JP2004536427A5 - - Google Patents

Info

Publication number

JP2004536427A5

JP2004536427A5 JP2003506031A JP2003506031A JP2004536427A5 JP 2004536427 A5 JP2004536427 A5 JP 2004536427A5 JP 2003506031 A JP2003506031 A JP 2003506031A JP 2003506031 A JP2003506031 A JP 2003506031A JP 2004536427 A5 JP2004536427 A5 JP 2004536427A5

Authority

JP

Japan

Prior art keywords

battery cell

chromium

discharge element

cell according

surface layer

Prior art date

2002-06-10

Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Granted

Links

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• 239000002344 surface layer Substances 0.000 claims 7
• 229910052751 metal Inorganic materials 0.000 claims 6
• 239000002184 metal Substances 0.000 claims 6
• VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims 5
• 229910052804 chromium Inorganic materials 0.000 claims 5
• 239000011651 chromium Substances 0.000 claims 5
• 239000010410 layer Substances 0.000 claims 4
• 239000000463 material Substances 0.000 claims 4
• BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims 4
• 238000009792 diffusion process Methods 0.000 claims 3
• 238000000034 method Methods 0.000 claims 3
• 230000001681 protective effect Effects 0.000 claims 3
• 238000005496 tempering Methods 0.000 claims 3
• 229910000599 Cr alloy Inorganic materials 0.000 claims 2
• XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims 2
• PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims 2
• -1 and / or -Carbides Chemical class 0.000 claims 2
• 239000002131 composite material Substances 0.000 claims 2
• 230000007423 decrease Effects 0.000 claims 2
• 239000003792 electrolyte Substances 0.000 claims 2
• 229910052741 iridium Inorganic materials 0.000 claims 2
• GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims 2
• 229910052762 osmium Inorganic materials 0.000 claims 2
• SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 claims 2
• 229910052697 platinum Inorganic materials 0.000 claims 2
• 229910052702 rhenium Inorganic materials 0.000 claims 2
• WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 claims 2
• 229910052703 rhodium Inorganic materials 0.000 claims 2
• 239000010948 rhodium Substances 0.000 claims 2
• MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims 2
• 229910052715 tantalum Inorganic materials 0.000 claims 2
• GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims 2
• 229910052713 technetium Inorganic materials 0.000 claims 2
• GKLVYJBZJHMRIY-UHFFFAOYSA-N technetium atom Chemical compound [Tc] GKLVYJBZJHMRIY-UHFFFAOYSA-N 0.000 claims 2
• WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims 2
• 229910052721 tungsten Inorganic materials 0.000 claims 2
• 239000010937 tungsten Substances 0.000 claims 2
• ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims 1
• RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 1
• WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 claims 1
• 239000011149 active material Substances 0.000 claims 1
• 229910045601 alloy Inorganic materials 0.000 claims 1
• 239000000956 alloy Substances 0.000 claims 1
• 229910000423 chromium oxide Inorganic materials 0.000 claims 1
• 229910017052 cobalt Inorganic materials 0.000 claims 1
• 239000010941 cobalt Substances 0.000 claims 1
• GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims 1
• 150000001875 compounds Chemical class 0.000 claims 1
• 238000000151 deposition Methods 0.000 claims 1
• 230000008021 deposition Effects 0.000 claims 1
• 238000004070 electrodeposition Methods 0.000 claims 1
• 229910052742 iron Inorganic materials 0.000 claims 1
• WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 claims 1
• 238000004519 manufacturing process Methods 0.000 claims 1
• 150000002739 metals Chemical class 0.000 claims 1
• 229910052750 molybdenum Inorganic materials 0.000 claims 1
• 239000011733 molybdenum Substances 0.000 claims 1
• 229910052759 nickel Inorganic materials 0.000 claims 1
• 150000004767 nitrides Chemical class 0.000 claims 1
• 239000011241 protective layer Substances 0.000 claims 1
• 239000000758 substrate Substances 0.000 claims 1
• 239000010936 titanium Substances 0.000 claims 1
• 229910052719 titanium Inorganic materials 0.000 claims 1
• 229910052720 vanadium Inorganic materials 0.000 claims 1
• GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 claims 1
• 229910052845 zircon Inorganic materials 0.000 claims 1
• GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 claims 1