EP0835848A3 - Fluorine-containing silica glass, its method of manufacture and a projection exposure apparatus comprising the glass - Google Patents

Fluorine-containing silica glass, its method of manufacture and a projection exposure apparatus comprising the glass Download PDF

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Publication number
EP0835848A3
EP0835848A3 EP97114460A EP97114460A EP0835848A3 EP 0835848 A3 EP0835848 A3 EP 0835848A3 EP 97114460 A EP97114460 A EP 97114460A EP 97114460 A EP97114460 A EP 97114460A EP 0835848 A3 EP0835848 A3 EP 0835848A3
Authority
EP
European Patent Office
Prior art keywords
glass
fluorine
exposure apparatus
containing silica
projection exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP97114460A
Other languages
German (de)
French (fr)
Other versions
EP0835848A2 (en
Inventor
Seishi c/o Nikon Corporation Fujiwara
Hiroyuki c/o Nikon Corporation Hiraiwa
Kazuhiro c/o Nikon Corporation Nakagawa
Shouji c/o Nikon Corporation Yajima
Norio c/o Nikon Corporation Komine
Hiroki c/o Nikon Corporation Jinbo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP8221248A external-priority patent/JPH1067521A/en
Priority claimed from JP8221254A external-priority patent/JPH1067526A/en
Application filed by Nikon Corp, Nippon Kogaku KK filed Critical Nikon Corp
Publication of EP0835848A2 publication Critical patent/EP0835848A2/en
Publication of EP0835848A3 publication Critical patent/EP0835848A3/en
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413—Reactant delivery systems
    • C03B37/0142—Reactant deposition burners
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C4/00—Compositions for glass with special properties
    • C03C4/0085—Compositions for glass with special properties for UV-transmitting glass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/07—Impurity concentration specified
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/60—Relationship between burner and deposit, e.g. position
    • C03B2207/66—Relative motion
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/08—Doped silica-based glasses containing boron or halide
    • C03C2201/12—Doped silica-based glasses containing boron or halide containing fluorine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/21—Doped silica-based glasses containing non-metals other than boron or halide containing molecular hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/23—Doped silica-based glasses containing non-metals other than boron or halide containing hydroxyl groups
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/40—Gas-phase processes
    • C03C2203/42—Gas-phase processes using silicon halides as starting materials
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/40—Gas-phase processes
    • C03C2203/42—Gas-phase processes using silicon halides as starting materials
    • C03C2203/46—Gas-phase processes using silicon halides as starting materials fluorine containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S501/00—Compositions: ceramic
    • Y10S501/90—Optical glass, e.g. silent on refractive index and/or ABBE number
    • Y10S501/905—Ultraviolet transmitting or absorbing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Glass Compositions (AREA)

Abstract

Disclosed are fluorine-containing silica glasses, and methods of their production. The silica glass may be used for an ultraviolet light optical system in which light in a wavelength region of 200 nm or less, such as an ArF (193nm) excimer laser, is used. Also disclosed is a projection exposure apparatus containing said fluorine-containing silica glass.
EP97114460A 1996-08-21 1997-08-21 Fluorine-containing silica glass, its method of manufacture and a projection exposure apparatus comprising the glass Withdrawn EP0835848A3 (en)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP21899196 1996-08-21
JP218991/96 1996-08-21
JP221248/96 1996-08-22
JP8221248A JPH1067521A (en) 1996-08-22 1996-08-22 Fluorine containing quartz glass, production of the same, and projection recording system
JP221254/96 1996-08-22
JP8221254A JPH1067526A (en) 1996-08-22 1996-08-22 Optical quartz glass element

Publications (2)

Publication Number Publication Date
EP0835848A2 EP0835848A2 (en) 1998-04-15
EP0835848A3 true EP0835848A3 (en) 1998-06-10

Family

ID=27330230

Family Applications (1)

Application Number Title Priority Date Filing Date
EP97114460A Withdrawn EP0835848A3 (en) 1996-08-21 1997-08-21 Fluorine-containing silica glass, its method of manufacture and a projection exposure apparatus comprising the glass

Country Status (2)

Country Link
US (2) US5958809A (en)
EP (1) EP0835848A3 (en)

Families Citing this family (45)

