JP2006126205A - 粒子検出デバイス、リソグラフィ装置およびデバイス製造方法 - Google Patents

粒子検出デバイス、リソグラフィ装置およびデバイス製造方法 Download PDF

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Publication number
JP2006126205A
JP2006126205A JP2005320099A JP2005320099A JP2006126205A JP 2006126205 A JP2006126205 A JP 2006126205A JP 2005320099 A JP2005320099 A JP 2005320099A JP 2005320099 A JP2005320099 A JP 2005320099A JP 2006126205 A JP2006126205 A JP 2006126205A
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Japan
Prior art keywords
detector
radiation
particle
particles
signal
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JP2005320099A
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English (en)
Japanese (ja)
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JP2006126205A5 (enExample
Inventor
Johannes Onvlee
オンフレー ヨハネス
Peter Ferdinand Greve
フェルディナント グレーフェ ペーター
Johannes Hendrikus Gertrudis Franssen
ヘンドリクス ゲルトルディス フランセン ヨハネス
Raymond Visser
フィッセル レイモンド
Erwin Theodorus Jacoba Verhagen
テオドルス ヤコバ フェルハーゲン アーウィン
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ASML Netherlands BV
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ASML Netherlands BV
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Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of JP2006126205A publication Critical patent/JP2006126205A/ja
Publication of JP2006126205A5 publication Critical patent/JP2006126205A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/94—Investigating contamination, e.g. dust
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

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  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP2005320099A 2004-10-05 2005-10-05 粒子検出デバイス、リソグラフィ装置およびデバイス製造方法 Pending JP2006126205A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/957,752 US7349082B2 (en) 2004-10-05 2004-10-05 Particle detection device, lithographic apparatus and device manufacturing method

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2008257384A Division JP4829284B2 (ja) 2004-10-05 2008-10-02 粒子検出システム及びリソグラフィ装置

Publications (2)

Publication Number Publication Date
JP2006126205A true JP2006126205A (ja) 2006-05-18
JP2006126205A5 JP2006126205A5 (enExample) 2008-06-19

Family

ID=36125181

Family Applications (2)

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JP2005320099A Pending JP2006126205A (ja) 2004-10-05 2005-10-05 粒子検出デバイス、リソグラフィ装置およびデバイス製造方法
JP2008257384A Expired - Fee Related JP4829284B2 (ja) 2004-10-05 2008-10-02 粒子検出システム及びリソグラフィ装置

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JP2008257384A Expired - Fee Related JP4829284B2 (ja) 2004-10-05 2008-10-02 粒子検出システム及びリソグラフィ装置

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US (2) US7349082B2 (enExample)
JP (2) JP2006126205A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023508115A (ja) * 2019-12-31 2023-02-28 エーエスエムエル ホールディング エヌ．ブイ． 汚染検出計測システム、リソグラフィ装置、それらの方法

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7265366B2 (en) * 2004-03-31 2007-09-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1677099A1 (en) * 2004-12-30 2006-07-05 Danmarks Tekniske Universitet Method and apparatus for classification of surfaces
US7599072B2 (en) * 2007-05-30 2009-10-06 University-Industry Cooperation Group Of Kyung Hee University Method for determining physical properties of a multilayered periodic structure
JP5235480B2 (ja) * 2008-04-17 2013-07-10 キヤノン株式会社 異物検査装置、露光装置及びデバイス製造方法
GB2462081A (en) * 2008-07-21 2010-01-27 Eigenlabs Ltd A programmable sound creation interface
TWI470210B (zh) * 2012-12-17 2015-01-21 Taiwan Power Testing Technology Co Ltd 顯示裝置之光學層件之缺陷檢測方法
US10262462B2 (en) 2014-04-18 2019-04-16 Magic Leap, Inc. Systems and methods for augmented and virtual reality
KR20160031274A (ko) * 2014-09-12 2016-03-22 삼성전자주식회사 레티클 검사 장치 및 방법
CN107884318B (zh) * 2016-09-30 2020-04-10 上海微电子装备（集团）股份有限公司 一种平板颗粒度检测方法
WO2021209273A1 (en) 2020-04-15 2021-10-21 Asml Holding N.V. Contaminant analyzing metrology system, lithographic apparatus, and methods thereof
US12405227B2 (en) 2020-01-23 2025-09-02 Asml Holding N.V. Method for region of interest processing for reticle particle detection
CN115023604A (zh) * 2020-02-03 2022-09-06 Asml控股股份有限公司 基于散射仪的粒子检查系统的改进对准

Family Cites Families (16)

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Publication number Priority date Publication date Assignee Title
JPS6270739A (ja) * 1985-09-25 1987-04-01 Hitachi Electronics Eng Co Ltd 異物検査装置
JPS62124447A (ja) * 1985-11-25 1987-06-05 Canon Inc 表面状態測定装置
JPS63226937A (ja) * 1987-03-16 1988-09-21 Hitachi Electronics Eng Co Ltd 異物検査装置
KR920007196B1 (ko) * 1989-09-18 1992-08-27 가부시끼가이샤 히다찌세이사꾸쇼 이물질 검출방법 및 그 장치
JPH0694633A (ja) * 1992-09-09 1994-04-08 Nikon Corp 欠陥検査装置
JP3099535B2 (ja) * 1992-07-08 2000-10-16 キヤノン株式会社 表面状態検査装置
JPH06249788A (ja) * 1993-02-24 1994-09-09 Nikon Corp 異物検査装置
JP3266217B2 (ja) * 1993-06-17 2002-03-18 日立電子エンジニアリング株式会社 液晶基板の異物検査装置
JPH0792096A (ja) * 1993-07-30 1995-04-07 Canon Inc 異物検査装置並びにこれを備えた露光装置及びデバイ スの製造方法
JPH07113759A (ja) * 1993-10-14 1995-05-02 Nikon Corp 異物検査装置
JPH07229844A (ja) * 1994-02-22 1995-08-29 Nikon Corp 異物検査装置
JP3385442B2 (ja) 1994-05-31 2003-03-10 株式会社ニュークリエイション 検査用光学系および検査装置
EP0930498A3 (en) 1997-12-26 1999-11-17 Nidek Co., Ltd. Inspection apparatus and method for detecting defects
JP2002228428A (ja) * 2001-02-02 2002-08-14 Nikon Corp 異物検出装置及び露光装置
US6927847B2 (en) * 2001-09-13 2005-08-09 Hitachi High-Technologies Corporation Method and apparatus for inspecting pattern defects
JP2004226939A (ja) * 2002-11-26 2004-08-12 Lasertec Corp 欠陥検査装置、欠陥検査方法並びにこれを用いた半導体デバイスの製造方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023508115A (ja) * 2019-12-31 2023-02-28 エーエスエムエル ホールディング エヌ．ブイ． 汚染検出計測システム、リソグラフィ装置、それらの方法
US11803119B2 (en) 2019-12-31 2023-10-31 Asml Holding N.V. Contaminant detection metrology system, lithographic apparatus, and methods thereof
JP7483893B2 (ja) 2019-12-31 2024-05-15 エーエスエムエル ホールディング エヌ．ブイ． 汚染検出計測システム、リソグラフィ装置、それらの方法

Also Published As

Publication number Publication date
JP2009016870A (ja) 2009-01-22
US7283225B2 (en) 2007-10-16
US20060072108A1 (en) 2006-04-06
US20060072107A1 (en) 2006-04-06
JP4829284B2 (ja) 2011-12-07
US7349082B2 (en) 2008-03-25

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