JP2005512229A - 混成の積み重ねられた集積回路ダイ要素を含む再構成可能なプロセッサモジュール - Google Patents
混成の積み重ねられた集積回路ダイ要素を含む再構成可能なプロセッサモジュール Download PDFInfo
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- 230000006870 function Effects 0.000 claims description 10
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Abstract
Description
この発明は、一般に再構成可能または適合データ処理のためのシステムおよび方法の分野に関する。特に、この発明は混成の積み重ねられた集積回路(「IC」)ダイ要素を含む非常に小型の再構成可能なプロセッサモジュールに関する。
られる。
この発明の代表的な実施例の開示によると、現在利用可能なウェハ処理技術を使用して、FPGA、マイクロプロセッサおよびキャッシュメモリを組合せ、特に有利な形の混成の再構成可能なプロセッサモジュールを作り、GPRPシステムの現在の別個の集積回路装置の実現例の限界を克服することができる。ここに開示されるように、この新しいプロセッサモジュールは、積み重ねられたダイ混成(「SDH; Stacked Die Hybrid」)プロセッサと称してもよい。
」)コントローラおよびFPGAダイを含む再構成可能性を備えたメモリまたはI/Oモジュールを提供するために使用することができ、有利である。
図1を参照すると、先行技術の再構成可能なコンピュータシステム10の一部分の簡略化した機能ブロック図が示される。コンピュータシステム10は、関連する部分に、1つまたは複数のマイクロプロセッサ12、1つまたは複数のマルチアダプティブプロセシング(multi-adaptive processing; MAPTM)要素14ならびに関連するシステムメモリ16を組込む。システムバス18は、ブリッジ22によってMAP要素14をマイクロプロセッサ12に双方向に結合し、クロスバースイッチ24によってMAP要素14をシステムメモリ16に双方向に結合する。各MAP要素14は、図示のように他の隣接するMAP要素14への1つまたは複数の双方向の接続20を含んでもよい。
。
Claims (47)
- プロセッサモジュールであって、
プログラマブルアレイを含む少なくとも第1の集積回路ダイ要素と、
前記第1の集積回路ダイ要素の前記プログラマブルアレイに積み重ねられかつ電気的に結合される少なくとも第2の集積回路ダイ要素とを含む、プロセッサモジュール。 - 前記第1の集積回路ダイ要素の前記プログラマブルアレイはFPGAを含む、請求項1に記載のプロセッサモジュール。
- 前記第2の集積回路ダイ要素の前記プロセッサはマイクロプロセッサを含む、請求項1に記載のプロセッサモジュール。
- 前記第2の集積回路ダイ要素はメモリを含む、請求項1に記載のプロセッサモジュール。
- 前記第1または第2の集積回路ダイ要素のうちの少なくとも1つに積み重ねられかつ電気的に結合される少なくとも第3の集積回路ダイ要素をさらに含む、請求項1に記載のプロセッサモジュール。
- 前記第3の集積回路ダイ要素はメモリを含む、請求項5に記載のプロセッサモジュール。
- 前記プログラマブルアレイは、処理要素として再構成可能である、請求項1に記載のプロセッサモジュール。
- 前記第1および第2の集積回路ダイ要素は、前記ダイ要素の表面にわたって分散されるいくつかのコンタクト点によって電気的に結合される、請求項1に記載のプロセッサモジュール。
- 前記コンタクト点は前記ダイ要素の厚みを横切る、請求項8に記載のプロセッサモジュール。
- 前記ダイ要素は、前記コンタクト点が前記ダイ要素の前記厚みを横切るまで薄くされる、請求項9に記載のプロセッサモジュール。
- 再構成可能なコンピュータシステムであって、
プロセッサと、
メモリと、
プログラマブルアレイを有する少なくとも第1の集積回路ダイ要素および前記第1の集積回路ダイ要素の前記プログラマブルアレイに積み重ねられかつ電気的に結合される少なくとも第2の集積回路ダイ要素を含む少なくとも1つのプロセッサモジュールとを含む、コンピュータシステム。 - 前記第1の集積回路ダイ要素の前記プログラマブルアレイはFPGAを含む、請求項11に記載のコンピュータシステム。
- 前記第2の集積回路ダイ要素の前記プロセッサはマイクロプロセッサを含む、請求項11に記載のコンピュータシステム。
- 前記第2の集積回路ダイ要素はメモリを含む、請求項11に記載のコンピュータシステム。
- 前記第1または第2の集積回路ダイ要素のうちの少なくとも1つに積み重ねられかつ電気的に結合される少なくとも第3の集積回路ダイ要素をさらに含む、請求項11に記載のコンピュータシステム。
