JP2006030528A - 無端状ベルト搬送体および画像形成装置 - Google Patents
無端状ベルト搬送体および画像形成装置 Download PDFInfo
- Publication number
- JP2006030528A JP2006030528A JP2004208396A JP2004208396A JP2006030528A JP 2006030528 A JP2006030528 A JP 2006030528A JP 2004208396 A JP2004208396 A JP 2004208396A JP 2004208396 A JP2004208396 A JP 2004208396A JP 2006030528 A JP2006030528 A JP 2006030528A
- Authority
- JP
- Japan
- Prior art keywords
- endless belt
- image forming
- toner image
- belt carrier
- forming apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000012546 transfer Methods 0.000 claims abstract description 32
- 239000000463 material Substances 0.000 claims description 17
- 229910021392 nanocarbon Inorganic materials 0.000 claims description 10
- 230000032258 transport Effects 0.000 claims description 7
- 239000004642 Polyimide Substances 0.000 claims description 6
- 229920001721 polyimide Polymers 0.000 claims description 6
- 239000004962 Polyamide-imide Substances 0.000 claims description 5
- 238000000465 moulding Methods 0.000 claims description 5
- 229920002312 polyamide-imide Polymers 0.000 claims description 5
- 239000002356 single layer Substances 0.000 claims description 3
- 230000007613 environmental effect Effects 0.000 abstract description 8
- 230000007547 defect Effects 0.000 description 10
- 238000000034 method Methods 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- 238000002474 experimental method Methods 0.000 description 6
- 239000006229 carbon black Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000000969 carrier Substances 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 241000519995 Stachys sylvatica Species 0.000 description 2
- 239000012876 carrier material Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- 108091008695 photoreceptors Proteins 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 230000008929 regeneration Effects 0.000 description 2
- 238000011069 regeneration method Methods 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 1
- 241000872198 Serjania polyphylla Species 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000006258 conductive agent Substances 0.000 description 1
- 229920001940 conductive polymer Polymers 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 230000009454 functional inhibition Effects 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78603—Thin film transistors, i.e. transistors with a channel being at least partly a thin film characterised by the insulating substrate or support
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G15/00—Apparatus for electrographic processes using a charge pattern
- G03G15/01—Apparatus for electrographic processes using a charge pattern for producing multicoloured copies
- G03G15/0105—Details of unit
- G03G15/0131—Details of unit for transferring a pattern to a second base
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G15/00—Apparatus for electrographic processes using a charge pattern
- G03G15/14—Apparatus for electrographic processes using a charge pattern for transferring a pattern to a second base
- G03G15/16—Apparatus for electrographic processes using a charge pattern for transferring a pattern to a second base of a toner pattern, e.g. a powder pattern, e.g. magnetic transfer
- G03G15/1665—Apparatus for electrographic processes using a charge pattern for transferring a pattern to a second base of a toner pattern, e.g. a powder pattern, e.g. magnetic transfer by introducing the second base in the nip formed by the recording member and at least one transfer member, e.g. in combination with bias or heat
