JP2005340849A - Esd防護用の高速スイッチング・ダイオード内臓ledチップ - Google Patents
Esd防護用の高速スイッチング・ダイオード内臓ledチップ Download PDFInfo
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- 229910052751 metal Inorganic materials 0.000 claims abstract description 46
- 239000002184 metal Substances 0.000 claims abstract description 46
- 239000000463 material Substances 0.000 claims abstract description 39
- 239000004065 semiconductor Substances 0.000 claims abstract description 6
- 239000000758 substrate Substances 0.000 claims description 22
- 238000000034 method Methods 0.000 claims description 6
- 229910002601 GaN Inorganic materials 0.000 claims description 4
- 239000004020 conductor Substances 0.000 claims description 4
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 claims description 3
- 230000001681 protective effect Effects 0.000 claims description 2
- 230000015556 catabolic process Effects 0.000 abstract description 4
- 239000010410 layer Substances 0.000 description 36
- 238000010586 diagram Methods 0.000 description 4
- 229910000679 solder Inorganic materials 0.000 description 4
- 230000005684 electric field Effects 0.000 description 3
- 238000002955 isolation Methods 0.000 description 2
- 238000005304 joining Methods 0.000 description 2
- 229910052594 sapphire Inorganic materials 0.000 description 2
- 239000010980 sapphire Substances 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 229910001020 Au alloy Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
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- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
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- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
- H01L2224/05599—Material
- H01L2224/056—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/05617—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 400°C and less than 950°C
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- H01L2224/02—Bonding areas; Manufacturing methods related thereto
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- H01L2224/0554—External layer
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- H01L2224/056—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/05638—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
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- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
- H01L2224/05599—Material
- H01L2224/056—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/05663—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than 1550°C
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Abstract
【解決手段】 比較的小型のESD防護ダイオードが、発光ダイオードと同じチップ上に形成されている。或る実施形態では、ESDダイオードがトレンチで発光ダイオードから分離されているメサ型ダイオードである。ESDダイオードの直列抵抗を下げるために、PN接合部と半導体材料に対する金属接点は、長さを長くし、実質的にチップの全幅に亘って伸張している。破壊電圧を高め、試験条件を改良するための、ESDダイオード用のPN接合部とN及びP金属接点の各種構成が記載されている。
【選択図】 図6
Description
52 ESD防護ダイオード
60 トレンチ
62 N型材料
64 P型材料
66,67,68,69 金属層
70,71、83,84,85,86 金属相互接続部
80,82,92,93 金属部
88 N金属部
98 基板
100 P型層
102 N型層
104 活性層
106 導電体材料
110 サブマウント
Claims (21)
- 発光素子において、
基板上の半導体材料により形成され、その端子に順方向のバイアス電圧を印加することにより発光する発光ダイオード(LED)と、
前記基板上の半導体材料により形成された静電放電(ESD)防護ダイオードであって、閾値より高い逆バイアス電圧が前記LEDの前記端子に印加された場合に、電流を分路して前記LEDから離すことにより、前記LEDを損傷から防護するために、前記LEDに対して逆並列構成に接続されているESD防護ダイオードと、を備えており、
前記ESD防護ダイオードは、PN接合部を形成しているN型材料とP型材料の接合部を備えており、前記PN接合部の長さは前記PN接合部の幅の少なくとも2倍であり、前記ESD防護ダイオードが前記基板に占める面積は、前記基板上の前記LEDダイオードと前記ESDダイオードが占める合計面積の30%よりも小さく、前記素子は、更に、
