DE10296723T5 - Verfahren zur Herstellung von Extremultraviolett-Lithographie-Substraten - Google Patents
Verfahren zur Herstellung von Extremultraviolett-Lithographie-Substraten Download PDFInfo
- Publication number
- DE10296723T5 DE10296723T5 DE10296723T DE10296723T DE10296723T5 DE 10296723 T5 DE10296723 T5 DE 10296723T5 DE 10296723 T DE10296723 T DE 10296723T DE 10296723 T DE10296723 T DE 10296723T DE 10296723 T5 DE10296723 T5 DE 10296723T5
- Authority
- DE
- Germany
- Prior art keywords
- silicon dioxide
- porous preform
- planar surface
- flat
- preform
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 238000000034 method Methods 0.000 title claims abstract description 52
- 238000001900 extreme ultraviolet lithography Methods 0.000 title claims abstract description 46
- 239000000758 substrate Substances 0.000 title claims abstract description 43
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 167
- 239000002243 precursor Substances 0.000 claims abstract description 67
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 66
- 239000011521 glass Substances 0.000 claims abstract description 65
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 65
- 239000002245 particle Substances 0.000 claims abstract description 31
- 238000000151 deposition Methods 0.000 claims abstract description 27
- 239000004071 soot Substances 0.000 claims description 57
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 36
- 239000000460 chlorine Substances 0.000 claims description 34
- 229910052801 chlorine Inorganic materials 0.000 claims description 34
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 32
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 23
- 239000000203 mixture Substances 0.000 claims description 22
- 239000004408 titanium dioxide Substances 0.000 claims description 18
- 239000011737 fluorine Substances 0.000 claims description 14
- 229910052731 fluorine Inorganic materials 0.000 claims description 14
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 11
- 238000007711 solidification Methods 0.000 claims description 9
- 230000008023 solidification Effects 0.000 claims description 9
- 239000005357 flat glass Substances 0.000 claims description 8
- 230000015572 biosynthetic process Effects 0.000 claims description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 5
- 238000001816 cooling Methods 0.000 claims description 3
- 210000004127 vitreous body Anatomy 0.000 claims description 2
- 150000004820 halides Chemical class 0.000 claims 10
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 4
- 238000007596 consolidation process Methods 0.000 claims 2
- 230000008021 deposition Effects 0.000 description 18
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 12
- 239000007789 gas Substances 0.000 description 11
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 10
- 238000001354 calcination Methods 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 8
- 238000005137 deposition process Methods 0.000 description 7
- 239000000446 fuel Substances 0.000 description 7
- 239000001307 helium Substances 0.000 description 7
- 229910052734 helium Inorganic materials 0.000 description 7
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 7
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 description 7
- 239000012159 carrier gas Substances 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 239000001301 oxygen Substances 0.000 description 6
- 229910052760 oxygen Inorganic materials 0.000 description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 239000011148 porous material Substances 0.000 description 5
- 239000010936 titanium Substances 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 239000011261 inert gas Substances 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 230000010355 oscillation Effects 0.000 description 4
