DE60217489T2 - Verfahren zur herstellung von vollfarbenen anzeigetafeln - Google Patents

Verfahren zur herstellung von vollfarbenen anzeigetafeln Download PDF

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Publication number
DE60217489T2
DE60217489T2 DE60217489T DE60217489T DE60217489T2 DE 60217489 T2 DE60217489 T2 DE 60217489T2 DE 60217489 T DE60217489 T DE 60217489T DE 60217489 T DE60217489 T DE 60217489T DE 60217489 T2 DE60217489 T2 DE 60217489T2
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DE
Germany
Prior art keywords
mask
pixels
ribs
distance
pixel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60217489T
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German (de)
English (en)
Other versions
DE60217489D1 (de
Inventor
A. Michael Saint Paul HAASE
F. Paul Saint Paul BAUDE
C. Robert Saint Paul WILLIAMS
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
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3M Innovative Properties Co
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Publication date
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Publication of DE60217489D1 publication Critical patent/DE60217489D1/de
Application granted granted Critical
Publication of DE60217489T2 publication Critical patent/DE60217489T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/225—Oblique incidence of vaporised material on substrate
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/30—Devices specially adapted for multicolour light emission
    • H10K59/35—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/30—Doping active layers, e.g. electron transporting layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
    • H10K50/125—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers specially adapted for multicolour light emission, e.g. for emitting white light
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/122—Pixel-defining structures or layers, e.g. banks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/17—Passive-matrix OLED displays
    • H10K59/173—Passive-matrix OLED displays comprising banks or shadow masks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
DE60217489T 2001-06-21 2002-04-05 Verfahren zur herstellung von vollfarbenen anzeigetafeln Expired - Fee Related DE60217489T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/886,447 US6791258B2 (en) 2001-06-21 2001-06-21 Organic light emitting full color display panel
US886447 2001-06-21
PCT/US2002/010591 WO2003001598A1 (en) 2001-06-21 2002-04-05 Method of making full color display panels

Publications (2)

Publication Number Publication Date
DE60217489D1 DE60217489D1 (de) 2007-02-22
DE60217489T2 true DE60217489T2 (de) 2007-10-11

Family

ID=25389063

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60217489T Expired - Fee Related DE60217489T2 (de) 2001-06-21 2002-04-05 Verfahren zur herstellung von vollfarbenen anzeigetafeln

Country Status (5)

Country Link
US (3) US6791258B2 (enExample)
EP (2) EP1768184A3 (enExample)
JP (1) JP2004534361A (enExample)
DE (1) DE60217489T2 (enExample)
WO (1) WO2003001598A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102013110037A1 (de) * 2013-09-12 2015-03-12 Osram Oled Gmbh Verfahren zum Herstellen eines Bauelementes

