JP2005064391A5 - - Google Patents

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Publication number
JP2005064391A5
JP2005064391A5 JP2003295566A JP2003295566A JP2005064391A5 JP 2005064391 A5 JP2005064391 A5 JP 2005064391A5 JP 2003295566 A JP2003295566 A JP 2003295566A JP 2003295566 A JP2003295566 A JP 2003295566A JP 2005064391 A5 JP2005064391 A5 JP 2005064391A5
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JP
Japan
Prior art keywords
cooling
optical member
exposure
phase
storage body
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Granted
Application number
JP2003295566A
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English (en)
Japanese (ja)
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JP2005064391A (ja
JP4262031B2 (ja
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Priority to JP2003295566A priority Critical patent/JP4262031B2/ja
Priority claimed from JP2003295566A external-priority patent/JP4262031B2/ja
Publication of JP2005064391A publication Critical patent/JP2005064391A/ja
Publication of JP2005064391A5 publication Critical patent/JP2005064391A5/ja
Application granted granted Critical
Publication of JP4262031B2 publication Critical patent/JP4262031B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2003295566A 2003-08-19 2003-08-19 露光装置及びデバイスの製造方法 Expired - Fee Related JP4262031B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003295566A JP4262031B2 (ja) 2003-08-19 2003-08-19 露光装置及びデバイスの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003295566A JP4262031B2 (ja) 2003-08-19 2003-08-19 露光装置及びデバイスの製造方法

Publications (3)

Publication Number Publication Date
JP2005064391A JP2005064391A (ja) 2005-03-10
JP2005064391A5 true JP2005064391A5 (https=) 2006-09-21
JP4262031B2 JP4262031B2 (ja) 2009-05-13

Family

ID=34371768

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003295566A Expired - Fee Related JP4262031B2 (ja) 2003-08-19 2003-08-19 露光装置及びデバイスの製造方法

Country Status (1)

Country Link
JP (1) JP4262031B2 (https=)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20170018113A (ko) 2003-04-09 2017-02-15 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
TW201834020A (zh) 2003-10-28 2018-09-16 日商尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
TW201809801A (zh) 2003-11-20 2018-03-16 日商尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法、以及元件製造方法
TWI389174B (zh) 2004-02-06 2013-03-11 尼康股份有限公司 偏光變換元件、光學照明裝置、曝光裝置以及曝光方法
EP2660854B1 (en) 2005-05-12 2017-06-21 Nikon Corporation Projection optical system, exposure apparatus and exposure method
JP2007027632A (ja) * 2005-07-21 2007-02-01 Nikon Corp 光学装置及び露光装置、並びにデバイス製造方法
JPWO2007122856A1 (ja) * 2006-04-24 2009-09-03 株式会社ニコン 光学素子冷却装置および露光装置
JP2008292761A (ja) * 2007-05-24 2008-12-04 Canon Inc 露光装置及びデバイス製造方法
US20090015806A1 (en) * 2007-06-04 2009-01-15 Nikon Corporation Environmental control apparatus, stage apparatus, exposure apparatus and device manufacturing method
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
NL2004322A (en) 2009-04-13 2010-10-14 Asml Netherlands Bv Cooling device, cooling arrangement and lithographic apparatus comprising a cooling arrangement.
NL2004242A (en) 2009-04-13 2010-10-14 Asml Netherlands Bv Detector module, cooling arrangement and lithographic apparatus comprising a detector module.
JP4977751B2 (ja) * 2009-12-24 2012-07-18 シャープ株式会社 画像形成装置
WO2012013751A1 (en) * 2010-07-30 2012-02-02 Carl Zeiss Smt Gmbh Euv exposure apparatus
DE102011081259A1 (de) 2010-09-28 2012-03-29 Carl Zeiss Smt Gmbh Anordnung zur Spiegeltemperaturmessung und/oder zur thermischen Aktuierung eines Spiegels in einer mikrolithographischen Projektionsbelichtungsanlage
DE102011010462A1 (de) 2011-01-28 2012-08-02 Carl Zeiss Laser Optics Gmbh Optische Anordnung für eine EUV-Projektionsbelichtungsanlage sowie Verfahren zum Kühlen eines optischen Bauelements
WO2013041134A1 (en) 2011-09-21 2013-03-28 Carl Zeiss Smt Gmbh Arrangement for thermal actuation of a mirror in a microlithographic projection exposure apparatus
US10691013B2 (en) 2013-12-22 2020-06-23 Applied Materials, Inc. Extreme ultraviolet lithography system having chuck assembly and method of manufacturing thereof
JP2017156465A (ja) * 2016-02-29 2017-09-07 キヤノン株式会社 駆動装置、リソグラフィ装置、冷却方法、および物品の製造方法
US11720034B2 (en) 2017-04-11 2023-08-08 Asml Netherlands B.V. Lithographic apparatus and cooling method
US20230123834A1 (en) * 2021-10-19 2023-04-20 Meta Platforms Technologies, Llc Euv lithography using polymer crystal based reticle

Family Cites Families (10)

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Publication number Priority date Publication date Assignee Title
JP2840315B2 (ja) * 1989-09-04 1998-12-24 キヤノン株式会社 露光方法
JP2928603B2 (ja) * 1990-07-30 1999-08-03 キヤノン株式会社 Ｘ線露光装置用ウエハ冷却装置
JP2975089B2 (ja) * 1990-11-01 1999-11-10 キヤノン株式会社 露光装置
JPH10125592A (ja) * 1996-10-21 1998-05-15 Nikon Corp 温度制御装置及びその方法
JPH11243052A (ja) * 1997-11-14 1999-09-07 Nikon Corp 露光装置
JP2000048750A (ja) * 1998-07-28 2000-02-18 Nikon Corp 荷電粒子線偏向器及びそれを内蔵する電磁レンズ
JP2000243684A (ja) * 1999-02-18 2000-09-08 Canon Inc 露光装置およびデバイス製造方法
JP2001013297A (ja) * 1999-06-30 2001-01-19 Nikon Corp 反射光学素子および露光装置
JP2003068600A (ja) * 2001-08-22 2003-03-07 Canon Inc 露光装置、および基板チャックの冷却方法
JP2003068626A (ja) * 2001-08-29 2003-03-07 Canon Inc 露光装置内ユニットの輻射冷却方法及び輻射冷却装置

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