JP2004532176A - 極紫外線リソグラフィー用基板の製造方法 - Google Patents

極紫外線リソグラフィー用基板の製造方法 Download PDF

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Publication number
JP2004532176A
JP2004532176A JP2002585342A JP2002585342A JP2004532176A JP 2004532176 A JP2004532176 A JP 2004532176A JP 2002585342 A JP2002585342 A JP 2002585342A JP 2002585342 A JP2002585342 A JP 2002585342A JP 2004532176 A JP2004532176 A JP 2004532176A
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JP
Japan
Prior art keywords
porous preform
planar surface
flat
silica
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002585342A
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English (en)
Japanese (ja)
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JP2004532176A5 (enExample
Inventor
イー アーディナ，ケネス
ジェイ ルッソ，ニッキ
エイチ ウォシルースキー，マイケル
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Corning Inc
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Corning Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Corning Inc filed Critical Corning Inc
Publication of JP2004532176A publication Critical patent/JP2004532176A/ja
Publication of JP2004532176A5 publication Critical patent/JP2004532176A5/ja
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1407—Deposition reactors therefor
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1484—Means for supporting, rotating or translating the article being formed
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/02—Pure silica glass, e.g. pure fused quartz
    • C03B2201/03—Impurity concentration specified
    • C03B2201/04—Hydroxyl ion (OH)
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/07—Impurity concentration specified
    • C03B2201/075—Hydroxyl ion (OH)
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03B2201/42—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn doped with titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
    • C03B2207/32—Non-halide

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Organic Chemistry (AREA)
  • Thermal Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Glass Compositions (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2002585342A 2001-04-27 2002-03-25 極紫外線リソグラフィー用基板の製造方法 Pending JP2004532176A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/844,081 US6606883B2 (en) 2001-04-27 2001-04-27 Method for producing fused silica and doped fused silica glass
PCT/US2002/009189 WO2002088035A1 (en) 2001-04-27 2002-03-25 Method for producing extreme ultraviolet lithography substrates

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2009011710A Division JP2009091246A (ja) 2001-04-27 2009-01-22 極紫外線リソグラフィー用基板の製造方法

Publications (2)

Publication Number Publication Date
JP2004532176A true JP2004532176A (ja) 2004-10-21
JP2004532176A5 JP2004532176A5 (enExample) 2005-12-22

Family

ID=25291758

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2002585342A Pending JP2004532176A (ja) 2001-04-27 2002-03-25 極紫外線リソグラフィー用基板の製造方法
JP2009011710A Abandoned JP2009091246A (ja) 2001-04-27 2009-01-22 極紫外線リソグラフィー用基板の製造方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2009011710A Abandoned JP2009091246A (ja) 2001-04-27 2009-01-22 極紫外線リソグラフィー用基板の製造方法

Country Status (5)

Country Link
US (1) US6606883B2 (enExample)
JP (2) JP2004532176A (enExample)
DE (1) DE10296723T5 (enExample)
TW (1) TWI276612B (enExample)
WO (1) WO2002088035A1 (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006103988A (ja) * 2004-10-01 2006-04-20 Asahi Glass Co Ltd ＴｉＯ２を含有するシリカガラスの製造方法
JP2007161573A (ja) * 2005-12-14 2007-06-28 Corning Inc 溶融シリカを製造するための方法および装置
JP2012033934A (ja) * 2010-07-29 2012-02-16 Corning Inc 高反射性硬化シリカ−チタニア物品およびその製造方法
JP2017505750A (ja) * 2014-01-31 2017-02-23 コーニング インコーポレイテッド 組成変化によるＴｚｃ勾配を有する低膨張シリカ−チタニア物品

Families Citing this family (40)