- G03G15/167—Apparatus for electrographic processes using a charge pattern for transferring a pattern to a second base of a toner pattern, e.g. a powder pattern, e.g. magnetic transfer by introducing the second base in the nip formed by the recording member and at least one transfer member, e.g. in combination with bias or heat at least one of the recording member or the transfer member being rotatable during the transfer
- G03G15/1685—Structure, details of the transfer member, e.g. chemical composition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
- H01L21/285—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation
- H01L21/28506—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers
- H01L21/28512—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising elements of Group IV of the Periodic System
- H01L21/28568—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising elements of Group IV of the Periodic System the conductive layers comprising transition metals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/76841—Barrier, adhesion or liner layers
- H01L21/76843—Barrier, adhesion or liner layers formed in openings in a dielectric
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/76841—Barrier, adhesion or liner layers
- H01L21/76843—Barrier, adhesion or liner layers formed in openings in a dielectric
- H01L21/76849—Barrier, adhesion or liner layers formed in openings in a dielectric the layer being positioned on top of the main fill metal
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/76841—Barrier, adhesion or liner layers
- H01L21/76853—Barrier, adhesion or liner layers characterized by particular after-treatment steps
- H01L21/76855—After-treatment introducing at least one additional element into the layer
- H01L21/76856—After-treatment introducing at least one additional element into the layer by treatment in plasmas or gaseous environments, e.g. nitriding a refractory metal liner
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/124—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/45—Ohmic electrodes
- H01L29/456—Ohmic electrodes on silicon
- H01L29/458—Ohmic electrodes on silicon for thin film silicon, e.g. source or drain electrode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66742—Thin film unipolar transistors
- H01L29/6675—Amorphous silicon or polysilicon transistors
- H01L29/66757—Lateral single gate single channel transistors with non-inverted structure, i.e. the channel layer is formed before the gate
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G2215/00—Apparatus for electrophotographic processes
- G03G2215/01—Apparatus for electrophotographic processes for producing multicoloured copies
- G03G2215/0103—Plural electrographic recording members
- G03G2215/0119—Linear arrangement adjacent plural transfer points
- G03G2215/0138—Linear arrangement adjacent plural transfer points primary transfer to a recording medium carried by a transport belt
- G03G2215/0141—Linear arrangement adjacent plural transfer points primary transfer to a recording medium carried by a transport belt the linear arrangement being horizontal
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G2215/00—Apparatus for electrophotographic processes
- G03G2215/16—Transferring device, details
- G03G2215/1604—Main transfer electrode
