JP2005504337A - 反射屈折縮小レンズ - Google Patents
反射屈折縮小レンズ Download PDFInfo
- Publication number
- JP2005504337A JP2005504337A JP2003531236A JP2003531236A JP2005504337A JP 2005504337 A JP2005504337 A JP 2005504337A JP 2003531236 A JP2003531236 A JP 2003531236A JP 2003531236 A JP2003531236 A JP 2003531236A JP 2005504337 A JP2005504337 A JP 2005504337A
- Authority
- JP
- Japan
- Prior art keywords
- beam splitter
- projection lens
- lens according
- lens
- object plane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000009467 reduction Effects 0.000 title claims description 18
- 230000003287 optical effect Effects 0.000 claims abstract description 141
- 239000000463 material Substances 0.000 claims abstract description 34
- 230000004075 alteration Effects 0.000 claims abstract description 25
- 238000004519 manufacturing process Methods 0.000 claims abstract description 14
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 claims description 18
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 claims description 9
- 229910001634 calcium fluoride Inorganic materials 0.000 claims description 9
- 238000005286 illumination Methods 0.000 claims description 9
- 230000005540 biological transmission Effects 0.000 claims description 5
- 239000000758 substrate Substances 0.000 claims description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- 238000005452 bending Methods 0.000 claims description 2
- 150000004673 fluoride salts Chemical class 0.000 claims description 2
- 238000001393 microlithography Methods 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 claims description 2
- 238000003384 imaging method Methods 0.000 abstract description 14
- 239000011248 coating agent Substances 0.000 description 24
- 238000000576 coating method Methods 0.000 description 24
- 230000009286 beneficial effect Effects 0.000 description 20
- 230000010287 polarization Effects 0.000 description 19
- 230000008901 benefit Effects 0.000 description 15
- 230000005499 meniscus Effects 0.000 description 7
- 206010010071 Coma Diseases 0.000 description 6
- 230000008859 change Effects 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 238000010276 construction Methods 0.000 description 4
- 239000013078 crystal Substances 0.000 description 3
- IEPNMLJMIRCTIV-UHFFFAOYSA-H aluminum;lithium;strontium;hexafluoride Chemical compound [Li+].[F-].[F-].[F-].[F-].[F-].[F-].[Al+3].[Sr+2] IEPNMLJMIRCTIV-UHFFFAOYSA-H 0.000 description 2
- 201000009310 astigmatism Diseases 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 230000009977 dual effect Effects 0.000 description 2
- 238000013021 overheating Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- LQFSFEIKYIRLTN-UHFFFAOYSA-H aluminum;calcium;lithium;hexafluoride Chemical compound [Li+].[F-].[F-].[F-].[F-].[F-].[F-].[Al+3].[Ca+2] LQFSFEIKYIRLTN-UHFFFAOYSA-H 0.000 description 1
- OYLGJCQECKOTOL-UHFFFAOYSA-L barium fluoride Chemical compound [F-].[F-].[Ba+2] OYLGJCQECKOTOL-UHFFFAOYSA-L 0.000 description 1
- 229910001632 barium fluoride Inorganic materials 0.000 description 1
- 239000013590 bulk material Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 230000028161 membrane depolarization Effects 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0892—Catadioptric systems specially adapted for the UV
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US32333001P | 2001-09-20 | 2001-09-20 | |
| US33125001P | 2001-11-13 | 2001-11-13 | |
| US33127601P | 2001-11-13 | 2001-11-13 | |
| PCT/EP2002/010281 WO2003027747A1 (en) | 2001-09-20 | 2002-09-13 | Catadioptric reduction lens |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005504337A true JP2005504337A (ja) | 2005-02-10 |