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US8047023B2 (en) * 2001-04-27 2011-11-01 Corning Incorporated Method for producing titania-doped fused silica glass
US20040194511A1 (en) * 2002-02-01 2004-10-07 Chih-Hsing Cheng Sol-gel-derived halogen-doped glass
US20030147606A1 (en) * 2002-02-01 2003-08-07 Shiho Wang Sol-gel-based optical preforms and methods of manufacture
US7053017B2 (en) * 2002-03-05 2006-05-30 Corning Incorporated Reduced striae extreme ultraviolet elements
US20030226377A1 (en) * 2002-03-05 2003-12-11 Barrett W. Tim Method of making silica-titania extreme ultraviolet elements
JP2011168485A (ja) * 2003-04-03 2011-09-01 Asahi Glass Co Ltd ＴｉＯ２を含有するシリカガラスおよびその製造法
JP4792705B2 (ja) * 2003-04-03 2011-10-12 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびその製造法
JP5402975B2 (ja) * 2003-04-03 2014-01-29 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびその製造法
DE10359102A1 (de) * 2003-12-17 2005-07-21 Carl Zeiss Smt Ag Optische Komponente umfassend ein Material mit einer vorbestimmten Homogenität der thermischen Längsausdehnung
US20050144986A1 (en) * 2003-12-30 2005-07-07 Bookbinder Dana C. Method of making an optical fiber preform
US7534733B2 (en) 2004-02-23 2009-05-19 Corning Incorporated Synthetic silica glass optical material having high resistance to laser induced damage
EP1752991B1 (en) * 2004-04-21 2012-11-21 Nuclear Fuel Industries, Ltd. Apparatus for manufacturing coated fuel particle for high temperature gas-cooled reactor
JP4957249B2 (ja) * 2004-07-01 2012-06-20 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびその製造方法
US8088440B2 (en) * 2004-11-24 2012-01-03 Guardian Industries Corp. Hydrophobic coating including underlayer(s) deposited via flame pyrolysis
US7506521B2 (en) * 2004-12-29 2009-03-24 Corning Incorporated High transmission synthetic silica glass and method of making same
US20060179879A1 (en) * 2004-12-29 2006-08-17 Ellison Adam J G Adjusting expansivity in doped silica glasses
US20060162382A1 (en) * 2004-12-30 2006-07-27 Hrdina Kenneth E Method and apparatus for producing oxide particles via flame
JP5066784B2 (ja) * 2005-02-04 2012-11-07 旭硝子株式会社 合成石英ガラスの製造方法
US7635658B2 (en) * 2005-11-07 2009-12-22 Corning Inc Deuteroxyl-doped silica glass, optical member and lithographic system comprising same and method of making same
US20080125014A1 (en) * 2006-11-29 2008-05-29 William Rogers Rosch Sub-aperture deterministric finishing of high aspect ratio glass products
US20080268201A1 (en) * 2007-04-27 2008-10-30 Richard Michael Fiacco Low OH glass for infrared applications
TW201000691A (en) * 2008-02-29 2010-01-01 Corning Inc Methods of making an unsupported article of pure or doped semiconducting material
US8062733B2 (en) * 2009-05-15 2011-11-22 Corning Incorporated Roll-to-roll glass material attributes and fingerprint
US8181485B2 (en) 2009-06-19 2012-05-22 Corning Incorporated Roll-to-roll glass soot sheet sintering method and apparatus
US8359884B2 (en) 2009-07-17 2013-01-29 Corning Incorporated Roll-to-roll glass: touch-free process and multilayer approach
US8328417B2 (en) * 2009-08-20 2012-12-11 Corning Incorporated Photoelastic method for absolute determination of zero CTE crossover in low expansion silica-titania glass samples
GB2478307A (en) * 2010-03-02 2011-09-07 Heraeus Quartz Uk Ltd Manufacture of silica glass
US8438876B2 (en) * 2010-03-29 2013-05-14 Corning Incorporated Method and apparatus for removing glass soot sheet from substrate
US9321669B2 (en) 2011-08-23 2016-04-26 Corning Incorporated Thin glass sheet with tunable coefficient of thermal expansion
DE102011121153B3 (de) * 2011-12-15 2013-03-21 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von synthetischem Quarzglas sowie Quarzglas für den Einsatz als Mantelmaterial einer optischen Faser
US9199870B2 (en) 2012-05-22 2015-12-01 Corning Incorporated Electrostatic method and apparatus to form low-particulate defect thin glass sheets
US9452946B2 (en) 2013-10-18 2016-09-27 Corning Incorporated Locally-sintered porous soot parts and methods of forming
DE102013112396B3 (de) * 2013-11-12 2014-11-13 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung eines Rohlings aus Titan- und Fluor-dotiertem, hochkieselsäurehaltigem Glas
EP3209615A4 (en) 2014-10-20 2018-07-04 Navus Automation, Inc. Fused silica furnace system&method for continuous production of fused silica
US10570048B2 (en) * 2015-02-13 2020-02-25 Corning Incorporated Silica-containing sheet and related system and methods
US10185084B2 (en) 2016-02-23 2019-01-22 Corning Incorporated Layered glass structures
JP2018531863A (ja) * 2015-08-21 2018-11-01 コーニング インコーポレイテッド 層状ガラス構造
US9422187B1 (en) 2015-08-21 2016-08-23 Corning Incorporated Laser sintering system and method for forming high purity, low roughness silica glass
DE102016012003A1 (de) 2016-10-06 2018-04-12 Karlsruher Institut für Technologie Zusammensetzung und Verfahren zur Herstellung eines Formkörpers aus hochreinem, transparentem Quarzglas mittels additiver Fertigung
WO2020028169A1 (en) * 2018-08-02 2020-02-06 Corning Incorporated Methods of capturing soot

