JP2005147671A - 荷電粒子線調整方法および装置 - Google Patents

荷電粒子線調整方法および装置 Download PDF

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Publication number
JP2005147671A
JP2005147671A JP2003380632A JP2003380632A JP2005147671A JP 2005147671 A JP2005147671 A JP 2005147671A JP 2003380632 A JP2003380632 A JP 2003380632A JP 2003380632 A JP2003380632 A JP 2003380632A JP 2005147671 A JP2005147671 A JP 2005147671A
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Japan
Prior art keywords
charged particle
particle beam
probe
sample
height
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JP2003380632A
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English (en)
Japanese (ja)
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JP2005147671A5 (enExample
Inventor
Takashi Furukawa
貴司 古川
Mitsugi Sato
佐藤　　貢
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Hitachi Ltd
Hitachi High Tech Corp
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Hitachi High Technologies Corp
Hitachi Ltd
Hitachi High Tech Corp
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Priority to JP2003380632A priority Critical patent/JP2005147671A/ja
Publication of JP2005147671A publication Critical patent/JP2005147671A/ja
Publication of JP2005147671A5 publication Critical patent/JP2005147671A5/ja
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  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
JP2003380632A 2003-11-11 2003-11-11 荷電粒子線調整方法および装置 Pending JP2005147671A (ja)

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JP2005147671A true JP2005147671A (ja) 2005-06-09
JP2005147671A5 JP2005147671A5 (enExample) 2007-01-25

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Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008041586A (ja) * 2006-08-10 2008-02-21 Hitachi High-Technologies Corp 走査荷電粒子線装置
JP2008270025A (ja) * 2007-04-23 2008-11-06 Hitachi High-Technologies Corp 荷電粒子ビーム装置
JP2009026749A (ja) * 2007-06-18 2009-02-05 Hitachi High-Technologies Corp 走査形電子顕微鏡、および走査形電子顕微鏡を用いた撮像方法
JP2009064746A (ja) * 2007-09-10 2009-03-26 Topcon Corp 荷電粒子ビーム装置の撮像方法、コンピュータプログラム、記録媒体
JP2011238635A (ja) * 2011-08-31 2011-11-24 Hitachi High-Technologies Corp 走査荷電粒子線装置
EP3018693A1 (en) * 2014-11-07 2016-05-11 FEI Company Automated tem sample preparation
US20180040456A1 (en) * 2016-08-03 2018-02-08 Nuflare Technology, Inc. Method for measuring resolution of charged particle beam and charged particle beam drawing apparatus
TWI675262B (zh) * 2016-11-18 2019-10-21 日商紐富來科技股份有限公司 多帶電粒子束描繪裝置及多帶電粒子束描繪方法
CN112630288A (zh) * 2020-11-17 2021-04-09 燕山大学 一种基于放电的二次电子发射系数测量装置及方法

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11264933A (ja) * 1998-03-17 1999-09-28 Yokogawa Electric Corp 共焦点装置
JP2000021937A (ja) * 1998-07-06 2000-01-21 Advantest Corp Ｅｂテスタ
JP2000035317A (ja) * 1998-07-17 2000-02-02 Matsushita Electric Ind Co Ltd ワイヤ高さ検査装置およびワイヤ高さ検査方法
JP2001084944A (ja) * 1999-07-09 2001-03-30 Hitachi Ltd 荷電粒子線装置
JP2002039724A (ja) * 2000-07-24 2002-02-06 Yasunaga Corp 孔内面検査装置
JP2003090719A (ja) * 2001-07-12 2003-03-28 Hitachi Ltd 試料の凹凸判定方法、及び荷電粒子線装置
JP2004108979A (ja) * 2002-09-19 2004-04-08 Jeol Ltd 走査電子顕微鏡を用いた検査方法および装置
JP2005005055A (ja) * 2003-06-10 2005-01-06 Hitachi High-Technologies Corp 試料の高さ情報取得方法

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11264933A (ja) * 1998-03-17 1999-09-28 Yokogawa Electric Corp 共焦点装置
JP2000021937A (ja) * 1998-07-06 2000-01-21 Advantest Corp Ｅｂテスタ
JP2000035317A (ja) * 1998-07-17 2000-02-02 Matsushita Electric Ind Co Ltd ワイヤ高さ検査装置およびワイヤ高さ検査方法
JP2001084944A (ja) * 1999-07-09 2001-03-30 Hitachi Ltd 荷電粒子線装置
JP2002039724A (ja) * 2000-07-24 2002-02-06 Yasunaga Corp 孔内面検査装置
JP2003090719A (ja) * 2001-07-12 2003-03-28 Hitachi Ltd 試料の凹凸判定方法、及び荷電粒子線装置
JP2004108979A (ja) * 2002-09-19 2004-04-08 Jeol Ltd 走査電子顕微鏡を用いた検査方法および装置
JP2005005055A (ja) * 2003-06-10 2005-01-06 Hitachi High-Technologies Corp 試料の高さ情報取得方法

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008041586A (ja) * 2006-08-10 2008-02-21 Hitachi High-Technologies Corp 走査荷電粒子線装置
JP2008270025A (ja) * 2007-04-23 2008-11-06 Hitachi High-Technologies Corp 荷電粒子ビーム装置
JP2009026749A (ja) * 2007-06-18 2009-02-05 Hitachi High-Technologies Corp 走査形電子顕微鏡、および走査形電子顕微鏡を用いた撮像方法
JP2009064746A (ja) * 2007-09-10 2009-03-26 Topcon Corp 荷電粒子ビーム装置の撮像方法、コンピュータプログラム、記録媒体
JP2011238635A (ja) * 2011-08-31 2011-11-24 Hitachi High-Technologies Corp 走査荷電粒子線装置
US9601313B2 (en) 2014-11-07 2017-03-21 Fei Company Automated TEM sample preparation
EP3018693A1 (en) * 2014-11-07 2016-05-11 FEI Company Automated tem sample preparation
US10340119B2 (en) 2014-11-07 2019-07-02 Fei Company Automated TEM sample preparation
US20180040456A1 (en) * 2016-08-03 2018-02-08 Nuflare Technology, Inc. Method for measuring resolution of charged particle beam and charged particle beam drawing apparatus
US10211027B2 (en) 2016-08-03 2019-02-19 Nuflare Technology, Inc. Method for measuring resolution of charged particle beam and charged particle beam drawing apparatus
TWI675262B (zh) * 2016-11-18 2019-10-21 日商紐富來科技股份有限公司 多帶電粒子束描繪裝置及多帶電粒子束描繪方法
US10497539B2 (en) 2016-11-18 2019-12-03 Nuflare Technology, Inc. Multi charged particle beam writing apparatus and multi charged particle beam writing method
CN112630288A (zh) * 2020-11-17 2021-04-09 燕山大学 一种基于放电的二次电子发射系数测量装置及方法

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