JP2004536171A5 - - Google Patents
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- Publication number
- JP2004536171A5 JP2004536171A5 JP2002589879A JP2002589879A JP2004536171A5 JP 2004536171 A5 JP2004536171 A5 JP 2004536171A5 JP 2002589879 A JP2002589879 A JP 2002589879A JP 2002589879 A JP2002589879 A JP 2002589879A JP 2004536171 A5 JP2004536171 A5 JP 2004536171A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- monomer units
- ether oxygen
- carbons
- copolymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 44
- 229920001577 copolymer Polymers 0.000 claims description 30
- 229920002313 fluoropolymer Polymers 0.000 claims description 30
- 239000004811 fluoropolymer Substances 0.000 claims description 30
- 239000000178 monomer Substances 0.000 claims description 28
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 26
- 229910052760 oxygen Inorganic materials 0.000 claims description 26
- 239000001301 oxygen Substances 0.000 claims description 26
- BQCIDUSAKPWEOX-UHFFFAOYSA-N 1,1-Difluoroethene Chemical compound FC(F)=C BQCIDUSAKPWEOX-UHFFFAOYSA-N 0.000 claims description 16
- 229910052739 hydrogen Inorganic materials 0.000 claims description 16
- 239000001257 hydrogen Substances 0.000 claims description 16
- 235000019000 fluorine Nutrition 0.000 claims description 12
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 12
- 125000004432 carbon atom Chemical group C* 0.000 claims description 10
- 230000005670 electromagnetic radiation Effects 0.000 claims description 10
- 229920001519 homopolymer Polymers 0.000 claims description 10
- 125000001153 fluoro group Chemical group F* 0.000 claims description 8
- 150000002431 hydrogen Chemical group 0.000 claims description 8
- 125000002733 (C1-C6) fluoroalkyl group Chemical group 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 6
- HFNSTEOEZJBXIF-UHFFFAOYSA-N 2,2,4,5-tetrafluoro-1,3-dioxole Chemical compound FC1=C(F)OC(F)(F)O1 HFNSTEOEZJBXIF-UHFFFAOYSA-N 0.000 claims description 4
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 4
- 238000002835 absorbance Methods 0.000 claims description 4
- 125000001033 ether group Chemical group 0.000 claims description 4
- 229910052731 fluorine Inorganic materials 0.000 claims description 4
- 239000011737 fluorine Substances 0.000 claims description 4
- 125000003709 fluoroalkyl group Chemical group 0.000 claims description 4
- XUCNUKMRBVNAPB-UHFFFAOYSA-N fluoroethene Chemical compound FC=C XUCNUKMRBVNAPB-UHFFFAOYSA-N 0.000 claims description 4
- 230000004927 fusion Effects 0.000 claims description 4
- 230000001747 exhibiting effect Effects 0.000 claims description 3
- 125000004429 atom Chemical group 0.000 claims description 2
- 230000003287 optical effect Effects 0.000 claims description 2
- 238000000034 method Methods 0.000 description 14
- YSYRISKCBOPJRG-UHFFFAOYSA-N 4,5-difluoro-2,2-bis(trifluoromethyl)-1,3-dioxole Chemical compound FC1=C(F)OC(C(F)(F)F)(C(F)(F)F)O1 YSYRISKCBOPJRG-UHFFFAOYSA-N 0.000 description 5
- 229920000642 polymer Polymers 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- LLXLDAGHLKXSPQ-UHFFFAOYSA-N 2-(trifluoromethyl)-1,3-dioxole Chemical compound FC(F)(F)C1OC=CO1 LLXLDAGHLKXSPQ-UHFFFAOYSA-N 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US29070801P | 2001-05-14 | 2001-05-14 | |
| PCT/US2002/018392 WO2002093261A1 (en) | 2001-05-14 | 2002-05-14 | Use of partially fluorinated polymers in applications requiring transparency in the ultraviolet and vacuum ultraviolet |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2004536171A JP2004536171A (ja) | 2004-12-02 |
| JP2004536171A5 true JP2004536171A5 (enExample) | 2006-01-05 |
Family
ID=23117205
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002589879A Pending JP2004536171A (ja) | 2001-05-14 | 2002-05-14 | 紫外線及び真空紫外線の透明性を必要とする適用での部分フッ素化ポリマーの使用 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7438995B2 (enExample) |
| EP (1) | EP1388026A1 (enExample) |
| JP (1) | JP2004536171A (enExample) |
| KR (1) | KR20040029988A (enExample) |
| WO (1) | WO2002093261A1 (enExample) |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7276624B2 (en) | 2002-05-14 | 2007-10-02 | E. I. Du Pont De Nemours And Company | Fluorosulfates of hexafluoroisobutylene and its higher homologs |