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JP3965734B2 (en) * 1997-09-11 2007-08-29 株式会社ニコン Quartz glass and method for producing the same
US6291377B1 (en) 1997-08-21 2001-09-18 Nikon Corporation Silica glass and its manufacturing method
US6309991B1 (en) * 1996-08-29 2001-10-30 Corning Incorporated Silica with low compaction under high energy irradiation
WO1998040319A1 (en) * 1997-03-07 1998-09-17 Schott Ml Gmbh Synthetic quartz glass preform and device for the production thereof
EP0870737B1 (en) 1997-04-08 2002-07-24 Shin-Etsu Quartz Products Co., Ltd. Optical synthetic quartz glass, production method thereof, and optical member for excimer laser using the synthetic quartz glass
TW440548B (en) * 1997-05-14 2001-06-16 Nippon Kogaku Kk Synthetic silica glass optical member and method of manufacturing the same
JPH10330124A (en) 1997-05-30 1998-12-15 Toshiba Corp Quartz glass and its production and heat-treatment apparatus using the same and heat treatment
EP1043282A4 (en) * 1998-10-28 2004-03-31 Asahi Glass Co Ltd Synthetic quartz glass and method for production thereof
US6682859B2 (en) 1999-02-12 2004-01-27 Corning Incorporated Vacuum ultraviolet trasmitting silicon oxyfluoride lithography glass
US6782716B2 (en) 1999-02-12 2004-08-31 Corning Incorporated Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass
TW581747B (en) 1999-02-16 2004-04-01 Nikon Corp Synthetic quartz glass optical member for ultraviolet light
JP4601022B2 (en) 1999-03-04 2010-12-22 信越石英株式会社 Synthetic quartz glass member for ArF excimer laser lithography
US6649268B1 (en) * 1999-03-10 2003-11-18 Nikon Corporation Optical member made of silica glass, method for manufacturing silica glass, and reduction projection exposure apparatus using the optical member
JP2000264671A (en) * 1999-03-12 2000-09-26 Shin Etsu Chem Co Ltd Synthetic quartz glass member
JP3069562B1 (en) * 1999-10-19 2000-07-24 信越石英株式会社 Silica glass optical material for excimer laser and excimer lamp and method for producing the same
JP3228732B2 (en) * 1999-11-24 2001-11-12 信越石英株式会社 Method for producing silica glass optical material for projection lens used in vacuum ultraviolet lithography
JP2001270731A (en) * 2000-03-28 2001-10-02 Nikon Corp Synthetic quartz glass member and optical lithography device using the same
US20020005051A1 (en) * 2000-04-28 2002-01-17 Brown John T. Substantially dry, silica-containing soot, fused silica and optical fiber soot preforms, apparatus, methods and burners for manufacturing same
JP2002040207A (en) * 2000-07-27 2002-02-06 Canon Inc Optical additional film and optical element
US6748768B2 (en) 2000-12-15 2004-06-15 Corning Incorporated Apparatus and method of doping silica with fluorine during laydown
US20050120752A1 (en) * 2001-04-11 2005-06-09 Brown John T. Substantially dry, silica-containing soot, fused silica and optical fiber soot preforms, apparatus, methods and burners for manufacturing same
JP4466809B2 (en) * 2001-07-18 2010-05-26 日本電気株式会社 Silicon insulating film, manufacturing method thereof, and termination method of silicon dangling bond
US20040162211A1 (en) * 2001-09-27 2004-08-19 Domey Jeffrey J. Fused silica having high internal transmission and low birefringence
JP2005503316A (en) * 2001-09-27 2005-02-03 コーニング インコーポレイテッド Improved method and furnace for quartz glass production
CN1558875A (en) * 2001-09-27 2004-12-29 康宁股份有限公司 Fused silica having high internal transmission and low birefringence
US6630418B2 (en) * 2001-12-21 2003-10-07 Corning Incorporated Fused silica containing aluminum
EP1456142B1 (en) * 2001-12-21 2007-03-07 Corning Incorporated Fused silica containing aluminum
ATE477218T1 (en) * 2002-03-01 2010-08-15 Schott Ag METHOD FOR PRODUCING QUARTZ GLASS AND A QUARTZ GLASS PREFORM
US20050044895A1 (en) * 2002-04-16 2005-03-03 Central Glass Company, Limited Method for putting color to glass or erasing color from colored glass
US6865327B2 (en) * 2002-08-30 2005-03-08 Fitel Usa Corp. Method of making optical fiber with reduced E-band and L-band loss peaks
JP2004168599A (en) * 2002-11-20 2004-06-17 Nikon Corp Synthetic quartz glass member and ultraviolet light exposure device using the same
US20040118155A1 (en) * 2002-12-20 2004-06-24 Brown John T Method of making ultra-dry, Cl-free and F-doped high purity fused silica
US6992753B2 (en) * 2003-12-24 2006-01-31 Carl Zeiss Smt Ag Projection optical system
JP4826118B2 (en) * 2005-03-29 2011-11-30 旭硝子株式会社 Method for producing synthetic quartz glass and synthetic quartz glass for optical member
DE112005003613B4 (en) * 2005-06-21 2015-07-23 Carl Zeiss Smt Gmbh Projection lens for microlithography, its use and end element for it
FI121336B (en) * 2006-03-27 2010-10-15 Beneq Oy Hydrophobic glass surface
US7592063B2 (en) * 2006-09-05 2009-09-22 Asahi Glass Company, Limited Quartz glass substrate and process for its production
DE102008049325B4 (en) * 2008-09-29 2011-08-25 Heraeus Quarzglas GmbH & Co. KG, 63450 Method for producing a tubular semifinished product made of quartz glass and semi-finished products made of quartz glass
DE102008064284A1 (en) * 2008-12-20 2010-06-24 Evonik Degussa Gmbh Low surface area fumed silica powder
JP5549525B2 (en) * 2009-11-16 2014-07-16 信越化学工業株式会社 Method for producing titania-doped quartz glass member co-added with sulfur
SG11201603720YA (en) 2013-12-20 2016-07-28 Novartis Ag Molds for making contact lenses
US10232574B2 (en) 2014-12-17 2019-03-19 Novartis Ag Reusable lens molds and methods of use thereof
WO2016100457A1 (en) 2014-12-17 2016-06-23 Novartis Ag Reusable lens molds and methods of use thereof
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US10773817B1 (en) 2018-03-08 2020-09-15 Northrop Grumman Systems Corporation Bi-directional flow ram air system for an aircraft

