JP2005504699A - 内部透過率が高く、複屈折が低い石英ガラス - Google Patents

内部透過率が高く、複屈折が低い石英ガラス Download PDF

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Publication number
JP2005504699A
JP2005504699A JP2003530628A JP2003530628A JP2005504699A JP 2005504699 A JP2005504699 A JP 2005504699A JP 2003530628 A JP2003530628 A JP 2003530628A JP 2003530628 A JP2003530628 A JP 2003530628A JP 2005504699 A JP2005504699 A JP 2005504699A
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JP
Japan
Prior art keywords
quartz glass
glass member
less
transmittance
internal transmittance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003530628A
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English (en)
Japanese (ja)
Other versions
JP2005504699A5 (enExample
Inventor
ジェイ ドゥーミー，ジェフリー
アール ヘスリン，マイケル
エル ラディソン，ジュリー
ダブリュ リンダー，マイケル
イー マクソン，ジョン
モル，ヨハネス
ジュニア，ロバート エス パヴリック
アール センポリンスキー，ダニエル
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Corning Inc
Original Assignee
Corning Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Corning Inc filed Critical Corning Inc
Publication of JP2005504699A publication Critical patent/JP2005504699A/ja
Publication of JP2005504699A5 publication Critical patent/JP2005504699A5/ja
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/21—Doped silica-based glasses containing non-metals other than boron or halide containing molecular hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/23—Doped silica-based glasses containing non-metals other than boron or halide containing hydroxyl groups

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Glass Compositions (AREA)
  • Silicon Compounds (AREA)
  • Glass Melting And Manufacturing (AREA)
JP2003530628A 2001-09-27 2002-09-13 内部透過率が高く、複屈折が低い石英ガラス Pending JP2005504699A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US32595001P 2001-09-27 2001-09-27
PCT/US2002/029116 WO2003027035A1 (en) 2001-09-27 2002-09-13 Fused silica having high internal transmission and low birefringence

Publications (2)

Publication Number Publication Date
JP2005504699A true JP2005504699A (ja) 2005-02-17
JP2005504699A5 JP2005504699A5 (enExample) 2009-03-26

Family

ID=23270140

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003530628A Pending JP2005504699A (ja) 2001-09-27 2002-09-13 内部透過率が高く、複屈折が低い石英ガラス

Country Status (6)

Country Link
US (1) US20030064877A1 (enExample)
EP (1) EP1441994A4 (enExample)
JP (1) JP2005504699A (enExample)
KR (1) KR20040045015A (enExample)
CN (1) CN1558875A (enExample)
WO (1) WO2003027035A1 (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006251781A (ja) * 2005-02-09 2006-09-21 Asahi Glass Co Ltd マスクブランクス
JP2007261942A (ja) * 2007-05-23 2007-10-11 Shinetsu Quartz Prod Co Ltd 光学用合成石英ガラス
JP2008070730A (ja) * 2006-09-15 2008-03-27 Sony Corp マスクブランクス選定方法、複屈折性指標の算出方法、リソグラフィ方法、マスクブランクス選定装置、複屈折性指標算出装置およびそのプログラム

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101153677B1 (ko) 2005-02-09 2012-06-18 아사히 가라스 가부시키가이샤 마스크 블랭크
US20070049482A1 (en) * 2005-08-11 2007-03-01 Shin-Etsu Chemical Co., Ltd. Synthetic quartz glass substrate for excimer lasers and making method
WO2015029141A1 (ja) * 2013-08-27 2015-03-05 三菱電機株式会社 レーザ発振器

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5364433A (en) * 1991-06-29 1994-11-15 Shin-Etsu Quartz Products Company Limited Optical member of synthetic quartz glass for excimer lasers and method for producing same
US6087283A (en) * 1995-01-06 2000-07-11 Nikon Corporation Silica glass for photolithography
US5616159A (en) * 1995-04-14 1997-04-01 Corning Incorporated Method of forming high purity fused silica having high resistance to optical damage
EP0780345A1 (en) * 1995-12-22 1997-06-25 Corning Incorporated Optical element for UV transmission
EP0835848A3 (en) * 1996-08-21 1998-06-10 Nikon Corporation Fluorine-containing silica glass, its method of manufacture and a projection exposure apparatus comprising the glass
US6291377B1 (en) * 1997-08-21 2001-09-18 Nikon Corporation Silica glass and its manufacturing method
US6333283B1 (en) * 1997-05-16 2001-12-25 Sumitomo Electric Industries, Ltd. Silica glass article and manufacturing process therefor
DE69816758T2 (de) * 1997-05-20 2004-06-03 Heraeus Quarzglas Gmbh & Co. Kg Synthetisches quarzglas zur verwendung in uv-strahlung und verfahren zu seiner herstellung
JP2001019465A (ja) * 1999-07-07 2001-01-23 Shin Etsu Chem Co Ltd エキシマレーザ用合成石英ガラス部材及びその製造方法
JP3228732B2 (ja) * 1999-11-24 2001-11-12 信越石英株式会社 真空紫外線リソグラフィーに用いられる投影レンズ用シリカガラス光学材料の製造方法
JP2001270731A (ja) * 2000-03-28 2001-10-02 Nikon Corp 合成石英ガラス部材及びこれを用いた光リソグラフィー装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006251781A (ja) * 2005-02-09 2006-09-21 Asahi Glass Co Ltd マスクブランクス
JP2008070730A (ja) * 2006-09-15 2008-03-27 Sony Corp マスクブランクス選定方法、複屈折性指標の算出方法、リソグラフィ方法、マスクブランクス選定装置、複屈折性指標算出装置およびそのプログラム
JP2007261942A (ja) * 2007-05-23 2007-10-11 Shinetsu Quartz Prod Co Ltd 光学用合成石英ガラス

Also Published As

Publication number Publication date
CN1558875A (zh) 2004-12-29
US20030064877A1 (en) 2003-04-03
WO2003027035A1 (en) 2003-04-03
EP1441994A1 (en) 2004-08-04
KR20040045015A (ko) 2004-05-31
EP1441994A4 (en) 2008-09-03

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