| US7022437B2 (en) | 2003-01-15 | 2006-04-04 | Asml Netherlands B.V. | Perfluoropolyether liquid pellicle and methods of cleaning masks using perfluoropolyether liquid |
| WO2005026820A1 (en) * | 2003-09-06 | 2005-03-24 | Donald Bennett Hilliard | Pellicle |
| DE602004022451D1 (de) * | 2003-12-03 | 2009-09-17 | Asahi Glass Co Ltd | Pellikel und neues fluoriertes polymer |
| DE102004030861A1 (de) * | 2004-06-25 | 2006-01-19 | Infineon Technologies Ag | Verfahren zum Strukturieren eines Halbleitersubstrats unter Verwendung einer Schutzschicht, die das Ausgasen während der Belichtung verringert oder verhindert |
| KR100625360B1 (ko) * | 2004-10-12 | 2006-09-18 | 에스케이씨 주식회사 | 광학적 특성이 개선된 폴리에스터 필름 |
| CN101090767A (zh) * | 2004-12-22 | 2007-12-19 | 纳幕尔杜邦公司 | 用于光化学反应的末端官能化全氟(烷基乙烯基醚)的官能化共聚物的反应器壁、增加烃和卤代烃的氟含量的方法和烯烃的制备 |
| WO2006069107A2 (en) | 2004-12-22 | 2006-06-29 | E.I. Dupont De Nemours And Company | Copolymers of perfluoro (alkyl venyl ether) for photochemical reactor, process for increasing fluorine content and production of olefinic compound by photochlorination |
| US7722819B2 (en) | 2005-10-11 | 2010-05-25 | Meadwestvaco Calmar, Inc. | Fragrance product, dispenser, and dispenser assembly |
| RU2428088C2 (ru) * | 2005-10-11 | 2011-09-10 | Мидвествако Корпорейшн | Парфюмерное изделие (варианты) |
| JP4747815B2 (ja) * | 2005-12-02 | 2011-08-17 | 旭硝子株式会社 | 非晶性含フッ素樹脂の製造方法 |
| CN101375183B (zh) * | 2006-01-27 | 2011-08-17 | 旭硝子株式会社 | 色差矫正透镜用含氟聚合物及色差矫正透镜 |
| WO2010101304A1 (en) | 2009-03-05 | 2010-09-10 | Daikin Industries, Ltd. | Fluoroelastomer, curable composition and cured rubber article |
| CN102822214A (zh) | 2010-03-31 | 2012-12-12 | 大金工业株式会社 | 2,3,3,3-四氟丙烯共聚物 |
| US8558152B2 (en) * | 2010-07-22 | 2013-10-15 | Raytheon Company | Lens concentrator system for semi-active laser target designation |
| CN104471479B (zh) * | 2012-08-02 | 2019-01-18 | 三井化学株式会社 | 防护膜组件 |
| CN106488964B (zh) * | 2014-07-15 | 2018-09-21 | Ａｇｃ株式会社 | 紫外线发光装置用粘接剂和紫外线发光装置 |
| WO2017054898A1 (en) * | 2015-09-29 | 2017-04-06 | Merck Patent Gmbh | A photosensitive composition and color converting film |
| WO2017195070A1 (en) * | 2016-05-09 | 2017-11-16 | 3M Innovative Properties Company | Hydrofluoroolefins and methods of using same |
| KR102417180B1 (ko) | 2017-09-29 | 2022-07-05 | 삼성전자주식회사 | Duv용 포토레지스트 조성물, 패턴 형성 방법 및 반도체 소자의 제조 방법 |
| DE102019200208A1 (de) | 2019-01-10 | 2020-07-16 | Carl Zeiss Smt Gmbh | Verfahren zum in situ dynamischen Schutz einer Oberfläche und optische Anordnung |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5948766A (ja) * | 1982-09-14 | 1984-03-21 | Mitsui Toatsu Chem Inc | フオトマスク |
| JPH01241557A (ja) | 1988-03-22 | 1989-09-26 | Bando Chem Ind Ltd | ペリクル膜 |
| US5061024C1 (en) | 1989-09-06 | 2002-02-26 | Dupont Photomasks Inc | Amorphous fluoropolymer pellicle films |
| DE69019268T2 (de) * | 1989-09-06 | 1995-11-09 | Du Pont | Nichtreflektierende Filmabdeckung. |
| JPH07295207A (ja) | 1994-04-28 | 1995-11-10 | Shin Etsu Chem Co Ltd | 高強度フッ素系膜ペリクル |
| TW337002B (en) | 1996-11-19 | 1998-07-21 | Mitsui Kagaku Kk | Pellicle |
| EP0907106A4 (en) | 1997-02-13 | 2000-04-05 | Mitsui Chemicals Inc | FILM MEMBRANE FOR ULTRAVIOLET RAYS AND FILM |
| ITMI981506A1 (it) * | 1998-06-30 | 1999-12-30 | Ausimont Spa | Manufatti di fluoropolimeri amorfi |
| US6280885B1 (en) * | 1999-08-11 | 2001-08-28 | Dupont Photomasks, Inc. | Dust cover comprising anti-reflective coating |
| EP1238309A1 (en) | 1999-11-17 | 2002-09-11 | E.I. Du Pont De Nemours And Company | Ultraviolet and vacuum ultraviolet transparent polymer compositions and their uses |
| US6548129B2 (en) * | 2000-03-15 | 2003-04-15 | Asahi Glass Company, Limited | Pellicle |
| US7129009B2 (en) * | 2002-05-14 | 2006-10-31 | E. I. Du Pont De Nemours And Company | Polymer-liquid compositions useful in ultraviolet and vacuum ultraviolet uses |
-
2002
- 2002-05-14 US US10/475,245 patent/US7438995B2/en not_active Expired - Fee Related
- 2002-05-14 WO PCT/US2002/018392 patent/WO2002093261A1/en not_active Ceased
- 2002-05-14 KR KR10-2003-7014718A patent/KR20040029988A/ko not_active Withdrawn
- 2002-05-14 EP EP02749576A patent/EP1388026A1/en not_active Withdrawn
- 2002-05-14 JP JP2002589879A patent/JP2004536171A/ja active Pending
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