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EP1357602A1 (de) * 2002-03-19 2003-10-29 Scheuten Glasgroep Selbstjustierende Serienverschaltung von Dünnschichten und Verfahren zur Herstellung
EP1493797B1 (en) * 2002-03-29 2012-11-14 Pioneer Corporation Organic electroluminescence element
US6667215B2 (en) 2002-05-02 2003-12-23 3M Innovative Properties Method of making transistors
US6943066B2 (en) * 2002-06-05 2005-09-13 Advantech Global, Ltd Active matrix backplane for controlling controlled elements and method of manufacture thereof
CN1310270C (zh) * 2003-03-26 2007-04-11 清华大学 一种场发射显示器的制备方法
US20050023974A1 (en) * 2003-08-01 2005-02-03 Universal Display Corporation Protected organic electronic devices and methods for making the same
EP1697916A2 (en) * 2003-12-16 2006-09-06 Koninklijke Philips Electronics N.V. A display panel comprising a plurality of pixels and a display device
US7126267B2 (en) * 2004-05-28 2006-10-24 Eastman Kodak Company Tandem OLED having stable intermediate connectors
US20060081184A1 (en) * 2004-10-19 2006-04-20 Yeh Te L Evaporation mask with high precision deposition pattern
US7358538B2 (en) * 2004-10-28 2008-04-15 Zheng-Hong Lu Organic light-emitting devices with multiple hole injection layers containing fullerene
US7271111B2 (en) * 2005-06-08 2007-09-18 Advantech Global, Ltd Shadow mask deposition of materials using reconfigurable shadow masks
US7532181B2 (en) * 2005-07-20 2009-05-12 Eastman Kodak Company Visible and invisible image display
JP4777796B2 (ja) * 2006-02-28 2011-09-21 京セラ株式会社 有機ｅｌディスプレイの製造方法
JP2007257897A (ja) * 2006-03-20 2007-10-04 Seiko Epson Corp 発光素子の製造方法、発光装置の製造方法および電子機器の製造方法
JP2007266160A (ja) * 2006-03-28 2007-10-11 Canon Inc 有機発光素子アレイ
JP5013048B2 (ja) * 2006-04-06 2012-08-29 ソニー株式会社 赤色有機発光素子およびこれを備えた表示装置
TWI303499B (en) * 2006-05-30 2008-11-21 Au Optronics Corp Full-color organic electroluminescence panel and method of fabricating the same
US20080117362A1 (en) * 2006-11-21 2008-05-22 3M Innovative Properties Company Organic Light Emitting Diode Devices With Optical Microstructures
KR100796620B1 (ko) 2007-01-10 2008-01-22 삼성에스디아이 주식회사 유기전계발광표시장치 및 그의 제조 방법
TWI343648B (en) * 2007-04-19 2011-06-11 Au Optronics Corp Organic electroluminescent structure and method of making the same
KR100994118B1 (ko) * 2009-01-13 2010-11-15 삼성모바일디스플레이주식회사 유기 발광 소자 및 그 제조 방법
TW201123957A (en) * 2009-12-17 2011-07-01 Au Optronics Corp Light-emitting apparatus, pixel structure, contact structure and method for fabricting the same
KR101193186B1 (ko) * 2010-02-01 2012-10-19 삼성디스플레이 주식회사 박막 증착 장치, 이를 이용한 유기 발광 디스플레이 장치의 제조방법 및 이에 따라 제조된 유기 발광 디스플레이 장치
US10270058B2 (en) * 2012-03-30 2019-04-23 Nec Lighting, Ltd. Organic electroluminescent illumination panel, manufacturing method thereof, and organic electroluminescent illumination device
KR101975020B1 (ko) * 2012-04-24 2019-05-07 삼성디스플레이 주식회사 유기 발광 표시 장치 및 그 제조 방법
KR101950836B1 (ko) * 2012-05-22 2019-02-22 엘지디스플레이 주식회사 유기 발광 소자 및 그의 제조 방법
KR20150031819A (ko) * 2013-09-17 2015-03-25 삼성디스플레이 주식회사 박막 증착방법 및 그를 이용한 유기전계발광 표시장치의 제조방법
KR102283853B1 (ko) * 2013-12-24 2021-07-29 엘지디스플레이 주식회사 유기발광표시장치 및 그 제조방법
KR102862449B1 (ko) * 2016-12-29 2025-09-18 엘지디스플레이 주식회사 전계 발광 표시 장치
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102013110037A1 (de) * 2013-09-12 2015-03-12 Osram Oled Gmbh Verfahren zum Herstellen eines Bauelementes
US9685638B2 (en) 2013-09-12 2017-06-20 ORAM OLED GmbH Method for producing a component
DE102013110037B4 (de) * 2013-09-12 2018-05-09 Osram Oled Gmbh Verfahren zum Herstellen eines optoelektronischen Bauelementes

Also Published As

Publication number Publication date
WO2003001598A1 (en) 2003-01-03
EP1768184A2 (en) 2007-03-28
EP1768184A3 (en) 2008-04-30
DE60217489D1 (de) 2007-02-22
US20050208205A1 (en) 2005-09-22
EP1399967B1 (en) 2007-01-10
US6965198B2 (en) 2005-11-15
EP1399967A1 (en) 2004-03-24
US20020195929A1 (en) 2002-12-26
US6791258B2 (en) 2004-09-14
JP2004534361A (ja) 2004-11-11
US20040217699A1 (en) 2004-11-04

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