JP2005504699A5 - - Google Patents

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Publication number
JP2005504699A5
JP2005504699A5 JP2003530628A JP2003530628A JP2005504699A5 JP 2005504699 A5 JP2005504699 A5 JP 2005504699A5 JP 2003530628 A JP2003530628 A JP 2003530628A JP 2003530628 A JP2003530628 A JP 2003530628A JP 2005504699 A5 JP2005504699 A5 JP 2005504699A5
Authority
JP
Japan
Prior art keywords
quartz glass
glass member
less
symbol
pulses
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003530628A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005504699A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2002/029116 external-priority patent/WO2003027035A1/en
Publication of JP2005504699A publication Critical patent/JP2005504699A/ja
Publication of JP2005504699A5 publication Critical patent/JP2005504699A5/ja
Pending legal-status Critical Current

Links

JP2003530628A 2001-09-27 2002-09-13 内部透過率が高く、複屈折が低い石英ガラス Pending JP2005504699A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US32595001P 2001-09-27 2001-09-27
PCT/US2002/029116 WO2003027035A1 (en) 2001-09-27 2002-09-13 Fused silica having high internal transmission and low birefringence

Publications (2)

Publication Number Publication Date
JP2005504699A JP2005504699A (ja) 2005-02-17
JP2005504699A5 true JP2005504699A5 (enExample) 2009-03-26

Family

ID=23270140

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003530628A Pending JP2005504699A (ja) 2001-09-27 2002-09-13 内部透過率が高く、複屈折が低い石英ガラス

Country Status (6)

Country Link
US (1) US20030064877A1 (enExample)
EP (1) EP1441994A4 (enExample)
JP (1) JP2005504699A (enExample)
KR (1) KR20040045015A (enExample)
CN (1) CN1558875A (enExample)
WO (1) WO2003027035A1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101153677B1 (ko) 2005-02-09 2012-06-18 아사히 가라스 가부시키가이샤 마스크 블랭크
JP2006251781A (ja) * 2005-02-09 2006-09-21 Asahi Glass Co Ltd マスクブランクス
US20070049482A1 (en) * 2005-08-11 2007-03-01 Shin-Etsu Chemical Co., Ltd. Synthetic quartz glass substrate for excimer lasers and making method
JP2008070730A (ja) * 2006-09-15 2008-03-27 Sony Corp マスクブランクス選定方法、複屈折性指標の算出方法、リソグラフィ方法、マスクブランクス選定装置、複屈折性指標算出装置およびそのプログラム
JP2007261942A (ja) * 2007-05-23 2007-10-11 Shinetsu Quartz Prod Co Ltd 光学用合成石英ガラス
WO2015029141A1 (ja) * 2013-08-27 2015-03-05 三菱電機株式会社 レーザ発振器

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5364433A (en) * 1991-06-29 1994-11-15 Shin-Etsu Quartz Products Company Limited Optical member of synthetic quartz glass for excimer lasers and method for producing same
US6087283A (en) * 1995-01-06 2000-07-11 Nikon Corporation Silica glass for photolithography
US5616159A (en) * 1995-04-14 1997-04-01 Corning Incorporated Method of forming high purity fused silica having high resistance to optical damage
EP0780345A1 (en) * 1995-12-22 1997-06-25 Corning Incorporated Optical element for UV transmission
EP0835848A3 (en) * 1996-08-21 1998-06-10 Nikon Corporation Fluorine-containing silica glass, its method of manufacture and a projection exposure apparatus comprising the glass
US6291377B1 (en) * 1997-08-21 2001-09-18 Nikon Corporation Silica glass and its manufacturing method
US6333283B1 (en) * 1997-05-16 2001-12-25 Sumitomo Electric Industries, Ltd. Silica glass article and manufacturing process therefor
DE69816758T2 (de) * 1997-05-20 2004-06-03 Heraeus Quarzglas Gmbh & Co. Kg Synthetisches quarzglas zur verwendung in uv-strahlung und verfahren zu seiner herstellung
JP2001019465A (ja) * 1999-07-07 2001-01-23 Shin Etsu Chem Co Ltd エキシマレーザ用合成石英ガラス部材及びその製造方法
JP3228732B2 (ja) * 1999-11-24 2001-11-12 信越石英株式会社 真空紫外線リソグラフィーに用いられる投影レンズ用シリカガラス光学材料の製造方法
JP2001270731A (ja) * 2000-03-28 2001-10-02 Nikon Corp 合成石英ガラス部材及びこれを用いた光リソグラフィー装置

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