JP2012046407A - 低膨張性かつ高透過性のチタニア・ドープ・シリカガラス - Google Patents
低膨張性かつ高透過性のチタニア・ドープ・シリカガラス Download PDFInfo
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims description 28
- 230000005540 biological transmission Effects 0.000 title abstract description 14
- 239000011521 glass Substances 0.000 claims abstract description 116
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 74
- 230000003287 optical effect Effects 0.000 claims abstract description 9
- 230000035699 permeability Effects 0.000 claims description 13
- 239000000377 silicon dioxide Substances 0.000 claims description 12
- 229910052739 hydrogen Inorganic materials 0.000 claims description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 5
- 239000001257 hydrogen Substances 0.000 claims description 5
- 238000002834 transmittance Methods 0.000 claims 6
- 238000000137 annealing Methods 0.000 abstract description 33
- 230000008859 change Effects 0.000 abstract description 7
- 239000002243 precursor Substances 0.000 description 14
- 238000000034 method Methods 0.000 description 13
- 230000006872 improvement Effects 0.000 description 11
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- 238000000151 deposition Methods 0.000 description 7
- 230000008021 deposition Effects 0.000 description 6
- 229910010413 TiO 2 Inorganic materials 0.000 description 5
- 238000001900 extreme ultraviolet lithography Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 239000004071 soot Substances 0.000 description 5
- 239000012159 carrier gas Substances 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 239000005350 fused silica glass Substances 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- -1 N 2 Substances 0.000 description 2
- 239000003570 air Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000446 fuel Substances 0.000 description 2
- 239000003517 fume Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000006096 absorbing agent Substances 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 239000012080 ambient air Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000006063 cullet Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000001393 microlithography Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical group C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1407—Deposition reactors therefor
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1415—Reactant delivery systems
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/0071—Compositions for glass with special properties for laserable glass
-
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- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/0085—Compositions for glass with special properties for UV-transmitting glass
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/60—Substrates
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
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- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/21—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with molecular hydrogen
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/23—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
- C03B2201/42—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn doped with titanium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
- C03C2201/21—Doped silica-based glasses containing non-metals other than boron or halide containing molecular hydrogen
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
- C03C2201/23—Doped silica-based glasses containing non-metals other than boron or halide containing hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/30—Doped silica-based glasses containing metals
- C03C2201/40—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
- C03C2201/42—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn containing titanium
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- C03—GLASS; MINERAL OR SLAG WOOL
