EP0835848A3 - Fluorine-containing silica glass, its method of manufacture and a projection exposure apparatus comprising the glass - Google Patents
Fluorine-containing silica glass, its method of manufacture and a projection exposure apparatus comprising the glass Download PDFInfo
- Publication number
- EP0835848A3 EP0835848A3 EP97114460A EP97114460A EP0835848A3 EP 0835848 A3 EP0835848 A3 EP 0835848A3 EP 97114460 A EP97114460 A EP 97114460A EP 97114460 A EP97114460 A EP 97114460A EP 0835848 A3 EP0835848 A3 EP 0835848A3
- Authority
- EP
- European Patent Office
- Prior art keywords
- glass
- fluorine
- exposure apparatus
- containing silica
- projection exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01413—Reactant delivery systems
- C03B37/0142—Reactant deposition burners
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/0085—Compositions for glass with special properties for UV-transmitting glass
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/07—Impurity concentration specified
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/60—Relationship between burner and deposit, e.g. position
- C03B2207/66—Relative motion
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/08—Doped silica-based glasses containing boron or halide
- C03C2201/12—Doped silica-based glasses containing boron or halide containing fluorine
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
- C03C2201/21—Doped silica-based glasses containing non-metals other than boron or halide containing molecular hydrogen
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
- C03C2201/23—Doped silica-based glasses containing non-metals other than boron or halide containing hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/40—Gas-phase processes
- C03C2203/42—Gas-phase processes using silicon halides as starting materials
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/40—Gas-phase processes
- C03C2203/42—Gas-phase processes using silicon halides as starting materials
- C03C2203/46—Gas-phase processes using silicon halides as starting materials fluorine containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S501/00—Compositions: ceramic
- Y10S501/90—Optical glass, e.g. silent on refractive index and/or ABBE number
- Y10S501/905—Ultraviolet transmitting or absorbing
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Manufacturing & Machinery (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Glass Compositions (AREA)
Abstract
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21899196 | 1996-08-21 | ||
JP218991/96 | 1996-08-21 | ||
JP221248/96 | 1996-08-22 | ||
JP8221248A JPH1067521A (en) | 1996-08-22 | 1996-08-22 | Fluorine containing quartz glass, production of the same, and projection recording system |
JP221254/96 | 1996-08-22 | ||
JP8221254A JPH1067526A (en) | 1996-08-22 | 1996-08-22 | Optical quartz glass element |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0835848A2 EP0835848A2 (en) | 1998-04-15 |
EP0835848A3 true EP0835848A3 (en) | 1998-06-10 |
Family
ID=27330230
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP97114460A Withdrawn EP0835848A3 (en) | 1996-08-21 | 1997-08-21 | Fluorine-containing silica glass, its method of manufacture and a projection exposure apparatus comprising the glass |
Country Status (2)
Country | Link |
---|---|
US (2) | US5958809A (en) |
EP (1) | EP0835848A3 (en) |
Families Citing this family (45)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3965734B2 (en) * | 1997-09-11 | 2007-08-29 | 株式会社ニコン | Quartz glass and method for producing the same |