| JP2005504337A5 JP2005504337A5 (enrdf_load_stackoverflow) | 2005-10-27 |
Family
ID=27406266
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003531236A Pending JP2005504337A (ja) | 2001-09-20 | 2002-09-13 | 反射屈折縮小レンズ |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP1430346A1 (enrdf_load_stackoverflow) |
| JP (1) | JP2005504337A (enrdf_load_stackoverflow) |
| TW (1) | TWI226453B (enrdf_load_stackoverflow) |
| WO (1) | WO2003027747A1 (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007013179A (ja) * | 2005-07-01 | 2007-01-18 | Carl Zeiss Smt Ag | リソグラフィ投影対物レンズの補正方法およびリソグラフィ投影対物レンズ |
| JP2008542829A (ja) * | 2005-06-02 | 2008-11-27 | カール・ツァイス・エスエムティー・アーゲー | マイクロリソグラフィ投影対物レンズ |
| JP2013250556A (ja) * | 2012-05-30 | 2013-12-12 | Ultratech Inc | マイクロリソグラフィーのための等倍率大型反射屈折レンズ |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10127227A1 (de) | 2001-05-22 | 2002-12-05 | Zeiss Carl | Katadioptrisches Reduktionsobjektiv |
| WO2004025349A1 (de) * | 2002-09-09 | 2004-03-25 | Carl Zeiss Smt Ag | Katadioptrisches projektionsobjektiv sowie verfahren zur kompensation der intrinsischen doppelbrechung in einem solchen |
| JP2006147809A (ja) * | 2004-11-18 | 2006-06-08 | Canon Inc | 露光装置の投影光学系、露光装置およびデバイスの製造方法 |
| DE102010021539B4 (de) * | 2010-05-19 | 2014-10-09 | Carl Zeiss Smt Gmbh | Projektionsobjektiv mit Blenden |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2698521B2 (ja) * | 1992-12-14 | 1998-01-19 | キヤノン株式会社 | 反射屈折型光学系及び該光学系を備える投影露光装置 |
| DE4417489A1 (de) * | 1994-05-19 | 1995-11-23 | Zeiss Carl Fa | Höchstaperturiges katadioptrisches Reduktionsobjektiv für die Miktrolithographie |
| JP3812051B2 (ja) * | 1997-04-30 | 2006-08-23 | 株式会社ニコン | 反射屈折投影光学系 |
| JPH1184248A (ja) * | 1997-09-12 | 1999-03-26 | Nikon Corp | 反射屈折縮小光学系 |
| JPH11326767A (ja) * | 1998-05-07 | 1999-11-26 | Nikon Corp | 反射屈折縮小光学系 |
| EP1102100A3 (de) * | 1999-11-12 | 2003-12-10 | Carl Zeiss | Katadioptrisches Objektiv mit physikalischem Strahlteiler |
-
2002
- 2002-09-13 WO PCT/EP2002/010281 patent/WO2003027747A1/en not_active Application Discontinuation
- 2002-09-13 JP JP2003531236A patent/JP2005504337A/ja active Pending
- 2002-09-13 EP EP02799405A patent/EP1430346A1/en not_active Withdrawn
- 2002-09-20 TW TW91121599A patent/TWI226453B/zh not_active IP Right Cessation
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008542829A (ja) * | 2005-06-02 | 2008-11-27 | カール・ツァイス・エスエムティー・アーゲー | マイクロリソグラフィ投影対物レンズ |
| JP2012186508A (ja) * | 2005-06-02 | 2012-09-27 | Carl Zeiss Smt Gmbh | マイクロリソグラフィ投影対物レンズ |
| JP2014143445A (ja) * | 2005-06-02 | 2014-08-07 | Carl Zeiss Smt Gmbh | マイクロリソグラフィ投影対物レンズ |
| KR20140130454A (ko) * | 2005-06-02 | 2014-11-10 | 칼 짜이스 에스엠티 게엠베하 | 마이크로리소그래피 투영 대물 렌즈 |
| KR101483791B1 (ko) * | 2005-06-02 | 2015-01-16 | 칼 짜이스 에스엠티 게엠베하 | 마이크로리소그래피 투영 대물 렌즈 |
| US9097984B2 (en) | 2005-06-02 | 2015-08-04 | Carl Zeiss Smt Gmbh | Microlithography projection objective |
| KR101590743B1 (ko) | 2005-06-02 | 2016-02-01 | 칼 짜이스 에스엠티 게엠베하 | 마이크로리소그래피 투영 대물 렌즈 |
| US10281824B2 (en) | 2005-06-02 | 2019-05-07 | Carl Zeiss Smt Gmbh | Microlithography projection objective |
| JP2007013179A (ja) * | 2005-07-01 | 2007-01-18 | Carl Zeiss Smt Ag | リソグラフィ投影対物レンズの補正方法およびリソグラフィ投影対物レンズ |
| JP2013250556A (ja) * | 2012-05-30 | 2013-12-12 | Ultratech Inc | マイクロリソグラフィーのための等倍率大型反射屈折レンズ |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1430346A1 (en) | 2004-06-23 |
| TWI226453B (en) | 2005-01-11 |
| WO2003027747A1 (en) | 2003-04-03 |
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