JP2005205363A - 枚葉塗膜形成装置及び枚葉塗膜形成方法 - Google Patents
枚葉塗膜形成装置及び枚葉塗膜形成方法Info
- Publication number
- JP2005205363A JP2005205363A JP2004016924A JP2004016924A JP2005205363A JP 2005205363 A JP2005205363 A JP 2005205363A JP 2004016924 A JP2004016924 A JP 2004016924A JP 2004016924 A JP2004016924 A JP 2004016924A JP 2005205363 A JP2005205363 A JP 2005205363A
- Authority
- JP
- Japan
- Prior art keywords
- coating
- film
- coating liquid
- plate
- chromaticity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06J—PLEATING, KILTING OR GOFFERING TEXTILE FABRICS OR WEARING APPAREL
- D06J1/00—Pleating, kilting or goffering textile fabrics or wearing apparel
- D06J1/10—Pleating, kilting or goffering textile fabrics or wearing apparel continuously and longitudinally to the direction of feed
-
- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06C—FINISHING, DRESSING, TENTERING OR STRETCHING TEXTILE FABRICS
- D06C23/00—Making patterns or designs on fabrics
-
- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06C—FINISHING, DRESSING, TENTERING OR STRETCHING TEXTILE FABRICS
- D06C7/00—Heating or cooling textile fabrics
-
- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06J—PLEATING, KILTING OR GOFFERING TEXTILE FABRICS OR WEARING APPAREL
- D06J1/00—Pleating, kilting or goffering textile fabrics or wearing apparel
- D06J1/12—Forms of pleats or the like
Landscapes
- Engineering & Computer Science (AREA)
- Textile Engineering (AREA)
- Coating Apparatus (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Materials For Photolithography (AREA)
Abstract
【解決手段】板状被処理物の表面にスリットノズルで塗布液を供給する塗布装置と、前記板状被処理物の表面に塗布した塗布液を乾燥、加熱する装置とを備える枚葉塗膜形成装置において、前記装置で加熱した前記板状被処理物の膜厚、色度および/または光学濃度を測定し、測定結果を前記塗布装置に転送する測定装置が設けられた枚葉塗膜形成装置を用いて、測定結果が所定の膜厚、色度および/または光学濃度に達していない場合は、前記塗布装置を一時停止して、前記スリットノズルからエア抜き及び/又は先端洗浄を行った後に、再び前記塗布装置を稼動させる。
【選択図】図1
Description
Claims (2)
- 板状被処理物の表面にスリットノズルで塗布液を供給する塗布装置と、前記板状被処理物の表面に塗布した塗布液をある程度乾燥せしめる減圧乾燥装置と、前記ある程度乾燥せしめられた塗布液を更に乾燥して被膜を形成する加熱装置とを備える枚葉塗膜形成装置において、前記加熱により形成された被膜の膜厚、色度および/または光学濃度を測定し、その測定結果を前記塗布装置にフィードバックする測定装置が設けられていることを特徴とする枚葉塗膜形成装置。
- 板状被処理物の表面にスリットノズルで塗布液を供給し、次に前記板状被処理物表面の塗布液を減圧乾燥して塗布液をある程度乾燥せしめ、次いで加熱することで更に塗布液を乾燥させて被膜とし、この被膜の膜厚、色度および/または光学濃度を測定装置で測定し、この測定結果が所定の値に達していない場合に、前記塗布装置を一時停止し、スリットノズルからエア抜き及び/又は先端洗浄を行った後に、再び塗布装置を稼動させることを特徴とする枚葉塗膜形成方法。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004016924A JP4342327B2 (ja) | 2004-01-26 | 2004-01-26 | 枚葉塗膜形成方法 |
TW094101445A TWI293581B (en) | 2004-01-26 | 2005-01-18 | Single-wafer coating film apparatus and method |
KR1020050006493A KR101092136B1 (ko) | 2004-01-26 | 2005-01-25 | 매엽 도막 형성장치 및 매엽 도막 형성방법 |
CNB2005100063247A CN100478083C (zh) | 2004-01-26 | 2005-01-26 | 单张涂膜形成装置及单张涂膜形成方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004016924A JP4342327B2 (ja) | 2004-01-26 | 2004-01-26 | 枚葉塗膜形成方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005205363A true JP2005205363A (ja) | 2005-08-04 |
JP4342327B2 JP4342327B2 (ja) | 2009-10-14 |
Family
ID=34901922
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004016924A Expired - Fee Related JP4342327B2 (ja) | 2004-01-26 | 2004-01-26 | 枚葉塗膜形成方法 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4342327B2 (ja) |
KR (1) | KR101092136B1 (ja) |
CN (1) | CN100478083C (ja) |
TW (1) | TWI293581B (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111434390A (zh) * | 2019-09-29 | 2020-07-21 | 杭州纤纳光电科技有限公司 | 一种狭缝式涂布装置 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101327148B1 (ko) * | 2010-12-23 | 2013-11-07 | 주식회사 케이씨텍 | 기판 처리용 슬릿 노즐의 세팅 방법 및 이를 이용한 슬릿 노즐의 세팅 장치 |
JP6181358B2 (ja) * | 2012-07-25 | 2017-08-16 | 東京エレクトロン株式会社 | ベーク処理システム及び有機el素子の有機機能膜の積層体の製造方法 |
CN110108218B (zh) * | 2019-05-20 | 2021-04-20 | 成都中电熊猫显示科技有限公司 | 吐胶速率的调整系统 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002219397A (ja) | 2001-01-24 | 2002-08-06 | Ebara Corp | 塗布装置 |
JP3987378B2 (ja) | 2002-05-24 | 2007-10-10 | 大日本スクリーン製造株式会社 | 基板処理装置 |
-
2004
- 2004-01-26 JP JP2004016924A patent/JP4342327B2/ja not_active Expired - Fee Related
-
2005
- 2005-01-18 TW TW094101445A patent/TWI293581B/zh not_active IP Right Cessation
- 2005-01-25 KR KR1020050006493A patent/KR101092136B1/ko not_active IP Right Cessation
- 2005-01-26 CN CNB2005100063247A patent/CN100478083C/zh not_active Expired - Fee Related
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111434390A (zh) * | 2019-09-29 | 2020-07-21 | 杭州纤纳光电科技有限公司 | 一种狭缝式涂布装置 |
CN111434390B (zh) * | 2019-09-29 | 2021-09-24 | 杭州纤纳光电科技有限公司 | 一种狭缝式涂布装置 |
Also Published As
Publication number | Publication date |
---|---|
KR101092136B1 (ko) | 2011-12-12 |
CN100478083C (zh) | 2009-04-15 |
TWI293581B (en) | 2008-02-21 |
TW200529936A (en) | 2005-09-16 |
JP4342327B2 (ja) | 2009-10-14 |
CN1680045A (zh) | 2005-10-12 |
KR20050077022A (ko) | 2005-07-29 |
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