US6291377B1 (en) | 1997-08-21 | 2001-09-18 | Nikon Corporation | Silica glass and its manufacturing method |
US6309991B1 (en) * | 1996-08-29 | 2001-10-30 | Corning Incorporated | Silica with low compaction under high energy irradiation |
WO1998040319A1 (en) * | 1997-03-07 | 1998-09-17 | Schott Ml Gmbh | Synthetic quartz glass preform and device for the production thereof |
EP0870737B1 (en) | 1997-04-08 | 2002-07-24 | Shin-Etsu Quartz Products Co., Ltd. | Optical synthetic quartz glass, production method thereof, and optical member for excimer laser using the synthetic quartz glass |
TW440548B (en) * | 1997-05-14 | 2001-06-16 | Nippon Kogaku Kk | Synthetic silica glass optical member and method of manufacturing the same |
JPH10330124A (en) | 1997-05-30 | 1998-12-15 | Toshiba Corp | Quartz glass and its production and heat-treatment apparatus using the same and heat treatment |
EP1043282A4 (en) * | 1998-10-28 | 2004-03-31 | Asahi Glass Co Ltd | Synthetic quartz glass and method for production thereof |
US6682859B2 (en) | 1999-02-12 | 2004-01-27 | Corning Incorporated | Vacuum ultraviolet trasmitting silicon oxyfluoride lithography glass |
US6782716B2 (en) | 1999-02-12 | 2004-08-31 | Corning Incorporated | Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass |
TW581747B (en) | 1999-02-16 | 2004-04-01 | Nikon Corp | Synthetic quartz glass optical member for ultraviolet light |
JP4601022B2 (en) | 1999-03-04 | 2010-12-22 | 信越石英株式会社 | Synthetic quartz glass member for ArF excimer laser lithography |
US6649268B1 (en) * | 1999-03-10 | 2003-11-18 | Nikon Corporation | Optical member made of silica glass, method for manufacturing silica glass, and reduction projection exposure apparatus using the optical member |
JP2000264671A (en) * | 1999-03-12 | 2000-09-26 | Shin Etsu Chem Co Ltd | Synthetic quartz glass member |
JP3069562B1 (en) * | 1999-10-19 | 2000-07-24 | 信越石英株式会社 | Silica glass optical material for excimer laser and excimer lamp and method for producing the same |
JP3228732B2 (en) * | 1999-11-24 | 2001-11-12 | 信越石英株式会社 | Method for producing silica glass optical material for projection lens used in vacuum ultraviolet lithography |
JP2001270731A (en) * | 2000-03-28 | 2001-10-02 | Nikon Corp | Synthetic quartz glass member and optical lithography device using the same |
US20020005051A1 (en) * | 2000-04-28 | 2002-01-17 | Brown John T. | Substantially dry, silica-containing soot, fused silica and optical fiber soot preforms, apparatus, methods and burners for manufacturing same |
JP2002040207A (en) * | 2000-07-27 | 2002-02-06 | Canon Inc | Optical additional film and optical element |
US6748768B2 (en) | 2000-12-15 | 2004-06-15 | Corning Incorporated | Apparatus and method of doping silica with fluorine during laydown |
US20050120752A1 (en) * | 2001-04-11 | 2005-06-09 | Brown John T. | Substantially dry, silica-containing soot, fused silica and optical fiber soot preforms, apparatus, methods and burners for manufacturing same |
JP4466809B2 (en) * | 2001-07-18 | 2010-05-26 | 日本電気株式会社 | Silicon insulating film, manufacturing method thereof, and termination method of silicon dangling bond |
US20040162211A1 (en) * | 2001-09-27 | 2004-08-19 | Domey Jeffrey J. | Fused silica having high internal transmission and low birefringence |
JP2005503316A (en) * | 2001-09-27 | 2005-02-03 | コーニング インコーポレイテッド | Improved method and furnace for quartz glass production |
CN1558875A (en) * | 2001-09-27 | 2004-12-29 | 康宁股份有限公司 | Fused silica having high internal transmission and low birefringence |
US6630418B2 (en) * | 2001-12-21 | 2003-10-07 | Corning Incorporated | Fused silica containing aluminum |