Citations (9)

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JPS59162143A (en) * 1983-03-03 1984-09-13 Shin Etsu Chem Co Ltd Production of synthetic quartz
EP0185106A1 (en) * 1983-06-17 1986-06-25 Sumitomo Electric Industries Limited Method of producing a rod containing fluorine
EP0146659B1 (en) * 1983-12-22 1988-03-30 Shin-Etsu Chemical Co., Ltd. A method for the preparation of synthetic quartz glass suitable as a material of optical fibers
EP0488320A1 (en) * 1990-11-28 1992-06-03 Sumitomo Electric Industries, Ltd UV light-permeable glass and article comprising the same
US5326729A (en) * 1992-02-07 1994-07-05 Asahi Glass Company Ltd. Transparent quartz glass and process for its production
JPH07291635A (en) * 1994-04-28 1995-11-07 Shin Etsu Chem Co Ltd Production of synthetic quartz glass member
EP0691312A1 (en) * 1994-07-07 1996-01-10 Nikon Corporation Method for producing silica glass for use with light in a vacuum ultraviolet wavelength range, and silica glass and optical member produced by the method
JPH0867530A (en) * 1994-08-26 1996-03-12 Sumitomo Electric Ind Ltd Optical glass for ultraviolet light
EP0720970A1 (en) * 1995-01-06 1996-07-10 Nikon Corporation Silica glass for photolithography, optical member including the same, exposure apparatus including the same, and method for producing the same

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JPS59162143A (en) * 1983-03-03 1984-09-13 Shin Etsu Chem Co Ltd Production of synthetic quartz
EP0185106A1 (en) * 1983-06-17 1986-06-25 Sumitomo Electric Industries Limited Method of producing a rod containing fluorine
EP0146659B1 (en) * 1983-12-22 1988-03-30 Shin-Etsu Chemical Co., Ltd. A method for the preparation of synthetic quartz glass suitable as a material of optical fibers
EP0488320A1 (en) * 1990-11-28 1992-06-03 Sumitomo Electric Industries, Ltd UV light-permeable glass and article comprising the same
US5326729A (en) * 1992-02-07 1994-07-05 Asahi Glass Company Ltd. Transparent quartz glass and process for its production
JPH07291635A (en) * 1994-04-28 1995-11-07 Shin Etsu Chem Co Ltd Production of synthetic quartz glass member
EP0691312A1 (en) * 1994-07-07 1996-01-10 Nikon Corporation Method for producing silica glass for use with light in a vacuum ultraviolet wavelength range, and silica glass and optical member produced by the method
JPH0867530A (en) * 1994-08-26 1996-03-12 Sumitomo Electric Ind Ltd Optical glass for ultraviolet light
EP0720970A1 (en) * 1995-01-06 1996-07-10 Nikon Corporation Silica glass for photolithography, optical member including the same, exposure apparatus including the same, and method for producing the same

Non-Patent Citations (3)

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Title
PATENT ABSTRACTS OF JAPAN vol. 096, no. 003 29 March 1996 (1996-03-29) *
PATENT ABSTRACTS OF JAPAN vol. 096, no. 007 31 July 1996 (1996-07-31) *
PATENT ABSTRACTS OF JAPAN vol. 9, no. 12 (C - 261) 18 January 1985 (1985-01-18) *

Also Published As

Publication number Publication date
US20030037568A1 (en) 2003-02-27
US5958809A (en) 1999-09-28
EP0835848A2 (en) 1998-04-15

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