JP2003176141A5 - - Google Patents
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- Publication number
- JP2003176141A5 JP2003176141A5 JP2002353981A JP2002353981A JP2003176141A5 JP 2003176141 A5 JP2003176141 A5 JP 2003176141A5 JP 2002353981 A JP2002353981 A JP 2002353981A JP 2002353981 A JP2002353981 A JP 2002353981A JP 2003176141 A5 JP2003176141 A5 JP 2003176141A5
- Authority
- JP
- Japan
- Prior art keywords
- quartz glass
- ppm
- weight
- molecules
- range
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 22
- 238000004519 manufacturing process Methods 0.000 claims 8
- 239000007789 gas Substances 0.000 claims 4
- 238000000265 homogenisation Methods 0.000 claims 4
- 238000000034 method Methods 0.000 claims 4
- 239000002245 particle Substances 0.000 claims 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 3
- 229910004298 SiO 2 Inorganic materials 0.000 claims 3
- 239000001257 hydrogen Substances 0.000 claims 3
- 229910052739 hydrogen Inorganic materials 0.000 claims 3
- 238000002156 mixing Methods 0.000 claims 2
- 239000004071 soot Substances 0.000 claims 2
- 238000004017 vitrification Methods 0.000 claims 2
- 238000000137 annealing Methods 0.000 claims 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- 230000003796 beauty Effects 0.000 claims 1
- 230000007547 defect Effects 0.000 claims 1
- 230000008021 deposition Effects 0.000 claims 1
- 239000011521 glass Substances 0.000 claims 1
- 230000007062 hydrolysis Effects 0.000 claims 1
- 238000006460 hydrolysis reaction Methods 0.000 claims 1
- 238000001393 microlithography Methods 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 239000002210 silicon-based material Substances 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10159961A DE10159961C2 (de) | 2001-12-06 | 2001-12-06 | Quarzglasrohling für ein optisches Bauteil sowie Verfahren zur Herstellung und Verwendung desselben |
| DE10159961.7 | 2001-12-06 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003176141A JP2003176141A (ja) | 2003-06-24 |
| JP2003176141A5 true JP2003176141A5 (enExample) | 2005-10-27 |
| JP4565805B2 JP4565805B2 (ja) | 2010-10-20 |
Family
ID=7708266
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002353981A Expired - Lifetime JP4565805B2 (ja) | 2001-12-06 | 2002-12-05 | 光学機器部品用石英ガラスブランクの製造方法及びその使用 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US7080527B2 (enExample) |
| EP (1) | EP1318124B1 (enExample) |
| JP (1) | JP4565805B2 (enExample) |
| KR (1) | KR100842203B1 (enExample) |
| AT (1) | ATE280139T1 (enExample) |
| DE (1) | DE10159961C2 (enExample) |
| TW (1) | TW583150B (enExample) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1134197B1 (en) * | 1999-08-12 | 2014-05-07 | Nikon Corporation | Method for preparation of synthetic vitreous silica |
| EP1288169A1 (de) * | 2001-08-30 | 2003-03-05 | Schott Glas | Verfahren zur Wasserstoffbeladung von Quarzglaskörpern zur Verbesserung der Brechzahlhomogenität und der Laserfestigkeit bei gleichzeitiger Einhaltung einer vorgegebenen Spannungsdoppelbrechung und danach hergestellte Quarzglaskörper |
| DE10159959A1 (de) * | 2001-12-06 | 2003-06-26 | Heraeus Quarzglas | Quarzglasrohling für ein optisches Bauteil und Verwendung desselben |
| US6992753B2 (en) | 2003-12-24 | 2006-01-31 | Carl Zeiss Smt Ag | Projection optical system |
| US7534733B2 (en) * | 2004-02-23 | 2009-05-19 | Corning Incorporated | Synthetic silica glass optical material having high resistance to laser induced damage |
| DE102004009577B3 (de) * | 2004-02-25 | 2005-03-03 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines optischen Bauteils |
| DE102004017031B4 (de) * | 2004-04-02 | 2008-10-23 | Heraeus Quarzglas Gmbh & Co. Kg | Optisches Bauteil aus Quarzglas, Verfahren zur Herstellung des Bauteils und Verwendung desselben |
| DE102004018887B4 (de) * | 2004-04-15 | 2009-04-16 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren für die Herstellung eines Bauteils aus Quarzglas zum Einsatz mit einer UV-Strahlenquelle und Verfahren für die Eignungsdiagnose eines derartigen Quarzglas-Bauteils |
| US7589039B2 (en) * | 2004-12-29 | 2009-09-15 | Corning Incorporated | Synthetic silica having low polarization-induced birefringence, method of making same and lithographic device comprising same |