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- C03C2203/00—Production processes
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- C03C2203/00—Production processes
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- C03C2203/52—Heat-treatment
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- Preparing Plates And Mask In Photomechanical Process (AREA)
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Abstract
焼きなまし速度の変化を通じて、透過特性の改善とCTEの絶対値の調整の両方を同時に生じる、CTEの絶対値を調整する手段。
【解決手段】
1つの実施の形態では、本開示は、340nm〜840nmの波長において>90%/cm、340nm〜840nmの波長において>93%/cm、または、340nm〜840nmの波長において>95%/cmの内部透過性を有するシリカ・チタニアガラスを対象とする。別の実施の形態では、本開示は、ガラスでできた光学系部材の全般的な透過性が、340nm〜840nmの波長において>84%、340nm〜840nmの波長において>86%、または330nm〜840nmの波長において>88%である、シリカ・チタニアガラスを対象とする。さらなる実施の形態では、シリカ・チタニアガラスは、3重量ppm未満のTi+3濃度レベルを有する。
【選択図】図3
Description
(1)温度を、50℃/時間の速度で25℃から990℃まで上昇させる;
(2)その温度を990℃で100時間保持する;
(3)100時間保持後、その温度を、0.87/時間の速度で990℃から850℃まで低下させる;
(4)その温度を、25℃/時間の速度で850℃から25℃まで低下させる。
(1)温度を、50℃/時間の速度で25℃から950℃まで上昇させる;
(2)その温度を950℃で400時間、窒素流下で保持する;
(3)400時間保持後、その温度を、3℃/時間の速度で950℃から850℃まで低下させる;
(4)その温度を、25℃/時間の速度で850℃から25℃まで低下させる。
Claims (16)
- 7〜10重量%のチタニアおよび90〜93重量%のシリカからなるシリカ・チタニアガラスであって、
前記ガラスが、340nm〜840nmの波長範囲における90%を超える内部透過性、600重量ppmを超える[OH]と共に、900℃未満の仮想温度を有し、
前記ガラスが2×1017未満の水素分子/cm3を有する、
シリカ・チタニアガラス。 - 前記ガラスが、6〜8重量%のチタニアおよび92〜94重量%のシリカからなることを特徴とする請求項1記載のシリカ・チタニアガラス。
- 前記ガラスが、20℃における1.5ppb/°K2未満の膨張率勾配を有することを特徴とする請求項1記載のシリカ・チタニアガラス。
- 前記ガラスが、20℃における1.5ppb/°K2未満の膨張率勾配を有することを特徴とする請求項2記載のシリカ・チタニアガラス。
- 前記ガラスが、20℃における1.2ppb/°K2未満の膨張率勾配を有することを特徴とする請求項1記載のシリカ・チタニアガラス。
- 前記ガラスが、20℃における1.2ppb/°K2未満の膨張率勾配を有することを特徴とする請求項2記載のシリカ・チタニアガラス。
- 前記シリカ・チタニアガラスが、3重量ppm未満のTi+3濃度レベル[Ti3+]を有することを特徴とする請求項1記載のシリカ・チタニアガラス。
- 前記シリカ・チタニアガラスが、3重量ppm未満のTi+3濃度レベル[Ti3+]を有することを特徴とする請求項2記載のシリカ・チタニアガラス。
- 前記ガラスが、330nm〜840nmの波長範囲において95%よりも大きい内部透過率を有することを特徴とする請求項1記載のシリカ・チタニアガラス。
- 前記ガラスが、330nm〜840nmの波長範囲において95%よりも大きい内部透過率を有することを特徴とする請求項2記載のシリカ・チタニアガラス。
- 前記ガラスが、310nm〜840nmの波長範囲において、84%よりも高い光学系部材の全般的な透過性を有することを特徴とする請求項1記載のシリカ・チタニアガラス。
- 前記ガラスが、310nm〜840nmの波長範囲において、88%よりも高い光学系部材の全般的な透過性を有することを特徴とする請求項1記載のシリカ・チタニアガラス。
- 前記ガラスが、340nm〜840nmの波長範囲において、86%よりも高い光学系部材の全般的な透過性を有することを特徴とする請求項2記載のシリカ・チタニアガラス。
- 前記ガラスが、340nm〜840nmの波長範囲において、88%よりも高い光学系部材の全般的な透過性を有することを特徴とする請求項2記載のシリカ・チタニアガラス。
- 前記ガラスが、600重量ppmより大きい[OH]と組み合わせて、890℃未満の仮想温度を有することを特徴とする請求項2記載のシリカ・チタニアガラス。
- 前記ガラスが、600重量ppmより大きい[OH]と組み合わせて、880℃未満の仮想温度を有することを特徴とする請求項2記載のシリカ・チタニアガラス。
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Application Number | Priority Date | Filing Date | Title |
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US30798410P | 2010-02-25 | 2010-02-25 | |
US61/307,984 | 2010-02-25 | ||
US13/028,472 | 2011-02-16 | ||
US13/028,472 US8541325B2 (en) | 2010-02-25 | 2011-02-16 | Low expansivity, high transmission titania doped silica glass |
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JP2012046407A true JP2012046407A (ja) | 2012-03-08 |
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JP2011039769A Pending JP2012046407A (ja) | 2010-02-25 | 2011-02-25 | 低膨張性かつ高透過性のチタニア・ドープ・シリカガラス |
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US (1) | US8541325B2 (ja) |
EP (1) | EP2428488B1 (ja) |
JP (1) | JP2012046407A (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016511211A (ja) * | 2013-02-11 | 2016-04-14 | ヘレウス・クアルツグラース・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツング・ウント・コンパニー・コマンディット・ゲゼルシャフトHeraeus Quarzglas GmbH & Co. KG | EUVリソグラフィに使用されるミラー基板用のTiO2−SiO2ガラスのブランク及びその製造方法 |
JP2016531082A (ja) * | 2013-09-13 | 2016-10-06 | コーニング インコーポレイテッド | 超低膨張ガラス |
JP2017197428A (ja) * | 2016-04-22 | 2017-11-02 | 旭硝子株式会社 | ガラス板、ディスプレイ用ガラス基板及び太陽電池用ガラス基板 |
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US8541325B2 (en) | 2013-09-24 |
EP2428488A1 (en) | 2012-03-14 |
EP2428488B1 (en) | 2014-06-18 |
US20110207592A1 (en) | 2011-08-25 |
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