TWI226453B - Catadioptric reduction lens - Google Patents
Catadioptric reduction lens Download PDFInfo
- Publication number
- TWI226453B TWI226453B TW91121599A TW91121599A TWI226453B TW I226453 B TWI226453 B TW I226453B TW 91121599 A TW91121599 A TW 91121599A TW 91121599 A TW91121599 A TW 91121599A TW I226453 B TWI226453 B TW I226453B
- Authority
- TW
- Taiwan
- Prior art keywords
- mirror
- beam splitter
- projection
- scope
- plane
- Prior art date
Links
- 230000009467 reduction Effects 0.000 title description 15
- 230000003287 optical effect Effects 0.000 claims abstract description 129
- 239000000463 material Substances 0.000 claims abstract description 43
- 230000004075 alteration Effects 0.000 claims abstract description 29
- 238000003384 imaging method Methods 0.000 claims abstract description 14
- 238000000034 method Methods 0.000 claims description 13
- 238000004519 manufacturing process Methods 0.000 claims description 12
- 239000000758 substrate Substances 0.000 claims description 9
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims description 6
- 238000005286 illumination Methods 0.000 claims description 5
- 239000007787 solid Substances 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 2
- 238000009826 distribution Methods 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 claims description 2
- 239000002689 soil Substances 0.000 claims description 2
- 102000000905 Cadherin Human genes 0.000 claims 1
- 108050007957 Cadherin Proteins 0.000 claims 1
- 238000005530 etching Methods 0.000 claims 1
- 239000007789 gas Substances 0.000 claims 1
- 210000003734 kidney Anatomy 0.000 claims 1
- 102100032986 CCR4-NOT transcription complex subunit 8 Human genes 0.000 description 101
- 101000942586 Homo sapiens CCR4-NOT transcription complex subunit 8 Proteins 0.000 description 101
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 77
- 229910001634 calcium fluoride Inorganic materials 0.000 description 77
- 238000013461 design Methods 0.000 description 36
- 238000000576 coating method Methods 0.000 description 24
- 239000011248 coating agent Substances 0.000 description 23
- 230000010287 polarization Effects 0.000 description 22
- 230000008901 benefit Effects 0.000 description 16
- 235000012431 wafers Nutrition 0.000 description 15
- 238000012937 correction Methods 0.000 description 12
- 230000000694 effects Effects 0.000 description 10
- 230000002349 favourable effect Effects 0.000 description 10
- 239000013078 crystal Substances 0.000 description 9
- 230000009286 beneficial effect Effects 0.000 description 7
- 230000005499 meniscus Effects 0.000 description 7
- 230000005855 radiation Effects 0.000 description 5
- 206010010071 Coma Diseases 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 4
- 238000004042 decolorization Methods 0.000 description 4
- 150000002222 fluorine compounds Chemical class 0.000 description 3
- 238000009434 installation Methods 0.000 description 3
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical class [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 2
- LQFSFEIKYIRLTN-UHFFFAOYSA-H aluminum;calcium;lithium;hexafluoride Chemical class [Li+].[F-].[F-].[F-].[F-].[F-].[F-].[Al+3].[Ca+2] LQFSFEIKYIRLTN-UHFFFAOYSA-H 0.000 description 2
- 201000009310 astigmatism Diseases 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- -1 gallium fluorides Chemical class 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 230000008093 supporting effect Effects 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 241000251468 Actinopterygii Species 0.000 description 1
- KLZUFWVZNOTSEM-UHFFFAOYSA-K Aluminium flouride Chemical class F[Al](F)F KLZUFWVZNOTSEM-UHFFFAOYSA-K 0.000 description 1
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- 241000238366 Cephalopoda Species 0.000 description 1
- 241000218691 Cupressaceae Species 0.000 description 1
- 244000046052 Phaseolus vulgaris Species 0.000 description 1