| US7506521B2 (en) | 2004-12-29 | 2009-03-24 | Corning Incorporated | High transmission synthetic silica glass and method of making same |
| TWI312768B (en) * | 2004-12-30 | 2009-08-01 | Corning Incorporate | Synthetic silica having low polarization-induced birefringence, method of making same and lithographic device comprising same |
| DE102005017752B4 (de) | 2005-04-15 | 2016-08-04 | Heraeus Quarzglas Gmbh & Co. Kg | Optisches Bauteil aus Quarzglas, Verfahren zur Herstellung des Bauteils und Verwendung desselben |
| DE102005017739B4 (de) * | 2005-04-15 | 2009-11-05 | Heraeus Quarzglas Gmbh & Co. Kg | Halter aus Quarzglas für die Prozessierung von Halbleiterwafern und Verfahren zur Herstellung des Halters |
| US20070059533A1 (en) * | 2005-09-12 | 2007-03-15 | Burdette Steven R | Thermal reflow of glass and fused silica body |
| US7994083B2 (en) * | 2005-09-16 | 2011-08-09 | Corning Incorporated | Fused silica glass and method for making the same |
| DE102008049325B4 (de) * | 2008-09-29 | 2011-08-25 | Heraeus Quarzglas GmbH & Co. KG, 63450 | Verfahren zur Herstellung eines rohrförmigen Halbzeugs aus Quarzglas sowie Halbzeug aus Quarzglas |
| US8176752B2 (en) * | 2009-07-23 | 2012-05-15 | Corning Incorporated | Silica glass with saturated induced absorption and method of making |
| JP5935765B2 (ja) * | 2012-07-10 | 2016-06-15 | 信越化学工業株式会社 | ナノインプリントモールド用合成石英ガラス、その製造方法、及びナノインプリント用モールド |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5086352A (en) * | 1989-06-09 | 1992-02-04 | Shin-Etsu Quartz Products Co., Ltd. | Optical members and blanks or synthetic silica glass and method for their production |
| JPH03109223A (ja) * | 1989-09-22 | 1991-05-09 | Asahi Glass Co Ltd | 石英ガラスおよびその製造方法 |
| US5364433A (en) * | 1991-06-29 | 1994-11-15 | Shin-Etsu Quartz Products Company Limited | Optical member of synthetic quartz glass for excimer lasers and method for producing same |
| US5326729A (en) | 1992-02-07 | 1994-07-05 | Asahi Glass Company Ltd. | Transparent quartz glass and process for its production |
| DE4204406C2 (de) * | 1992-02-14 | 1995-04-06 | Heraeus Quarzglas | Verfahren zur Herstellung eines homogenen, schlierenfreien Körpers aus Quarzglas oder aus einem hochkieselsäurehaltigen Glas durch Umformen eines stabförmigen Ausgangskörpers |
| JP2784708B2 (ja) * | 1992-12-28 | 1998-08-06 | 信越石英株式会社 | エキシマレーザー用光学石英ガラス部材及びその製造方法 |
| JP3194667B2 (ja) * | 1994-03-26 | 2001-07-30 | 信越石英株式会社 | 光学用合成石英ガラス成形体及びその製造方法 |
| US6087283A (en) | 1995-01-06 | 2000-07-11 | Nikon Corporation | Silica glass for photolithography |
| US5707908A (en) | 1995-01-06 | 1998-01-13 | Nikon Corporation | Silica glass |
| US5616159A (en) * | 1995-04-14 | 1997-04-01 | Corning Incorporated | Method of forming high purity fused silica having high resistance to optical damage |
| JPH0959034A (ja) * | 1995-08-22 | 1997-03-04 | Sumitomo Metal Ind Ltd | 合成石英ガラス材及びその製造方法 |
| JP3188624B2 (ja) * | 1995-12-27 | 2001-07-16 | 信越石英株式会社 | 遠紫外線用高純度合成シリカガラス及びその製造方法 |
| ATE203980T1 (de) * | 1997-05-15 | 2001-08-15 | Schott Ml Gmbh | Verfahren und vorrichtung zur herstellung einer homogenen, schlierenfreien quarzglasplatte |
| DE69816758T2 (de) | 1997-05-20 | 2004-06-03 | Heraeus Quarzglas Gmbh & Co. Kg | Synthetisches quarzglas zur verwendung in uv-strahlung und verfahren zu seiner herstellung |
| WO1999038814A1 (fr) * | 1998-01-30 | 1999-08-05 | Asahi Glass Company Ltd. | Elements optiques en verre de silice synthetique et leur procede de production |
| JP4493060B2 (ja) * | 1999-03-17 | 2010-06-30 | 信越石英株式会社 | エキシマレーザー用光学石英ガラスの製造方法 |
| DE10159962A1 (de) * | 2001-12-06 | 2003-07-03 | Heraeus Quarzglas | Quarzglasrohling für ein optisches Bauteil sowie Verfahren zur Herstellung und Verwendung desselben |
-
2001
- 2001-12-06 DE DE10159961A patent/DE10159961C2/de not_active Expired - Lifetime
-
2002
- 2002-10-25 TW TW091125264A patent/TW583150B/zh not_active IP Right Cessation
- 2002-12-04 KR KR1020020076622A patent/KR100842203B1/ko not_active Expired - Fee Related
- 2002-12-04 AT AT02027123T patent/ATE280139T1/de not_active IP Right Cessation
- 2002-12-04 EP EP02027123A patent/EP1318124B1/de not_active Expired - Lifetime
- 2002-12-05 US US10/310,349 patent/US7080527B2/en not_active Expired - Lifetime
- 2002-12-05 JP JP2002353981A patent/JP4565805B2/ja not_active Expired - Lifetime
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