2006169123 A JP 2006169123A JP 2004359749 A JP2004359749 A JP 2004359749A JP 2004359749 A JP2004359749 A JP 2004359749A JP 2006169123 A JP2006169123 A JP 2006169123A
Authority
JP
Japan
Prior art keywords
powder
mass
cosmetic
acid
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2004359749A
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English (en)
Japanese (ja)
Other versions
JP2006169123A5 (https=
Inventor
Hirochika Nishimura
博睦 西村
Takemasa Toyoda
剛正 豊田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Pola Orbis Holdings Inc
Original Assignee
Pola Chemical Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pola Chemical Industries Inc filed Critical Pola Chemical Industries Inc
Priority to JP2004359749A priority Critical patent/JP2006169123A/ja
Publication of JP2006169123A publication Critical patent/JP2006169123A/ja
Publication of JP2006169123A5 publication Critical patent/JP2006169123A5/ja
Pending legal-status Critical Current

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JP2004359749A 2004-12-13 2004-12-13 メークアップ化粧料 Pending JP2006169123A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004359749A JP2006169123A (ja) 2004-12-13 2004-12-13 メークアップ化粧料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004359749A JP2006169123A (ja) 2004-12-13 2004-12-13 メークアップ化粧料

Publications (2)

Publication Number Publication Date
JP2006169123A true JP2006169123A (ja) 2006-06-29
JP2006169123A5 JP2006169123A5 (https=) 2008-01-17

Family

ID=36670254

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004359749A Pending JP2006169123A (ja) 2004-12-13 2004-12-13 メークアップ化粧料

Country Status (1)

Country Link
JP (1) JP2006169123A (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023097497A (ja) * 2021-12-28 2023-07-10 株式会社コーセー 化粧料

Citations (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04230306A (ja) * 1990-12-27 1992-08-19 Kao Corp 粉体化粧料
JPH0558841A (ja) * 1991-08-30 1993-03-09 Kao Corp 粉体化粧料
JPH07118123A (ja) * 1993-10-19 1995-05-09 Pola Chem Ind Inc 化粧料用の粉体及びそれを含有する化粧料
JPH07187952A (ja) * 1993-12-28 1995-07-25 Kao Corp 粉体化粧料
JPH1045524A (ja) * 1996-07-26 1998-02-17 Shiseido Co Ltd 化粧料
JPH1143419A (ja) * 1997-07-30 1999-02-16 Kao Corp 粉体化粧料
JPH11152208A (ja) * 1997-11-20 1999-06-08 Kao Corp 粉体化粧料
JP2002104932A (ja) * 2000-09-25 2002-04-10 Kao Corp 粉体化粧料
JP2002173415A (ja) * 2000-12-07 2002-06-21 Pola Chem Ind Inc 拡散透過層を有する扁平粉体
JP2002249415A (ja) * 2001-02-21 2002-09-06 Kose Corp 粉末化粧料
JP2003055573A (ja) * 2001-08-14 2003-02-26 Nippon Shikizai Inc 積層型干渉性球状顔料及びそれを配合した化粧料
JP2004137199A (ja) * 2002-10-17 2004-05-13 Nof Corp 粉体被覆剤、表面被覆処理法、粉体及びこれを含有する化粧料
JP2004189652A (ja) * 2002-12-10 2004-07-08 Iwase Cosfa Kk 改質粉体および化粧料
JP2004292342A (ja) * 2003-03-26 2004-10-21 Kose Corp 粉体化粧料
JP2006160675A (ja) * 2004-12-08 2006-06-22 Pola Chem Ind Inc メークアップ化粧料
JP2006160703A (ja) * 2004-12-10 2006-06-22 Pola Chem Ind Inc メークアップ化粧料

Patent Citations (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04230306A (ja) * 1990-12-27 1992-08-19 Kao Corp 粉体化粧料
JPH0558841A (ja) * 1991-08-30 1993-03-09 Kao Corp 粉体化粧料
JPH07118123A (ja) * 1993-10-19 1995-05-09 Pola Chem Ind Inc 化粧料用の粉体及びそれを含有する化粧料
JPH07187952A (ja) * 1993-12-28 1995-07-25 Kao Corp 粉体化粧料
JPH1045524A (ja) * 1996-07-26 1998-02-17 Shiseido Co Ltd 化粧料
JPH1143419A (ja) * 1997-07-30 1999-02-16 Kao Corp 粉体化粧料
JPH11152208A (ja) * 1997-11-20 1999-06-08 Kao Corp 粉体化粧料
JP2002104932A (ja) * 2000-09-25 2002-04-10 Kao Corp 粉体化粧料
JP2002173415A (ja) * 2000-12-07 2002-06-21 Pola Chem Ind Inc 拡散透過層を有する扁平粉体
JP2002249415A (ja) * 2001-02-21 2002-09-06 Kose Corp 粉末化粧料
JP2003055573A (ja) * 2001-08-14 2003-02-26 Nippon Shikizai Inc 積層型干渉性球状顔料及びそれを配合した化粧料
JP2004137199A (ja) * 2002-10-17 2004-05-13 Nof Corp 粉体被覆剤、表面被覆処理法、粉体及びこれを含有する化粧料
JP2004189652A (ja) * 2002-12-10 2004-07-08 Iwase Cosfa Kk 改質粉体および化粧料
JP2004292342A (ja) * 2003-03-26 2004-10-21 Kose Corp 粉体化粧料
JP2006160675A (ja) * 2004-12-08 2006-06-22 Pola Chem Ind Inc メークアップ化粧料
JP2006160703A (ja) * 2004-12-10 2006-06-22 Pola Chem Ind Inc メークアップ化粧料

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023097497A (ja) * 2021-12-28 2023-07-10 株式会社コーセー 化粧料
JP7842561B2 (ja) 2021-12-28 2026-04-08 株式会社コーセーホールディングス 化粧料

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