- G03G2215/1623—Transfer belt
Abstract
【解決手段】画像形成装置は、記録媒体をトナー像形成手段7に搬送してトナー像形成手段7により形成されたトナー像を上記記録媒体に転写させる無端状ベルト搬送体1を備える。上記無端状ベルト搬送体は、500[V]を印加して10秒後の表面抵抗率をρs[Ω/□]とし、250[V]を印加して10秒後の体積抵抗率をρv[Ω・cm]としたとき、0.3≦(logρs−logρv)≦1.3を満たす。
【選択図】 図1
Description
記録媒体を画像形成装置のトナー像形成手段に搬送して上記トナー像形成手段により形成されたトナー像を上記記録媒体に転写させる無端状ベルト搬送体において、
500[V]を印加して10秒後の表面抵抗率をρs[Ω/□]とし、250[V]を印加して10秒後の体積抵抗率をρv[Ω・cm]としたとき、
0.3≦(logρs−logρv)≦1.3
を満たす
ことを特徴とする。
図1は本発明の実施の形態1の画像形成装置の側面図である。また、図2は図1の画像形成装置においての無端状ベルト搬送装置の斜視図であり、図1と同じものには同じ符号を付してある。
x=logρs−logρv…(1)
ただし、logは常用対数である。本願において、上記(1)式のx(=logρs−logρv)を「階差」と称する。
0.3≦x(=logρs−logρv)≦1.3…(2)
を満たすことを特徴とするものである。
本発明の実施の形態2の画像形成装置の構成および動作は、上記実施の形態1の画像形成装置(図1参照)と同様であり、実施の形態2の画像形成装置においての無端状ベルト搬送装置の構成および動作は、上記実施の形態1の画像形成装置においての無端状ベルト搬送装置(図2)と同様である。
2 ドライブローラ
3 ベルトフレーム
4 テンションローラ
5 感光体
6 帯電装置
7 トナー像形成手段
8 転写ローラ
9 露光装置
17 印刷媒体供給部
18 印刷媒体整列部
19 定着部
Claims (9)
- 記録媒体を画像形成装置のトナー像形成手段に搬送して上記トナー像形成手段により形成されたトナー像を上記記録媒体に転写させる無端状ベルト搬送体において、
500[V]を印加して10秒後の表面抵抗率をρs[Ω/□]とし、250[V]を印加して10秒後の体積抵抗率をρv[Ω・cm]としたとき、
0.3≦(logρs−logρv)≦1.3
を満たす
ことを特徴とする無端状ベルト搬送体。 - 単層構造からなることを特徴とする請求項1に記載の無端状ベルト搬送体。
- ヤング率200[MPa]以上の材料を母材とすることを特徴とする請求項1または2に記載の無端状ベルト搬送体。
- ポリアミドイミドを母材とすることを特徴とする請求項1から3までのいずれかに記載の無端状ベルト搬送体。
- ポリイミドを母材とすることを特徴とする請求項1から3までのいずれかに記載の無端状ベルト搬送体。
- ナノカーボンを含有することを特徴とする請求項1から5に記載の無端状ベルト搬送体。
- 遠心成形を用いて成形されたことを特徴とする請求項1から6に記載の無端状ベルト搬送体。
- 合せ金型を用いて成形したことを特徴とする請求項1から6に記載の無端状ベルト搬送体。
- 記録媒体をトナー像形成手段に搬送して上記トナー像形成手段により形成されたトナー像を上記記録媒体に転写させる無端状ベルト搬送体を備えた画像形成装置において、
上記無端状ベルト搬送体が、請求項1から8までのいずれかに記載の無端状ベルト搬送体であることを特徴とする画像形成装置。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004208396A JP2006030528A (ja) | 2004-07-15 | 2004-07-15 | 無端状ベルト搬送体および画像形成装置 |
EP05106359A EP1617300B1 (en) | 2004-07-15 | 2005-07-12 | Endless belt type transferring apparatus and image forming apparatus |
DE602005011073T DE602005011073D1 (de) | 2004-07-15 | 2005-07-12 | Übertragungsvorrichtung mit endlosem Band und Bilderzeugungsgerät |
US11/180,358 US7356296B2 (en) | 2004-07-15 | 2005-07-13 | Endless belt type transferring apparatus and image forming apparatus |
CN2005100874923A CN1722022B (zh) | 2004-07-15 | 2005-07-15 | 环形带传输装置以及图像形成装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004208396A JP2006030528A (ja) | 2004-07-15 | 2004-07-15 | 無端状ベルト搬送体および画像形成装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2006030528A true JP2006030528A (ja) | 2006-02-02 |
Family
ID=35094642
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004208396A Pending JP2006030528A (ja) | 2004-07-15 | 2004-07-15 | 無端状ベルト搬送体および画像形成装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7356296B2 (ja) |
EP (1) | EP1617300B1 (ja) |
JP (1) | JP2006030528A (ja) |
CN (1) | CN1722022B (ja) |
DE (1) | DE602005011073D1 (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5095133B2 (ja) * | 2006-06-06 | 2012-12-12 | 株式会社リコー | 転写装置の製造方法 |
US7851111B2 (en) | 2006-07-31 | 2010-12-14 | Xerox Corporation | Imaging belt with nanotube backing layer, and image forming devices including the same |
US7738820B2 (en) * | 2008-04-09 | 2010-06-15 | Xerox Corporation | HSD wires using fibrous carbon nanomaterial yarns |
US20090263166A1 (en) * | 2008-04-18 | 2009-10-22 | Kabushiki Kaisha Toshiba | Image forming apparatus |
JP5142037B2 (ja) * | 2008-07-24 | 2013-02-13 | 株式会社リコー | ベルト部材、転写装置及び画像形成装置 |
JP2012173607A (ja) * | 2011-02-23 | 2012-09-10 | Fuji Xerox Co Ltd | 画像形成装置 |