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 238000001459 lithography Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- -1 titanium alkoxide Chemical class 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 2
- 229910003902 SiCl 4 Inorganic materials 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 239000003570 air Substances 0.000 description 2
- 239000012080 ambient air Substances 0.000 description 2
- 150000001804 chlorine Chemical class 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 239000003517 fume Substances 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- MFRCZYUUKMFJQJ-UHFFFAOYSA-N 1,4-dioxane-2,5-dione;1,3-dioxan-2-one Chemical compound O=C1OCCCO1.O=C1COC(=O)CO1 MFRCZYUUKMFJQJ-UHFFFAOYSA-N 0.000 description 1
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 239000012024 dehydrating agents Substances 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910001510 metal chloride Inorganic materials 0.000 description 1
- 238000001393 microlithography Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000003345 natural gas Substances 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000011819 refractory material Substances 0.000 description 1
- 239000011856 silicon-based particle Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1407—Deposition reactors therefor
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1484—Means for supporting, rotating or translating the article being formed
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/02—Pure silica glass, e.g. pure fused quartz
- C03B2201/03—Impurity concentration specified
- C03B2201/04—Hydroxyl ion (OH)
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/07—Impurity concentration specified
- C03B2201/075—Hydroxyl ion (OH)
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
- C03B2201/42—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn doped with titanium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
- C03B2207/32—Non-halide
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Organic Chemistry (AREA)
- Thermal Sciences (AREA)
- Physics & Mathematics (AREA)
- Glass Compositions (AREA)
- Glass Melting And Manufacturing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/844,081 | 2001-04-27 | ||
| US09/844,081 US6606883B2 (en) | 2001-04-27 | 2001-04-27 | Method for producing fused silica and doped fused silica glass |
| PCT/US2002/009189 WO2002088035A1 (en) | 2001-04-27 | 2002-03-25 | Method for producing extreme ultraviolet lithography substrates |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE10296723T5 true DE10296723T5 (de) | 2004-04-29 |
Family
ID=25291758
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE10296723T Ceased DE10296723T5 (de) | 2001-04-27 | 2002-03-25 | Verfahren zur Herstellung von Extremultraviolett-Lithographie-Substraten |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US6606883B2 (enExample) |
| JP (2) | JP2004532176A (enExample) |
| DE (1) | DE10296723T5 (enExample) |
| TW (1) | TWI276612B (enExample) |
| WO (1) | WO2002088035A1 (enExample) |
Families Citing this family (44)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8047023B2 (en) * | 2001-04-27 | 2011-11-01 | Corning Incorporated | Method for producing titania-doped fused silica glass |
| US20040194511A1 (en) * | 2002-02-01 | 2004-10-07 | Chih-Hsing Cheng | Sol-gel-derived halogen-doped glass |
| US20030147606A1 (en) * | 2002-02-01 | 2003-08-07 | Shiho Wang | Sol-gel-based optical preforms and methods of manufacture |
| US7053017B2 (en) * | 2002-03-05 | 2006-05-30 | Corning Incorporated | Reduced striae extreme ultraviolet elements |
| US20030226377A1 (en) * | 2002-03-05 | 2003-12-11 | Barrett W. Tim | Method of making silica-titania extreme ultraviolet elements |
| JP2011168485A (ja) * | 2003-04-03 | 2011-09-01 | Asahi Glass Co Ltd | ＴｉＯ２を含有するシリカガラスおよびその製造法 |
