JP2004534361A - フルカラーディスプレイパネルの製造方法 - Google Patents

フルカラーディスプレイパネルの製造方法 Download PDF

Info

Publication number
JP2004534361A
JP2004534361A JP2003507892A JP2003507892A JP2004534361A JP 2004534361 A JP2004534361 A JP 2004534361A JP 2003507892 A JP2003507892 A JP 2003507892A JP 2003507892 A JP2003507892 A JP 2003507892A JP 2004534361 A JP2004534361 A JP 2004534361A
Authority
JP
Japan
Prior art keywords
mask
pixel
red
pixels
green
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003507892A
Other languages
English (en)
Japanese (ja)
Other versions
JP2004534361A5 (enExample
Inventor
エー． ハース，マイケル
エフ． ボード，ポール
シー． ウィリアムズ，ロバート
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of JP2004534361A publication Critical patent/JP2004534361A/ja
Publication of JP2004534361A5 publication Critical patent/JP2004534361A5/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/225—Oblique incidence of vaporised material on substrate
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/30—Devices specially adapted for multicolour light emission
    • H10K59/35—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/30—Doping active layers, e.g. electron transporting layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
    • H10K50/125—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers specially adapted for multicolour light emission, e.g. for emitting white light
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/122—Pixel-defining structures or layers, e.g. banks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/17—Passive-matrix OLED displays
    • H10K59/173—Passive-matrix OLED displays comprising banks or shadow masks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
JP2003507892A 2001-06-21 2002-04-05 フルカラーディスプレイパネルの製造方法 Pending JP2004534361A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/886,447 US6791258B2 (en) 2001-06-21 2001-06-21 Organic light emitting full color display panel
PCT/US2002/010591 WO2003001598A1 (en) 2001-06-21 2002-04-05 Method of making full color display panels

Publications (2)

Publication Number Publication Date
JP2004534361A true JP2004534361A (ja) 2004-11-11
JP2004534361A5 JP2004534361A5 (enExample) 2005-12-22

Family

ID=25389063

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003507892A Pending JP2004534361A (ja) 2001-06-21 2002-04-05 フルカラーディスプレイパネルの製造方法

Country Status (5)

Country Link
US (3) US6791258B2 (enExample)
EP (2) EP1768184A3 (enExample)
JP (1) JP2004534361A (enExample)
DE (1) DE60217489T2 (enExample)
WO (1) WO2003001598A1 (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007234345A (ja) * 2006-02-28 2007-09-13 Kyocera Corp 有機ｅｌディスプレイ、有機ｅｌディスプレイの製造方法およびマスク
KR101355413B1 (ko) * 2006-04-06 2014-01-24 소니 주식회사 적색 유기 발광소자 및 이것을 구비한 표시장치, 도너 기판및 이것을 사용한 전사 방법, 표시장치의 제조 방법, 및 표시장치의 제조 시스템
JP2016186937A (ja) * 2012-04-24 2016-10-27 三星ディスプレイ株式會社Ｓａｍｓｕｎｇ Ｄｉｓｐｌａｙ Ｃｏ．，Ｌｔｄ． 有機電界発光表示装置の製造方法
KR20180077718A (ko) * 2016-12-29 2018-07-09 엘지디스플레이 주식회사 전계 발광 표시 장치