- 235000010627 Phaseolus vulgaris Nutrition 0.000 description 1
- 241000283984 Rodentia Species 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- KWQWLILZLWGOCD-UHFFFAOYSA-L calcium lithium difluoride Chemical compound [F-].[Li+].[F-].[Ca+2] KWQWLILZLWGOCD-UHFFFAOYSA-L 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000010409 ironing Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000008092 positive effect Effects 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 230000002040 relaxant effect Effects 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- IZVAOCKUNBYXSU-UHFFFAOYSA-J rhenium;tetrafluoride Chemical compound [F-].[F-].[F-].[F-].[Re] IZVAOCKUNBYXSU-UHFFFAOYSA-J 0.000 description 1
- 230000001932 seasonal effect Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000000779 smoke Substances 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 239000003351 stiffener Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0892—Catadioptric systems specially adapted for the UV
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US32333001P | 2001-09-20 | 2001-09-20 | |
| US33125001P | 2001-11-13 | 2001-11-13 | |
| US33127601P | 2001-11-13 | 2001-11-13 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWI226453B true TWI226453B (en) | 2005-01-11 |
Family
ID=27406266
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW91121599A TWI226453B (en) | 2001-09-20 | 2002-09-20 | Catadioptric reduction lens |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP1430346A1 (enrdf_load_stackoverflow) |
| JP (1) | JP2005504337A (enrdf_load_stackoverflow) |
| TW (1) | TWI226453B (enrdf_load_stackoverflow) |
| WO (1) | WO2003027747A1 (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI631369B (zh) * | 2010-05-19 | 2018-08-01 | 德商卡爾蔡司Ｓｍｔ有限公司 | 具有光圈之投射物鏡 |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10127227A1 (de) | 2001-05-22 | 2002-12-05 | Zeiss Carl | Katadioptrisches Reduktionsobjektiv |
| WO2004025349A1 (de) * | 2002-09-09 | 2004-03-25 | Carl Zeiss Smt Ag | Katadioptrisches projektionsobjektiv sowie verfahren zur kompensation der intrinsischen doppelbrechung in einem solchen |
| JP2006147809A (ja) * | 2004-11-18 | 2006-06-08 | Canon Inc | 露光装置の投影光学系、露光装置およびデバイスの製造方法 |
| KR101763092B1 (ko) * | 2005-06-02 | 2017-07-28 | 칼 짜이스 에스엠티 게엠베하 | 마이크로리소그래피 투영 대물 렌즈 |
| EP1746463A2 (de) * | 2005-07-01 | 2007-01-24 | Carl Zeiss SMT AG | Verfahren zum Korrigieren eines lithographischen Projektionsobjektivs und derartiges Projektionsobjektiv |
| US8830590B2 (en) * | 2012-05-30 | 2014-09-09 | Ultratech, Inc. | Unit magnification large-format catadioptric lens for microlithography |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2698521B2 (ja) * | 1992-12-14 | 1998-01-19 | キヤノン株式会社 | 反射屈折型光学系及び該光学系を備える投影露光装置 |
| DE4417489A1 (de) * | 1994-05-19 | 1995-11-23 | Zeiss Carl Fa | Höchstaperturiges katadioptrisches Reduktionsobjektiv für die Miktrolithographie |
| JP3812051B2 (ja) * | 1997-04-30 | 2006-08-23 | 株式会社ニコン | 反射屈折投影光学系 |
| JPH1184248A (ja) * | 1997-09-12 | 1999-03-26 | Nikon Corp | 反射屈折縮小光学系 |
| JPH11326767A (ja) * | 1998-05-07 | 1999-11-26 | Nikon Corp | 反射屈折縮小光学系 |
| EP1102100A3 (de) * | 1999-11-12 | 2003-12-10 | Carl Zeiss | Katadioptrisches Objektiv mit physikalischem Strahlteiler |
-
2002
- 2002-09-13 WO PCT/EP2002/010281 patent/WO2003027747A1/en not_active Application Discontinuation
- 2002-09-13 JP JP2003531236A patent/JP2005504337A/ja active Pending
- 2002-09-13 EP EP02799405A patent/EP1430346A1/en not_active Withdrawn
- 2002-09-20 TW TW91121599A patent/TWI226453B/zh not_active IP Right Cessation
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI631369B (zh) * | 2010-05-19 | 2018-08-01 | 德商卡爾蔡司Ｓｍｔ有限公司 | 具有光圈之投射物鏡 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2005504337A (ja) | 2005-02-10 |
| EP1430346A1 (en) | 2004-06-23 |
| WO2003027747A1 (en) | 2003-04-03 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |