JP2005057262A - 超格子構造の半導体層を有する半導体素子及びその製造方法 - Google Patents
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 87
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 17
- 239000000463 material Substances 0.000 claims abstract description 85
- 229910002704 AlGaN Inorganic materials 0.000 claims description 44
- 238000000034 method Methods 0.000 claims description 34
- 238000005253 cladding Methods 0.000 claims description 18
- 150000004767 nitrides Chemical class 0.000 claims description 2
- 230000003287 optical effect Effects 0.000 abstract description 10
- 239000010410 layer Substances 0.000 description 209
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 14
- 150000001875 compounds Chemical class 0.000 description 14
- 239000007789 gas Substances 0.000 description 13
- 230000004888 barrier function Effects 0.000 description 12
- 239000000758 substrate Substances 0.000 description 8
- 229910021529 ammonia Inorganic materials 0.000 description 7
- 239000002019 doping agent Substances 0.000 description 7
- 230000008569 process Effects 0.000 description 7
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- 230000002829 reductive effect Effects 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
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- 230000009467 reduction Effects 0.000 description 5
- 229910002601 GaN Inorganic materials 0.000 description 4
- 238000003917 TEM image Methods 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 238000002161 passivation Methods 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 230000008859 change Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 229910052733 gallium Inorganic materials 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- -1 nitride compound Chemical class 0.000 description 2
- 229910052594 sapphire Inorganic materials 0.000 description 2
- 239000010980 sapphire Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 230000008094 contradictory effect Effects 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
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- 239000004047 hole gas Substances 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
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- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 1
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- 238000005457 optimization Methods 0.000 description 1
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- 238000012360 testing method Methods 0.000 description 1
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- H—ELECTRICITY
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
- H01S3/094—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
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- H01L33/04—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
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- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/15—Structures with periodic or quasi periodic potential variation, e.g. multiple quantum wells, superlattices
- H01L29/151—Compositional structures
- H01L29/152—Compositional structures with quantum effects only in vertical direction, i.e. layered structures with quantum effects solely resulting from vertical potential variation
- H01L29/155—Comprising only semiconductor materials
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- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
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- H01L33/04—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction
- H01L33/06—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction within the light emitting region, e.g. quantum confinement structure or tunnel barrier
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- H01L33/26—Materials of the light emitting region
- H01L33/30—Materials of the light emitting region containing only elements of group III and group V of the periodic system
- H01L33/32—Materials of the light emitting region containing only elements of group III and group V of the periodic system containing nitrogen
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S2301/00—Functional characteristics
- H01S2301/17—Semiconductor lasers comprising special layers
- H01S2301/173—The laser chip comprising special buffer layers, e.g. dislocation prevention or reduction
Abstract
【解決手段】 異種の第1及び第2物質層が交互的に多重積層されている超格子構造の半導体層を含み、超格子構造を形成する前記第1物質層と第2物質層それぞれに多数のホールが形成され、当該物質層の各ホールに隣接した他の物質層の物質が充填されている半導体素子である。本発明による超格子構造で与えられた光制限特性を維持しつつも電荷の効率的な移動をナノホールを通じて許容することによって、動作電圧を低くできる。
【選択図】 図1
Description
光制限層は、AlGaN層の間にGaN層が介在される超格子構造を有する。光制限層において、AlGaN層の間に介在されたGaNは、高いAl組成を有するAlGaN層のクラックを防止する。また、GaNはAlGaNと共に超格子構造を形成することによって、バルクAlGaN層に比べて高いドーピング効率を表し、特に、2次元的なホールガスの形成による深いアクセプタのドーピング効率が上昇し、このようなドーピング効率の上昇によるホール濃度が増加する。
これは、エネルギーバンドギャップの差による生じた障壁による抵抗の減少に何れも効果があるためである。また、ドーパントがSiのようなnタイプでもMgのようなpタイプでも関係ない。ドーピングが実施される層もAlxInyGa1−x−yN/Alx´Iny´Ga1−x´−y´N双方に行っても良く、一方、何れか一方の層にだけ行っても良い。
以下の実施の形態では、図9に示された構造のLDを製造する方法を説明する。以下の説明で参照される図9は、リッジ導波路がまだ形成されていない結果物を概略的に示す。下記工程の説明で、基板に対する単純な結晶層の成長が反復され、積層数の増加以外に他のプロファイルの変化がないので、各工程に対応する図面なしに図9に依存して説明される。
52 バッファ層、
53 下部導波層、
54 下部クラッド層、
55 上部導波層、
56 活性層、
57 上部電極、
58 上部クラッド層、
58a リッジ、
61 第1半導体層、
63 レーザ共振層、
64 オームコンタクト層、
65 第2半導体層、
68 埋込層、
69 保護層。
Claims (13)
- 異種の第1及び第2物質層が交互的に多重積層されている超格子構造の半導体層を含む半導体素子において、
超格子構造を形成する前記第1物質層と第2物質層それぞれに多数のホールが形成され、当該物質層の各ホールに隣接した他の物質層の物質が充填されていることを特徴とする半導体素子。 - 前記超格子構造は、p型半導体層であることを特徴とする請求項1に記載の半導体素子。
- 前記超格子構造は、GaN/AlGaNの構造を有することを特徴とする請求項1または2に記載の半導体素子。
- レーザ共振層と、
前記レーザ共振層の一側に形成される第1半導体層と、
前記レーザ共振層の他側に形成される第2半導体層と、を備え、
前記第2半導体層は、異種の第1物質による第1層と第2物質による第2層とが多重積層された超格子構造を含み、
前記超格子構造を形成する第1層と第2層それぞれに多数のホールが形成されて、それぞれのホールに異種の第2物質と第1物質とが充填されていることを特徴とするレーザダイオード。 - 前記第1半導体層は、n−GaN系列のIII−V族窒化物半導体層であることを特徴とする請求項4に記載のレーザダイオード。
- 前記共振層は、
前記第1半導体層上に積層され、前記下部クラッド層より屈折率が大きい下部導波路層と、前記下部導波路層の上面に積層され、レーザ光が生成される活性層と、前記活性層上に積層される上部導波路層と、をさらに含むことを特徴とする請求項4に記載のレーザダイオード。 - 前記第2半導体層は、p−GaN/AlGaNより形成することを特徴とする請求項4に記載のレーザダイオード。
- 半導体素子で異種の第1及び第2物質層が交互的に多重積層されている超格子構造の半導体層を形成する方法において、
前記第1及び第2物質層を成長させる時に150torr以上に圧力調節して、当該物質層に多数のナノホールを形成することを特徴とする超格子半導体層の形成方法。 - 前記圧力は、150〜400Torr間であることを特徴とする請求項8に記載の超格子半導体層の形成方法。
- 超格子半導体層を有する半導体素子で異種の第1及び第2物質層が交互的に多重積層されている超格子構造の半導体層を形成する方法において、
前記第1及び第2物質層を成長させる時に3〜50秒間に一時的に成長物質の供給を中断して、当該物質層に多数のナノホールを形成することを特徴とする超格子半導体層を有する半導体素子の製造方法。 - 前記成長物質供給の中断時間は3〜15秒であることを特徴とする請求項10に記載の超格子半導体層を有する半導体素子の製造方法。
- 超格子半導体層を有する半導体素子で異種の第1及び第2物質層が交互的に多重積層されている超格子構造の半導体層を形成する方法において、
前記第1及び第2物質層を成長速度を1〜10Å/sに調節して、当該物質層に多数のナノホールを形成することを特徴とする超格子半導体層を有する半導体素子の製造方法。 - 前記成長速度は、2〜6Å/sであることを特徴とする請求項12に記載の超格子半導体層を有する半導体素子の製造方法。
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Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20070228385A1 (en) * | 2006-04-03 | 2007-10-04 | General Electric Company | Edge-emitting light emitting diodes and methods of making the same |
EP1883140B1 (de) * | 2006-07-27 | 2013-02-27 | OSRAM Opto Semiconductors GmbH | LD oder LED mit Übergitter-Mantelschicht und Dotierungsgradienten |
EP1883141B1 (de) * | 2006-07-27 | 2017-05-24 | OSRAM Opto Semiconductors GmbH | LD oder LED mit Übergitter-Mantelschicht |
EP1883119B1 (de) * | 2006-07-27 | 2015-11-04 | OSRAM Opto Semiconductors GmbH | Halbleiter-Schichtstruktur mit Übergitter |
JP4105216B2 (ja) * | 2006-08-04 | 2008-06-25 | 三菱電機株式会社 | 半導体光素子の製造方法 |
KR20110006652A (ko) * | 2008-03-25 | 2011-01-20 | 라티스 파워(지앙시) 코포레이션 | 양면 패시베이션을 갖는 반도체 발광 소자 |
JP2011077351A (ja) * | 2009-09-30 | 2011-04-14 | Sumitomo Electric Ind Ltd | 発光素子 |
DE102009060749B4 (de) * | 2009-12-30 | 2021-12-30 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Optoelektronischer Halbleiterchip |
US8624222B2 (en) * | 2011-10-21 | 2014-01-07 | University Of Utah Research Foundation | Homogeneous multiple band gap devices |
EP2595193A1 (en) | 2011-11-16 | 2013-05-22 | Hitachi, Ltd. | Multiple quantum well structure |
TWI536605B (zh) * | 2013-08-20 | 2016-06-01 | 隆達電子股份有限公司 | 發光二極體 |
CN103594552B (zh) * | 2013-10-22 | 2015-09-23 | 溧阳市东大技术转移中心有限公司 | 一种光伏电池的制造方法 |
JP6986349B2 (ja) | 2014-05-27 | 2021-12-22 | シランナ・ユー・ブイ・テクノロジーズ・プライベート・リミテッドSilanna Uv Technologies Pte Ltd | n型超格子及びp型超格子を備える電子デバイス |
US11322643B2 (en) | 2014-05-27 | 2022-05-03 | Silanna UV Technologies Pte Ltd | Optoelectronic device |
CN106663718B (zh) * | 2014-05-27 | 2019-10-01 | 斯兰纳Uv科技有限公司 | 光电装置 |
JP6636459B2 (ja) | 2014-05-27 | 2020-01-29 | シランナ・ユー・ブイ・テクノロジーズ・プライベート・リミテッドSilanna Uv Technologies Pte Ltd | 半導体構造と超格子とを用いた高度電子デバイス |
CN104269740B (zh) * | 2014-09-23 | 2018-01-30 | 中国科学院半导体研究所 | 一种激光器及其制作方法 |
US11355667B2 (en) * | 2018-04-12 | 2022-06-07 | Atomera Incorporated | Method for making semiconductor device including vertically integrated optical and electronic devices and comprising a superlattice |
CN116130555B (zh) * | 2023-01-17 | 2024-02-09 | 苏州苏纳光电有限公司 | 在半导体脊型结构上制作电极的方法 |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60728A (ja) * | 1983-06-16 | 1985-01-05 | Sanyo Electric Co Ltd | 分子線エピタキシヤル成長法 |
JPS6174327A (ja) * | 1984-09-14 | 1986-04-16 | エイ・ティ・アンド・ティ・コーポレーション | 超格子デバイス |
JPS641227A (en) * | 1987-03-23 | 1989-01-05 | Xerox Corp | Epitaxial formation of group (iv)x(iii-v)1-x alloy, method for transforming group iii-v semiconductor structure into disordered alloy, and hetero-structure and semiconductor device manufactured by them |
JPH02156628A (ja) * | 1988-12-09 | 1990-06-15 | Sony Corp | 超格子の形成方法 |
JPH05326922A (ja) * | 1992-05-18 | 1993-12-10 | Nippon Telegr & Teleph Corp <Ntt> | 半導体結晶成長方法 |
JPH06244113A (ja) * | 1993-02-16 | 1994-09-02 | Nippon Telegr & Teleph Corp <Ntt> | 半導体量子細線の製造方法 |
JPH10107376A (ja) * | 1996-09-26 | 1998-04-24 | Nec Corp | Ii−vi族化合物半導体発光素子およびその製造方法 |
JP2000244070A (ja) * | 1999-02-19 | 2000-09-08 | Sony Corp | 半導体装置および半導体発光素子 |
JP2002033513A (ja) * | 2000-07-13 | 2002-01-31 | Shiro Sakai | 発光素子 |
JP2003218469A (ja) * | 2002-01-22 | 2003-07-31 | Toshiba Corp | 窒化物系半導体レーザ装置 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4205329A (en) * | 1976-03-29 | 1980-05-27 | Bell Telephone Laboratories, Incorporated | Periodic monolayer semiconductor structures grown by molecular beam epitaxy |
US4594603A (en) * | 1982-04-22 | 1986-06-10 | Board Of Trustees Of The University Of Illinois | Semiconductor device with disordered active region |
JPS6098615A (ja) * | 1983-11-02 | 1985-06-01 | Nippon Telegr & Teleph Corp <Ntt> | 多層膜の製造方法 |
JPH0779158B2 (ja) * | 1988-11-19 | 1995-08-23 | 新技術事業団 | 結合量子箱列構造半導体 |
JP3672678B2 (ja) * | 1996-04-05 | 2005-07-20 | 富士通株式会社 | 量子半導体装置およびその製造方法 |
JP3679914B2 (ja) * | 1997-02-12 | 2005-08-03 | 株式会社東芝 | 半導体発光装置及びその製造方法 |
KR100425341B1 (ko) * | 2000-02-08 | 2004-03-31 | 삼성전기주식회사 | 질화물 반도체 발광 소자 |
JP4608731B2 (ja) | 2000-04-27 | 2011-01-12 | ソニー株式会社 | 半導体レーザの製造方法 |
US6853663B2 (en) * | 2000-06-02 | 2005-02-08 | Agilent Technologies, Inc. | Efficiency GaN-based light emitting devices |
JP2002111131A (ja) | 2000-09-28 | 2002-04-12 | Sony Corp | 半導体発光素子およびその製造方法 |
-
2003
- 2003-08-04 KR KR1020030053889A patent/KR100580623B1/ko active IP Right Grant
-
2004
- 2004-06-29 US US10/877,982 patent/US6992318B2/en active Active
- 2004-06-30 AT AT04253951T patent/ATE442669T1/de active
- 2004-06-30 EP EP04253951A patent/EP1505698B1/en active Active
- 2004-06-30 DE DE602004023038T patent/DE602004023038D1/de active Active
- 2004-07-02 CN CNB2004100621431A patent/CN100391014C/zh active Active
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Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60728A (ja) * | 1983-06-16 | 1985-01-05 | Sanyo Electric Co Ltd | 分子線エピタキシヤル成長法 |
JPS6174327A (ja) * | 1984-09-14 | 1986-04-16 | エイ・ティ・アンド・ティ・コーポレーション | 超格子デバイス |
JPS641227A (en) * | 1987-03-23 | 1989-01-05 | Xerox Corp | Epitaxial formation of group (iv)x(iii-v)1-x alloy, method for transforming group iii-v semiconductor structure into disordered alloy, and hetero-structure and semiconductor device manufactured by them |
JPH02156628A (ja) * | 1988-12-09 | 1990-06-15 | Sony Corp | 超格子の形成方法 |
JPH05326922A (ja) * | 1992-05-18 | 1993-12-10 | Nippon Telegr & Teleph Corp <Ntt> | 半導体結晶成長方法 |
JPH06244113A (ja) * | 1993-02-16 | 1994-09-02 | Nippon Telegr & Teleph Corp <Ntt> | 半導体量子細線の製造方法 |
JPH10107376A (ja) * | 1996-09-26 | 1998-04-24 | Nec Corp | Ii−vi族化合物半導体発光素子およびその製造方法 |
JP2000244070A (ja) * | 1999-02-19 | 2000-09-08 | Sony Corp | 半導体装置および半導体発光素子 |
JP2002033513A (ja) * | 2000-07-13 | 2002-01-31 | Shiro Sakai | 発光素子 |
JP2003218469A (ja) * | 2002-01-22 | 2003-07-31 | Toshiba Corp | 窒化物系半導体レーザ装置 |
Also Published As
Publication number | Publication date |
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US6992318B2 (en) | 2006-01-31 |
CN1581528A (zh) | 2005-02-16 |
KR100580623B1 (ko) | 2006-05-16 |
CN100391014C (zh) | 2008-05-28 |
EP1505698B1 (en) | 2009-09-09 |
ATE442669T1 (de) | 2009-09-15 |
KR20050017685A (ko) | 2005-02-23 |
EP1505698A2 (en) | 2005-02-09 |
DE602004023038D1 (de) | 2009-10-22 |
US20050029506A1 (en) | 2005-02-10 |
EP1505698A3 (en) | 2006-04-26 |
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