| JP4792705B2 (ja) * | 2003-04-03 | 2011-10-12 | 旭硝子株式会社 | ＴｉＯ２を含有するシリカガラスおよびその製造法 |
| JP5402975B2 (ja) * | 2003-04-03 | 2014-01-29 | 旭硝子株式会社 | ＴｉＯ２を含有するシリカガラスおよびその製造法 |
| DE10359102A1 (de) * | 2003-12-17 | 2005-07-21 | Carl Zeiss Smt Ag | Optische Komponente umfassend ein Material mit einer vorbestimmten Homogenität der thermischen Längsausdehnung |
| US20050144986A1 (en) * | 2003-12-30 | 2005-07-07 | Bookbinder Dana C. | Method of making an optical fiber preform |
| US7534733B2 (en) | 2004-02-23 | 2009-05-19 | Corning Incorporated | Synthetic silica glass optical material having high resistance to laser induced damage |
| EP1752991B1 (en) * | 2004-04-21 | 2012-11-21 | Nuclear Fuel Industries, Ltd. | Apparatus for manufacturing coated fuel particle for high temperature gas-cooled reactor |
| JP4957249B2 (ja) * | 2004-07-01 | 2012-06-20 | 旭硝子株式会社 | ＴｉＯ２を含有するシリカガラスおよびその製造方法 |
| JP4513486B2 (ja) * | 2004-10-01 | 2010-07-28 | 旭硝子株式会社 | ＴｉＯ２を含有するシリカガラスの製造方法 |
| US8088440B2 (en) * | 2004-11-24 | 2012-01-03 | Guardian Industries Corp. | Hydrophobic coating including underlayer(s) deposited via flame pyrolysis |
| US7506521B2 (en) * | 2004-12-29 | 2009-03-24 | Corning Incorporated | High transmission synthetic silica glass and method of making same |
| US20060179879A1 (en) * | 2004-12-29 | 2006-08-17 | Ellison Adam J G | Adjusting expansivity in doped silica glasses |
| US20060162382A1 (en) * | 2004-12-30 | 2006-07-27 | Hrdina Kenneth E | Method and apparatus for producing oxide particles via flame |
| JP5066784B2 (ja) * | 2005-02-04 | 2012-11-07 | 旭硝子株式会社 | 合成石英ガラスの製造方法 |
| US7635658B2 (en) * | 2005-11-07 | 2009-12-22 | Corning Inc | Deuteroxyl-doped silica glass, optical member and lithographic system comprising same and method of making same |
| US8137469B2 (en) * | 2005-12-14 | 2012-03-20 | Corning Incorporated | Method and apparatus for making fused silica |
| US20080125014A1 (en) * | 2006-11-29 | 2008-05-29 | William Rogers Rosch | Sub-aperture deterministric finishing of high aspect ratio glass products |
| US20080268201A1 (en) * | 2007-04-27 | 2008-10-30 | Richard Michael Fiacco | Low OH glass for infrared applications |
| TW201000691A (en) * | 2008-02-29 | 2010-01-01 | Corning Inc | Methods of making an unsupported article of pure or doped semiconducting material |
| US8062733B2 (en) * | 2009-05-15 | 2011-11-22 | Corning Incorporated | Roll-to-roll glass material attributes and fingerprint |
| US8181485B2 (en) | 2009-06-19 | 2012-05-22 | Corning Incorporated | Roll-to-roll glass soot sheet sintering method and apparatus |
| US8359884B2 (en) | 2009-07-17 | 2013-01-29 | Corning Incorporated | Roll-to-roll glass: touch-free process and multilayer approach |
| US8328417B2 (en) * | 2009-08-20 | 2012-12-11 | Corning Incorporated | Photoelastic method for absolute determination of zero CTE crossover in low expansion silica-titania glass samples |
| GB2478307A (en) * | 2010-03-02 | 2011-09-07 | Heraeus Quartz Uk Ltd | Manufacture of silica glass |
| US8438876B2 (en) * | 2010-03-29 | 2013-05-14 | Corning Incorporated | Method and apparatus for removing glass soot sheet from substrate |
| US20120026473A1 (en) * | 2010-07-29 | 2012-02-02 | Michael Lucien Genier | Highly reflective, hardened silica titania article and method of making |
| US9321669B2 (en) | 2011-08-23 | 2016-04-26 | Corning Incorporated | Thin glass sheet with tunable coefficient of thermal expansion |
| DE102011121153B3 (de) * | 2011-12-15 | 2013-03-21 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung von synthetischem Quarzglas sowie Quarzglas für den Einsatz als Mantelmaterial einer optischen Faser |
| US9199870B2 (en) | 2012-05-22 | 2015-12-01 | Corning Incorporated | Electrostatic method and apparatus to form low-particulate defect thin glass sheets |
