JP2005119956A5 - - Google Patents
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- Publication number
- JP2005119956A5 JP2005119956A5 JP2004276569A JP2004276569A JP2005119956A5 JP 2005119956 A5 JP2005119956 A5 JP 2005119956A5 JP 2004276569 A JP2004276569 A JP 2004276569A JP 2004276569 A JP2004276569 A JP 2004276569A JP 2005119956 A5 JP2005119956 A5 JP 2005119956A5
- Authority
- JP
- Japan
- Prior art keywords
- tetrafluorosilane
- reactor
- producing
- sulfuric acid
- hydrogen fluoride
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 claims 29
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims 16
- 238000004519 manufacturing process Methods 0.000 claims 16
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 6
- 239000007789 gas Substances 0.000 claims 6
- 229910000040 hydrogen fluoride Inorganic materials 0.000 claims 6
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims 3
- 229910052796 boron Inorganic materials 0.000 claims 3
- 229910052799 carbon Inorganic materials 0.000 claims 3
- -1 hexafluorosilicic acid Chemical compound 0.000 claims 3
- 229910052698 phosphorus Inorganic materials 0.000 claims 3
- 239000011574 phosphorus Substances 0.000 claims 3
- 235000012239 silicon dioxide Nutrition 0.000 claims 3
- 239000000377 silicon dioxide Substances 0.000 claims 3
- 229910052723 transition metal Inorganic materials 0.000 claims 3
- 150000003624 transition metals Chemical class 0.000 claims 3
- ARBIYISMVFAYHV-UHFFFAOYSA-N trifluoro(trifluorosilyloxy)silane Chemical compound F[Si](F)(F)O[Si](F)(F)F ARBIYISMVFAYHV-UHFFFAOYSA-N 0.000 claims 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims 2
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 claims 2
- 239000007795 chemical reaction product Substances 0.000 claims 2
- 239000012535 impurity Substances 0.000 claims 2
- 239000002808 molecular sieve Substances 0.000 claims 2
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 claims 2
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 claims 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims 1
- 229910002092 carbon dioxide Inorganic materials 0.000 claims 1
- 239000001569 carbon dioxide Substances 0.000 claims 1
- 238000007380 fibre production Methods 0.000 claims 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 claims 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 claims 1
- 229910000037 hydrogen sulfide Inorganic materials 0.000 claims 1
- 239000011261 inert gas Substances 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 239000013307 optical fiber Substances 0.000 claims 1
- 239000002245 particle Substances 0.000 claims 1
- 239000011148 porous material Substances 0.000 claims 1
- 238000000746 purification Methods 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 claims 1
- 238000007873 sieving Methods 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004276569A JP4588396B2 (ja) | 2003-09-25 | 2004-09-24 | テトラフルオロシランの製造方法 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003333061 | 2003-09-25 | ||
| JP2004276569A JP4588396B2 (ja) | 2003-09-25 | 2004-09-24 | テトラフルオロシランの製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005119956A JP2005119956A (ja) | 2005-05-12 |
| JP2005119956A5 true JP2005119956A5 (https=) | 2007-06-14 |
| JP4588396B2 JP4588396B2 (ja) | 2010-12-01 |
Family
ID=34622000
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004276569A Expired - Fee Related JP4588396B2 (ja) | 2003-09-25 | 2004-09-24 | テトラフルオロシランの製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4588396B2 (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4576312B2 (ja) | 2005-10-03 | 2010-11-04 | 東北電力株式会社 | 四フッ化ケイ素の製造方法、及びそれに用いる製造装置 |
| JP5291098B2 (ja) * | 2007-08-23 | 2013-09-18 | オブシェストボ、エス、オルガニチェンノイ、オトベトストベンノストユ、“ソーラー、エスアイ” | フルオロケイ酸溶液からの多結晶シリコン製造の技術ならびにその製造のための設備 |
| KR101215490B1 (ko) | 2010-06-11 | 2012-12-26 | 주식회사 케이씨씨 | 다양한 플루오라이드 원료들과 비정질 실리카 및 황산을 이용한 사불화규소의 연속 제조방법 |
| CN108455616A (zh) * | 2017-12-20 | 2018-08-28 | 湖北瓮福蓝天化工有限公司 | 一种氟硅酸除氯方法及装置 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IT1196983B (it) * | 1986-07-23 | 1988-11-25 | Enichem Agricoltura Spa | Procedimento per la produzione di tetrafluoruro di silicio |
| US5232602A (en) * | 1992-07-01 | 1993-08-03 | Hemlock Semiconductor Corporation | Phosphorous removal from tetrachlorosilane |
| JP3734009B2 (ja) * | 1999-06-17 | 2006-01-11 | 信越化学工業株式会社 | クロロシラン類中のボロン化合物の分離方法及びクロロシラン類蒸発用組成物 |
| JP3909385B2 (ja) * | 2001-07-12 | 2007-04-25 | 昭和電工株式会社 | テトラフルオロシランの製造方法およびその用途 |
-
2004
- 2004-09-24 JP JP2004276569A patent/JP4588396B2/ja not_active Expired - Fee Related
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