JP2005243987A5 - - Google Patents
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- Publication number
- JP2005243987A5 JP2005243987A5 JP2004052807A JP2004052807A JP2005243987A5 JP 2005243987 A5 JP2005243987 A5 JP 2005243987A5 JP 2004052807 A JP2004052807 A JP 2004052807A JP 2004052807 A JP2004052807 A JP 2004052807A JP 2005243987 A5 JP2005243987 A5 JP 2005243987A5
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- processing apparatus
- processing chamber
- coating
- plasma processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 claims 11
- 239000011248 coating agent Substances 0.000 claims 7
- 238000000576 coating method Methods 0.000 claims 7
- 239000000203 mixture Substances 0.000 claims 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims 1
- 239000004642 Polyimide Substances 0.000 claims 1
- 229910004298 SiO 2 Inorganic materials 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 239000011737 fluorine Substances 0.000 claims 1
- 238000009832 plasma treatment Methods 0.000 claims 1
- 229920001721 polyimide Polymers 0.000 claims 1
- 229920001296 polysiloxane Polymers 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
- 238000007789 sealing Methods 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004052807A JP4181069B2 (ja) | 2004-02-27 | 2004-02-27 | プラズマ処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004052807A JP4181069B2 (ja) | 2004-02-27 | 2004-02-27 | プラズマ処理装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005243987A JP2005243987A (ja) | 2005-09-08 |
| JP2005243987A5 true JP2005243987A5 (enExample) | 2005-11-17 |
| JP4181069B2 JP4181069B2 (ja) | 2008-11-12 |
Family
ID=35025389
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004052807A Expired - Lifetime JP4181069B2 (ja) | 2004-02-27 | 2004-02-27 | プラズマ処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4181069B2 (enExample) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007115973A (ja) * | 2005-10-21 | 2007-05-10 | Shin Etsu Chem Co Ltd | 耐食性部材 |
| JP2007243020A (ja) * | 2006-03-10 | 2007-09-20 | Hitachi High-Technologies Corp | プラズマ処理装置 |
| JP4905697B2 (ja) * | 2006-04-20 | 2012-03-28 | 信越化学工業株式会社 | 導電性耐プラズマ部材 |
| JP4887910B2 (ja) * | 2006-05-30 | 2012-02-29 | パナソニック株式会社 | プラズマ処理装置 |
| JP5071856B2 (ja) * | 2007-03-12 | 2012-11-14 | 日本碍子株式会社 | 酸化イットリウム材料及び半導体製造装置用部材 |
| JP5551353B2 (ja) * | 2008-10-30 | 2014-07-16 | 株式会社日本セラテック | 耐食性部材 |
| JP5782293B2 (ja) * | 2011-05-10 | 2015-09-24 | 東京エレクトロン株式会社 | プラズマ生成用電極およびプラズマ処理装置 |
| US9123651B2 (en) * | 2013-03-27 | 2015-09-01 | Lam Research Corporation | Dense oxide coated component of a plasma processing chamber and method of manufacture thereof |
| JP6156850B2 (ja) * | 2014-12-25 | 2017-07-05 | 東京エレクトロン株式会社 | プラズマ処理装置及びプラズマ処理装置の部材の交換判断方法 |
| WO2017087474A1 (en) * | 2015-11-16 | 2017-05-26 | Coorstek, Inc. | Corrosion-resistant components and methods of making |
| US12567564B2 (en) | 2015-11-16 | 2026-03-03 | Coorstek, Inc. | Corrosion-resistant components |
| WO2018093414A1 (en) * | 2016-11-16 | 2018-05-24 | Coorstek, Inc. | Corrosion-resistant components and methods of making |
-
2004
- 2004-02-27 JP JP2004052807A patent/JP4181069B2/ja not_active Expired - Lifetime
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