EP1456142B1 (en) * | 2001-12-21 | 2007-03-07 | Corning Incorporated | Fused silica containing aluminum |
ATE477218T1 (en) * | 2002-03-01 | 2010-08-15 | Schott Ag | METHOD FOR PRODUCING QUARTZ GLASS AND A QUARTZ GLASS PREFORM |
US20050044895A1 (en) * | 2002-04-16 | 2005-03-03 | Central Glass Company, Limited | Method for putting color to glass or erasing color from colored glass |
US6865327B2 (en) * | 2002-08-30 | 2005-03-08 | Fitel Usa Corp. | Method of making optical fiber with reduced E-band and L-band loss peaks |
JP2004168599A (en) * | 2002-11-20 | 2004-06-17 | Nikon Corp | Synthetic quartz glass member and ultraviolet light exposure device using the same |
US20040118155A1 (en) * | 2002-12-20 | 2004-06-24 | Brown John T | Method of making ultra-dry, Cl-free and F-doped high purity fused silica |
US6992753B2 (en) * | 2003-12-24 | 2006-01-31 | Carl Zeiss Smt Ag | Projection optical system |
JP4826118B2 (en) * | 2005-03-29 | 2011-11-30 | 旭硝子株式会社 | Method for producing synthetic quartz glass and synthetic quartz glass for optical member |
DE112005003613B4 (en) * | 2005-06-21 | 2015-07-23 | Carl Zeiss Smt Gmbh | Projection lens for microlithography, its use and end element for it |
FI121336B (en) * | 2006-03-27 | 2010-10-15 | Beneq Oy | Hydrophobic glass surface |
US7592063B2 (en) * | 2006-09-05 | 2009-09-22 | Asahi Glass Company, Limited | Quartz glass substrate and process for its production |
DE102008049325B4 (en) * | 2008-09-29 | 2011-08-25 | Heraeus Quarzglas GmbH & Co. KG, 63450 | Method for producing a tubular semifinished product made of quartz glass and semi-finished products made of quartz glass |
DE102008064284A1 (en) * | 2008-12-20 | 2010-06-24 | Evonik Degussa Gmbh | Low surface area fumed silica powder |
JP5549525B2 (en) * | 2009-11-16 | 2014-07-16 | 信越化学工業株式会社 | Method for producing titania-doped quartz glass member co-added with sulfur |
SG11201603720YA (en) | 2013-12-20 | 2016-07-28 | Novartis Ag | Molds for making contact lenses |
US10232574B2 (en) | 2014-12-17 | 2019-03-19 | Novartis Ag | Reusable lens molds and methods of use thereof |
WO2016100457A1 (en) | 2014-12-17 | 2016-06-23 | Novartis Ag | Reusable lens molds and methods of use thereof |
HUE044106T2 (en) | 2014-12-17 | 2019-09-30 | Novartis Ag | Reusable lens molds and methods of use thereof |
US10773817B1 (en) | 2018-03-08 | 2020-09-15 | Northrop Grumman Systems Corporation | Bi-directional flow ram air system for an aircraft |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59162143A (en) * | 1983-03-03 | 1984-09-13 | Shin Etsu Chem Co Ltd | Production of synthetic quartz |
EP0185106A1 (en) * | 1983-06-17 | 1986-06-25 | Sumitomo Electric Industries Limited | Method of producing a rod containing fluorine |
EP0146659B1 (en) * | 1983-12-22 | 1988-03-30 | Shin-Etsu Chemical Co., Ltd. | A method for the preparation of synthetic quartz glass suitable as a material of optical fibers |
EP0488320A1 (en) * | 1990-11-28 | 1992-06-03 | Sumitomo Electric Industries, Ltd | UV light-permeable glass and article comprising the same |
US5326729A (en) * | 1992-02-07 | 1994-07-05 | Asahi Glass Company Ltd. | Transparent quartz glass and process for its production |
JPH07291635A (en) * | 1994-04-28 | 1995-11-07 | Shin Etsu Chem Co Ltd | Production of synthetic quartz glass member |
EP0691312A1 (en) * | 1994-07-07 | 1996-01-10 | Nikon Corporation | Method for producing silica glass for use with light in a vacuum ultraviolet wavelength range, and silica glass and optical member produced by the method |
JPH0867530A (en) * | 1994-08-26 | 1996-03-12 | Sumitomo Electric Ind Ltd | Optical glass for ultraviolet light |