| US9452946B2 (en) | 2013-10-18 | 2016-09-27 | Corning Incorporated | Locally-sintered porous soot parts and methods of forming |
| DE102013112396B3 (de) * | 2013-11-12 | 2014-11-13 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines Rohlings aus Titan- und Fluor-dotiertem, hochkieselsäurehaltigem Glas |
| US9382151B2 (en) * | 2014-01-31 | 2016-07-05 | Corning Incorporated | Low expansion silica-titania articles with a Tzc gradient by compositional variation |
| EP3209615A4 (en) | 2014-10-20 | 2018-07-04 | Navus Automation, Inc. | Fused silica furnace system&method for continuous production of fused silica |
| US10570048B2 (en) * | 2015-02-13 | 2020-02-25 | Corning Incorporated | Silica-containing sheet and related system and methods |
| US10185084B2 (en) | 2016-02-23 | 2019-01-22 | Corning Incorporated | Layered glass structures |
| JP2018531863A (ja) * | 2015-08-21 | 2018-11-01 | コーニング インコーポレイテッド | 層状ガラス構造 |
| US9422187B1 (en) | 2015-08-21 | 2016-08-23 | Corning Incorporated | Laser sintering system and method for forming high purity, low roughness silica glass |
| DE102016012003A1 (de) | 2016-10-06 | 2018-04-12 | Karlsruher Institut für Technologie | Zusammensetzung und Verfahren zur Herstellung eines Formkörpers aus hochreinem, transparentem Quarzglas mittels additiver Fertigung |
| WO2020028169A1 (en) * | 2018-08-02 | 2020-02-06 | Corning Incorporated | Methods of capturing soot |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6037063B2 (ja) * | 1982-11-19 | 1985-08-23 | 古河電気工業株式会社 | 無水プリフオ−ムロツドの製造方法 |
| JPH03131544A (ja) | 1989-06-29 | 1991-06-05 | Sumitomo Electric Ind Ltd | 光ファイバ用ガラス母材の加熱炉および製法 |
| US5152819A (en) * | 1990-08-16 | 1992-10-06 | Corning Incorporated | Method of making fused silica |
| US5043002A (en) * | 1990-08-16 | 1991-08-27 | Corning Incorporated | Method of making fused silica by decomposing siloxanes |
| KR100298167B1 (ko) | 1994-07-07 | 2001-10-24 | 오노 시게오 | 진공자외선파장대광선용실리카유리의제조방법,및그에의해제조된실리카유리및광학부재 |
| US5599371A (en) * | 1994-12-30 | 1997-02-04 | Corning Incorporated | Method of using precision burners for oxidizing halide-free, silicon-containing compounds |
| WO1997010184A1 (en) * | 1995-09-12 | 1997-03-20 | Corning Incorporated | Boule oscillation patterns for producing fused silica glass |
| CA2274478A1 (en) | 1996-12-16 | 1998-06-25 | Corning Incorporated | Organometallics for lightwave optical circuit applications |
| JP3893816B2 (ja) | 1998-10-28 | 2007-03-14 | 旭硝子株式会社 | 合成石英ガラスおよびその製造方法 |
| US6265115B1 (en) | 1999-03-15 | 2001-07-24 | Corning Incorporated | Projection lithography photomask blanks, preforms and methods of making |
| USRE41220E1 (en) | 1999-07-22 | 2010-04-13 | Corning Incorporated | Extreme ultraviolet soft x-ray projection lithographic method system and lithographic elements |
| US6328807B1 (en) * | 1999-12-14 | 2001-12-11 | Corning Incorporated | Chuck heater for improved planar deposition process |
| WO2002014230A1 (en) | 2000-08-15 | 2002-02-21 | Corning Incorporated | Flame hydrolysis deposition process for making integrated optical components |
-
2001
- 2001-04-27 US US09/844,081 patent/US6606883B2/en not_active Expired - Fee Related
-
2002
- 2002-03-25 DE DE10296723T patent/DE10296723T5/de not_active Ceased
- 2002-03-25 JP JP2002585342A patent/JP2004532176A/ja active Pending
- 2002-03-25 WO PCT/US2002/009189 patent/WO2002088035A1/en not_active Ceased
- 2002-04-27 TW TW091109111A patent/TWI276612B/zh not_active IP Right Cessation
-
2009
- 2009-01-22 JP JP2009011710A patent/JP2009091246A/ja not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| JP2009091246A (ja) | 2009-04-30 |
| TWI276612B (en) | 2007-03-21 |
| WO2002088035A1 (en) | 2002-11-07 |
| US20020157420A1 (en) | 2002-10-31 |
| JP2004532176A (ja) | 2004-10-21 |
| US6606883B2 (en) | 2003-08-19 |
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