JP2005100526A5 - - Google Patents

Download PDF

Info

Publication number
JP2005100526A5
JP2005100526A5 JP2003332657A JP2003332657A JP2005100526A5 JP 2005100526 A5 JP2005100526 A5 JP 2005100526A5 JP 2003332657 A JP2003332657 A JP 2003332657A JP 2003332657 A JP2003332657 A JP 2003332657A JP 2005100526 A5 JP2005100526 A5 JP 2005100526A5
Authority
JP
Japan
Prior art keywords
region
amorphous
amorphous region
concavo
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003332657A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005100526A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2003332657A priority Critical patent/JP2005100526A/ja
Priority claimed from JP2003332657A external-priority patent/JP2005100526A/ja
Priority to CNA2004100742506A priority patent/CN1601694A/zh
Priority to US10/933,215 priority patent/US20050106508A1/en
Publication of JP2005100526A publication Critical patent/JP2005100526A/ja
Publication of JP2005100526A5 publication Critical patent/JP2005100526A5/ja
Pending legal-status Critical Current

Links

JP2003332657A 2003-09-25 2003-09-25 デバイスの製造方法及び観察方法 Pending JP2005100526A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2003332657A JP2005100526A (ja) 2003-09-25 2003-09-25 デバイスの製造方法及び観察方法
CNA2004100742506A CN1601694A (zh) 2003-09-25 2004-09-03 器件的制造方法和观察方法
US10/933,215 US20050106508A1 (en) 2003-09-25 2004-09-03 Method of fabricating devices and observing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003332657A JP2005100526A (ja) 2003-09-25 2003-09-25 デバイスの製造方法及び観察方法

Publications (2)

Publication Number Publication Date
JP2005100526A JP2005100526A (ja) 2005-04-14
JP2005100526A5 true JP2005100526A5 (enExample) 2006-03-02

Family

ID=34460887

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003332657A Pending JP2005100526A (ja) 2003-09-25 2003-09-25 デバイスの製造方法及び観察方法

Country Status (3)

Country Link
US (1) US20050106508A1 (enExample)
JP (1) JP2005100526A (enExample)
CN (1) CN1601694A (enExample)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005056223A1 (ja) * 2003-12-09 2005-06-23 Ricoh Company, Ltd. 構造体及びその製造方法、構造体形成用媒体、並びに光記録媒体及びその再生方法
JP4456527B2 (ja) * 2005-05-20 2010-04-28 株式会社日立製作所 光情報記録媒体、並びにそれを用いた情報記録方法及び情報再生方法
KR100630766B1 (ko) * 2005-09-05 2006-10-04 삼성전자주식회사 상변화 물질을 사용한 패턴 형성 방법 및 그 재작업 방법
FR2909797B1 (fr) * 2006-12-08 2009-02-13 Commissariat Energie Atomique Formation de zones en creux profondes et son utilisation lors de la fabrication d'un support d'enregistrement optique
US20080142475A1 (en) * 2006-12-15 2008-06-19 Knowles Electronics, Llc Method of creating solid object from a material and apparatus thereof
JP4580380B2 (ja) 2006-12-28 2010-11-10 株式会社日立製作所 光ディスク装置
JP4685754B2 (ja) 2006-12-28 2011-05-18 株式会社日立製作所 トラッキング方法
FR2912538B1 (fr) * 2007-02-08 2009-04-24 Commissariat Energie Atomique Formation de zones en creux profondes et son utilisation lors de la fabrication d'un support d'enregistrement optique
JP4903081B2 (ja) 2007-05-17 2012-03-21 株式会社日立製作所 光ディスク媒体及びトラッキング方法
JP5057925B2 (ja) 2007-10-18 2012-10-24 株式会社日立製作所 デジタル情報再生方法
JP2009245505A (ja) * 2008-03-31 2009-10-22 Pioneer Electronic Corp 光学情報記録媒体製造用の原盤
CN103151053B (zh) * 2008-10-14 2015-12-09 旭化成电子材料株式会社 热反应型抗蚀剂材料、使用它的热光刻用层压体以及使用它们的模具的制造方法
EP2808735B1 (en) * 2012-01-27 2017-03-22 Asahi Kasei Kabushiki Kaisha Fine concavo-convex structure product, mold fabrication method, and use of a heat-reactive resist material
GB2521417A (en) * 2013-12-19 2015-06-24 Swisslitho Ag Multiscale patterning of a sample with apparatus having both thermo-optical lithography capability and thermal scanning probe lithography capability
CN114512150B (zh) 2020-11-16 2025-02-18 华为技术有限公司 一种光存储介质、光存储介质制备方法以及系统
US11733468B2 (en) * 2021-12-08 2023-08-22 Viavi Solutions Inc. Photonic structure using optical heater

