JP2005079569A5 - - Google Patents
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- Publication number
- JP2005079569A5 JP2005079569A5 JP2003312291A JP2003312291A JP2005079569A5 JP 2005079569 A5 JP2005079569 A5 JP 2005079569A5 JP 2003312291 A JP2003312291 A JP 2003312291A JP 2003312291 A JP2003312291 A JP 2003312291A JP 2005079569 A5 JP2005079569 A5 JP 2005079569A5
- Authority
- JP
- Japan
- Prior art keywords
- nozzles
- liquid
- gas
- substrate
- droplet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 58
- 239000007788 liquid Substances 0.000 claims description 56
- 239000012530 fluid Substances 0.000 claims description 14
- 238000005192 partition Methods 0.000 claims description 13
- 238000000034 method Methods 0.000 claims description 7
- 239000007789 gas Substances 0.000 description 32
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 25
- 238000004140 cleaning Methods 0.000 description 12
- 239000004065 semiconductor Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N HCl Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N HF Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- -1 for example Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000000875 corresponding Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003312291A JP2005079569A (ja) | 2003-09-04 | 2003-09-04 | 基板処理装置および基板処理方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003312291A JP2005079569A (ja) | 2003-09-04 | 2003-09-04 | 基板処理装置および基板処理方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005079569A JP2005079569A (ja) | 2005-03-24 |
| JP2005079569A5 true JP2005079569A5 (ko) | 2006-08-03 |
Family
ID=34413585
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003312291A Pending JP2005079569A (ja) | 2003-09-04 | 2003-09-04 | 基板処理装置および基板処理方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2005079569A (ko) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5153332B2 (ja) * | 2005-07-04 | 2013-02-27 | 株式会社 エルフォテック | 高精細パターンの形成方法及び装置 |
| JP2012164896A (ja) * | 2011-02-08 | 2012-08-30 | Tokyo Electron Ltd | 流体供給部材、液処理装置、および液処理方法 |
| CN108345187A (zh) * | 2018-02-02 | 2018-07-31 | 武汉华星光电技术有限公司 | 显影腔室及其喷淋组件、显影方法 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003145064A (ja) * | 2001-11-12 | 2003-05-20 | Tokyo Electron Ltd | ２流体ジェットノズル及び基板洗浄装置 |
-
2003
- 2003-09-04 JP JP2003312291A patent/JP2005079569A/ja active Pending
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