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1357602A1 (de) * 2002-03-19 2003-10-29 Scheuten Glasgroep Selbstjustierende Serienverschaltung von Dünnschichten und Verfahren zur Herstellung
EP1493797B1 (en) * 2002-03-29 2012-11-14 Pioneer Corporation Organic electroluminescence element
US6667215B2 (en) 2002-05-02 2003-12-23 3M Innovative Properties Method of making transistors
US6943066B2 (en) * 2002-06-05 2005-09-13 Advantech Global, Ltd Active matrix backplane for controlling controlled elements and method of manufacture thereof
CN1310270C (zh) * 2003-03-26 2007-04-11 清华大学 一种场发射显示器的制备方法
US20050023974A1 (en) * 2003-08-01 2005-02-03 Universal Display Corporation Protected organic electronic devices and methods for making the same
EP1697916A2 (en) * 2003-12-16 2006-09-06 Koninklijke Philips Electronics N.V. A display panel comprising a plurality of pixels and a display device
US7126267B2 (en) * 2004-05-28 2006-10-24 Eastman Kodak Company Tandem OLED having stable intermediate connectors
US20060081184A1 (en) * 2004-10-19 2006-04-20 Yeh Te L Evaporation mask with high precision deposition pattern
US7358538B2 (en) * 2004-10-28 2008-04-15 Zheng-Hong Lu Organic light-emitting devices with multiple hole injection layers containing fullerene
US7271111B2 (en) * 2005-06-08 2007-09-18 Advantech Global, Ltd Shadow mask deposition of materials using reconfigurable shadow masks
US7532181B2 (en) * 2005-07-20 2009-05-12 Eastman Kodak Company Visible and invisible image display
JP2007257897A (ja) * 2006-03-20 2007-10-04 Seiko Epson Corp 発光素子の製造方法、発光装置の製造方法および電子機器の製造方法
JP2007266160A (ja) * 2006-03-28 2007-10-11 Canon Inc 有機発光素子アレイ
TWI303499B (en) * 2006-05-30 2008-11-21 Au Optronics Corp Full-color organic electroluminescence panel and method of fabricating the same
US20080117362A1 (en) * 2006-11-21 2008-05-22 3M Innovative Properties Company Organic Light Emitting Diode Devices With Optical Microstructures
KR100796620B1 (ko) 2007-01-10 2008-01-22 삼성에스디아이 주식회사 유기전계발광표시장치 및 그의 제조 방법
TWI343648B (en) * 2007-04-19 2011-06-11 Au Optronics Corp Organic electroluminescent structure and method of making the same
KR100994118B1 (ko) * 2009-01-13 2010-11-15 삼성모바일디스플레이주식회사 유기 발광 소자 및 그 제조 방법
TW201123957A (en) * 2009-12-17 2011-07-01 Au Optronics Corp Light-emitting apparatus, pixel structure, contact structure and method for fabricting the same
KR101193186B1 (ko) * 2010-02-01 2012-10-19 삼성디스플레이 주식회사 박막 증착 장치, 이를 이용한 유기 발광 디스플레이 장치의 제조방법 및 이에 따라 제조된 유기 발광 디스플레이 장치
US10270058B2 (en) * 2012-03-30 2019-04-23 Nec Lighting, Ltd. Organic electroluminescent illumination panel, manufacturing method thereof, and organic electroluminescent illumination device
KR101950836B1 (ko) * 2012-05-22 2019-02-22 엘지디스플레이 주식회사 유기 발광 소자 및 그의 제조 방법
DE102013110037B4 (de) 2013-09-12 2018-05-09 Osram Oled Gmbh Verfahren zum Herstellen eines optoelektronischen Bauelementes
KR20150031819A (ko) * 2013-09-17 2015-03-25 삼성디스플레이 주식회사 박막 증착방법 및 그를 이용한 유기전계발광 표시장치의 제조방법
KR102283853B1 (ko) * 2013-12-24 2021-07-29 엘지디스플레이 주식회사 유기발광표시장치 및 그 제조방법
KR102501705B1 (ko) * 2017-03-24 2023-02-21 삼성디스플레이 주식회사 투명 표시 패널 및 이를 포함하는 표시 장치
US12037678B2 (en) * 2019-11-12 2024-07-16 Chengdu Boe Optoelectronics Technology Co., Ltd. Mask