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4309225A (en) * 1979-09-13 1982-01-05 Massachusetts Institute Of Technology Method of crystallizing amorphous material with a moving energy beam
JPH066393B2 (ja) * 1984-03-07 1994-01-26 株式会社日立製作所 情報の記録・消去方法
US5051340A (en) * 1989-06-23 1991-09-24 Eastman Kodak Company Master for optical element replication
US6030556A (en) * 1997-07-08 2000-02-29 Imation Corp. Optical disc stampers and methods/systems for manufacturing the same
KR100284693B1 (ko) * 1997-12-30 2001-03-15 윤종용 상변화형 디스크의 초기화 방법
DE69931953T2 (de) * 1998-10-26 2006-10-12 Mitsubishi Kagaku Media Corp., Ltd. Verfahren zur aufzeichnung und wiedergabe von mehrwertigen digitalen signalen und mehrwertaufzeichnungsmedium des phasenwechseltyps
EP1213715A3 (en) * 2000-11-30 2003-05-07 Victor Company Of Japan, Ltd. Optical recording medium
JP2002230828A (ja) * 2001-01-31 2002-08-16 Pioneer Electronic Corp 情報記録媒体
TW527592B (en) * 2001-03-19 2003-04-11 Matsushita Electric Industrial Co Ltd Optical information recording media, and the manufacturing method and record regeneration method of the same

Similar Documents

Publication Publication Date Title
JP2005100526A5 (enExample)
JP2000228361A5 (enExample)
JP2007053364A5 (enExample)
JP4864596B2 (ja) 多結晶シリコーン薄膜の製造方法及びこの方法を利用した薄膜トランジスタの製造方法
TWI227912B (en) Manufacturing method for crystal semiconductor material and manufacturing method for semiconductor device
JPH09275081A5 (enExample)
JP2017507886A (ja) 金属結晶質基板上での、パルスレーザーを用いた大面積のグラフェンの合成方法
CN106910678A (zh) 图案化掩膜版、其制备方法及使用其进行激光剥离的方法
TW201216399A (en) Pulse train annealing method and apparatus
TWI296825B (enExample)
CN101971293A (zh) 用于薄膜的闪光退火
TW201112314A (en) Methods of solid phase recrystallization of thin film using pulse train annealing method
JP2003086604A5 (enExample)
CN101866979B (zh) 太阳能电池的制造方法
KR100739631B1 (ko) 단결정 구조를 갖는 박막의 형성 방법
JP2000031463A (ja) 透明電極の形成方法
TWI364613B (en) Display
JP2004039701A5 (enExample)
JP6129837B2 (ja) 結晶化法
CN107017342A (zh) 一种使用不同波长的超短脉冲皮秒激光诱导相变材料薄膜晶化的方法
KR101727960B1 (ko) 레이저를 이용한 상변화 메모리 제조방법
JPS5892213A (ja) 半導体単結晶膜の製造方法
JP2020533807A (ja) ターゲット材料を処理する方法
JP5339322B2 (ja) レーザによるシリコン結晶成長方法
TW200952089A (en) Lithographic method of making uniform crystalline Si films