- 前記第3の集積回路ダイ要素はメモリを含む、請求項15に記載のコンピュータシステム。
- 前記プログラマブルアレイは、処理要素として再構成可能である、請求項11に記載のコンピュータシステム。
- 前記第1および第2の集積回路ダイ要素は、前記ダイ要素の表面にわたって分散されるいくつかのコンタクト点によって電気的に結合される、請求項11に記載のコンピュータシステム。
- 前記コンタクト点は前記ダイ要素の厚みを横切る、請求項18に記載のコンピュータシステム。
- 前記ダイ要素は、前記コンタクト点が前記ダイ要素の前記厚みを横切るまで薄くされる、請求項19に記載のコンピュータシステム。
- プロセッサモジュールであって、
プログラマブルアレイを含む少なくとも第1の集積回路ダイ要素と、
前記第1の集積回路ダイ要素の前記プログラマブルアレイに積み重ねられかつ電気的に結合されるプロセッサを含む少なくとも第2の集積回路ダイ要素と、
前記第1および第2の集積回路ダイ要素の前記プログラマブルアレイおよび前記プロセッサにそれぞれ積み重ねられかつ電気的に結合されるメモリを含む少なくとも第3の集積回路ダイ要素とを含む、プロセッサモジュール。 - 前記第1の集積回路ダイ要素の前記プログラマブルアレイはFPGAを含む、請求項21に記載のプロセッサモジュール。
- 前記第2の集積回路ダイ要素の前記プロセッサはマイクロプロセッサを含む、請求項21に記載のプロセッサモジュール。
- 前記第3の集積回路ダイ要素の前記メモリはメモリアレイを含む、請求項21に記載のプロセッサモジュール。
- 前記プログラマブルアレイは処理要素として再構成可能である、請求項21に記載のプロセッサモジュール。
- 前記第1、第2および第3の集積回路ダイ要素は、前記ダイ要素の表面にわたって分散されるいくつかのコンタクト点によって電気的に結合される、請求項21に記載のプロセッサモジュール。
- 前記コンタクト点は前記ダイ要素の厚みを横切る、請求項26に記載のプロセッサモジュール。
- 前記ダイ要素は、前記コンタクト点が前記ダイ要素の前記厚みを横切るまで薄くされる、請求項27に記載のプロセッサモジュール。
- プログラマブルアレイモジュールであって、
フィールドプログラマブルゲートアレイを含む少なくとも第1の集積回路ダイ要素と、
前記第1の集積回路ダイ要素の前記フィールドプログラマブルゲートアレイに積み重ねられかつ電気的に結合されるメモリアレイを含む少なくとも第2の集積回路ダイ要素とを含む、プログラマブルアレイモジュール。 - 前記フィールドプログラマブルゲートアレイは、処理要素としてプログラム可能である、請求項29に記載のプログラマブルアレイモジュール。
- 前記メモリアレイは、前記フィールドプログラマブルゲートアレイの、処理要素としての再構成を加速するように機能する、請求項30に記載のプログラマブルアレイモジュール。
- 前記メモリアレイは、前記処理要素への外部メモリ参照を加速するように機能する、請求項30に記載のプログラマブルアレイモジュール。
- 前記メモリアレイは、前記処理要素のためのブロックメモリとして機能する、請求項30に記載のプログラマブルアレイモジュール。
- 再構成可能なプロセッサモジュールであって、
プログラマブルアレイを含む少なくとも第1の集積回路ダイ要素と、
前記第1の集積回路ダイ要素の前記プログラマブルアレイに積み重ねられかつ電気的に結合されるプロセッサを含む少なくとも第2の集積回路ダイ要素と、
前記第1および第2の集積回路ダイ要素の前記プログラマブルアレイおよび前記プロセッサにそれぞれ積み重ねられかつ電気的に結合されるメモリを含む少なくとも第3の集積回路ダイ要素とを含み、
前記プロセッサおよび前記プログラマブルアレイは、それらの間でデータを共有するように動作する、再構成可能なプロセッサモジュール。 - 前記メモリは少なくとも前記データを一時的に記憶するように動作する、請求項34に記載の再構成可能なプロセッサモジュール。
- 前記第1の集積回路ダイ要素の前記プログラマブルアレイはFPGAを含む、請求項34に記載の再構成可能なプロセッサモジュール。
- 前記第2の集積回路ダイ要素の前記プロセッサはマイクロプロセッサを含む、請求項34に記載の再構成可能なプロセッサモジュール。
- 前記第3の集積回路ダイ要素の前記メモリはメモリアレイを含む、請求項34に記載の再構成可能なプロセッサモジュール。
- プログラマブルアレイモジュールであって、
フィールドプログラマブルゲートアレイを含む少なくとも第1の集積回路ダイ要素と、
前記第1の集積回路ダイ要素の前記フィールドプログラマブルゲートアレイに積み重ねられかつ電気的に結合されるメモリアレイを含む少なくとも第2の集積回路ダイ要素とを含み、前記第1および第2の集積回路ダイ要素は、前記ダイ要素の表面にわたって分散されるいくつかのコンタクト点によって結合される、プログラマブルアレイモジュール。 - 前記フィールドプログラマブルゲートアレイは、処理要素としてプログラム可能である、請求項39に記載のプログラマブルアレイモジュール。
