JP2004525409A5 - - Google Patents

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Publication number
JP2004525409A5
JP2004525409A5 JP2002568111A JP2002568111A JP2004525409A5 JP 2004525409 A5 JP2004525409 A5 JP 2004525409A5 JP 2002568111 A JP2002568111 A JP 2002568111A JP 2002568111 A JP2002568111 A JP 2002568111A JP 2004525409 A5 JP2004525409 A5 JP 2004525409A5
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JP
Japan
Prior art keywords
glass
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content
ppm
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002568111A
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English (en)
Japanese (ja)
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JP2004525409A (ja
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Application filed filed Critical
Priority claimed from PCT/US2001/044547 external-priority patent/WO2002069054A1/en
Publication of JP2004525409A publication Critical patent/JP2004525409A/ja
Publication of JP2004525409A5 publication Critical patent/JP2004525409A5/ja
Pending legal-status Critical Current

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JP2002568111A 2001-02-24 2001-11-28 真空紫外透過性シリコンオキシフルオライドリソグラフィガラス Pending JP2004525409A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US27113601P 2001-02-24 2001-02-24
PCT/US2001/044547 WO2002069054A1 (en) 2001-02-24 2001-11-28 Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass

Publications (2)

Publication Number Publication Date
JP2004525409A JP2004525409A (ja) 2004-08-19
JP2004525409A5 true JP2004525409A5 (enExample) 2005-12-22

Family

ID=23034342

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002568111A Pending JP2004525409A (ja) 2001-02-24 2001-11-28 真空紫外透過性シリコンオキシフルオライドリソグラフィガラス

Country Status (5)

Country Link
EP (1) EP1368711A4 (enExample)
JP (1) JP2004525409A (enExample)
KR (1) KR20040030512A (enExample)
TW (1) TW554260B (enExample)
WO (1) WO2002069054A1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4792146B2 (ja) * 2004-02-25 2011-10-12 Ｈｏｙａ株式会社 マスクブランクス用ガラス基板の製造方法、マスクブランクスの製造方法、露光用マスクの製造方法、反射型マスクブランクスの製造方法、及び反射型マスクの製造方法
JP2005255423A (ja) 2004-03-09 2005-09-22 Asahi Glass Co Ltd 合成石英ガラス製フォトマスク基板およびフォトマスク
KR101005978B1 (ko) * 2010-05-24 2011-01-05 최문열 알루미늄 장식 바 및 그 제조방법

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5707908A (en) * 1995-01-06 1998-01-13 Nikon Corporation Silica glass
US5935733A (en) * 1996-04-05 1999-08-10 Intel Corporation Photolithography mask and method of fabrication
DE19649935C2 (de) * 1996-12-02 1999-09-16 Heraeus Quarzglas Verfahren zur Herstellung von Quarzglaskörpern
WO2000024685A1 (fr) * 1998-10-28 2000-05-04 Asahi Glass Company Ltd. Verre en quartz synthetique et procede de fabrication
JP3654500B2 (ja) * 1998-12-26 2005-06-02 信越石英株式会社 Ｆ２エキシマレーザー光学部材用石英ガラス材料及び光学部材
US6265115B1 (en) * 1999-03-15 2001-07-24 Corning Incorporated Projection lithography photomask blanks, preforms and methods of making
US6242136B1 (en) * 1999-02-12 2001-06-05 Corning Incorporated Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass
JP2004519704A (ja) * 2000-09-08 2004-07-02 コーニング インコーポレイテッド 真空紫外線を透過する直接堆積ガラス固化オキシフッ化珪素リソグラフィガラスフォトマスクブランク

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