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5294869A (en) 1991-12-30 1994-03-15 Eastman Kodak Company Organic electroluminescent multicolor image display device
US5294870A (en) 1991-12-30 1994-03-15 Eastman Kodak Company Organic electroluminescent multicolor image display device
DE4241045C1 (de) * 1992-12-05 1994-05-26 Bosch Gmbh Robert Verfahren zum anisotropen Ätzen von Silicium
JP3451680B2 (ja) * 1993-11-15 2003-09-29 三菱化学株式会社 有機電界発光素子
FR2730240A1 (fr) * 1995-02-07 1996-08-09 Atochem Elf Sa Stabilisation d'un polymere par un radical libre stable
US5641611A (en) * 1995-08-21 1997-06-24 Motorola Method of fabricating organic LED matrices
KR980005265A (ko) * 1996-06-06 1998-03-30 빈센트 비. 인그라시아 정공수송층으로 부터 방출되는 유기 전자발광장치
US6037712A (en) 1996-06-10 2000-03-14 Tdk Corporation Organic electroluminescence display device and producing method thereof
JP2833605B2 (ja) * 1997-02-07 1998-12-09 日本電気株式会社 発光ディスプレイの製造方法
JP3760556B2 (ja) * 1997-04-07 2006-03-29 三菱化学株式会社 有機電界発光素子
JPH10319870A (ja) 1997-05-15 1998-12-04 Nec Corp シャドウマスク及びこれを用いたカラー薄膜ｅｌ表示装置の製造方法
JP3206646B2 (ja) * 1998-01-22 2001-09-10 日本電気株式会社 多色発光有機ｅｌパネルおよびその製造方法
GB9817745D0 (en) 1998-08-15 1998-10-14 Philips Electronics Nv Manufacture of electronic devices comprising thin-film circuit elements
JP2000132762A (ja) 1998-10-27 2000-05-12 Matsushita Electric Works Ltd 受光量表示ユニット付き光電式分離型感知器及び波形確認端子ユニット付き光電式分離型感知器
US6384529B2 (en) 1998-11-18 2002-05-07 Eastman Kodak Company Full color active matrix organic electroluminescent display panel having an integrated shadow mask
JP3641963B2 (ja) * 1999-02-15 2005-04-27 双葉電子工業株式会社 有機ｅｌ素子とその製造方法
US6310360B1 (en) * 1999-07-21 2001-10-30 The Trustees Of Princeton University Intersystem crossing agents for efficient utilization of excitons in organic light emitting devices
WO2001080319A2 (en) * 2000-04-14 2001-10-25 Emagin Corporation Improved method of fabrication of color changing medium layers in organic light emitting devices resulting in improved light extraction
JP4053209B2 (ja) 2000-05-01 2008-02-27 三星エスディアイ株式会社 有機ｅｌディスプレイの製造方法
US6244448B1 (en) * 2000-05-03 2001-06-12 Enzo Hang Bathroom bracket free of installation
TW451601B (en) * 2000-08-07 2001-08-21 Ind Tech Res Inst The fabrication method of full color organic electroluminescent device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007234345A (ja) * 2006-02-28 2007-09-13 Kyocera Corp 有機ｅｌディスプレイ、有機ｅｌディスプレイの製造方法およびマスク
KR101355413B1 (ko) * 2006-04-06 2014-01-24 소니 주식회사 적색 유기 발광소자 및 이것을 구비한 표시장치, 도너 기판및 이것을 사용한 전사 방법, 표시장치의 제조 방법, 및 표시장치의 제조 시스템
JP2016186937A (ja) * 2012-04-24 2016-10-27 三星ディスプレイ株式會社Ｓａｍｓｕｎｇ Ｄｉｓｐｌａｙ Ｃｏ．，Ｌｔｄ． 有機電界発光表示装置の製造方法
KR20180077718A (ko) * 2016-12-29 2018-07-09 엘지디스플레이 주식회사 전계 발광 표시 장치
KR102862449B1 (ko) * 2016-12-29 2025-09-18 엘지디스플레이 주식회사 전계 발광 표시 장치

Also Published As

Publication number Publication date
WO2003001598A1 (en) 2003-01-03
EP1768184A2 (en) 2007-03-28
EP1768184A3 (en) 2008-04-30
DE60217489D1 (de) 2007-02-22
US20050208205A1 (en) 2005-09-22
EP1399967B1 (en) 2007-01-10
US6965198B2 (en) 2005-11-15
EP1399967A1 (en) 2004-03-24
US20020195929A1 (en) 2002-12-26
DE60217489T2 (de) 2007-10-11
US6791258B2 (en) 2004-09-14
US20040217699A1 (en) 2004-11-04

Similar Documents

Publication Publication Date Title
US6965198B2 (en) Organic light emitting full color display panel
US6517996B1 (en) Method of manufacturing full-color organic electro-luminescent device
US9530962B2 (en) Patterning method for OLEDs
EP1758170B1 (en) Organic light emitting display and method for fabricating the same
US6099746A (en) Organic electroluminescent device and method for fabricating the same
US6403392B1 (en) Method for patterning devices
US20060125382A1 (en) Highly efficient organic electroluminescent device
KR100944861B1 (ko) 유기 일렉트로 루미네센스 표시 장치 및 그 제조 방법
CN1239395A (zh) 制造有机场致发光显示板的方法
JP3641963B2 (ja) 有機ｅｌ素子とその製造方法
WO2012099011A1 (ja) 被成膜基板、製造方法、および有機ｅｌ表示装置
WO2012099019A1 (ja) 被成膜基板、有機ｅｌ表示装置および蒸着方法
US20030012981A1 (en) Method of manufacturing electroluminescence display apparatus
KR100573110B1 (ko) 유기 전계 발광 소자와, 이를 이용한 평판 표시 장치와,이를 제조하기 위한 방법
KR100269390B1 (ko) 유기전계발광 디스플레이 패널 및 그 제조방법
JP4309099B2 (ja) 有機電子発光素子用メタルマスク及びこれを利用した有機電子発光素子の製造方法
TWI915464B (zh) 形成電致發光裝置的方法與設備
TW202533759A (zh) 有機發光顯示裝置
JP2008234896A (ja) 有機エレクトロルミネッセンス装置の製造方法
KR20040076334A (ko) 다중 새도우 마스크를 사용한 유기 전계발광소자의 제조방법
JP2004152572A (ja) 有機エレクトロルミネッセンス素子の製造方法
JPH11251058A (ja) 有機電界発光素子の製造方法と製造装置
JP2007242322A (ja) 有機エレクトロルミネッセンスパネルの製造方法及び有機エレクトロルミネッセンスパネル

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20050404

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20050404

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20080415

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20080930