JP5927523B2 (ja) | 2011-11-29 | 2016-06-01 | 株式会社Joled | 薄膜トランジスタおよび薄膜トランジスタの製造方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3409578B2 (ja) | 1996-05-08 | 2003-05-26 | カシオ電子工業株式会社 | 転写搬送ベルトの抵抗特性安定化方法、転写搬送ベルトの生産方法、及び画像形成装置の生産方法 |
US5930573A (en) * | 1997-10-06 | 1999-07-27 | Ricoh Company, Ltd. | Image forming apparatus and image transferring device thereof having conveying member with selected surface resistivity |
US5922440A (en) * | 1998-01-08 | 1999-07-13 | Xerox Corporation | Polyimide and doped metal oxide intermediate transfer components |
JP2000187403A (ja) * | 1998-12-21 | 2000-07-04 | Nitto Denko Corp | 半導電性ベルト |
US6336026B1 (en) * | 1999-08-17 | 2002-01-01 | Xerox Corporation | Stabilized fluorosilicone transfer members |
JP4806845B2 (ja) * | 2000-01-07 | 2011-11-02 | 富士ゼロックス株式会社 | 半導電性ベルト、半導電性ロール、および画像形成装置 |
JP2003076155A (ja) * | 2001-09-04 | 2003-03-14 | Canon Inc | 画像形成装置、中間転写ユニット及び記録材搬送ユニット |
JP2003255640A (ja) * | 2002-02-27 | 2003-09-10 | Fuji Xerox Co Ltd | ポリイミド樹脂無端ベルト、及びその製造方法 |
DE10246333B4 (de) | 2002-10-04 | 2008-06-19 | Neoperl Gmbh | Strahlregler |
EP1650609B1 (en) * | 2003-07-25 | 2013-09-18 | Mitsubishi Chemical Corporation | Endless belt for image forming devices and image forming device |
-
2004
- 2004-07-15 JP JP2004208396A patent/JP2006030528A/ja active Pending
-
2005
- 2005-07-12 DE DE602005011073T patent/DE602005011073D1/de active Active
- 2005-07-12 EP EP05106359A patent/EP1617300B1/en not_active Expired - Fee Related
- 2005-07-13 US US11/180,358 patent/US7356296B2/en active Active
- 2005-07-15 CN CN2005100874923A patent/CN1722022B/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CN1722022B (zh) | 2011-03-16 |
EP1617300B1 (en) | 2008-11-19 |
CN1722022A (zh) | 2006-01-18 |
US20060210323A9 (en) | 2006-09-21 |
EP1617300A3 (en) | 2006-07-19 |
US20050249525A1 (en) | 2005-11-10 |
DE602005011073D1 (de) | 2009-01-02 |
EP1617300A2 (en) | 2006-01-18 |
US7356296B2 (en) | 2008-04-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPH11258834A (ja) | 融解装置用フィルム | |
JP2010217598A (ja) | 画像形成ユニット及び画像形成装置 | |
US9715192B2 (en) | Semiconductive roller, method for manufacturing the same and image forming apparatus | |
US7356296B2 (en) | Endless belt type transferring apparatus and image forming apparatus | |
JP2004151260A (ja) | 画像形成方法および画像形成装置 | |
JP2004310064A (ja) | ローラー部材及び画像形成装置 | |
US8506277B2 (en) | Cylindrical core for manufacturing endless belt-shaped body, and method for manufacturing endless belt-shaped body | |
US6219522B1 (en) | Fuser and image forming apparatus | |
JP4911986B2 (ja) | 無端状ベルト、ベルト装置及び画像形成装置 | |
JP4627251B2 (ja) | 画像形成装置 | |
JP2007033494A (ja) | 画像形成装置 | |
JP4508562B2 (ja) | 転写部材、及びこれを用いた画像形成装置 | |
JP4517796B2 (ja) | 画像形成装置及び定着装置 | |
US20110033200A1 (en) | Belt cleaning apparatus and image forming apparatus | |
JP2010151969A (ja) | 電子写真用部材、無端ベルト、定着装置及び画像形成装置 | |
JP2000122435A (ja) | 画像形成装置 | |
JP3880459B2 (ja) | 画像形成装置 | |
JP3943976B2 (ja) | ベルト状転写部材、ベルト状転写部材の製造方法、画像形成装置及び中間転写ベルト−潜像担持体一体型カートリッジ | |
JPH11327322A (ja) | 画像形成装置 | |
JP7175742B2 (ja) | 中間転写ベルト及び画像形成装置 | |
JP2000172106A (ja) | 定着装置及びこれを用いた画像形成装置 | |
JP2021135327A (ja) | 転写ユニットおよび画像形成装置 | |
JP5297698B2 (ja) | 一次転写ローラ | |
JP2006337640A (ja) | カラー画像形成装置 | |
JP2020067579A (ja) | 清掃部材、清掃部材の製造方法、及び画像形成装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20070221 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20090827 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20090901 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20091027 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20091117 |