前記PN接合部の長さの少なくとも50%に亘って前記N型材料に接触している金属層部分を備えていることを特徴とする素子。 - 前記ESD防護ダイオードが前記基板に占める面積は、前記基板上の前記LEDダイオードと前記ESDダイオードが占める合計面積の10%よりも小さいことを特徴とする、請求項1に記載の素子。
- 前記金属部分は、前記PN接合部の長さの少なくとも75%に亘って前記N型材料に接触していることを特徴とする、請求項1に記載の素子。
- 前記N型材料に接触している前記金属層部分は、前記P型材料を実質的に取り囲んでいることを特徴とする、請求項1に記載の素子。
- 前記N型材料に接触している前記金属層部分は、前記P型材料を完全に取り囲んでいることを特徴とする請求項1に記載の素子。
- 前記N型材料に接触している前記金属層部分は、前記P型材料の少なくとも2つの側辺で前記N型材料に接していることを特徴とする、請求項1に記載の素子。
- 前記PN接合部に活性領域が形成されていることを特徴とする、請求項1に記載の素子。
- 前記LEDと前記ESD防護ダイオードは、前記LEDと前記ESD防護ダイオードの表面を覆って形成された金属層部分によって相互接続されていることを特徴とする、請求項1に記載の素子。
- 前記LEDと前記ESD防護ダイオードは、前記LEDと前記ESD防護ダイオードに対して外付けのパッケージの導電体によって相互接続されていることを特徴とする、請求項1に記載の素子。
- 前記LEDと前記ESD防護ダイオードは、前記LEDと前記ESD防護ダイオードに対して外付けのサブマウント上の導電体によって相互接続されていることを特徴とする、請求項1に記載の素子。
- 前記LEDと前記ESD防護ダイオードの表面積は、1mm2よりも小さいことを特徴とする、請求項1に記載の素子。
- 前記LEDと前記ESD防護ダイオードの表面積は、1mm2よりも大きいことを特徴とする、請求項1に記載の素子。
- 前記ESD防護ダイオードの表面積は、20,000から60,000平方ミクロンであることを特徴とする、請求項1に記載の素子。
- 前記ESD防護ダイオードの表面積は、60,000から100,000平方ミクロンであることを特徴とする、請求項1に記載の素子。
- 前記LEDと前記ESD防護ダイオードを分離するため、前記LEDと前記ESD防護ダイオードの間にトレンチを更に備えていることを特徴とする、請求項1に記載の素子。
- 前記LEDと前記ESD防護ダイオードは、窒化ガリウムベースのダイオードであることを特徴とする、請求項1に記載の素子。
- 前記LEDと前記ESD防護ダイオードは、フリップチップを形成していることを特徴とする、請求項1に記載の素子。
- 前記PN接合部の少なくとも一部は丸い角部を有している、請求項1に記載の素子。
- 発光素子を形成するための方法において、
基板上に発光ダイオード(LED)を形成する段階であって、前記LEDは、その端子に順方向のバイアス電圧を印加することにより発光する、LEDを形成する段階と
前記基板上に静電放電(ESD)防護ダイオードを形成する段階であって、閾値より高い逆バイアス電圧が前記LEDの端子に印加された場合に、電流を分路して前記LEDから離すことにより、前記LEDを損傷から防護するために、前記LEDに対して逆並列構成に接続されたESD防護ダイオードを形成する段階と、を含んでおり、
前記ESD防護ダイオードは、PN接合部を形成しているN型材料とP型材料の接合部を備えており、前記PN接合部の長さは前記PN接合部の幅の少なくとも2倍であり、前記ESD防護ダイオードが前記基板に占める面積は、前記基板上の前記LEDダイオードと前記ESDダイオードが占める合計面積の30%よりも小さく、前記方法は、更に、
前記PN接合部の長さの少なくとも50%に亘って前記N型材料に接触している金属層部分を形成する段階を含んでいることを特徴とする方法。 - 前記ESD防護ダイオードが前記基板に占める面積は、前記基板上の前記LEDと前記ESD防護ダイオードが占める合計面積の10%よりも小さいことを特徴とする、請求項19に記載の方法。
- 前記金属部分は、前記PN接合部の長さの少なくとも75%に亘って前記N型材料に接触していることを特徴とする、請求項19に記載の方法。
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US10/855277 | 2004-05-26 | ||
US10/855,277 US7064353B2 (en) | 2004-05-26 | 2004-05-26 | LED chip with integrated fast switching diode for ESD protection |
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JP5015433B2 JP5015433B2 (ja) | 2012-08-29 |
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Cited By (7)
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JP2007266450A (ja) * | 2006-03-29 | 2007-10-11 | Nec Electronics Corp | 半導体装置 |
WO2008017207A1 (fr) * | 2006-08-02 | 2008-02-14 | Helio Optoelectronics Corporation | Un circuit de diode émettrice de lumière comportant une pluralité de tensions critiques et un dispositif de diode émettrice de lumière |
JP2009531852A (ja) * | 2006-03-26 | 2009-09-03 | エルジー イノテック カンパニー リミテッド | 窒化物半導体発光素子及びその製造方法 |
JP2012160611A (ja) * | 2011-02-01 | 2012-08-23 | Renesas Electronics Corp | 半導体装置 |
JP2013528953A (ja) * | 2010-06-17 | 2013-07-11 | オスラム オプト セミコンダクターズ ゲゼルシャフト ミット ベシュレンクテル ハフツング | オプトエレクトロニクス半導体チップの製造方法、および、オプトエレクトロニクス半導体チップ |
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Also Published As
Publication number | Publication date |
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EP1601019B1 (en) | 2017-07-12 |
US7064353B2 (en) | 2006-06-20 |
TWI389287B (zh) | 2013-03-11 |
US20050274956A1 (en) | 2005-12-15 |
TW200614486A (en) | 2006-05-01 |
JP5015433B2 (ja) | 2012-08-29 |
EP1601019A2 (en) | 2005-11-30 |
EP1601019A3 (en) | 2011-03-23 |
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