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JPS6037063B2 (ja) * 1982-11-19 1985-08-23 古河電気工業株式会社 無水プリフオ−ムロツドの製造方法
JPH03131544A (ja) 1989-06-29 1991-06-05 Sumitomo Electric Ind Ltd 光ファイバ用ガラス母材の加熱炉および製法
US5152819A (en) * 1990-08-16 1992-10-06 Corning Incorporated Method of making fused silica
US5043002A (en) * 1990-08-16 1991-08-27 Corning Incorporated Method of making fused silica by decomposing siloxanes
KR100298167B1 (ko) 1994-07-07 2001-10-24 오노 시게오 진공자외선파장대광선용실리카유리의제조방법,및그에의해제조된실리카유리및광학부재
US5599371A (en) * 1994-12-30 1997-02-04 Corning Incorporated Method of using precision burners for oxidizing halide-free, silicon-containing compounds
WO1997010184A1 (en) * 1995-09-12 1997-03-20 Corning Incorporated Boule oscillation patterns for producing fused silica glass
CA2274478A1 (en) 1996-12-16 1998-06-25 Corning Incorporated Organometallics for lightwave optical circuit applications
JP3893816B2 (ja) 1998-10-28 2007-03-14 旭硝子株式会社 合成石英ガラスおよびその製造方法
US6265115B1 (en) 1999-03-15 2001-07-24 Corning Incorporated Projection lithography photomask blanks, preforms and methods of making
USRE41220E1 (en) 1999-07-22 2010-04-13 Corning Incorporated Extreme ultraviolet soft x-ray projection lithographic method system and lithographic elements
US6328807B1 (en) * 1999-12-14 2001-12-11 Corning Incorporated Chuck heater for improved planar deposition process
WO2002014230A1 (en) 2000-08-15 2002-02-21 Corning Incorporated Flame hydrolysis deposition process for making integrated optical components

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006103988A (ja) * 2004-10-01 2006-04-20 Asahi Glass Co Ltd ＴｉＯ２を含有するシリカガラスの製造方法
JP2007161573A (ja) * 2005-12-14 2007-06-28 Corning Inc 溶融シリカを製造するための方法および装置
JP2012033934A (ja) * 2010-07-29 2012-02-16 Corning Inc 高反射性硬化シリカ−チタニア物品およびその製造方法
JP2017505750A (ja) * 2014-01-31 2017-02-23 コーニング インコーポレイテッド 組成変化によるＴｚｃ勾配を有する低膨張シリカ−チタニア物品

Also Published As

Publication number Publication date
JP2009091246A (ja) 2009-04-30
TWI276612B (en) 2007-03-21
WO2002088035A1 (en) 2002-11-07
US20020157420A1 (en) 2002-10-31
DE10296723T5 (de) 2004-04-29
US6606883B2 (en) 2003-08-19

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