EP0720970A1 (en) * | 1995-01-06 | 1996-07-10 | Nikon Corporation | Silica glass for photolithography, optical member including the same, exposure apparatus including the same, and method for producing the same |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2660531B2 (en) * | 1988-02-08 | 1997-10-08 | 日本石英硝子株式会社 | Modification method of synthetic quartz glass |
US5325230A (en) * | 1989-06-09 | 1994-06-28 | Shin-Etsu Quartz Products Co., Ltd. | Optical members and blanks of synthetic silica glass and method for their production |
DE69015453T3 (en) * | 1989-06-09 | 2001-10-11 | Heraeus Quarzglas | Optical parts and blanks made of synthetic silicon dioxide glass and process for their production. |
JPH0627013B2 (en) * | 1989-06-14 | 1994-04-13 | 信越石英株式会社 | Synthetic silica glass optical body for ultraviolet laser and manufacturing method thereof |
JPH05211217A (en) * | 1992-01-08 | 1993-08-20 | Nec Corp | Manufacture of semiconductor integrated circuit device |
JP3125630B2 (en) * | 1994-07-07 | 2001-01-22 | 株式会社ニコン | Method for producing quartz glass for vacuum ultraviolet and quartz glass optical member |
US5707908A (en) * | 1995-01-06 | 1998-01-13 | Nikon Corporation | Silica glass |
-
1997
- 1997-08-21 US US08/915,562 patent/US5958809A/en not_active Expired - Lifetime
- 1997-08-21 EP EP97114460A patent/EP0835848A3/en not_active Withdrawn
-
2002
- 2002-05-07 US US10/139,358 patent/US20030037568A1/en not_active Abandoned
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59162143A (en) * | 1983-03-03 | 1984-09-13 | Shin Etsu Chem Co Ltd | Production of synthetic quartz |
EP0185106A1 (en) * | 1983-06-17 | 1986-06-25 | Sumitomo Electric Industries Limited | Method of producing a rod containing fluorine |
EP0146659B1 (en) * | 1983-12-22 | 1988-03-30 | Shin-Etsu Chemical Co., Ltd. | A method for the preparation of synthetic quartz glass suitable as a material of optical fibers |
EP0488320A1 (en) * | 1990-11-28 | 1992-06-03 | Sumitomo Electric Industries, Ltd | UV light-permeable glass and article comprising the same |
US5326729A (en) * | 1992-02-07 | 1994-07-05 | Asahi Glass Company Ltd. | Transparent quartz glass and process for its production |
JPH07291635A (en) * | 1994-04-28 | 1995-11-07 | Shin Etsu Chem Co Ltd | Production of synthetic quartz glass member |
EP0691312A1 (en) * | 1994-07-07 | 1996-01-10 | Nikon Corporation | Method for producing silica glass for use with light in a vacuum ultraviolet wavelength range, and silica glass and optical member produced by the method |
JPH0867530A (en) * | 1994-08-26 | 1996-03-12 | Sumitomo Electric Ind Ltd | Optical glass for ultraviolet light |
EP0720970A1 (en) * | 1995-01-06 | 1996-07-10 | Nikon Corporation | Silica glass for photolithography, optical member including the same, exposure apparatus including the same, and method for producing the same |
Non-Patent Citations (3)
Title |
---|
PATENT ABSTRACTS OF JAPAN vol. 096, no. 003 29 March 1996 (1996-03-29) * |
PATENT ABSTRACTS OF JAPAN vol. 096, no. 007 31 July 1996 (1996-07-31) * |
PATENT ABSTRACTS OF JAPAN vol. 9, no. 12 (C - 261) 18 January 1985 (1985-01-18) * |
Also Published As
Publication number | Publication date |
---|---|
US20030037568A1 (en) | 2003-02-27 |
US5958809A (en) | 1999-09-28 |
EP0835848A2 (en) | 1998-04-15 |
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Legal Events
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PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
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AK | Designated contracting states |
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