- 前記メモリアレイは、前記フィールドプログラマブルゲートアレイの、処理要素としての再構成を加速するように機能する、請求項40に記載のプログラマブルアレイモジュール。
- 前記メモリアレイは、前記処理要素への外部メモリ参照を加速するように機能する、請求項40に記載のプログラマブルアレイモジュール。
- 前記メモリアレイは、前記処理要素のためのブロックメモリとして機能する、請求項40に記載のプログラマブルアレイモジュール。
- 前記コンタクト点は、前記フィールドプログラマブルゲートアレイから前記少なくとも第2の集積回路ダイ要素へとテスト刺激を与えるようにさらに機能する、請求項39に記載のプログラマブルアレイモジュール。
- 前記第1または第2の集積回路ダイ要素のうちの少なくとも1つに積み重ねられかつ電気的に結合される少なくとも第3の集積回路ダイ要素をさらに含む、請求項39に記載のプログラマブルアレイモジュール。
- 前記第3の集積回路ダイ要素は別のフィールドプログラマブルゲートアレイを含む、請求項45に記載のプログラマブルアレイモジュール。
- 前記第3の集積回路ダイ要素は入出力コントローラを含む、請求項45に記載のプログラマブルアレイモジュール。
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US10/012,057 US6627985B2 (en) | 2001-12-05 | 2001-12-05 | Reconfigurable processor module comprising hybrid stacked integrated circuit die elements |
PCT/US2002/035972 WO2003050694A1 (en) | 2001-12-05 | 2002-11-08 | Reconfigurable processor module comprising hybrid stacked integrated circuit die elements |
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JP2022531983A (ja) * | 2019-05-21 | 2022-07-12 | アーバー・カンパニー・エルエルエルピイ | 積層集積回路ダイ素子と電池を集積するためのシステムおよび方法 |
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- 2002-11-08 WO PCT/US2002/035972 patent/WO2003050694A1/en active Application Filing
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JP2023531294A (ja) * | 2020-06-29 | 2023-07-21 | アーバー・カンパニー・エルエルエルピイ | プロセッサ非依存5Gモデムを有する3Dダイ・スタッキングの再構成可能プロセッサ・モジュールを使用するモバイルIoTエッジ・デバイス |
JP7402357B2 (ja) | 2020-06-29 | 2023-12-20 | アーバー・カンパニー・エルエルエルピイ | プロセッサ非依存5Gモデムを有する3Dダイ・スタッキングの再構成可能プロセッサ・モジュールを使用するモバイルIoTエッジ・デバイス |
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Also Published As
Publication number | Publication date |
---|---|
AU2002352582A1 (en) | 2003-06-23 |
EP1461715A1 (en) | 2004-09-29 |
KR20040072645A (ko) | 2004-08-18 |
US20040000705A1 (en) | 2004-01-01 |
US6627985B2 (en) | 2003-09-30 |
US6781226B2 (en) | 2004-08-24 |
US20030102495A1 (en) | 2003-06-05 |
USRE42035E1 (en) | 2011-01-18 |
CA2467821A1 (en) | 2003-06-19 |
EP1461715A4 (en) | 2007-08-01 |
WO2003050694A1 (en) | 2003-06-19 |
CA2467821C (en) | 2006-09-12 |
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